ATE449361T1 - Optisches system zur umwandlung einer primären intensitätsverteilung in eine vorgegebene, raumwinkelabhängige intensitätsverteilung - Google Patents

Optisches system zur umwandlung einer primären intensitätsverteilung in eine vorgegebene, raumwinkelabhängige intensitätsverteilung

Info

Publication number
ATE449361T1
ATE449361T1 AT05768103T AT05768103T ATE449361T1 AT E449361 T1 ATE449361 T1 AT E449361T1 AT 05768103 T AT05768103 T AT 05768103T AT 05768103 T AT05768103 T AT 05768103T AT E449361 T1 ATE449361 T1 AT E449361T1
Authority
AT
Austria
Prior art keywords
intensity distribution
distribution
dependent
converting
optical system
Prior art date
Application number
AT05768103T
Other languages
English (en)
Inventor
Matthias Cumme
Original Assignee
Jenoptik Laser Optik Sys Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jenoptik Laser Optik Sys Gmbh filed Critical Jenoptik Laser Optik Sys Gmbh
Application granted granted Critical
Publication of ATE449361T1 publication Critical patent/ATE449361T1/de

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0927—Systems for changing the beam intensity distribution, e.g. Gaussian to top-hat
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0938—Using specific optical elements
    • G02B27/0944—Diffractive optical elements, e.g. gratings, holograms

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Lenses (AREA)
  • Optical Couplings Of Light Guides (AREA)
AT05768103T 2004-07-19 2005-07-15 Optisches system zur umwandlung einer primären intensitätsverteilung in eine vorgegebene, raumwinkelabhängige intensitätsverteilung ATE449361T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102004035489A DE102004035489A1 (de) 2004-07-19 2004-07-19 Optisches System zur Umwandlung einer primären Intensitätsverteilung in eine vorgegebene, raumwinkelabhängige Intensitätsverteilung
PCT/DE2005/001268 WO2006007828A1 (de) 2004-07-19 2005-07-15 Optisches system zur umwandlung einer primären intensitätsverteilung in eine vorgegebene, raumwinkelabhängige intensitätsverteilung

Publications (1)

Publication Number Publication Date
ATE449361T1 true ATE449361T1 (de) 2009-12-15

Family

ID=35058183

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05768103T ATE449361T1 (de) 2004-07-19 2005-07-15 Optisches system zur umwandlung einer primären intensitätsverteilung in eine vorgegebene, raumwinkelabhängige intensitätsverteilung

Country Status (6)

Country Link
US (1) US20080074746A1 (de)
EP (1) EP1789833B1 (de)
JP (1) JP2008506995A (de)
AT (1) ATE449361T1 (de)
DE (2) DE102004035489A1 (de)
WO (1) WO2006007828A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
SG185313A1 (en) * 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
JP5366019B2 (ja) 2010-08-02 2013-12-11 株式会社ニコン 伝送光学系、照明光学系、露光装置、およびデバイス製造方法
JP6120001B2 (ja) * 2011-10-24 2017-04-26 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
CN107204524A (zh) * 2017-05-12 2017-09-26 东南大学 基于p‑b相位结构的人工电磁表面及其设计方法
CN113330339B (zh) * 2019-01-31 2023-10-20 Ａｇｃ株式会社 衍射光学元件、使用了该衍射光学元件的投影装置及计测装置
US11782195B2 (en) 2019-09-30 2023-10-10 Himax Technologies Limited Diffractive optical element and method for fabricating the diffractive optical element
DE102019128362B3 (de) * 2019-10-21 2021-02-18 Trumpf Laser- Und Systemtechnik Gmbh Segmentiertes Strahlformungselement und Laserbearbeitungsanlage
CN114296245B (zh) * 2021-12-09 2024-03-01 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） 一种拉曼光束整形装置
CN114296167B (zh) * 2021-12-09 2024-05-03 华中光电技术研究所（中国船舶重工集团公司第七一七研究所） 一种衍射光学芯片

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4547037A (en) * 1980-10-16 1985-10-15 Regents Of The University Of Minnesota Holographic method for producing desired wavefront transformations
EP0479490A3 (en) * 1990-10-02 1992-08-12 Physical Optics Corporation Volume holographic diffuser
US5315427A (en) * 1992-12-14 1994-05-24 Xerox Corporation Pair of binary diffraction optics for use in overfilled raster output scanning systems
US5684566A (en) * 1995-05-24 1997-11-04 Svg Lithography Systems, Inc. Illumination system and method employing a deformable mirror and diffractive optical elements
JPH1041225A (ja) * 1996-07-24 1998-02-13 Canon Inc 照明装置及びそれを用いた投影露光装置
US6118559A (en) * 1996-12-20 2000-09-12 Digital Optics Corporation Broadband diffractive diffuser and associated methods
US6002520A (en) * 1997-04-25 1999-12-14 Hewlett-Packard Company Illumination system for creating a desired irradiance profile using diffractive optical elements
DE19753344A1 (de) * 1997-12-02 1999-06-10 Rodenstock Instr Vorrichtung zur Homogenisierung eines Licht- oder Laserstrahls
DE19820154A1 (de) * 1998-03-10 1999-09-16 Vitaly Lissotschenko Vorrichtung und Verfahren zur optischen Strahltransformation
DE10062579A1 (de) * 1999-12-15 2001-06-21 Nikon Corp Optischer Integrierer,optische Beleuchtungseinrichtung, Photolithographie-Belichtungseinrichtung,und Beobachtungseinrichtung
DE10132988B4 (de) * 2001-07-06 2005-07-28 Carl Zeiss Smt Ag Projektionsbelichtungsanlage
US6819490B2 (en) * 2001-09-10 2004-11-16 Micronic Laser Systems Ab Homogenization of a spatially coherent radiation beam and printing and inspection, respectively, of a pattern on a workpiece
US6903859B2 (en) * 2001-12-07 2005-06-07 Micronic Laser Systems Ab Homogenizer
US20040125453A1 (en) * 2002-07-03 2004-07-01 Mcaulay Alastair D. Inverse computation of phase masks for two layer diffractive optic element system
US6859326B2 (en) * 2002-09-20 2005-02-22 Corning Incorporated Random microlens array for optical beam shaping and homogenization

Also Published As

Publication number Publication date
WO2006007828A1 (de) 2006-01-26
EP1789833A1 (de) 2007-05-30
DE102004035489A1 (de) 2006-02-16
DE502005008553D1 (de) 2009-12-31
US20080074746A1 (en) 2008-03-27
EP1789833B1 (de) 2009-11-18
JP2008506995A (ja) 2008-03-06

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