ATE456823T1 - Verbundzusammensetzung für mikrostrukturierte schichten - Google Patents

Verbundzusammensetzung für mikrostrukturierte schichten

Info

Publication number
ATE456823T1
ATE456823T1 AT07787376T AT07787376T ATE456823T1 AT E456823 T1 ATE456823 T1 AT E456823T1 AT 07787376 T AT07787376 T AT 07787376T AT 07787376 T AT07787376 T AT 07787376T AT E456823 T1 ATE456823 T1 AT E456823T1
Authority
AT
Austria
Prior art keywords
composite composition
microstructured layers
patterned
micropatterns
hydrolysate
Prior art date
Application number
AT07787376T
Other languages
English (en)
Inventor
Pamela Kalmes
Michael Veith
Carsten Becker-Willinger
Etsuko Hino
Norio Ohkuma
Mitsutoshi Noguchi
Yoshikazu Saito
Original Assignee
Leibniz Inst Neue Materialien
Canon Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leibniz Inst Neue Materialien, Canon Kk filed Critical Leibniz Inst Neue Materialien
Application granted granted Critical
Publication of ATE456823T1 publication Critical patent/ATE456823T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Ceramic Engineering (AREA)
  • Silicon Polymers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
  • Polyethers (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
AT07787376T 2006-07-18 2007-07-11 Verbundzusammensetzung für mikrostrukturierte schichten ATE456823T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200610033280 DE102006033280A1 (de) 2006-07-18 2006-07-18 Kompositzusammensetzung für mikrostrukturierte Schichten
PCT/EP2007/057103 WO2008009608A1 (en) 2006-07-18 2007-07-11 Composite composition for micropatterned layers

Publications (1)

Publication Number Publication Date
ATE456823T1 true ATE456823T1 (de) 2010-02-15

Family

ID=38738873

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07787376T ATE456823T1 (de) 2006-07-18 2007-07-11 Verbundzusammensetzung für mikrostrukturierte schichten

Country Status (8)

Country Link
US (1) US8680179B2 (de)
EP (1) EP2049949B1 (de)
JP (1) JP5089690B2 (de)
AT (1) ATE456823T1 (de)
DE (2) DE102006033280A1 (de)
ES (1) ES2339501T3 (de)
TW (1) TWI434140B (de)
WO (1) WO2008009608A1 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE60324157D1 (de) 2003-07-22 2008-11-27 Leibniz Inst Neue Materialien Flüssigkeitsabweisende, alkali-beständige beschichtungszusammensetzung und beschichtungsmuster.
DE102005002960A1 (de) 2005-01-21 2006-08-03 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrogemusterte Schichten mit hohem Relaxationsvermögen, hoher chemischer Beständigkeit und mechanischer Stabilität
DE102006033280A1 (de) 2006-07-18 2008-01-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrostrukturierte Schichten
US20090142694A1 (en) * 2007-11-30 2009-06-04 Braggone Oy Siloxane polymer compositions and methods of using the same
JP5631738B2 (ja) * 2007-11-30 2014-11-26 オプティチューン オサケ ユキチュア 新規シロキサンポリマー組成物
JP2011132416A (ja) * 2009-12-25 2011-07-07 Nagase Chemtex Corp 熱硬化性樹脂組成物及び有機無機複合樹脂
JP5729133B2 (ja) * 2010-07-16 2015-06-03 Jsr株式会社 感放射線性組成物、保護膜、層間絶縁膜、及びそれらの形成方法
RU2472197C2 (ru) * 2011-02-24 2013-01-10 Государственное образовательное учреждение высшего профессионального образования "Московский государственный текстильный университет имени А.Н. Косыгина" Фотополимеризующаяся композиция для печати по текстильным материалам
WO2013099785A1 (ja) * 2011-12-26 2013-07-04 東レ株式会社 感光性樹脂組成物および半導体素子の製造方法
JP6127497B2 (ja) * 2012-12-19 2017-05-17 Jsr株式会社 着色組成物、カラーフィルタ、表示素子及びポリシロキサン
US20150060113A1 (en) * 2013-01-22 2015-03-05 Yongcai Wang Photocurable composition, article, and method of use
KR101956273B1 (ko) * 2013-08-13 2019-03-08 삼성전기주식회사 수지 조성물, 이를 이용한 인쇄회로기판 및 그 제조방법
WO2015046333A1 (ja) * 2013-09-27 2015-04-02 株式会社ダイセル 半導体積層用接着剤組成物
JP6557856B2 (ja) * 2015-06-22 2019-08-14 パナソニックＩｐマネジメント株式会社 樹脂組成物およびその製造方法、それを用いた製品
KR102508142B1 (ko) * 2015-10-13 2023-03-08 인프리아 코포레이션 유기주석 옥사이드 하이드록사이드 패터닝 조성물, 전구체 및 패터닝
US11015040B2 (en) * 2016-11-07 2021-05-25 3M Innovative Properties Company Curable resin including nanoparticles including surface-bonded hydrophobically-modifying alkyl groups
DE102017101823A1 (de) 2017-01-31 2018-08-02 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Strukturiertes Komposit aus Matrixmaterial und Nanopartikeln
WO2019018507A1 (en) 2017-07-20 2019-01-24 Saudi Arabian Oil Company MITIGATION OF CONDENSATE ACCUMULATION USING SURFACE MODIFICATION
EP3524635A1 (de) * 2018-02-08 2019-08-14 Surfix B.V. Verfahren zur modifizierung einer festen oberfläche
WO2020154063A1 (en) 2019-01-23 2020-07-30 Saudi Arabian Oil Company Mitigation of condensate and water banking using functionalized nanoparticles

Family Cites Families (70)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61261365A (ja) * 1985-05-14 1986-11-19 Nippon Oil Co Ltd 光硬化性被覆組成物
JPH0830169B2 (ja) 1986-08-19 1996-03-27 日本合成ゴム株式会社 コ−テイング用組成物
US4994299A (en) * 1989-06-22 1991-02-19 General Electric Company Substantially odor free, UV curable organopolysiloxane release coating compositions and coating method
US5057550A (en) * 1989-12-04 1991-10-15 Dow Corning Corporation Epoxy-silanol functional uv curable polymers
JPH03293067A (ja) 1990-04-10 1991-12-24 Mitsui Toatsu Chem Inc 塗膜硬化方法
US5457003A (en) * 1990-07-06 1995-10-10 Nippon Telegraph And Telephone Corporation Negative working resist material, method for the production of the same and process of forming resist patterns using the same
JPH04338958A (ja) 1990-07-06 1992-11-26 Nippon Telegr & Teleph Corp <Ntt> レジスト材料、その製造方法およびこれを用いたパターン形成方法
DE69130966T2 (de) 1990-07-06 1999-09-16 Nippon Telegraph And Telephone Corp., Tokio/Tokyo Resistmaterial, Methode zu seiner Herstellung und Verfahren zum Herstellen von Resistbildern mit diesem Material
US5178959A (en) * 1991-03-27 1993-01-12 General Electric Company Epoxy-functional fluorosilicones
DE4118184A1 (de) * 1991-06-03 1992-12-10 Inst Neue Mat Gemein Gmbh Beschichtungszusammensetzungen auf der basis von fluorhaltigen anorganischen polykondensaten, deren herstellung und deren verwendung
US5217805A (en) * 1991-10-15 1993-06-08 Minnesota Mining And Manufacturing Company Uv-curable silicon release compositions
US5260348A (en) * 1992-01-31 1993-11-09 General Electric Company Silicone compositions which exhibit enhanced cure characteristics
JP2748769B2 (ja) 1992-03-19 1998-05-13 信越化学工業株式会社 熱硬化性樹脂組成物及び硬化物
US5290900A (en) 1992-04-27 1994-03-01 Dow Corning Toray Silicone, Ltd. Curable fluorosilicone resin composition
US5411996A (en) * 1992-06-25 1995-05-02 General Electric Company One-part UV-curable epoxy silicone compositions containing a fluorinated alcohol
DE4310733A1 (de) * 1993-04-01 1994-10-06 Fraunhofer Ges Forschung Selbsthärtende Systeme
JP3339910B2 (ja) 1993-04-15 2002-10-28 東レ・ダウコーニング・シリコーン株式会社 硬化性樹脂組成物
EP0620242B1 (de) * 1993-04-15 1998-08-19 Dow Corning Toray Silicone Company, Limited Epoxygruppen enthaltendes Siliconharz und Massen auf seiner Basis
US5952439A (en) * 1993-04-15 1999-09-14 Dow Corning Toray Silicone Co., Ltd. Epoxy group-containing silicone resin and compositions based thereon
JP3143308B2 (ja) * 1994-01-31 2001-03-07 キヤノン株式会社 インクジェット記録ヘッドの製造方法
JP3609480B2 (ja) * 1995-03-31 2005-01-12 大日本インキ化学工業株式会社 塗膜形成方法及びそれに使用されるベースコート塗料
DE19512427A1 (de) * 1995-04-03 1996-10-10 Inst Neue Mat Gemein Gmbh Kompositklebstoff für optische und optoelektronische Anwendungen
US5656336A (en) * 1996-03-08 1997-08-12 Revlon Consumer Products Corporation Glass decorating method using bis-phenol-a epoxy resins and related compositions and articles
JP3289125B2 (ja) * 1996-03-15 2002-06-04 ソニーケミカル株式会社 光情報記録媒体
DE19613650C1 (de) * 1996-04-04 1997-04-10 Fraunhofer Ges Forschung Hydrolisierbare, fluorierte Silane, Verfahren zu deren Herstellung und deren Verwendung zur Herstellung von Kieselsäurepolykondensaten und Kieselsäureheteropolykondensaten
DE19630319C1 (de) * 1996-07-26 1998-04-23 Siemens Ag Modifiziertes Epoxysiloxan Kondensat, Verfahren zu dessen Herstellung und dessen Einsatz als Low-Stress-Gießharz für die Elektronik und Elektrotechnik
FR2757870B1 (fr) * 1996-12-30 1999-03-26 Rhodia Chimie Sa Utilisation de compositions silicones reticulables par voie cationique sous uv et d'un photoamorceur du type borate d'onium, pour le revetements de joints plats, notamment de joints de culasse
MY122234A (en) 1997-05-13 2006-04-29 Inst Neue Mat Gemein Gmbh Nanostructured moulded bodies and layers and method for producing same
DE19726829A1 (de) * 1997-06-24 1999-01-07 Inst Neue Mat Gemein Gmbh Verwendung von nanoskaligen Metalloxid-Teilchen als Polymerisationskatalysatoren
DE19737328A1 (de) * 1997-08-27 1999-03-04 Bayer Ag Beschichtungszusammensetzungen auf der Basis von Epoxidgruppen enthaltenden Silanen
JPH11131022A (ja) 1997-10-31 1999-05-18 Sho Bond Constr Co Ltd 落書き除去方法
JP3559697B2 (ja) * 1997-12-01 2004-09-02 キヤノン株式会社 インクジェット記録ヘッドの製造方法
US6391999B1 (en) 1998-02-06 2002-05-21 Rensselaer Polytechnic Institute Epoxy alkoxy siloxane oligomers
BR9911608A (pt) 1998-06-04 2001-02-06 Nippon Sheet Glass Co Ltd Processo para a produção de artigo revestido com pelìcula repelente de água, artigo revestido com pelìcula repelente de água, e composição lìquida para revestimento de pelìcula repelente de água
TW482817B (en) 1998-06-18 2002-04-11 Jsr Corp Photosetting compositions and photoset articles
JP2000212443A (ja) 1999-01-27 2000-08-02 Toagosei Co Ltd 光カチオン硬化性樹脂組成物
JP4096138B2 (ja) 1999-04-12 2008-06-04 Ｊｓｒ株式会社 レジスト下層膜用組成物の製造方法
JP2000347001A (ja) 1999-06-03 2000-12-15 Asahi Denka Kogyo Kk 光重合性組成物およびハードコート剤
JP3450251B2 (ja) 2000-01-28 2003-09-22 大日本塗料株式会社 水性塗料組成物
FR2805273B1 (fr) 2000-02-18 2006-08-11 Rhodia Chimie Sa Traitement de surface de materiau plastique avec une composition a fonctions reactives polymerisable et/ou reticulable
US6514574B1 (en) * 2000-06-29 2003-02-04 Essilor International Compagnie Generale D'optique Process for making an abrasion resistant coating onto an organic glass substrate
DE60130187T2 (de) 2000-12-13 2008-05-21 Shin-Etsu Chemical Co., Ltd. Strahlenhärtbare Siliconzusammensetzungen
JP2002298648A (ja) 2001-04-02 2002-10-11 Mitsubishi Rayon Co Ltd 導電性光硬化性樹脂組成物、導電性光硬化性シートおよび導電性インサート成形品
US6476174B1 (en) * 2001-06-15 2002-11-05 Industrial Technology Research Institute Process for preparing a silica-based organic-inorganic hybrid resin and the organic-inorganic hybrid resin prepared therefrom
US6743510B2 (en) 2001-11-13 2004-06-01 Sumitomo Chemical Company, Limited Composition comprising a cationic polymerization compound and coating obtained from the same
US6992117B2 (en) * 2002-01-17 2006-01-31 Canon Kabushiki Kaisha Epoxy resin composition, surface treatment method, liquid-jet recording head and liquid-jet recording apparatus
JP2004038142A (ja) * 2002-03-03 2004-02-05 Shipley Co Llc ポリシロキサンを製造する方法及びそれを含むフォトレジスト組成物
JP4305608B2 (ja) 2002-03-11 2009-07-29 Ｊｓｒ株式会社 カラーフィルタ保護膜用組成物および保護膜
JP4180844B2 (ja) 2002-06-06 2008-11-12 昭和電工株式会社 硬化性難燃組成物、その硬化物及びその製造方法
JP4205368B2 (ja) 2002-06-11 2009-01-07 株式会社Ａｄｅｋａ 光学材料用硬化性組成物
JP2004027145A (ja) * 2002-06-28 2004-01-29 Tamura Kaken Co Ltd 塗工用硬化性樹脂組成物、多層プリント配線板、プリント配線板及びドライフィルム
JP2004155954A (ja) 2002-11-07 2004-06-03 Mitsubishi Chemicals Corp 光硬化性組成物及びその製造方法、並びに硬化物
US7022410B2 (en) * 2003-12-16 2006-04-04 General Electric Company Combinations of resin compositions and methods of use thereof
FR2849867B1 (fr) * 2003-01-10 2005-03-25 Centre Nat Rech Scient Croissance diamant a grande vitesse par plasma micro-onde en regime pulse.
JPWO2004072150A1 (ja) 2003-02-12 2006-06-01 日本化薬株式会社 エポキシ基含有ケイ素化合物及び熱硬化性樹脂組成物
DE10323729A1 (de) 2003-05-26 2004-12-16 Institut Für Neue Materialien Gem. Gmbh Zusammensetzung mit Nichtnewtonschem Verhalten
JP4110401B2 (ja) 2003-06-13 2008-07-02 信越化学工業株式会社 感光性シリコーン樹脂組成物及びその硬化物並びにネガ型微細パターンの形成方法
JP4412705B2 (ja) 2003-06-25 2010-02-10 日本化薬株式会社 感光性樹脂組成物及びその硬化皮膜を有するフィルム
AU2003304346A1 (en) * 2003-07-22 2005-02-04 Canon Kabushiki Kaisha Ink jet head and its manufacture method
DE60324157D1 (de) * 2003-07-22 2008-11-27 Leibniz Inst Neue Materialien Flüssigkeitsabweisende, alkali-beständige beschichtungszusammensetzung und beschichtungsmuster.
AU2003254564A1 (en) 2003-07-22 2005-02-25 Canon Kabushiki Kaisha Liquid-repellent coating composition and coating having high alkali resistance
JP2005089697A (ja) 2003-09-19 2005-04-07 Toagosei Co Ltd 活性エネルギー線硬化型組成物
JP4629367B2 (ja) 2004-05-31 2011-02-09 東レ・ダウコーニング株式会社 活性エネルギー線硬化型オルガノポリシロキサン樹脂組成物、光伝送部材およびその製造方法
JP4498232B2 (ja) * 2004-06-28 2010-07-07 キヤノン株式会社 光カチオン重合性エポキシ樹脂組成物、並びに、これを用いた微細構造体の製造方法及びインクジェットヘッドの製造方法
JP4656290B2 (ja) * 2004-09-02 2011-03-23 株式会社スリーボンド 光硬化性組成物
US8017211B2 (en) * 2004-12-03 2011-09-13 Mitsubishi Chemical Corporation Composition, cured product and article
DE102005002960A1 (de) 2005-01-21 2006-08-03 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrogemusterte Schichten mit hohem Relaxationsvermögen, hoher chemischer Beständigkeit und mechanischer Stabilität
DE102006033280A1 (de) 2006-07-18 2008-01-24 Leibniz-Institut Für Neue Materialien Gemeinnützige Gmbh Kompositzusammensetzung für mikrostrukturierte Schichten
JP2008133422A (ja) * 2006-10-31 2008-06-12 Tohoku Ricoh Co Ltd 活性エネルギー線硬化型インキ
JP5480469B2 (ja) 2006-10-31 2014-04-23 株式会社日本触媒 樹脂組成物、光学材料、及び、該光学材料の制御方法

Also Published As

Publication number Publication date
US20100260978A9 (en) 2010-10-14
WO2008009608A1 (en) 2008-01-24
TWI434140B (zh) 2014-04-11
ES2339501T3 (es) 2010-05-20
EP2049949B1 (de) 2010-01-27
JP5089690B2 (ja) 2012-12-05
DE602007004626D1 (de) 2010-03-18
JP2009543920A (ja) 2009-12-10
DE102006033280A1 (de) 2008-01-24
EP2049949A1 (de) 2009-04-22
US20090258197A1 (en) 2009-10-15
TW200811601A (en) 2008-03-01
US8680179B2 (en) 2014-03-25

Similar Documents

Publication Publication Date Title
ATE456823T1 (de) Verbundzusammensetzung für mikrostrukturierte schichten
BRPI0720985A8 (pt) Composições de pneus contendo polissulfetos com núcleo silado, e pneu que as compreende
ATE499417T1 (de) Wässrige hochleistungsbeschichtungszusammensetzungen
ATE522570T1 (de) Reifenzusammensetzungen und d komponenten mit silylierten polysulfiden mit cyclischem kern
TW200739269A (en) Coating compositions for photoresists
MX2012007209A (es) Agentes de recubrimiento y articulos recubiertos.
WO2008027979A3 (en) Resin systems including reactive surface-modified nanoparticles
AR060293A1 (es) Sistema-resina hibrida reactiva de dos componentes (acuoso), procedimiento para su produccion, asi como su utilizacion
ATE446856T1 (de) Kautschukmischungen
WO2007127984A3 (en) Siloxane epoxy polymers for redistribution layer applications
BRPI0805539A2 (pt) dispersões adesivas contendo siloxano
TWI339673B (en) Liquid-repellent, alkali-resistant coating composition and coating suitable for pattern forming
WO2009011777A3 (en) Curable silicon-containing compositions possessing high translucency
ATE541863T1 (de) Redispergierbare nanopartikel
BRPI0820971A8 (pt) Camada protetora para plantas e árvores, sua produção e seu uso
TW200632040A (en) Composite composition for micropatterned layers having high relaxation ability, high chemical resistance and mechanical stability
DE502007006853D1 (de) Bedruckte, verformbare folien
BRPI0813208A2 (pt) &#34;composição de revestimento, resina epóxi modificada por silicato, processo para a preparação de uma resina epóxi modificada por silicato, uso da resina epóxi modificada por silicato, processo de revestimento de um substrato e substrato revestido&#34;
MA33037B1 (fr) Procede de fabrication de particules de caoutchouc enrobees , particules de caoutchouc enrobees et formation d&#39;enrobage sans solvant
TW200745194A (en) Epoxy resin hardener and epoxy resin composition
WO2007087618A3 (en) Coating suitable for surgical instruments
BRPI0511929A (pt) método para formar ou curar compósitos poliméricos
TW200732367A (en) Epoxy resin curing agent composition for epoxy resin and epoxy resin composition
ATE452620T1 (de) Partikel, funktionalisiert mit organischen verbindungen
WO2012093860A3 (ko) 프리프레그 및 이를 포함하는 프린트 배선판

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties