ATE552970T1 - Lichtempfindliche zusammensetzung und damit hergestellte flachdruckplatten-vorstufe - Google Patents
Lichtempfindliche zusammensetzung und damit hergestellte flachdruckplatten-vorstufeInfo
- Publication number
- ATE552970T1 ATE552970T1 AT04003843T AT04003843T ATE552970T1 AT E552970 T1 ATE552970 T1 AT E552970T1 AT 04003843 T AT04003843 T AT 04003843T AT 04003843 T AT04003843 T AT 04003843T AT E552970 T1 ATE552970 T1 AT E552970T1
- Authority
- AT
- Austria
- Prior art keywords
- light sensitive
- sensitive composition
- produced therefrom
- plant plate
- primer produced
- Prior art date
Links
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 abstract 1
- 239000006096 absorbing agent Substances 0.000 abstract 1
- 239000011230 binding agent Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
- 239000002243 precursor Substances 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/26—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
- B41M5/36—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
- B41M5/368—Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties involving the creation of a soluble/insoluble or hydrophilic/hydrophobic permeability pattern; Peel development
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/12—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by non-macromolecular organic compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/266—Polyurethanes; Polyureas
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003044091A JP2004252285A (ja) | 2003-02-21 | 2003-02-21 | 感光性組成物及びそれを用いた平版印刷版原版 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE552970T1 true ATE552970T1 (de) | 2012-04-15 |
Family
ID=32732983
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT04003843T ATE552970T1 (de) | 2003-02-21 | 2004-02-20 | Lichtempfindliche zusammensetzung und damit hergestellte flachdruckplatten-vorstufe |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20040170922A1 (de) |
| EP (1) | EP1449650B1 (de) |
| JP (1) | JP2004252285A (de) |
| AT (1) | ATE552970T1 (de) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004126050A (ja) | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4137577B2 (ja) | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
| EP1857276A3 (de) | 2002-09-30 | 2007-12-05 | FUJIFILM Corporation | Flachdruckplattenvorläufer |
| US8110337B2 (en) * | 2002-12-18 | 2012-02-07 | Fujifilm Corporation | Polymerizable composition and lithographic printing plate precursor |
| JP4150261B2 (ja) | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
| JP2004252201A (ja) | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4048134B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
| JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
| JP2005099284A (ja) * | 2003-09-24 | 2005-04-14 | Fuji Photo Film Co Ltd | 感光性組成物及び平版印刷版原版 |
| US6902866B1 (en) * | 2003-11-24 | 2005-06-07 | Gary Ganghui Teng | Thermosensitive lithographic printing plate comprising specific acrylate monomers |
| JP4340530B2 (ja) * | 2003-12-26 | 2009-10-07 | 富士フイルム株式会社 | 画像記録材料 |
| US7279255B2 (en) | 2006-02-07 | 2007-10-09 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| JP5283339B2 (ja) * | 2006-03-09 | 2013-09-04 | 富士フイルム株式会社 | 画像形成材料、画像形成方法、平版印刷版原版及び平版印刷方法 |
| US7524614B2 (en) | 2006-05-26 | 2009-04-28 | Eastman Kodak Company | Negative-working radiation-sensitive compositions and imageable materials |
| US7862984B2 (en) | 2007-03-28 | 2011-01-04 | Eastman Kodak Company | Polyonium borates and radiation-sensitive composition and imageable elements containing same |
| US7781143B2 (en) | 2007-05-31 | 2010-08-24 | Eastman Kodak Company | Negative-working imageable elements and methods of use |
| EP2098367A1 (de) | 2008-03-05 | 2009-09-09 | Eastman Kodak Company | Sensibilisator/Initiator-Kombination für negativ arbeitende wärmeempfindliche Zusammensetzungen für Lithografieplatten |
| US8084182B2 (en) | 2008-04-29 | 2011-12-27 | Eastman Kodak Company | On-press developable elements and methods of use |
| US20100151385A1 (en) | 2008-12-17 | 2010-06-17 | Ray Kevin B | Stack of negative-working imageable elements |
| US20100215919A1 (en) | 2009-02-20 | 2010-08-26 | Ting Tao | On-press developable imageable elements |
| US20100227269A1 (en) | 2009-03-04 | 2010-09-09 | Simpson Christopher D | Imageable elements with colorants |
| US8900798B2 (en) | 2010-10-18 | 2014-12-02 | Eastman Kodak Company | On-press developable lithographic printing plate precursors |
| US20120090486A1 (en) | 2010-10-18 | 2012-04-19 | Celin Savariar-Hauck | Lithographic printing plate precursors and methods of use |
| US20120141942A1 (en) | 2010-12-03 | 2012-06-07 | Domenico Balbinot | Method of preparing lithographic printing plates |
| US20120141941A1 (en) | 2010-12-03 | 2012-06-07 | Mathias Jarek | Developing lithographic printing plate precursors in simple manner |
| US20120141935A1 (en) | 2010-12-03 | 2012-06-07 | Bernd Strehmel | Developer and its use to prepare lithographic printing plates |
| US20120199028A1 (en) | 2011-02-08 | 2012-08-09 | Mathias Jarek | Preparing lithographic printing plates |
| US8632940B2 (en) | 2011-04-19 | 2014-01-21 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8722308B2 (en) | 2011-08-31 | 2014-05-13 | Eastman Kodak Company | Aluminum substrates and lithographic printing plate precursors |
| US8632941B2 (en) | 2011-09-22 | 2014-01-21 | Eastman Kodak Company | Negative-working lithographic printing plate precursors with IR dyes |
| US9029063B2 (en) | 2011-09-22 | 2015-05-12 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8679726B2 (en) | 2012-05-29 | 2014-03-25 | Eastman Kodak Company | Negative-working lithographic printing plate precursors |
| US8889341B2 (en) | 2012-08-22 | 2014-11-18 | Eastman Kodak Company | Negative-working lithographic printing plate precursors and use |
| EP2735903B1 (de) | 2012-11-22 | 2019-02-27 | Eastman Kodak Company | Negativ arbeitende Lithografiedruckplattenvorläufer mit hochverzweigtem Bindemittelmaterial |
| US9063423B2 (en) | 2013-02-28 | 2015-06-23 | Eastman Kodak Company | Lithographic printing plate precursors and use |
| EP2778782B1 (de) | 2013-03-13 | 2015-12-30 | Kodak Graphic Communications GmbH | Negativ arbeitende strahlungsempfindliche Elemente |
| CN103435515B (zh) * | 2013-09-02 | 2015-11-18 | 江苏开磷瑞阳化工股份有限公司 | 一种低粘度高反应活性低体积收缩的改性季戊四醇丙烯酸酯及其制备方法 |
| US9201302B2 (en) | 2013-10-03 | 2015-12-01 | Eastman Kodak Company | Negative-working lithographic printing plate precursor |
| CN107001304B (zh) | 2014-09-26 | 2021-04-30 | 科慕埃弗西有限公司 | 用于表面效果组合物的非氟化单体和聚合物 |
| KR20170063810A (ko) | 2014-09-26 | 2017-06-08 | 더 케무어스 컴퍼니 에프씨, 엘엘씨 | 비-플루오르화 또는 부분 플루오르화 중합체로부터 유도되는 폴리우레탄 |
| US20190365610A1 (en) | 2017-03-31 | 2019-12-05 | Mitsui Chemicals, Inc. | Dental polyfunctional monomers and dental hydroxyl group-containing monomers |
| CN113412253B (zh) * | 2018-12-13 | 2024-08-27 | 汉高股份有限及两合公司 | (甲基)丙烯酸酯官能化的蜡和由其制成的可固化组合物 |
| JP7321261B2 (ja) * | 2019-06-28 | 2023-08-04 | 富士フイルム株式会社 | 平版印刷版原版、平版印刷版の作製方法、及び、平版印刷方法 |
| US11633948B2 (en) | 2020-01-22 | 2023-04-25 | Eastman Kodak Company | Method for making lithographic printing plates |
| KR102649772B1 (ko) * | 2022-08-29 | 2024-03-22 | 울산과학기술원 | 수소화 자일릴렌 디이소시아네이트 기반 가교제를 포함하는 감압성 점착제 및 이를 포함하는 감압성 점참제 필름 |
Family Cites Families (77)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3839171A (en) * | 1968-02-15 | 1974-10-01 | Asahi Chemical Ind | Unsaturated polyesters and laminates thereof |
| DE2027466A1 (de) * | 1970-06-04 | 1971-12-09 | Kalle Ag | Polymere N-Carbonylsulfonamide und Verfahren zu ihrer Herstellung |
| DE2064080C3 (de) | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
| DE2361041C3 (de) * | 1973-12-07 | 1980-08-14 | Hoechst Ag, 6000 Frankfurt | Photopolymerisierbares Gemisch |
| DE2363806B2 (de) * | 1973-12-21 | 1979-05-17 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches Gemisch |
| ZA757984B (en) | 1974-10-04 | 1976-12-29 | Dynachem Corp | Polymers for aqueous processed photoresists |
| JPS5492723A (en) | 1977-12-30 | 1979-07-23 | Somar Mfg | Photosensitive material and use |
| US4239849A (en) * | 1978-06-19 | 1980-12-16 | Dynachem Corporation | Polymers for aqueous processed photoresists |
| DE3022473A1 (de) * | 1980-06-14 | 1981-12-24 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung |
| DE3136818C2 (de) * | 1980-09-19 | 1990-08-02 | Hitachi Chemical Co., Ltd., Tokio/Tokyo | Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske |
| JPS5944615A (ja) | 1982-09-07 | 1984-03-13 | Furuno Electric Co Ltd | ジヤイロ装置 |
| JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| JPS5971048A (ja) * | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
| US4476215A (en) * | 1983-11-25 | 1984-10-09 | Minnesota Mining And Manufacturing Company | Negative-acting photoresist composition |
| US5080999A (en) * | 1985-06-10 | 1992-01-14 | Fuji Photo Film Co., Ltd. | Light-sensitive diazo resin composition containing a higher fatty acid or higher fatty acid amide |
| US4772538A (en) * | 1985-08-02 | 1988-09-20 | American Hoechst Corporation | Water developable lithographic composition |
| US4952478A (en) * | 1986-12-02 | 1990-08-28 | Canon Kabushiki Kaisha | Transfer recording medium comprising a layer changing its transferability when provided with light and heat |
| US4950581A (en) * | 1987-07-06 | 1990-08-21 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
| JP2571115B2 (ja) * | 1989-01-17 | 1997-01-16 | 富士写真フイルム株式会社 | 感光性組成物の増感方法及び増感された感光性組成物 |
| JP2712564B2 (ja) | 1989-06-01 | 1998-02-16 | 大日本インキ化学工業株式会社 | 感光性組成物 |
| US5246816A (en) * | 1990-09-03 | 1993-09-21 | Nippon Oil Co., Ltd. | Cationic electrodeposition negative type resist composition |
| US5340699A (en) * | 1993-05-19 | 1994-08-23 | Eastman Kodak Company | Radiation-sensitive composition containing a resole resin and a novolac resin and use thereof in lithographic printing plates |
| US5641608A (en) * | 1995-10-23 | 1997-06-24 | Macdermid, Incorporated | Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
| US6030750A (en) * | 1995-10-24 | 2000-02-29 | Agfa-Gevaert. N.V. | Method for making a lithographic printing plate involving on press development |
| US5879861A (en) * | 1996-04-23 | 1999-03-09 | Agfa-Gevaert, N.V. | Method for making a lithographic printing plate wherein an imaging element is used that comprises a thermosensitive mask |
| JP3645362B2 (ja) * | 1996-07-22 | 2005-05-11 | 富士写真フイルム株式会社 | ネガ型画像記録材料 |
| US5705322A (en) * | 1996-09-30 | 1998-01-06 | Eastman Kodak Company | Method of providing an image using a negative-working infrared photosensitive element |
| US5919601A (en) * | 1996-11-12 | 1999-07-06 | Kodak Polychrome Graphics, Llc | Radiation-sensitive compositions and printing plates |
| JPH10195119A (ja) | 1997-01-08 | 1998-07-28 | Mitsubishi Chem Corp | 光重合性組成物 |
| JP3810510B2 (ja) * | 1997-03-26 | 2006-08-16 | 富士写真フイルム株式会社 | ネガ型画像記録材料及び平版印刷版原版 |
| DE19739299A1 (de) * | 1997-09-08 | 1999-03-11 | Agfa Gevaert Ag | Weißlicht-unempfindliches, thermisch bebilderbares Material und Verfahren zur Herstellung von Druckformen für den Offsetdruck |
| US5952154A (en) * | 1998-05-29 | 1999-09-14 | Morton International, Inc. | Photoimageable composition having improved flexibility |
| CA2364441C (en) * | 1999-03-03 | 2008-01-08 | Lilly Industries, Inc. | Abrasion resistant coatings |
| DE60026205T2 (de) * | 1999-07-27 | 2006-11-16 | Fuji Photo Film Co., Ltd., Minami-Ashigara | Bildaufzeichnungsmaterial |
| US6566035B1 (en) * | 1999-10-29 | 2003-05-20 | Fuji Photo Film Co., Ltd. | Negative-type image recording material and precursor for negative-type lithographic printing plate |
| JP4050854B2 (ja) * | 1999-12-21 | 2008-02-20 | 富士フイルム株式会社 | 画像形成方法 |
| US6309792B1 (en) * | 2000-02-18 | 2001-10-30 | Kodak Polychrome Graphics Llc | IR-sensitive composition and use thereof for the preparation of printing plate precursors |
| US6692896B2 (en) * | 2000-03-01 | 2004-02-17 | Fuji Photo Film Co., Ltd. | Heat mode-compatible planographic printing plate |
| JP2002006482A (ja) | 2000-06-20 | 2002-01-09 | Fuji Photo Film Co Ltd | 感熱性組成物及びそれを用いた平版印刷版原版 |
| JP2002023350A (ja) * | 2000-07-07 | 2002-01-23 | Fuji Photo Film Co Ltd | ネガ型平版印刷版原版 |
| JP4105371B2 (ja) * | 2000-07-28 | 2008-06-25 | 富士フイルム株式会社 | ネガ型感光性平版印刷版 |
| EP1563991B1 (de) * | 2000-08-21 | 2007-05-23 | FUJIFILM Corporation | Bildaufzeichnungsmaterial |
| JP2002072474A (ja) * | 2000-08-29 | 2002-03-12 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4373624B2 (ja) | 2000-09-04 | 2009-11-25 | 富士フイルム株式会社 | 感熱性組成物、それを用いた平版印刷版原版及びスルホニウム塩化合物 |
| US6482571B1 (en) * | 2000-09-06 | 2002-11-19 | Gary Ganghui Teng | On-press development of thermosensitive lithographic plates |
| US6576401B2 (en) * | 2001-09-14 | 2003-06-10 | Gary Ganghui Teng | On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator |
| JP2002082429A (ja) * | 2000-09-08 | 2002-03-22 | Fuji Photo Film Co Ltd | ネガ型画像記録材料 |
| US6777155B2 (en) * | 2000-10-03 | 2004-08-17 | Fuji Photo Film Co., Ltd. | Photosensitive lithographic printing plate |
| US6884568B2 (en) * | 2000-10-17 | 2005-04-26 | Kodak Polychrome Graphics, Llc | Stabilized infrared-sensitive polymerizable systems |
| JP4248137B2 (ja) * | 2000-11-22 | 2009-04-02 | 富士フイルム株式会社 | ネガ型感光性平版印刷版 |
| JP4512281B2 (ja) * | 2001-02-22 | 2010-07-28 | 富士フイルム株式会社 | ネガ型平版印刷版原版 |
| JP2002251008A (ja) * | 2001-02-23 | 2002-09-06 | Fuji Photo Film Co Ltd | 画像記録材料 |
| JP4098483B2 (ja) * | 2001-03-12 | 2008-06-11 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4266077B2 (ja) * | 2001-03-26 | 2009-05-20 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷方法 |
| JP2002351094A (ja) * | 2001-05-22 | 2002-12-04 | Fuji Photo Film Co Ltd | 現像液組成物及び画像形成方法 |
| JP2002350207A (ja) | 2001-05-29 | 2002-12-04 | Kazumasa Onishi | コリオリ流量計 |
| US6702437B2 (en) * | 2001-08-23 | 2004-03-09 | Fuji Photo Film Co., Ltd. | Image recording material |
| JP2003084432A (ja) * | 2001-09-10 | 2003-03-19 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
| JP2003107720A (ja) * | 2001-09-28 | 2003-04-09 | Fuji Photo Film Co Ltd | 平版印刷版用原版 |
| EP1332870A3 (de) * | 2002-02-05 | 2005-01-12 | Fuji Photo Film Co., Ltd. | Infrarot-empfindliche Zusammensetzung |
| JP2003302770A (ja) * | 2002-02-08 | 2003-10-24 | Fuji Photo Film Co Ltd | 画像形成方法 |
| EP1369231A3 (de) * | 2002-06-05 | 2009-07-08 | FUJIFILM Corporation | Infrarotempfindliche Zusammensetzung und Bildaufzeichnungsmaterial für IR-Strahlung |
| US7569328B2 (en) * | 2002-08-16 | 2009-08-04 | Fujifilm Corporation | Resin composition and thermo/photosensitive composition |
| US7090957B2 (en) * | 2002-09-11 | 2006-08-15 | Fuji Photo Film Co., Ltd. | Polymerizable composition and planographic printing plate precursor using the same |
| JP2004115673A (ja) * | 2002-09-26 | 2004-04-15 | Fuji Photo Film Co Ltd | 重合性組成物 |
| JP2004126050A (ja) * | 2002-09-30 | 2004-04-22 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| EP1857276A3 (de) * | 2002-09-30 | 2007-12-05 | FUJIFILM Corporation | Flachdruckplattenvorläufer |
| JP4137577B2 (ja) * | 2002-09-30 | 2008-08-20 | 富士フイルム株式会社 | 感光性組成物 |
| US8110337B2 (en) * | 2002-12-18 | 2012-02-07 | Fujifilm Corporation | Polymerizable composition and lithographic printing plate precursor |
| JP4150261B2 (ja) * | 2003-01-14 | 2008-09-17 | 富士フイルム株式会社 | 平版印刷版原版の製版方法 |
| JP2004240093A (ja) * | 2003-02-05 | 2004-08-26 | Konica Minolta Holdings Inc | 感光性平版印刷版の画像形成方法 |
| JP2004252201A (ja) * | 2003-02-20 | 2004-09-09 | Fuji Photo Film Co Ltd | 平版印刷版原版 |
| JP4048134B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4048133B2 (ja) * | 2003-02-21 | 2008-02-13 | 富士フイルム株式会社 | 感光性組成物及びそれを用いた平版印刷版原版 |
| JP4139724B2 (ja) * | 2003-04-10 | 2008-08-27 | 富士フイルム株式会社 | 平版印刷版原版 |
| JP4299639B2 (ja) * | 2003-07-29 | 2009-07-22 | 富士フイルム株式会社 | 重合性組成物及びそれを用いた画像記録材料 |
| JP2005059446A (ja) * | 2003-08-15 | 2005-03-10 | Fuji Photo Film Co Ltd | 平版印刷版原版及び平版印刷方法 |
-
2003
- 2003-02-21 JP JP2003044091A patent/JP2004252285A/ja active Pending
-
2004
- 2004-02-20 AT AT04003843T patent/ATE552970T1/de active
- 2004-02-20 US US10/781,922 patent/US20040170922A1/en not_active Abandoned
- 2004-02-20 EP EP04003843A patent/EP1449650B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US20040170922A1 (en) | 2004-09-02 |
| JP2004252285A (ja) | 2004-09-09 |
| EP1449650A3 (de) | 2005-07-27 |
| EP1449650A2 (de) | 2004-08-25 |
| EP1449650B1 (de) | 2012-04-11 |
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