ATE484840T1 - Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen - Google Patents
Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchenInfo
- Publication number
- ATE484840T1 ATE484840T1 AT02016838T AT02016838T ATE484840T1 AT E484840 T1 ATE484840 T1 AT E484840T1 AT 02016838 T AT02016838 T AT 02016838T AT 02016838 T AT02016838 T AT 02016838T AT E484840 T1 ATE484840 T1 AT E484840T1
- Authority
- AT
- Austria
- Prior art keywords
- aligning
- column
- charged particle
- particle beams
- aperture
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 4
- 239000002245 particle Substances 0.000 title abstract 3
- 201000009310 astigmatism Diseases 0.000 abstract 1
- 230000008033 biological extinction Effects 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
- H01J37/1471—Arrangements for directing or deflecting the discharge along a desired path for centering, aligning or positioning of ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical, image processing or photographic arrangements associated with the tube
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/263—Contrast, resolution or power of penetration
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/261—Details
- H01J37/265—Controlling the tube; circuit arrangements adapted to a particular application not otherwise provided, e.g. bright-field-dark-field illumination
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/045—Diaphragms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/15—Means for deflecting or directing discharge
- H01J2237/1501—Beam alignment means or procedures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/153—Correcting image defects, e.g. stigmators
- H01J2237/1532—Astigmatism
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/21—Focus adjustment
- H01J2237/216—Automatic focusing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/22—Treatment of data
- H01J2237/221—Image processing
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
- Electron Beam Exposure (AREA)
- Measurement Of Radiation (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US32845201P | 2001-10-10 | 2001-10-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE484840T1 true ATE484840T1 (de) | 2010-10-15 |
Family
ID=23281045
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02016839T ATE453205T1 (de) | 2001-10-10 | 2002-07-29 | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
| AT02016838T ATE484840T1 (de) | 2001-10-10 | 2002-07-29 | Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02016839T ATE453205T1 (de) | 2001-10-10 | 2002-07-29 | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US7271396B2 (de) |
| EP (2) | EP1306878B1 (de) |
| JP (1) | JP4928506B2 (de) |
| CN (1) | CN100397549C (de) |
| AT (2) | ATE453205T1 (de) |
| DE (2) | DE60237952D1 (de) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7016080B2 (en) * | 2000-09-21 | 2006-03-21 | Eastman Kodak Company | Method and system for improving scanned image detail |
| ATE453205T1 (de) | 2001-10-10 | 2010-01-15 | Applied Materials Israel Ltd | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
| JP4108604B2 (ja) * | 2001-10-10 | 2008-06-25 | アプライド マテリアルズ イスラエル リミテッド | 荷電粒子ビームカラムのアライメント方法および装置 |
| EP1489641B1 (de) * | 2003-06-18 | 2019-08-14 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Ablenksystem für geladene Teilchen |
| JP4111908B2 (ja) * | 2003-12-15 | 2008-07-02 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡 |
| EP1557866B1 (de) | 2004-01-21 | 2011-03-16 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Strahlenoptische Komponente mit einer teilchenoptischen Linse |
| JP4351108B2 (ja) * | 2004-04-07 | 2009-10-28 | 日本電子株式会社 | Semの収差自動補正方法及び収差自動補正装置 |
| JP4383950B2 (ja) * | 2004-04-23 | 2009-12-16 | 株式会社日立ハイテクノロジーズ | 荷電粒子線調整方法、及び荷電粒子線装置 |
| JP4522203B2 (ja) * | 2004-09-14 | 2010-08-11 | 日本電子株式会社 | 荷電粒子ビーム装置の色収差補正方法及び装置並びに荷電粒子ビーム装置 |
| US7492057B2 (en) * | 2004-11-10 | 2009-02-17 | Baldwin Mark H | High reliability DC power distribution system |
| JP2006173038A (ja) * | 2004-12-20 | 2006-06-29 | Hitachi High-Technologies Corp | 荷電粒子線装置、試料像表示方法及びイメージシフト感度計測方法 |
| JP4611755B2 (ja) * | 2005-01-13 | 2011-01-12 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡及びその撮像方法 |
| JP4652830B2 (ja) * | 2005-01-26 | 2011-03-16 | キヤノン株式会社 | 収差調整方法、デバイス製造方法及び荷電粒子線露光装置 |
| US8026491B2 (en) * | 2006-03-08 | 2011-09-27 | Hitachi High-Technologies Corporation | Charged particle beam apparatus and method for charged particle beam adjustment |
| JP4857101B2 (ja) * | 2006-12-21 | 2012-01-18 | 株式会社日立ハイテクノロジーズ | プローブ評価方法 |
| US8345162B2 (en) * | 2007-07-31 | 2013-01-01 | Verint Systems Inc. | Systems and methods for triggering an out of focus alert |
| JP5188846B2 (ja) * | 2008-03-10 | 2013-04-24 | 日本電子株式会社 | 走査型透過電子顕微鏡の収差補正装置及び収差補正方法 |
| WO2010013167A1 (en) * | 2008-07-28 | 2010-02-04 | Philips Intellectual Property & Standards Gmbh | Method and device for generating euv radiation or soft x-rays |
| EP2166557A1 (de) * | 2008-09-22 | 2010-03-24 | FEI Company | Verfahren zur Berichtigung von Verzerrungen in einer teilchenoptischen Vorrichtung |
| EP2228817B1 (de) * | 2009-03-09 | 2012-07-18 | IMS Nanofabrication AG | Allgemeine Punktverbreitungsfunktion bei Mehrstrahlenmusterung |
| GB0912332D0 (en) * | 2009-07-16 | 2009-08-26 | Vg Systems Ltd | Magnetic lens,method for focussing charged particles and charged particle energy analyser |
| EP2316799A1 (de) * | 2009-10-30 | 2011-05-04 | AGC Glass Europe | Beschichtetes Flachglas |
| KR101455944B1 (ko) * | 2010-09-30 | 2014-10-28 | 가부시키가이샤 히다치 하이테크놀로지즈 | 주사 전자 현미경 |
| JP5537460B2 (ja) * | 2011-02-17 | 2014-07-02 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微鏡及びそれを用いた計測画像の補正方法 |
| EP2511936B1 (de) * | 2011-04-13 | 2013-10-02 | Fei Company | Verzerrungsfreie Stigmation eines TEM |
| JP5386544B2 (ja) * | 2011-06-07 | 2014-01-15 | 株式会社アドバンテスト | 電子ビーム露光装置及び電子ビーム露光方法 |
| US8507855B2 (en) * | 2011-07-28 | 2013-08-13 | Applied Materials Israel, Ltd. | Inductive modulation of focusing voltage in charged beam system |
| JP5959320B2 (ja) * | 2012-05-31 | 2016-08-02 | 日本電子株式会社 | 荷電粒子ビームの軸合わせ方法および荷電粒子ビーム装置 |
| US9002097B1 (en) * | 2013-02-26 | 2015-04-07 | Hermes Microvision Inc. | Method and system for enhancing image quality |
| US9437394B1 (en) * | 2014-03-28 | 2016-09-06 | Carl Zeiss Microscopy Ltd. | Method of operating a charged particle microscope and charged particle microscope operating according to such method |
| US10573489B2 (en) | 2016-01-29 | 2020-02-25 | Hitachi High-Technologies Corporation | Charged particle beam device and optical-axis adjusting method thereof |
| US10460903B2 (en) * | 2016-04-04 | 2019-10-29 | Kla-Tencor Corporation | Method and system for charge control for imaging floating metal structures on non-conducting substrates |
| JP6804043B2 (ja) * | 2016-10-21 | 2020-12-23 | コニカミノルタ株式会社 | 画像形成装置、画像形成システムおよび制御プログラム |
| US10790114B2 (en) * | 2017-06-29 | 2020-09-29 | Kla-Tencor Corporation | Scanning electron microscope objective lens calibration using X-Y voltages iteratively determined from images obtained using said voltages |
| DE102017220398B3 (de) | 2017-11-15 | 2019-02-28 | Carl Zeiss Microscopy Gmbh | Verfahren zum Justieren eines Teilchenstrahlmikroskops |
| JP6953324B2 (ja) * | 2018-02-07 | 2021-10-27 | Tasmit株式会社 | 走査電子顕微鏡のオートフォーカス方法 |
| DE102018010335B9 (de) | 2018-02-22 | 2026-03-05 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens |
| DE102018202728B4 (de) * | 2018-02-22 | 2019-11-21 | Carl Zeiss Microscopy Gmbh | Verfahren zum Betrieb eines Teilchenstrahlgeräts, Computerprogrammprodukt und Teilchenstrahlgerät zur Durchführung des Verfahrens |
| JP7040199B2 (ja) * | 2018-03-26 | 2022-03-23 | 株式会社島津製作所 | 荷電粒子ビーム軸合わせ装置、荷電粒子ビーム照射装置および荷電粒子ビーム軸合わせ方法 |
| EP3651182A1 (de) | 2018-11-12 | 2020-05-13 | FEI Company | Ladungsteilchenmikroskop zur untersuchung einer probe und verfahren zur bestimmung einer aberration des ladungsteilchenmikroskops |
| US11086118B2 (en) | 2019-04-29 | 2021-08-10 | Molecular Devices, Llc | Self-calibrating and directional focusing systems and methods for infinity corrected microscopes |
| JP7308581B2 (ja) * | 2019-10-18 | 2023-07-14 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置、複合荷電粒子ビーム装置、及び荷電粒子ビーム装置の制御方法 |
| NL2024065B1 (en) * | 2019-10-21 | 2021-06-22 | Univ Delft Tech | Multi-beam charged particle source with alignment means |
| EP3951832A1 (de) * | 2020-08-03 | 2022-02-09 | FEI Company | Verfahren zur ausrichtung einer ladungsteilchenstrahlvorrichtung |
| JP7431136B2 (ja) * | 2020-10-09 | 2024-02-14 | 株式会社日立ハイテク | 荷電粒子線装置、及び制御方法 |
| US20250183001A1 (en) * | 2023-12-04 | 2025-06-05 | Applied Materials Israel Ltd. | Calibration of an examination system |
Family Cites Families (43)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4162403A (en) * | 1978-07-26 | 1979-07-24 | Advanced Metals Research Corp. | Method and means for compensating for charge carrier beam astigmatism |
| JPS57212754A (en) * | 1981-06-24 | 1982-12-27 | Hitachi Ltd | Electron-beam controller for electron microscope |
| US4423305A (en) * | 1981-07-30 | 1983-12-27 | International Business Machines Corporation | Method and apparatus for controlling alignment of an electron beam of a variable shape |
| US4438336A (en) * | 1982-03-26 | 1984-03-20 | Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. | Corpuscular radiation device for producing an irradiation pattern on a workpiece |
| NL8304217A (nl) * | 1983-12-07 | 1985-07-01 | Philips Nv | Automatisch instelbare electronenmicroscoop. |
| JPS614140A (ja) | 1984-06-15 | 1986-01-10 | Toshiba Corp | 電子光学鏡筒 |
| DE3522340A1 (de) * | 1985-06-22 | 1987-01-02 | Finnigan Mat Gmbh | Linsenanordnung zur fokussierung von elektrisch geladenen teilchen und massenspektrometer mit einer derartigen linsenanordnung |
| JPH0652650B2 (ja) | 1985-06-24 | 1994-07-06 | 株式会社東芝 | 荷電ビ−ムの軸合わせ方法 |
| JPS63307652A (ja) | 1987-06-08 | 1988-12-15 | Nikon Corp | 電子顕微鏡の焦点位置検出装置 |
| JP2803831B2 (ja) | 1989-03-07 | 1998-09-24 | 株式会社日立製作所 | 走査電子顕微鏡 |
| JPH0658795B2 (ja) * | 1989-05-09 | 1994-08-03 | 日本電子株式会社 | ダイナミックフォーカス回路 |
| JPH03194839A (ja) | 1989-12-25 | 1991-08-26 | Hitachi Ltd | 電子顕微鏡における焦点調整方法及び非点収差補正方法 |
| JP3148353B2 (ja) * | 1991-05-30 | 2001-03-19 | ケーエルエー・インストルメンツ・コーポレーション | 電子ビーム検査方法とそのシステム |
| JPH053009A (ja) * | 1991-06-21 | 1993-01-08 | Jeol Ltd | 電子顕微鏡における軸上コマ補正方式 |
| JPH05266840A (ja) | 1992-03-18 | 1993-10-15 | Hitachi Ltd | 走査形電子顕微鏡 |
| JP3730263B2 (ja) * | 1992-05-27 | 2005-12-21 | ケーエルエー・インストルメンツ・コーポレーション | 荷電粒子ビームを用いた自動基板検査の装置及び方法 |
| JP2877624B2 (ja) * | 1992-07-16 | 1999-03-31 | 株式会社東芝 | 走査電子顕微鏡の対物レンズアライメント制御装置及び制御方法 |
| US5414261A (en) * | 1993-07-01 | 1995-05-09 | The Regents Of The University Of California | Enhanced imaging mode for transmission electron microscopy |
| KR100220674B1 (ko) * | 1994-01-18 | 1999-09-15 | 전주범 | 투사형 화상표시장치 |
| JP3319854B2 (ja) * | 1994-02-04 | 2002-09-03 | セイコーインスツルメンツ株式会社 | 走査型電子顕微鏡 |
| US5627373A (en) * | 1996-06-17 | 1997-05-06 | Hewlett-Packard Company | Automatic electron beam alignment and astigmatism correction in scanning electron microscope |
| JP3595079B2 (ja) | 1996-07-25 | 2004-12-02 | 株式会社東芝 | 陰極線管 |
| WO1998005032A1 (fr) * | 1996-07-31 | 1998-02-05 | Sanyo Electric Co., Ltd. | Dispositif pour disque optique |
| US6067164A (en) * | 1996-09-12 | 2000-05-23 | Kabushiki Kaisha Toshiba | Method and apparatus for automatic adjustment of electron optics system and astigmatism correction in electron optics device |
| JPH1092354A (ja) | 1996-09-12 | 1998-04-10 | Toshiba Corp | 走査型電子顕微鏡の電子光学系自動調節装置及び電子光学系自動調節方法 |
| JPH10269975A (ja) | 1997-03-24 | 1998-10-09 | Shimadzu Corp | 荷電粒子用軸合せ装置 |
| JPH11149895A (ja) * | 1997-08-11 | 1999-06-02 | Hitachi Ltd | 電子線式検査または測定装置およびその方法、高さ検出装置並びに電子線式描画装置 |
| US6441384B1 (en) * | 1998-04-08 | 2002-08-27 | Nikon Corporation | Charged particle beam exposure device exhibiting reduced image blur |
| JP2000048749A (ja) * | 1998-07-30 | 2000-02-18 | Jeol Ltd | 走査電子顕微鏡および電子ビームの軸合わせ方法 |
| JP2000077018A (ja) | 1998-08-28 | 2000-03-14 | Jeol Ltd | 走査電子顕微鏡の焦点合わせ装置 |
| JP2001068048A (ja) | 1999-06-23 | 2001-03-16 | Hitachi Ltd | 荷電粒子線装置および自動非点収差調整方法 |
| US6583413B1 (en) * | 1999-09-01 | 2003-06-24 | Hitachi, Ltd. | Method of inspecting a circuit pattern and inspecting instrument |
| JP2001084934A (ja) | 1999-09-10 | 2001-03-30 | Jeol Ltd | 絞り支持装置 |
| JP2001084938A (ja) * | 1999-09-13 | 2001-03-30 | Hitachi Ltd | 透過形電子顕微鏡及び透過電子顕微鏡像観察方法 |
| JP2001210263A (ja) * | 2000-01-27 | 2001-08-03 | Hitachi Ltd | 走査電子顕微鏡、そのダイナミックフォーカス制御方法および半導体デバイスの表面および断面形状の把握方法 |
| US6552340B1 (en) * | 2000-10-12 | 2003-04-22 | Nion Co. | Autoadjusting charged-particle probe-forming apparatus |
| JP3951590B2 (ja) * | 2000-10-27 | 2007-08-01 | 株式会社日立製作所 | 荷電粒子線装置 |
| ATE453205T1 (de) * | 2001-10-10 | 2010-01-15 | Applied Materials Israel Ltd | Verfahren und vorrichtung zur automatischen bilderzeugung geeignet zur ausrichtung einer geladenen teilchen strahlsäule |
| US7539340B2 (en) * | 2003-04-25 | 2009-05-26 | Topcon Corporation | Apparatus and method for three-dimensional coordinate measurement |
| US7151258B2 (en) * | 2003-07-24 | 2006-12-19 | Topcon Corporation | Electron beam system and electron beam measuring and observing methods |
| US7164128B2 (en) * | 2003-11-25 | 2007-01-16 | Hitachi High-Technologies Corporation | Method and apparatus for observing a specimen |
| JP4587742B2 (ja) * | 2004-08-23 | 2010-11-24 | 株式会社日立ハイテクノロジーズ | 荷電粒子線顕微方法及び荷電粒子線応用装置 |
| JP4708856B2 (ja) * | 2005-05-16 | 2011-06-22 | 株式会社日立ハイテクノロジーズ | 電子ビーム校正方法及び電子ビーム装置 |
-
2002
- 2002-07-29 AT AT02016839T patent/ATE453205T1/de not_active IP Right Cessation
- 2002-07-29 AT AT02016838T patent/ATE484840T1/de not_active IP Right Cessation
- 2002-07-29 DE DE60237952T patent/DE60237952D1/de not_active Expired - Lifetime
- 2002-07-29 EP EP02016838A patent/EP1306878B1/de not_active Expired - Lifetime
- 2002-07-29 EP EP02016839A patent/EP1302971B1/de not_active Expired - Lifetime
- 2002-07-29 DE DE60234802T patent/DE60234802D1/de not_active Expired - Lifetime
- 2002-10-04 US US10/492,574 patent/US7271396B2/en not_active Expired - Lifetime
- 2002-10-04 US US10/492,257 patent/US7335893B2/en not_active Expired - Lifetime
- 2002-10-09 CN CNB028246330A patent/CN100397549C/zh not_active Expired - Lifetime
-
2007
- 2007-03-22 US US11/689,870 patent/US7385205B2/en not_active Expired - Lifetime
-
2008
- 2008-07-11 JP JP2008181754A patent/JP4928506B2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| DE60237952D1 (de) | 2010-11-25 |
| US20050012050A1 (en) | 2005-01-20 |
| US7271396B2 (en) | 2007-09-18 |
| CN100397549C (zh) | 2008-06-25 |
| DE60234802D1 (de) | 2010-02-04 |
| US20050006598A1 (en) | 2005-01-13 |
| EP1302971A3 (de) | 2006-04-19 |
| EP1302971A2 (de) | 2003-04-16 |
| JP2008300358A (ja) | 2008-12-11 |
| US7385205B2 (en) | 2008-06-10 |
| EP1302971B1 (de) | 2009-12-23 |
| ATE453205T1 (de) | 2010-01-15 |
| EP1306878A3 (de) | 2006-04-19 |
| EP1306878B1 (de) | 2010-10-13 |
| US20070235659A1 (en) | 2007-10-11 |
| US7335893B2 (en) | 2008-02-26 |
| JP4928506B2 (ja) | 2012-05-09 |
| EP1306878A2 (de) | 2003-05-02 |
| CN1602537A (zh) | 2005-03-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE484840T1 (de) | Verfahren und vorrichtung zur ausrichtung einer säule für strahlen geladener teilchen | |
| ATE524822T1 (de) | Belichtungsverfahren für strahlen aus geladenen teilchen | |
| CA2084408A1 (en) | Illumination system and method for a high definition light microscope | |
| WO2009080825A3 (en) | Apparatus and method for investigating and/or modifying a sample | |
| EP0838837A3 (de) | Elektronenstrahl-Belichtungsgerät und Belichtungsverfahren | |
| WO2003100815A3 (en) | Charged particle beam column and method for directing a charged particle beam | |
| WO2003032359A3 (en) | Method and device for aligning a charged particle beam column | |
| WO2004086452A3 (en) | Charged particle beam device | |
| JPS6134221B2 (de) | ||
| WO2005071708A3 (en) | Focussing lens for charged particle beams | |
| JPS6452370A (en) | Potential measuring apparatus | |
| TW200701384A (en) | Sample inspection device | |
| US7060985B2 (en) | Multipole field-producing apparatus in charged-particle optical system and aberration corrector | |
| US7560713B2 (en) | Correction lens system for a particle beam projection device | |
| EP1442471B1 (de) | System und verfahren für schnelle änderungen der brennweite | |
| JPH01264149A (ja) | 荷電粒子線応用装置 | |
| KR20030043685A (ko) | 주사 전자 현미경과 그 유사 장치에서 빈 필터에 의해발생되는 광행차의 감소 | |
| JP2005173210A (ja) | 偏波面保持光ファイバの回転基準位置決定方法及び光ファイバ融着接続機 | |
| JPS5911179B2 (ja) | 電子線偏向装置 | |
| US12347640B2 (en) | Electron beam apparatus | |
| JPS63202835A (ja) | 荷電ビ−ムの自動調整方法および自動調整装置 | |
| WO2003034143A3 (en) | Optical scanning device | |
| JPS62219445A (ja) | 電子線装置 | |
| JPS62133655A (ja) | 荷電粒子線のプロ−ブ径測定装置 | |
| JPS5848989B2 (ja) | 電子線装置における焦点合わせ装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |