ATE447728T1 - Lichtempfindliche verbindung und lichtempfindliches harz - Google Patents

Lichtempfindliche verbindung und lichtempfindliches harz

Info

Publication number
ATE447728T1
ATE447728T1 AT01103264T AT01103264T ATE447728T1 AT E447728 T1 ATE447728 T1 AT E447728T1 AT 01103264 T AT01103264 T AT 01103264T AT 01103264 T AT01103264 T AT 01103264T AT E447728 T1 ATE447728 T1 AT E447728T1
Authority
AT
Austria
Prior art keywords
chem
photosensitive
compound
photosensitive resin
group
Prior art date
Application number
AT01103264T
Other languages
English (en)
Inventor
Kentaro Tada
Toru Shibuya
Original Assignee
Toyo Gosei Kogyo Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Gosei Kogyo Kk filed Critical Toyo Gosei Kogyo Kk
Application granted granted Critical
Publication of ATE447728T1 publication Critical patent/ATE447728T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/008—Azides
    • G03F7/012—Macromolecular azides; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Thiazole And Isothizaole Compounds (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Nitrogen Condensed Heterocyclic Rings (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
AT01103264T 2000-02-14 2001-02-12 Lichtempfindliche verbindung und lichtempfindliches harz ATE447728T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000035734A JP4390237B2 (ja) 2000-02-14 2000-02-14 感光性化合物及び感光性樹脂

Publications (1)

Publication Number Publication Date
ATE447728T1 true ATE447728T1 (de) 2009-11-15

Family

ID=18559892

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01103264T ATE447728T1 (de) 2000-02-14 2001-02-12 Lichtempfindliche verbindung und lichtempfindliches harz

Country Status (8)

Country Link
US (1) US6610791B2 (de)
EP (1) EP1128214B1 (de)
JP (1) JP4390237B2 (de)
KR (1) KR100618047B1 (de)
CN (1) CN1208685C (de)
AT (1) ATE447728T1 (de)
DE (1) DE60140333D1 (de)
TW (1) TW594394B (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4036440B2 (ja) 2002-03-29 2008-01-23 東洋合成工業株式会社 新規な感光性化合物及び感光性樹脂並びに感光性組成物
JP4385812B2 (ja) * 2004-03-26 2009-12-16 株式会社日立製作所 薄膜トランジスタおよびその製造方法
DE102004050478A1 (de) * 2004-10-15 2006-04-27 Chemische Fabrik Budenheim Kg Formmasse für die Herstellung schwer entflammbarer Gegenstände, Pigment hierfür und dessen Verwendung
WO2006106629A1 (ja) * 2005-03-31 2006-10-12 Toyo Gosei Co., Ltd. 感光性樹脂及び感光性組成物並びに光架橋体
KR100728490B1 (ko) * 2005-09-23 2007-06-14 (주)이그잭스 감광성 물질 및 이를 유효 성분으로 포함하는 컬러브라운관의 블랙 매트릭스 형성용 감광성 수지 조성물
JP2011520142A (ja) * 2008-05-01 2011-07-14 アドバンスド テクノロジー マテリアルズ，インコーポレイテッド 高密度注入レジストの除去のための低ｐＨ混合物

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53325B2 (de) 1974-04-26 1978-01-07
JPS565761A (en) 1979-06-29 1981-01-21 Asahi Chemical Ind Novel laminate
JPS565762A (en) 1979-06-28 1981-01-21 Uchida Yoko:Kk Automatic adjusting circuit for background density in stencil paper making machine
JPS5611906A (en) 1979-07-11 1981-02-05 Agency Of Ind Science & Technol Photo-insolubilizable polyvinyl alcohol derivative and its preparation
JPH02204750A (ja) 1989-02-03 1990-08-14 Hitachi Ltd 感光性組成物、及びそれを用いたパターン形成方法
JPH0426849A (ja) 1990-05-23 1992-01-30 Hitachi Ltd 水溶性感光性化合物、その合成方法、感光性組成物及びパターン形成方法
JP2936438B2 (ja) 1990-09-28 1999-08-23 東京応化工業株式会社 水溶性感光性樹脂組成物
JPH0527404A (ja) 1991-07-19 1993-02-05 Fuji Photo Film Co Ltd プリント処理装置
JPH05113661A (ja) 1991-10-23 1993-05-07 Hitachi Ltd 感光性組成物及びそれを用いたパターン形成方法並びにけい光面形成方法
JPH06239930A (ja) 1993-02-18 1994-08-30 Hitachi Chem Co Ltd 水溶性感光性樹脂水溶液の製造方法
JP3517074B2 (ja) 1996-05-15 2004-04-05 未来工業株式会社 円穿孔用センターの表示機能を備えたボックス探知器、及び該センターの表示具
EP0878739B1 (de) * 1997-05-13 2002-11-27 Toyo Gosei Kogyo Co., Ltd. Photoempfindliche Verbindungen, photoempfindliche Harzzusammensetzungen, und Verfahren zur Herstellung von Mustern unter Verwendung dieser Verbindungen oder dieser Zusammensetzungen

Also Published As

Publication number Publication date
US20010047068A1 (en) 2001-11-29
US6610791B2 (en) 2003-08-26
CN1309329A (zh) 2001-08-22
JP2001226360A (ja) 2001-08-21
EP1128214B1 (de) 2009-11-04
KR100618047B1 (ko) 2006-08-29
EP1128214A1 (de) 2001-08-29
DE60140333D1 (de) 2009-12-17
CN1208685C (zh) 2005-06-29
KR20010088330A (ko) 2001-09-26
JP4390237B2 (ja) 2009-12-24
TW594394B (en) 2004-06-21

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties