ATE450886T1 - Beleuchtungsapparat, methode zur justierung des beleuchtungsapparats, belichtungssystem und belichtungsverfahren - Google Patents

Beleuchtungsapparat, methode zur justierung des beleuchtungsapparats, belichtungssystem und belichtungsverfahren

Info

Publication number
ATE450886T1
ATE450886T1 AT05768370T AT05768370T ATE450886T1 AT E450886 T1 ATE450886 T1 AT E450886T1 AT 05768370 T AT05768370 T AT 05768370T AT 05768370 T AT05768370 T AT 05768370T AT E450886 T1 ATE450886 T1 AT E450886T1
Authority
AT
Austria
Prior art keywords
distribution
illuminated
pupil
lighting apparatus
adjusting
Prior art date
Application number
AT05768370T
Other languages
English (en)
Inventor
Hirohisa Tanaka
Koji Shigematsu
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35907362&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE450886(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE450886T1 publication Critical patent/ATE450886T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0004—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed
    • G02B19/0009—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only
    • G02B19/0014—Condensers, e.g. light collectors or similar non-imaging optics characterised by the optical means employed having refractive surfaces only at least one surface having optical power
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B19/00—Condensers, e.g. light collectors or similar non-imaging optics
    • G02B19/0033—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use
    • G02B19/0047—Condensers, e.g. light collectors or similar non-imaging optics characterised by the use for use with a light source
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Studio Devices (AREA)
  • Exposure Control For Cameras (AREA)
AT05768370T 2004-08-17 2005-08-03 Beleuchtungsapparat, methode zur justierung des beleuchtungsapparats, belichtungssystem und belichtungsverfahren ATE450886T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004236913A JP4599936B2 (ja) 2004-08-17 2004-08-17 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法
PCT/JP2005/014166 WO2006018972A1 (ja) 2004-08-17 2005-08-03 照明光学装置、照明光学装置の調整方法、露光装置、および露光方法

Publications (1)

Publication Number Publication Date
ATE450886T1 true ATE450886T1 (de) 2009-12-15

Family

ID=35907362

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05768370T ATE450886T1 (de) 2004-08-17 2005-08-03 Beleuchtungsapparat, methode zur justierung des beleuchtungsapparats, belichtungssystem und belichtungsverfahren

Country Status (10)

Country Link
US (1) US9235133B2 (de)
EP (1) EP1798758B2 (de)
JP (1) JP4599936B2 (de)
KR (2) KR101251214B1 (de)
CN (1) CN100539018C (de)
AT (1) ATE450886T1 (de)
DE (1) DE602005018082D1 (de)
IL (1) IL181344A (de)
TW (2) TWI493276B (de)
WO (1) WO2006018972A1 (de)

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Also Published As

Publication number Publication date
EP1798758A1 (de) 2007-06-20
IL181344A0 (en) 2007-07-04
TW201300936A (zh) 2013-01-01
TWI493276B (zh) 2015-07-21
JP2006059834A (ja) 2006-03-02
KR20120101599A (ko) 2012-09-13
KR20070041582A (ko) 2007-04-18
CN101006552A (zh) 2007-07-25
KR101251214B1 (ko) 2013-04-08
DE602005018082D1 (de) 2010-01-14
CN100539018C (zh) 2009-09-09
US9235133B2 (en) 2016-01-12
IL181344A (en) 2015-07-30
WO2006018972A1 (ja) 2006-02-23
EP1798758B1 (de) 2009-12-02
EP1798758B2 (de) 2019-03-13
JP4599936B2 (ja) 2010-12-15
TWI390331B (zh) 2013-03-21
TW200609656A (en) 2006-03-16
US20080030707A1 (en) 2008-02-07
HK1106064A1 (zh) 2008-02-29
KR101285056B1 (ko) 2013-07-10
EP1798758A4 (de) 2008-06-25

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