ATE539383T1 - Projektionssystem mit einem polarisationsmodulierenden optischen element mit variabler dicke - Google Patents

Projektionssystem mit einem polarisationsmodulierenden optischen element mit variabler dicke

Info

Publication number
ATE539383T1
ATE539383T1 AT05706888T AT05706888T ATE539383T1 AT E539383 T1 ATE539383 T1 AT E539383T1 AT 05706888 T AT05706888 T AT 05706888T AT 05706888 T AT05706888 T AT 05706888T AT E539383 T1 ATE539383 T1 AT E539383T1
Authority
AT
Austria
Prior art keywords
polarization
light
state
optical element
substantially along
Prior art date
Application number
AT05706888T
Other languages
English (en)
Inventor
Damian Fiolka
Markus Deguenther
Original Assignee
Zeiss Carl Smt Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Gmbh filed Critical Zeiss Carl Smt Gmbh
Application granted granted Critical
Publication of ATE539383T1 publication Critical patent/ATE539383T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3083—Birefringent or phase retarding elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/08—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of polarising materials
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
    • G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0136—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  for the control of polarisation, e.g. state of polarisation [SOP] control, polarisation scrambling, TE-TM mode conversion or separation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/0147—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on thermo-optic effects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Polarising Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AT05706888T 2004-01-16 2005-01-14 Projektionssystem mit einem polarisationsmodulierenden optischen element mit variabler dicke ATE539383T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US53732704P 2004-01-16 2004-01-16
PCT/EP2005/000320 WO2005069081A2 (en) 2004-01-16 2005-01-14 Polarization-modulating optical element

Publications (1)

Publication Number Publication Date
ATE539383T1 true ATE539383T1 (de) 2012-01-15

Family

ID=34794448

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05706888T ATE539383T1 (de) 2004-01-16 2005-01-14 Projektionssystem mit einem polarisationsmodulierenden optischen element mit variabler dicke

Country Status (7)

Country Link
US (6) US8279524B2 (de)
EP (1) EP1716457B9 (de)
JP (8) JP4958562B2 (de)
KR (7) KR101230757B1 (de)
CN (5) CN101793993B (de)
AT (1) ATE539383T1 (de)
WO (1) WO2005069081A2 (de)

Families Citing this family (187)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10503084B2 (en) 2002-11-12 2019-12-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US9482966B2 (en) 2002-11-12 2016-11-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI251127B (en) 2002-11-12 2006-03-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
SG2010050110A (en) 2002-11-12 2014-06-27 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE10261775A1 (de) 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
KR101506408B1 (ko) 2003-02-26 2015-03-26 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
EP1610361B1 (de) 2003-03-25 2014-05-21 Nikon Corporation Belichtungssystem und bauelementeherstellungsverfahren
KR101176817B1 (ko) 2003-04-07 2012-08-24 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
WO2004093159A2 (en) 2003-04-09 2004-10-28 Nikon Corporation Immersion lithography fluid control system
KR20170018113A (ko) 2003-04-09 2017-02-15 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
EP3062152B1 (de) 2003-04-10 2017-12-20 Nikon Corporation Umgebungssystem mit einer transportregion für eine immersionslithografievorrichtung
KR20180089562A (ko) 2003-04-10 2018-08-08 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
WO2004093160A2 (en) 2003-04-10 2004-10-28 Nikon Corporation Run-off path to collect liquid for an immersion lithography apparatus
JP4315198B2 (ja) 2003-04-11 2009-08-19 株式会社ニコン 液浸液体を光学アセンブリ下に維持するリソグラフィ装置及び液浸液体維持方法並びにそれらを用いるデバイス製造方法
KR101324818B1 (ko) 2003-04-11 2013-11-01 가부시키가이샤 니콘 액침 리소그래피에 의한 광학기기의 세정방법
JP4582089B2 (ja) 2003-04-11 2010-11-17 株式会社ニコン 液浸リソグラフィ用の液体噴射回収システム
CN1774667A (zh) 2003-04-17 2006-05-17 株式会社尼康 用在浸没式平版印刷方法中自动聚焦部件的光学配置
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
WO2004102646A1 (ja) 2003-05-15 2004-11-25 Nikon Corporation 露光装置及びデバイス製造方法
TWI511181B (zh) 2003-05-23 2015-12-01 尼康股份有限公司 Exposure method and exposure apparatus, and device manufacturing method
TWI518742B (zh) 2003-05-23 2016-01-21 尼康股份有限公司 A method of manufacturing an exposure apparatus and an element
KR20180122033A (ko) 2003-05-28 2018-11-09 가부시키가이샤 니콘 노광 방법, 노광 장치, 및 디바이스 제조 방법
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
EP2261742A3 (de) 2003-06-11 2011-05-25 ASML Netherlands BV Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
TWI409853B (zh) 2003-06-13 2013-09-21 尼康股份有限公司 An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method
DE602004024782D1 (de) 2003-06-19 2010-02-04 Nippon Kogaku Kk Belichtungseinrichtung und bauelementeherstellungsverfahren
WO2005006026A2 (en) 2003-07-01 2005-01-20 Nikon Corporation Using isotopically specified fluids as optical elements
EP3179309A1 (de) 2003-07-08 2017-06-14 Nikon Corporation Waferplatte für die immersionslithografie
WO2005006415A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
WO2005006418A1 (ja) 2003-07-09 2005-01-20 Nikon Corporation 露光装置及びデバイス製造方法
DE602004030247D1 (de) 2003-07-09 2011-01-05 Nippon Kogaku Kk Belichtungsvorrichtung und verfahren zur bauelementherstellung
EP1650787A4 (de) 2003-07-25 2007-09-19 Nikon Corp Untersuchungsverfahren und untersuchungseinrichtung für ein optisches projektionssystem und herstellungsverfahren für ein optisches projektionssystem
KR101641011B1 (ko) 2003-07-28 2016-07-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법, 그리고 노광 장치의 제어 방법
EP1503244A1 (de) 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
US7779781B2 (en) 2003-07-31 2010-08-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
KR101419192B1 (ko) 2003-08-29 2014-07-15 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
KR101288140B1 (ko) 2003-09-03 2013-07-19 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
WO2005029559A1 (ja) 2003-09-19 2005-03-31 Nikon Corporation 露光装置及びデバイス製造方法
KR101743378B1 (ko) 2003-09-29 2017-06-15 가부시키가이샤 니콘 노광장치, 노광방법 및 디바이스 제조방법
WO2005036623A1 (ja) 2003-10-08 2005-04-21 Zao Nikon Co., Ltd. 基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
JP2005136364A (ja) 2003-10-08 2005-05-26 Zao Nikon Co Ltd 基板搬送装置、露光装置、並びにデバイス製造方法
KR101111364B1 (ko) 2003-10-08 2012-02-27 가부시키가이샤 자오 니콘 기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광방법, 디바이스 제조 방법
TWI553701B (zh) 2003-10-09 2016-10-11 尼康股份有限公司 Exposure apparatus and exposure method, component manufacturing method
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
US7411653B2 (en) 2003-10-28 2008-08-12 Asml Netherlands B.V. Lithographic apparatus
JP4295712B2 (ja) 2003-11-14 2009-07-15 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置及び装置製造方法
TWI512335B (zh) * 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
TWI605315B (zh) 2003-12-03 2017-11-11 尼康股份有限公司 Exposure device, exposure method, and device manufacturing method
KR101941351B1 (ko) 2003-12-15 2019-01-22 가부시키가이샤 니콘 스테이지 장치, 노광 장치, 및 노광 방법
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
KR101230757B1 (ko) 2004-01-16 2013-02-06 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
WO2005071491A2 (en) 2004-01-20 2005-08-04 Carl Zeiss Smt Ag Exposure apparatus and measuring device for a projection lens
TWI395068B (zh) * 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
KR101276392B1 (ko) 2004-02-03 2013-06-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
JP5167572B2 (ja) * 2004-02-04 2013-03-21 株式会社ニコン 露光装置、露光方法及びデバイス製造方法
TWI505329B (zh) * 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
KR101504445B1 (ko) 2004-03-25 2015-03-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US8054448B2 (en) 2004-05-04 2011-11-08 Nikon Corporation Apparatus and method for providing fluid for immersion lithography
US7616383B2 (en) 2004-05-18 2009-11-10 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7324280B2 (en) 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
US7796274B2 (en) 2004-06-04 2010-09-14 Carl Zeiss Smt Ag System for measuring the image quality of an optical imaging system
KR101162128B1 (ko) 2004-06-09 2012-07-03 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
US7463330B2 (en) 2004-07-07 2008-12-09 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8384874B2 (en) 2004-07-12 2013-02-26 Nikon Corporation Immersion exposure apparatus and device manufacturing method to detect if liquid on base member
US8305553B2 (en) 2004-08-18 2012-11-06 Nikon Corporation Exposure apparatus and device manufacturing method
US7701550B2 (en) 2004-08-19 2010-04-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7397533B2 (en) 2004-12-07 2008-07-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7880860B2 (en) 2004-12-20 2011-02-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI453795B (zh) * 2005-01-21 2014-09-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
US8692973B2 (en) 2005-01-31 2014-04-08 Nikon Corporation Exposure apparatus and method for producing device
EP3079164A1 (de) 2005-01-31 2016-10-12 Nikon Corporation Belichtungsvorrichtung und herstellungsverfahren einer vorrichtung
US7282701B2 (en) 2005-02-28 2007-10-16 Asml Netherlands B.V. Sensor for use in a lithographic apparatus
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
JP4920041B2 (ja) * 2005-10-04 2012-04-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系とりわけマイクロリソグラフィック投影露光機における偏光分布に影響を与えるための装置及び方法
JP4959968B2 (ja) * 2005-10-20 2012-06-27 京セラクリスタルデバイス株式会社 紫外光用１／２波長板
KR100786475B1 (ko) * 2005-11-23 2007-12-17 삼성에스디아이 주식회사 액정표시장치 및 그 구동방법
US7649611B2 (en) 2005-12-30 2010-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
WO2007096250A1 (de) 2006-02-21 2007-08-30 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen projektionsbelichtungsanlage
DE102006015213A1 (de) * 2006-03-30 2007-10-11 Carl Zeiss Smt Ag Polarisationsbeeinflussende optische Anordnung
DE102006021334B3 (de) 2006-05-05 2007-08-30 Carl Zeiss Smt Ag Polarisationsbeeinflussendes optisches Element sowie Verfahren zu dessen Herstellung sowie optisches System und mikrolithographische Projektionsbelichtungsanlage mit einem solchen Element
DE102006021797A1 (de) 2006-05-09 2007-11-15 Carl Zeiss Smt Ag Optische Abbildungseinrichtung mit thermischer Dämpfung
DE102006032810A1 (de) 2006-07-14 2008-01-17 Carl Zeiss Smt Ag Beleuchtungsoptik für eine Mikrolithografie-Projektionsbelichtungsanlage, Beleuchtungssystem mit einer derartigen Beleuchtungsoptik, mikrolithografie-Projektionsbelichtungsanlage mit einem derartigen Beleuchtungssystem, mikrolithografisches Herstellungsverfahren für Bauelemente sowie mit diesem Verfahren hergestelltes Bauelement
DE102006038643B4 (de) 2006-08-17 2009-06-10 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102007042047A1 (de) 2006-09-06 2008-03-27 Carl Zeiss Smt Ag Teilsystem einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
KR100860303B1 (ko) * 2006-10-02 2008-09-25 삼성전기주식회사 히터를 이용한 온도 적응형 광변조기 소자
DE102007027985A1 (de) * 2006-12-21 2008-06-26 Carl Zeiss Smt Ag Optisches System, insbesondere Beleuchtungseinrichtung oder Projektionsobjektiv einer mikrolithographischen Projektionsbelichtungsanlage
JP2008209888A (ja) * 2007-01-31 2008-09-11 Sony Corp 光学装置および投射型表示装置
US8237911B2 (en) 2007-03-15 2012-08-07 Nikon Corporation Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
DE102008011134A1 (de) 2007-04-03 2008-10-09 Carl Zeiss Smt Ag Verfahren zum Anpassen der Abbildungseigenschaften von wenigstens zwei mikrolithographischen Projektionsbelichtungsanlagen aneinander
DE102008013567A1 (de) 2007-05-08 2008-11-13 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
KR100916623B1 (ko) * 2007-06-12 2009-09-09 한국과학기술원 고개구수 렌즈의 입사광을 변조하기 위한 삼층 편광 변조장치
NL1036123A1 (nl) * 2007-11-13 2009-05-14 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
DE102007055567A1 (de) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optisches System
US8040492B2 (en) 2007-11-27 2011-10-18 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
DE102008054683A1 (de) 2008-03-13 2009-09-17 Carl Zeiss Smt Ag Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zum Manipulieren der Abbildungseigenschaften eines optischen Systems
DE102009016063A1 (de) 2008-05-21 2009-11-26 Carl Zeiss Smt Ag Mikrolithographisches Projektionsbelichtungsverfahren, sowie Projektionsbelichtungsanlage
US9176393B2 (en) 2008-05-28 2015-11-03 Asml Netherlands B.V. Lithographic apparatus and a method of operating the apparatus
JP5319766B2 (ja) 2008-06-20 2013-10-16 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の光学系及びマイクロリソグラフィ露光方法
TW201015125A (en) * 2008-10-01 2010-04-16 Ind Tech Res Inst Optical sheet
DE102008054844B4 (de) 2008-12-17 2010-09-23 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie mikrolithographisches Projektionsbelichtungsverfahren
DE102009030502A1 (de) 2009-06-24 2010-12-02 Carl Zeiss Smt Ag Projektionsbelichtungsanlage für die Mikrolithographie
US20110037962A1 (en) * 2009-08-17 2011-02-17 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
JP5531518B2 (ja) * 2009-09-08 2014-06-25 株式会社ニコン 偏光変換ユニット、照明光学系、露光装置、およびデバイス製造方法
TWI404894B (zh) * 2009-12-22 2013-08-11 Ind Tech Res Inst 照明系統
DE102009055184B4 (de) 2009-12-22 2011-11-10 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102011003035A1 (de) 2010-02-08 2011-08-11 Carl Zeiss SMT GmbH, 73447 Polarisationsbeeinflussende optische Anordnung, sowie optisches System einer mikrolithographischen Projektionsbelichtungsanlage
NL2006255A (en) * 2010-02-23 2011-08-24 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
US9389519B2 (en) 2010-02-25 2016-07-12 Nikon Corporation Measuring method and measuring apparatus of pupil transmittance distribution, exposure method and exposure apparatus, and device manufacturing method
US20110205519A1 (en) * 2010-02-25 2011-08-25 Nikon Corporation Polarization converting unit, illumination optical system, exposure apparatus, and device manufacturing method
EP2381310B1 (de) 2010-04-22 2015-05-06 ASML Netherlands BV Flüssigkeitshandhabungsstruktur und lithographischer Apparat
DE102010029339A1 (de) 2010-05-27 2011-12-01 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102010029905A1 (de) * 2010-06-10 2011-12-15 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
EP2622411B1 (de) * 2010-09-28 2015-11-04 Carl Zeiss SMT GmbH Optisches system eines mikrolithografischen projektionsbelichtungsgeräts und verfahren zur minimierung von bildpositionierungsfehlern
JP2012073414A (ja) * 2010-09-29 2012-04-12 Kyocera Kinseki Corp 偏光変換素子及び偏光変換素子の製造方法
JP2012073413A (ja) * 2010-09-29 2012-04-12 Kyocera Kinseki Corp 偏光変換素子及び偏光変換素子の製造方法
DE102011076434A1 (de) 2011-05-25 2012-11-29 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
JP6020834B2 (ja) * 2011-06-07 2016-11-02 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
DE102011079548A1 (de) 2011-07-21 2012-07-19 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102011079777A1 (de) 2011-07-26 2013-01-31 Carl Zeiss Smt Gmbh Mikrolithographisches Belichtungsverfahren
WO2013042679A1 (ja) * 2011-09-19 2013-03-28 株式会社ニコン 照明光学装置、光学系ユニット、照明方法、並びに露光方法及び装置
JP6120001B2 (ja) * 2011-10-24 2017-04-26 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
DE102011085334A1 (de) 2011-10-27 2013-05-02 Carl Zeiss Smt Gmbh Optisches System in einer Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
DE102012200370A1 (de) 2012-01-12 2013-08-01 Carl Zeiss Smt Gmbh Verfahren zum Herstellen eines polarisationsbeeinflussenden optischen Elements, sowie polarisationsbeeinflussendes optisches Element
DE102012200371A1 (de) 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102012200368A1 (de) 2012-01-12 2013-07-18 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage
TW201331521A (zh) * 2012-01-18 2013-08-01 勝華科技股份有限公司 極化光源模組
DE102012203944A1 (de) 2012-03-14 2013-10-02 Carl Zeiss Smt Gmbh Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage
DE102012205045A1 (de) 2012-03-29 2013-10-02 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
WO2013143594A1 (en) 2012-03-29 2013-10-03 Carl Zeiss Smt Gmbh Apparatus and method for compensating a defect of a channel of a microlithographic projection exposure system
DE102012205554A1 (de) 2012-04-04 2013-04-25 Carl Zeiss Smt Gmbh Optisches System für die Mikrolithographie
CN103365104B (zh) * 2012-04-11 2016-07-06 上海微电子装备有限公司 可变偏振照明系统
DE102012206151A1 (de) 2012-04-16 2013-05-02 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206150B9 (de) * 2012-04-16 2014-06-12 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012206159A1 (de) 2012-04-16 2013-06-20 Carl Zeiss Smt Gmbh Polarisationsbeeinflussende optische Anordnung
DE102012206148A1 (de) 2012-04-16 2013-10-17 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage, sowie Verfahren zur Justage eines optischen Systems
DE102012206154A1 (de) 2012-04-16 2013-06-06 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
DE102012206287A1 (de) 2012-04-17 2013-10-17 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012212864A1 (de) 2012-07-23 2013-08-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012213553A1 (de) 2012-08-01 2013-08-22 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102012214052A1 (de) 2012-08-08 2014-02-13 Carl Zeiss Smt Gmbh Mikrolithographisches Belichtungsverfahren, sowie mikrolithographische Projektionsbelichtungsanlage
DE102012214198A1 (de) 2012-08-09 2013-05-29 Carl Zeiss Smt Gmbh Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage
CN102830499B (zh) * 2012-09-05 2015-01-21 山东大学 矢量光场转换器件及偏振光转换的方法
DE102012217769A1 (de) 2012-09-28 2014-04-03 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage sowie mikrolithographisches Belichtungsverfahren
CN103869626B (zh) * 2012-12-11 2016-12-07 上海微电子装备有限公司 超高数值孔径光刻成像偏振补偿装置及方法
DE102012223217B9 (de) * 2012-12-14 2014-07-10 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102012223230A1 (de) 2012-12-14 2014-02-13 Carl Zeiss Smt Gmbh Optisches System, insbesondere einer mikrolithographischen Projektionsbelichtungsanlage
DE102013200137A1 (de) 2013-01-08 2013-11-14 Carl Zeiss Smt Gmbh Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
EP2754524B1 (de) 2013-01-15 2015-11-25 Corning Laser Technologies GmbH Verfahren und Vorrichtung zum laserbasierten Bearbeiten von flächigen Substraten, d.h. Wafer oder Glaselement, unter Verwendung einer Laserstrahlbrennlinie
TW201431224A (zh) * 2013-01-18 2014-08-01 Hon Hai Prec Ind Co Ltd 光源系統
DE102013201133A1 (de) 2013-01-24 2014-07-24 Carl Zeiss Smt Gmbh Optisches System einer mikrolithographischen Projektionsbelichtungsanlage
DE102013202757B4 (de) 2013-02-20 2014-11-20 Carl Zeiss Smt Gmbh Lithographiebeleuchtungssysteme mit hohem Lichtleitwert und Faltspiegel
CN104049466B (zh) * 2013-03-11 2018-02-06 上海微电子装备（集团）股份有限公司 超高数值孔径光刻成像偏振补偿装置及方法
US8922753B2 (en) 2013-03-14 2014-12-30 Carl Zeiss Smt Gmbh Optical system for a microlithographic projection exposure apparatus
DE102013204453B4 (de) 2013-03-14 2019-11-21 Carl Zeiss Smt Gmbh Optisches System für eine mikrolithographische Projektionsbelichtungsanlage, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur mikrolithographischen Herstellung mikrostrukturierter Bauelemente
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
CN104102015A (zh) * 2013-04-09 2014-10-15 深圳市大族激光科技股份有限公司 一种径向偏振光产生装置及激光加工系统
JP6036506B2 (ja) * 2013-04-15 2016-11-30 富士通株式会社 障害影響範囲を特定するためのプログラム及び情報処理装置
US9995850B2 (en) 2013-06-06 2018-06-12 Kla-Tencor Corporation System, method and apparatus for polarization control
JP6516134B2 (ja) * 2013-06-29 2019-05-22 堀　健治 位相変換作用を持つフィルター、レンズ、結像光学系及び撮像システム
CN103389583A (zh) * 2013-07-24 2013-11-13 中国科学院光电技术研究所 一种偏振光调制元件
JP6234105B2 (ja) * 2013-08-05 2017-11-22 オリンパス株式会社 超解像顕微鏡
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
KR102445217B1 (ko) 2014-07-08 2022-09-20 코닝 인코포레이티드 재료를 레이저 가공하는 방법 및 장치
LT6250B (lt) 2014-07-10 2016-02-25 Uab "Altechna R&D" Lazerinio pluošto skersinio profilio formuotuvas, išsaugantis bangos fronto kreivumą, ir jo panaudojimo būdas
LT3169477T (lt) * 2014-07-14 2020-05-25 Corning Incorporated Skaidrių medžiagų apdorojimo sistema ir būdas, naudojant lazerio pluošto židinio linijas, kurių ilgis ir skersmuo yra reguliuojami
DE102014215952B4 (de) 2014-08-12 2016-11-10 Carl Zeiss Industrielle Messtechnik Gmbh Beleuchtungsmodul für einen optischen Sensor sowie optischer Sensor mit einem solchen Belechtungsmodul für ein Koordinatenmessgerät zur Vermessung von Innengewinden oder Bohrlöchern eines Werkstücks
WO2016154284A1 (en) 2015-03-24 2016-09-29 Corning Incorporated Laser cutting and processing of display glass compositions
JP6667555B2 (ja) * 2015-06-23 2020-03-18 テラダイオード， インコーポレーテッド レーザ送達システムにおけるビームパラメータ積を変動させるための光学要素配置
US9709897B2 (en) 2015-10-28 2017-07-18 Cymer, Llc Polarization control of pulsed light beam
WO2017126363A1 (ja) * 2016-01-18 2017-07-27 三菱電機株式会社 レーザ光のためのパワーバランス装置、レーザ加工装置
JP6439723B2 (ja) * 2016-03-09 2018-12-19 信越化学工業株式会社 合成石英ガラス基板の製造方法
WO2018064409A1 (en) 2016-09-30 2018-04-05 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
LT3529214T (lt) 2016-10-24 2021-02-25 Corning Incorporated Substrato apdorojimo stotis lakšto formos stiklo substratų lazeriniam mašininiam apdorojimui
CN107085309B (zh) * 2017-05-03 2020-08-04 中国人民解放军陆军军官学院 基于一螺旋波片板产生多种高功率柱矢量偏振光束的方法
US10942135B2 (en) 2018-11-14 2021-03-09 Kla Corporation Radial polarizer for particle detection
CN109491097B (zh) * 2019-01-15 2021-05-04 中国工程物理研究院上海激光等离子体研究所 一种基于晶体旋光性产生轴对称矢量光束的方法
US10948423B2 (en) 2019-02-17 2021-03-16 Kla Corporation Sensitive particle detection with spatially-varying polarization rotator and polarizer
CN110058430B (zh) * 2019-04-12 2021-02-02 西安交通大学 一种单偏振相位调制光学器件
CN110737116A (zh) * 2019-11-15 2020-01-31 深圳市光凡通讯技术有限公司 一种光隔离器的核心器件及光隔离器
US12326588B2 (en) * 2020-01-30 2025-06-10 Lawrence Livermore National Security, Llc Polarization manipulation of free-space electromagnetic radiation fields
JP7180898B2 (ja) * 2020-09-28 2022-11-30 禾橙科技股▲分▼有限公司 光学レンズ、光学レンズ成形金型及びその製造方法
CN116449638B (zh) * 2023-03-23 2026-04-14 深圳市当智科技有限公司 激光投影设备

Family Cites Families (218)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3293882B2 (ja) 1992-03-27 2002-06-17 株式会社東芝 投影露光装置
US2473857A (en) 1946-12-05 1949-06-21 Burchell Holloway Corp Apparatus for insertion in color display devices utilizing polarized light for securing changing saturation of specific hues in fixed zones as vewed by observers
GB856621A (en) * 1956-07-20 1960-12-21 Nat Res Dev Improvements in or relating to polarising microscopes
US3484714A (en) 1964-12-16 1969-12-16 American Optical Corp Laser having a 90 polarization rotator between two rods to compensate for the effects of thermal gradients
US3438692A (en) 1965-03-08 1969-04-15 Bell Telephone Labor Inc Birefringent device for forming multiple images
US3630598A (en) * 1970-01-02 1971-12-28 Xerox Corp Optical demodulation filter
US3758201A (en) 1971-07-15 1973-09-11 American Optical Corp Optical system for improved eye refraction
US3719415A (en) 1971-09-22 1973-03-06 Bell Telephone Labor Inc Radial and tangential polarizers
US3957375A (en) 1973-02-28 1976-05-18 The United States Of America As Represented By The United States Energy Research And Development Administration Variable thickness double-refracting plate
US3892469A (en) 1974-02-01 1975-07-01 Hughes Aircraft Co Electro-optical variable focal length lens using optical ring polarizer
US3892470A (en) 1974-02-01 1975-07-01 Hughes Aircraft Co Optical device for transforming monochromatic linearly polarized light to ring polarized light
FR2385241A1 (fr) * 1976-12-23 1978-10-20 Marie G R P Convertisseurs de mode de polarisation pour faisceaux laser et generateurs de plasma les utilisant
GB1599097A (en) 1977-02-08 1981-09-30 Marie G R P Generators of electromagnetic light or infrared waves having plasma confining modes
JPS53145922A (en) 1977-05-26 1978-12-19 Eisai Co Ltd Remedy for peptic ulcer containing prenyl ketone compound
US4272158A (en) 1979-03-02 1981-06-09 Coherent, Inc. Broadband optical diode for a ring laser
US4286843A (en) 1979-05-14 1981-09-01 Reytblatt Zinovy V Polariscope and filter therefor
FR2465241A1 (fr) 1979-09-10 1981-03-20 Thomson Csf Dispositif illuminateur destine a fournir un faisceau d'eclairement a distribution d'intensite ajustable et systeme de transfert de motifs comprenant un tel dispositif
CA1253726A (en) 1982-06-28 1989-05-09 Masataka Shirasaki Polarization rotation compensator and optical isolator using the same
JPS5923616U (ja) 1982-08-03 1984-02-14 積水樹脂株式会社 測量用スタツフ
JPS6191662U (de) 1984-11-20 1986-06-13
JPH0653120B2 (ja) 1985-05-10 1994-07-20 オリンパス光学工業株式会社 超音波診断装置
DE3523641C1 (de) * 1985-07-02 1986-12-18 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Einrichtung zum Selektieren von rotationssymmetrischen Polarisationskomponenten einesLichtbuendels und Verwendung einer solchen Einrichtung
US4744615A (en) 1986-01-29 1988-05-17 International Business Machines Corporation Laser beam homogenizer
JPH0666246B2 (ja) 1986-05-14 1994-08-24 キヤノン株式会社 照明光学系
JPS6344726A (ja) * 1986-08-12 1988-02-25 Norihisa Ito エキシマレ−ザを用いたステツパの照明光学装置
US5253110A (en) 1988-12-22 1993-10-12 Nikon Corporation Illumination optical arrangement
US5475491A (en) 1989-02-10 1995-12-12 Canon Kabushiki Kaisha Exposure apparatus
US7656504B1 (en) 1990-08-21 2010-02-02 Nikon Corporation Projection exposure apparatus with luminous flux distribution
JP2995820B2 (ja) 1990-08-21 1999-12-27 株式会社ニコン 露光方法及び方法，並びにデバイス製造方法
JP3049774B2 (ja) 1990-12-27 2000-06-05 株式会社ニコン 投影露光装置及び方法、並びに素子製造方法
US6252647B1 (en) 1990-11-15 2001-06-26 Nikon Corporation Projection exposure apparatus
EP0967524A3 (de) 1990-11-15 2000-01-05 Nikon Corporation Verfahren und Vorrichtung zur Projektionsbelichtung
US5719704A (en) 1991-09-11 1998-02-17 Nikon Corporation Projection exposure apparatus
JPH04101148U (ja) 1991-01-31 1992-09-01 日本電気ホームエレクトロニクス株式会社 シリアルデータ送信装置
JPH0590128A (ja) 1991-06-13 1993-04-09 Nikon Corp 露光装置
US5541026A (en) 1991-06-13 1996-07-30 Nikon Corporation Exposure apparatus and photo mask
KR950004968B1 (ko) 1991-10-15 1995-05-16 가부시키가이샤 도시바 투영노광 장치
JPH05109601A (ja) 1991-10-15 1993-04-30 Nikon Corp 露光装置及び露光方法
JP2866243B2 (ja) 1992-02-10 1999-03-08 三菱電機株式会社 投影露光装置及び半導体装置の製造方法
JP2796005B2 (ja) 1992-02-10 1998-09-10 三菱電機株式会社 投影露光装置及び偏光子
JP3278896B2 (ja) 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
JP3246615B2 (ja) 1992-07-27 2002-01-15 株式会社ニコン 照明光学装置、露光装置、及び露光方法
JPH06188169A (ja) 1992-08-24 1994-07-08 Canon Inc 結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法
US6404482B1 (en) 1992-10-01 2002-06-11 Nikon Corporation Projection exposure method and apparatus
JP2884947B2 (ja) * 1992-10-01 1999-04-19 株式会社ニコン 投影露光装置、露光方法および半導体集積回路の製造方法
JPH06118169A (ja) 1992-10-02 1994-04-28 Oki Shisutetsuku Tokai:Kk 音響測位装置
JPH06118623A (ja) 1992-10-07 1994-04-28 Fujitsu Ltd レチクル及びこれを用いた半導体露光装置
JPH06124873A (ja) 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
US5459000A (en) 1992-10-14 1995-10-17 Canon Kabushiki Kaisha Image projection method and device manufacturing method using the image projection method
JP3322274B2 (ja) 1992-10-29 2002-09-09 株式会社ニコン 投影露光方法及び投影露光装置
JPH06169415A (ja) 1992-11-30 1994-06-14 Olympus Optical Co Ltd 撮像装置
JP2866267B2 (ja) 1992-12-11 1999-03-08 三菱電機株式会社 光描画装置およびウェハ基板の光描画方法
JP2698521B2 (ja) 1992-12-14 1998-01-19 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
JP3201027B2 (ja) 1992-12-22 2001-08-20 株式会社ニコン 投影露光装置及び方法
JPH06204121A (ja) 1992-12-28 1994-07-22 Canon Inc 照明装置及びそれを用いた投影露光装置
JP2516374Y2 (ja) 1993-01-07 1996-11-06 株式会社トーザイ 射出成形機のノズル
JPH08505961A (ja) 1993-01-21 1996-06-25 イー−テック・ダイナミックス・インコーポレイテッド 偏光モード分散の低い光学装置
US5739898A (en) 1993-02-03 1998-04-14 Nikon Corporation Exposure method and apparatus
JPH07142338A (ja) 1993-06-14 1995-06-02 Canon Inc 像投影方法及びそれを用いた露光装置
JP3099933B2 (ja) 1993-12-28 2000-10-16 株式会社東芝 露光方法及び露光装置
KR0153796B1 (ko) 1993-09-24 1998-11-16 사토 후미오 노광장치 및 노광방법
KR0166612B1 (ko) 1993-10-29 1999-02-01 가나이 쓰토무 패턴노광방법 및 그 장치와 그것에 이용되는 마스크와 그것을 이용하여 만들어진 반도체 집적회로
US5442184A (en) 1993-12-10 1995-08-15 Texas Instruments Incorporated System and method for semiconductor processing using polarized radiant energy
US6285443B1 (en) 1993-12-13 2001-09-04 Carl-Zeiss-Stiftung Illuminating arrangement for a projection microlithographic apparatus
DE19520563A1 (de) 1995-06-06 1996-12-12 Zeiss Carl Fa Beleuchtungseinrichtung für ein Projektions-Mikrolithographie-Gerät
JPH07183201A (ja) 1993-12-21 1995-07-21 Nec Corp 露光装置および露光方法
JP2836483B2 (ja) 1994-05-13 1998-12-14 日本電気株式会社 照明光学装置
KR0173168B1 (ko) 1994-02-24 1999-03-20 가네꼬 히사시 웨이퍼상의 레지스트막을 노광하기 위한 노광계와 그에 사용되는 조명계 및 방법
US5453814A (en) 1994-04-13 1995-09-26 Nikon Precision Inc. Illumination source and method for microlithography
JPH07283119A (ja) 1994-04-14 1995-10-27 Hitachi Ltd 露光装置および露光方法
JPH088177A (ja) 1994-04-22 1996-01-12 Canon Inc 投影露光装置及びそれを用いたデバイスの製造方法
JPH08254668A (ja) 1995-03-17 1996-10-01 Fujitsu Ltd レーザ・ダイオード・モジュール及びデポラライザ
US5663785A (en) 1995-05-24 1997-09-02 International Business Machines Corporation Diffraction pupil filler modified illuminator for annular pupil fills
US5631721A (en) 1995-05-24 1997-05-20 Svg Lithography Systems, Inc. Hybrid illumination system for use in photolithography
JP3534363B2 (ja) * 1995-07-31 2004-06-07 パイオニア株式会社 結晶レンズ及びこれを用いた光ピックアップ光学系
DE19529563A1 (de) 1995-08-11 1997-02-13 Audi Ag Vorrichtung zum Verstellen der Phasenlage zumindest einer Welle
US5815247A (en) 1995-09-21 1998-09-29 Siemens Aktiengesellschaft Avoidance of pattern shortening by using off axis illumination with dipole and polarizing apertures
DE19535392A1 (de) 1995-09-23 1997-03-27 Zeiss Carl Fa Radial polarisationsdrehende optische Anordnung und Mikrolithographie-Projektionsbelichtungsanlage damit
JPH09120154A (ja) 1995-10-25 1997-05-06 Hitachi Ltd 偏光マスク及びその製作方法及びそれを用いたパターン露光方法及びそれを用いたパターン投影露光装置
JP3576685B2 (ja) 1996-02-07 2004-10-13 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
CN1179549A (zh) * 1996-05-27 1998-04-22 三星电子株式会社 光学隔离器
DE19621512A1 (de) 1996-05-29 1997-12-04 Univ Schiller Jena Verfahren und Anordnung zur Auswertung des wellenlängenabhängigen Polarisationszustandes einer Strahlung
JPH1079337A (ja) 1996-09-04 1998-03-24 Nikon Corp 投影露光装置
EP0823662A2 (de) 1996-08-07 1998-02-11 Nikon Corporation Projektionsbelichtungsapparat
US6111700A (en) 1996-09-05 2000-08-29 Fujitsu Limited Optical display device having a reflection-type polarizer
JPH10104427A (ja) 1996-10-03 1998-04-24 Sankyo Seiki Mfg Co Ltd 波長板およびそれを備えた光ピックアップ装置
US5781704C1 (en) * 1996-10-11 2002-07-16 Environmental Criminology Res Expert system method of performing crime site analysis
US5841500A (en) 1997-01-09 1998-11-24 Tellium, Inc. Wedge-shaped liquid crystal cell
JPH10282434A (ja) * 1997-04-07 1998-10-23 Ishikawajima Harima Heavy Ind Co Ltd らせんくさび形光学補正器
JP3747566B2 (ja) 1997-04-23 2006-02-22 株式会社ニコン 液浸型露光装置
US6324203B1 (en) 1997-06-13 2001-11-27 Nikon Corporation Laser light source, illuminating optical device, and exposure device
JP3264224B2 (ja) 1997-08-04 2002-03-11 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
DE19807120A1 (de) 1998-02-20 1999-08-26 Zeiss Carl Fa Optisches System mit Polarisationskompensator
KR20010042098A (ko) 1998-03-24 2001-05-25 오노 시게오 조명 장치, 노광 방법 및 장치와 디바이스 제조 방법
AU2747999A (en) 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
US6327085B1 (en) 1998-03-31 2001-12-04 Nikon Corporation Optical filter and optical device provided with this optical filter
DE69931690T2 (de) 1998-04-08 2007-06-14 Asml Netherlands B.V. Lithographischer Apparat
US6438199B1 (en) 1998-05-05 2002-08-20 Carl-Zeiss-Stiftung Illumination system particularly for microlithography
JP3985346B2 (ja) 1998-06-12 2007-10-03 株式会社ニコン 投影露光装置、投影露光装置の調整方法、及び投影露光方法
DE19829612A1 (de) 1998-07-02 2000-01-05 Zeiss Carl Fa Beleuchtungssystem der Mikrolithographie mit Depolarisator
TW468179B (en) 1998-08-05 2001-12-11 Matsushita Electric Industrial Co Ltd Optical recording medium
US6031658A (en) 1998-09-25 2000-02-29 University Of Central Florida Digital control polarization based optical scanner
JP4065923B2 (ja) 1998-09-29 2008-03-26 株式会社ニコン 照明装置及び該照明装置を備えた投影露光装置、該照明装置による投影露光方法、及び該投影露光装置の調整方法
US6563567B1 (en) 1998-12-17 2003-05-13 Nikon Corporation Method and apparatus for illuminating a surface using a projection imaging apparatus
EP1014196A3 (de) 1998-12-17 2002-05-29 Nikon Corporation Beleuchtungsverfahren und -System für einen optischen Projektionsapparat
DE60042186D1 (de) 1999-01-06 2009-06-25 Nikon Corp Onssystems
JP3640059B2 (ja) 1999-02-12 2005-04-20 パイオニア株式会社 収差補正装置及びこれを用いた光学装置
EP1045272A3 (de) 1999-04-12 2004-02-25 Matsushita Electric Industrial Co., Ltd. Reflektive Farb-Flüssigkristall-Anzeigevorrichtung
WO2000067303A1 (en) 1999-04-28 2000-11-09 Nikon Corporation Exposure method and apparatus
DE19921795A1 (de) 1999-05-11 2000-11-23 Zeiss Carl Fa Projektions-Belichtungsanlage und Belichtungsverfahren der Mikrolithographie
WO2000079331A1 (fr) 1999-06-21 2000-12-28 Citizen Watch Co., Ltd. Dispositif optique
JP3189009B2 (ja) 1999-06-21 2001-07-16 株式会社ニコン 露光装置及び方法、並びに半導体素子の製造方法
US6769273B1 (en) 1999-07-05 2004-08-03 Nikon Corporation Method of manufacturing silica glass member and silica glass member obtained by the method
JP2001135560A (ja) 1999-11-04 2001-05-18 Nikon Corp 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法
US6361909B1 (en) 1999-12-06 2002-03-26 Industrial Technology Research Institute Illumination aperture filter design using superposition
TWI282909B (en) 1999-12-23 2007-06-21 Asml Netherlands Bv Lithographic apparatus and a method for manufacturing a device
WO2001048520A1 (en) 1999-12-29 2001-07-05 Metrologic Instruments, Inc. Illumination apparatus with polarizing elements for beam shaping
US6437904B1 (en) 2000-01-13 2002-08-20 Raytheon Company Waveplate polarization rotator
DE10010131A1 (de) 2000-03-03 2001-09-06 Zeiss Carl Mikrolithographie - Projektionsbelichtung mit tangentialer Polarisartion
JP3927753B2 (ja) 2000-03-31 2007-06-13 キヤノン株式会社 露光装置及びデバイス製造方法
US6553156B1 (en) 2000-06-30 2003-04-22 Oplink Communications, Inc. Optical isolators with ultra-low polarization mode dispersion
JP3645801B2 (ja) 2000-08-24 2005-05-11 ペンタックス株式会社 ビーム列検出方法および検出用位相フィルター
JP2002075835A (ja) 2000-08-30 2002-03-15 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
JP2002231619A (ja) 2000-11-29 2002-08-16 Nikon Corp 照明光学装置および該照明光学装置を備えた露光装置
TWI285295B (en) 2001-02-23 2007-08-11 Asml Netherlands Bv Illumination optimization in lithography
US7375887B2 (en) 2001-03-27 2008-05-20 Moxtek, Inc. Method and apparatus for correcting a visible light beam using a wire-grid polarizer
CN1312509C (zh) 2001-04-05 2007-04-25 费伦茨·基什 在偏振光影响下具有旋光性的滤色镜装置
JP2002324743A (ja) 2001-04-24 2002-11-08 Canon Inc 露光方法及び装置
AU2002253574A1 (en) 2001-04-24 2002-11-11 Canon Kabushiki Kaisha Exposure method and apparatus
WO2002091078A1 (en) * 2001-05-07 2002-11-14 Massachusetts Institute Of Technology Methods and apparatus employing an index matching medium
DE10124566A1 (de) 2001-05-15 2002-11-21 Zeiss Carl Optisches Abbildungssystem mit Polarisationsmitteln und Quarzkristallplatte hierfür
KR20040015251A (ko) 2001-05-15 2004-02-18 칼 짜이스 에스엠티 아게 불화물 결정 렌즈들을 포함하는 렌즈 시스템
DE10124474A1 (de) 2001-05-19 2002-11-21 Zeiss Carl Mikrolithographisches Belichtungsverfahren sowie Projektionsobjektiv zur Durchführung des Verfahrens
DE10124803A1 (de) 2001-05-22 2002-11-28 Zeiss Carl Polarisator und Mikrolithographie-Projektionsanlage mit Polarisator
US7053988B2 (en) 2001-05-22 2006-05-30 Carl Zeiss Smt Ag. Optically polarizing retardation arrangement, and microlithography projection exposure machine
JP2002359176A (ja) 2001-05-31 2002-12-13 Canon Inc 照明装置、照明制御方法、露光装置、デバイス製造方法及びデバイス
US6737662B2 (en) 2001-06-01 2004-05-18 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
US6727992B2 (en) 2001-07-06 2004-04-27 Zygo Corporation Method and apparatus to reduce effects of sheared wavefronts on interferometric phase measurements
US6788389B2 (en) 2001-07-10 2004-09-07 Nikon Corporation Production method of projection optical system
JP4923370B2 (ja) 2001-09-18 2012-04-25 株式会社ニコン 照明光学系、露光装置、及びマイクロデバイスの製造方法
KR100431883B1 (ko) 2001-11-05 2004-05-17 삼성전자주식회사 노광방법 및 투영 노광 장치
JP4141147B2 (ja) 2002-02-01 2008-08-27 株式会社日立メディコ 磁気共鳴イメージング装置
DE10206061A1 (de) 2002-02-08 2003-09-04 Carl Zeiss Semiconductor Mfg S Polarisationsoptimiertes Beleuchtungssystem
US7075721B2 (en) 2002-03-06 2006-07-11 Corning Incorporated Compensator for radially symmetric birefringence
JP2003297727A (ja) 2002-04-03 2003-10-17 Nikon Corp 照明光学装置、露光装置および露光方法
JP3689681B2 (ja) 2002-05-10 2005-08-31 キヤノン株式会社 測定装置及びそれを有する装置群
JP4324957B2 (ja) 2002-05-27 2009-09-02 株式会社ニコン 照明光学装置、露光装置および露光方法
US7038763B2 (en) 2002-05-31 2006-05-02 Asml Netherlands B.V. Kit of parts for assembling an optical element, method of assembling an optical element, optical element, lithographic apparatus, and device manufacturing method
EP1367446A1 (de) 2002-05-31 2003-12-03 ASML Netherlands B.V. Lithographischer Apparat
JP2004179172A (ja) 2002-06-26 2004-06-24 Nikon Corp 露光装置及び露光方法並びにデバイス製造方法
US7386860B2 (en) * 2002-06-28 2008-06-10 Microsoft Corporation Type extensions to web services description language
WO2004012013A2 (en) 2002-07-26 2004-02-05 Massachusetts Institute Of Technology Optical imaging using a pupil filter and coordinated illumination polarisation
US7170679B2 (en) 2002-09-18 2007-01-30 Vision Quest Lighting, Inc. Optically active color filter
JP3958163B2 (ja) 2002-09-19 2007-08-15 キヤノン株式会社 露光方法
TW200412617A (en) 2002-12-03 2004-07-16 Nikon Corp Optical illumination device, method for adjusting optical illumination device, exposure device and exposure method
EP1429190B1 (de) 2002-12-10 2012-05-09 Canon Kabushiki Kaisha Belichtungsapparat und -verfahren
US7090964B2 (en) 2003-02-21 2006-08-15 Asml Holding N.V. Lithographic printing with polarized light
US6943941B2 (en) 2003-02-27 2005-09-13 Asml Netherlands B.V. Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
US20050164522A1 (en) 2003-03-24 2005-07-28 Kunz Roderick R. Optical fluids, and systems and methods of making and using the same
KR20170018113A (ko) 2003-04-09 2017-02-15 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
US6842223B2 (en) 2003-04-11 2005-01-11 Nikon Precision Inc. Enhanced illuminator for use in photolithographic systems
US7511886B2 (en) 2003-05-13 2009-03-31 Carl Zeiss Smt Ag Optical beam transformation system and illumination system comprising an optical beam transformation system
DE10321598A1 (de) 2003-05-13 2004-12-02 Carl Zeiss Smt Ag Beleuchtungssystem mit Axikon-Modul
JP2005024890A (ja) 2003-07-02 2005-01-27 Renesas Technology Corp 偏光子、投影レンズ系、露光装置及び露光方法
JP4101148B2 (ja) 2003-10-10 2008-06-18 古河電気工業株式会社 光ファイバ及びこの光ファイバを用いた光信号処理装置
AU2003255441A1 (en) 2003-08-14 2005-03-29 Carl Zeiss Smt Ag Illuminating device for a microlithographic projection illumination system
JP4323903B2 (ja) 2003-09-12 2009-09-02 キヤノン株式会社 照明光学系及びそれを用いた露光装置
DE10344010A1 (de) 2003-09-15 2005-04-07 Carl Zeiss Smt Ag Wabenkondensor und Beleuchtungssystem damit
US7408616B2 (en) 2003-09-26 2008-08-05 Carl Zeiss Smt Ag Microlithographic exposure method as well as a projection exposure system for carrying out the method
ATE396428T1 (de) 2003-09-26 2008-06-15 Zeiss Carl Smt Ag Belichtungsverfahren sowie projektions- belichtungssystem zur ausführung des verfahrens
JP2005108925A (ja) 2003-09-29 2005-04-21 Nikon Corp 照明光学装置、露光装置および露光方法
JPWO2005036619A1 (ja) 2003-10-09 2007-11-22 株式会社ニコン 照明光学装置、露光装置および露光方法
TWI569308B (zh) 2003-10-28 2017-02-01 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造 方法
TWI512335B (zh) 2003-11-20 2015-12-11 尼康股份有限公司 光束變換元件、光學照明裝置、曝光裝置、以及曝光方法
JP4552428B2 (ja) 2003-12-02 2010-09-29 株式会社ニコン 照明光学装置、投影露光装置、露光方法及びデバイス製造方法
US6970233B2 (en) 2003-12-03 2005-11-29 Texas Instruments Incorporated System and method for custom-polarized photolithography illumination
JP5102492B2 (ja) 2003-12-19 2012-12-19 カール・ツァイス・エスエムティー・ゲーエムベーハー 結晶素子を有するマイクロリソグラフィー投影用対物レンズ
US7292315B2 (en) 2003-12-19 2007-11-06 Asml Masktools B.V. Optimized polarization illumination
US7414786B2 (en) 2004-01-12 2008-08-19 University Of Rochester System and method converting the polarization state of an optical beam into an inhomogeneously polarized state
KR101230757B1 (ko) 2004-01-16 2013-02-06 칼 짜이스 에스엠티 게엠베하 편광변조 광학소자
US20070019179A1 (en) 2004-01-16 2007-01-25 Damian Fiolka Polarization-modulating optical element
US8270077B2 (en) 2004-01-16 2012-09-18 Carl Zeiss Smt Gmbh Polarization-modulating optical element
TWI395068B (zh) 2004-01-27 2013-05-01 尼康股份有限公司 光學系統、曝光裝置以及曝光方法
TWI505329B (zh) 2004-02-06 2015-10-21 尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法以及元件製造方法
JP4497968B2 (ja) 2004-03-18 2010-07-07 キヤノン株式会社 照明装置、露光装置及びデバイス製造方法
US7304719B2 (en) 2004-03-31 2007-12-04 Asml Holding N.V. Patterned grid element polarizer
JP4332460B2 (ja) 2004-04-02 2009-09-16 キヤノン株式会社 照明光学系及び当該照明光学系を有する露光装置
JP4776891B2 (ja) 2004-04-23 2011-09-21 キヤノン株式会社 照明光学系、露光装置、及びデバイス製造方法
US7324280B2 (en) 2004-05-25 2008-01-29 Asml Holding N.V. Apparatus for providing a pattern of polarization
JP5159027B2 (ja) 2004-06-04 2013-03-06 キヤノン株式会社 照明光学系及び露光装置
JP2006005319A (ja) 2004-06-21 2006-01-05 Canon Inc 照明光学系及び方法、露光装置及びデバイス製造方法
US7548370B2 (en) 2004-06-29 2009-06-16 Asml Holding N.V. Layered structure for a tile wave plate assembly
JPWO2006016469A1 (ja) 2004-08-10 2008-05-01 株式会社ニコン 照明光学装置、露光装置、および露光方法
DE102004040534B4 (de) 2004-08-20 2006-06-14 Carl Zeiss Jena Gmbh Diffraktives polarisationstrennendes Element für unpolarisierte elektromagnetische Strahlung im UV-Bereich, System mit zwei solchen Elementen und Verfahren zur Herstellung eines solchen Elementes
JP4528580B2 (ja) 2004-08-24 2010-08-18 株式会社東芝 照明光源の設計方法、マスクパターン設計方法、フォトマスクの製造方法、半導体装置の製造方法、及びプログラム
US7433046B2 (en) 2004-09-03 2008-10-07 Carl Ziess Meditec, Inc. Patterned spinning disk based optical phase shifter for spectral domain optical coherence tomography
US20060072207A1 (en) 2004-09-30 2006-04-06 Williams David L Method and apparatus for polarizing electromagnetic radiation
US7245353B2 (en) 2004-10-12 2007-07-17 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method
US7271874B2 (en) 2004-11-02 2007-09-18 Asml Holding N.V. Method and apparatus for variable polarization control in a lithography system
WO2006059549A1 (ja) 2004-12-03 2006-06-08 Nikon Corporation 照明光学装置、その製造方法、露光装置、および露光方法
JP2006179516A (ja) 2004-12-20 2006-07-06 Toshiba Corp 露光装置、露光方法及び半導体装置の製造方法
US7345740B2 (en) 2004-12-28 2008-03-18 Asml Netherlands B.V. Polarized radiation in lithographic apparatus and device manufacturing method
US7312852B2 (en) 2004-12-28 2007-12-25 Asml Netherlands B.V. Polarized radiation in lithographic apparatus and device manufacturing method
US20060158424A1 (en) 2005-01-19 2006-07-20 Tong Xie Optical slide pad
TWI453795B (zh) 2005-01-21 2014-09-21 尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
US7317512B2 (en) 2005-07-11 2008-01-08 Asml Netherlands B.V. Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method
DE102006031807A1 (de) 2005-07-12 2007-01-18 Carl Zeiss Smt Ag Beleuchtungseinrichtung einer mikrolithographischen Projektionsbelichtungsanlage, sowie Depolarisator
US20070058151A1 (en) 2005-09-13 2007-03-15 Asml Netherlands B.V. Optical element for use in lithography apparatus and method of conditioning radiation beam
JP4920041B2 (ja) 2005-10-04 2012-04-18 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系とりわけマイクロリソグラフィック投影露光機における偏光分布に影響を与えるための装置及び方法
US20090115989A1 (en) 2005-11-10 2009-05-07 Hirohisa Tanaka Lighting optical system, exposure system, and exposure method
JP5283317B2 (ja) 2006-01-30 2013-09-04 Ｎｔｎ株式会社 車輪用軸受装置の製造方法
JP4245015B2 (ja) * 2006-08-11 2009-03-25 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置、有機エレクトロルミネッセンス装置の製造方法並びに電子機器
JP4225357B2 (ja) 2007-04-13 2009-02-18 ダイキン工業株式会社 冷媒充填装置、冷凍装置及び冷媒充填方法
KR20100085974A (ko) 2007-10-12 2010-07-29 가부시키가이샤 니콘 조명 광학 장치, 및 노광 방법 및 장치
JP5090128B2 (ja) 2007-10-30 2012-12-05 株式会社三共 スロットマシン
JP5109601B2 (ja) 2007-11-09 2012-12-26 豊田合成株式会社 エアバッグ装置
JP5316744B2 (ja) 2008-02-28 2013-10-16 良信 田中 ゴルフパター
JP5326370B2 (ja) 2008-06-16 2013-10-30 富士ゼロックス株式会社 静電荷像現像用トナー、静電荷像現像剤及び画像形成方法

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KR101165862B1 (ko) 2012-07-17
KR20060132598A (ko) 2006-12-21
KR101099847B1 (ko) 2011-12-27
KR20110122877A (ko) 2011-11-11
US8861084B2 (en) 2014-10-14
KR101295438B1 (ko) 2013-08-09
JP2014139677A (ja) 2014-07-31
JP5398770B2 (ja) 2014-01-29
EP1716457B1 (de) 2011-12-28
US8289623B2 (en) 2012-10-16
CN101799587A (zh) 2010-08-11
JP4958562B2 (ja) 2012-06-20
JP5497683B2 (ja) 2014-05-21
CN101793993A (zh) 2010-08-04
CN1910522B (zh) 2010-05-26
CN101726863B (zh) 2012-08-29
KR101099913B1 (ko) 2011-12-29
US20140102355A1 (en) 2014-04-17
KR20110122879A (ko) 2011-11-11
US20080316598A1 (en) 2008-12-25
US9316772B2 (en) 2016-04-19
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JP2011175271A (ja) 2011-09-08
JP5193330B2 (ja) 2013-05-08
US20070081114A1 (en) 2007-04-12
US8320043B2 (en) 2012-11-27
KR20120023188A (ko) 2012-03-12
CN101726863A (zh) 2010-06-09
CN101799637A (zh) 2010-08-11
JP2011138164A (ja) 2011-07-14
US8711479B2 (en) 2014-04-29
US20130222778A1 (en) 2013-08-29
KR20110122880A (ko) 2011-11-11
WO2005069081A3 (en) 2005-11-10
KR20120088864A (ko) 2012-08-08
US20090002675A1 (en) 2009-01-01
EP1716457B9 (de) 2012-04-04
JP2011175272A (ja) 2011-09-08
JP2015180936A (ja) 2015-10-15
KR101233879B1 (ko) 2013-02-15
US20100177293A1 (en) 2010-07-15
WO2005069081A2 (en) 2005-07-28
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JP5639941B2 (ja) 2014-12-10
CN101799587B (zh) 2012-05-30

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