ATE486369T1 - Elektrische einrichtung mit einem phasenänderungsmaterial - Google Patents

Elektrische einrichtung mit einem phasenänderungsmaterial

Info

Publication number
ATE486369T1
ATE486369T1 AT05709025T AT05709025T ATE486369T1 AT E486369 T1 ATE486369 T1 AT E486369T1 AT 05709025 T AT05709025 T AT 05709025T AT 05709025 T AT05709025 T AT 05709025T AT E486369 T1 ATE486369 T1 AT E486369T1
Authority
AT
Austria
Prior art keywords
change material
phase
phase change
electrical device
electrical resistivity
Prior art date
Application number
AT05709025T
Other languages
English (en)
Inventor
Martijn Lankhorst
Erwin Meinders
Robertus Wolters
Franciscus Widdershoven
Original Assignee
Nxp Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nxp Bv filed Critical Nxp Bv
Application granted granted Critical
Publication of ATE486369T1 publication Critical patent/ATE486369T1/de

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C11/00Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/56Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
    • G11C11/5678Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using amorphous/crystalline phase transition storage elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/30Resistance change memory devices, e.g. resistive RAM [ReRAM] devices comprising selection components having three or more electrodes, e.g. transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B63/00Resistance change memory devices, e.g. resistive RAM [ReRAM] devices
    • H10B63/80Arrangements comprising multiple bistable or multi-stable switching components of the same type on a plane parallel to the substrate, e.g. cross-point arrays
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • H10N70/061Shaping switching materials
    • H10N70/063Shaping switching materials by etching of pre-deposited switching material layers, e.g. lithography
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • H10N70/061Shaping switching materials
    • H10N70/068Shaping switching materials by processes specially adapted for achieving sub-lithographic dimensions, e.g. using spacers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • H10N70/231Multistable switching devices, e.g. memristors based on solid-state phase change, e.g. between amorphous and crystalline phases, Ovshinsky effect
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/823Device geometry adapted for essentially horizontal current flow, e.g. bridge type devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/826Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • H10N70/8265Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices on sidewalls of dielectric structures, e.g. mesa-shaped or cup-shaped devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/861Thermal details
    • H10N70/8613Heating or cooling means other than resistive heating electrodes, e.g. heater in parallel
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/884Switching materials based on at least one element of group IIIA, IVA or VA, e.g. elemental or compound semiconductors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C13/00Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
    • G11C13/0002Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
    • G11C13/0004Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements comprising amorphous/crystalline phase transition cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Semiconductor Memories (AREA)
  • Developing Agents For Electrophotography (AREA)
  • Discharge Heating (AREA)
AT05709025T 2004-03-26 2005-03-16 Elektrische einrichtung mit einem phasenänderungsmaterial ATE486369T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04101259 2004-03-26
PCT/IB2005/050923 WO2005093839A2 (en) 2004-03-26 2005-03-16 Electric device comprising phase change material

Publications (1)

Publication Number Publication Date
ATE486369T1 true ATE486369T1 (de) 2010-11-15

Family

ID=34961289

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05709025T ATE486369T1 (de) 2004-03-26 2005-03-16 Elektrische einrichtung mit einem phasenänderungsmaterial

Country Status (9)

Country Link
US (1) US8115239B2 (de)
EP (1) EP1787329B1 (de)
JP (1) JP2007531260A (de)
KR (1) KR20070004779A (de)
CN (1) CN100594613C (de)
AT (1) ATE486369T1 (de)
DE (1) DE602005024415D1 (de)
TW (1) TW200603271A (de)
WO (1) WO2005093839A2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1886318B1 (de) * 2005-05-19 2008-10-08 Koninklijke Philips Electronics N.V. Verfahren zum regeln des zuerst schmelzenden bereiches einer pcm-zelle und damit hergestellte vorrichtungen
JP2007103620A (ja) * 2005-10-04 2007-04-19 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法ならびにその配線装置
US7626858B2 (en) * 2006-06-09 2009-12-01 Qimonda North America Corp. Integrated circuit having a precharging circuit
EP2156481B1 (de) 2007-05-31 2012-10-31 Nxp B.V. Elektronische vorrichtung mit einer umkehrbaren struktur und verfahren zur herstellung einer elektronischen vorrichtung
JP2009123847A (ja) * 2007-11-13 2009-06-04 Gunma Univ メモリ素子、メモリセル、メモリセルアレイ及び電子機器
KR100968889B1 (ko) * 2007-12-12 2010-07-09 한국전자통신연구원 비휘발성 프로그래머블 스위치 소자 및 그 제조 방법
JP5334995B2 (ja) * 2008-01-16 2013-11-06 エヌエックスピー ビー ヴィ 相変化材料層を有する多層構造およびその製造方法
WO2009115995A1 (en) * 2008-03-21 2009-09-24 Nxp B.V. An electronic component comprising a convertible structure
US8610215B2 (en) * 2008-09-19 2013-12-17 Agere Systems Llc Allotropic or morphologic change in silicon induced by electromagnetic radiation for resistance turning of integrated circuits
EP2246915B1 (de) * 2009-04-30 2013-07-31 Taiwan Semiconductor Manufacturing Co., Ltd. Phasenwechselmaterial für eine Phasenwechselspeichervorrichtung sowie Verfahren zur Einstellung des spezifischen Widerstands des Materials
US8129268B2 (en) 2009-11-16 2012-03-06 International Business Machines Corporation Self-aligned lower bottom electrode
US8233317B2 (en) * 2009-11-16 2012-07-31 International Business Machines Corporation Phase change memory device suitable for high temperature operation
JP2011199215A (ja) 2010-03-24 2011-10-06 Hitachi Ltd 半導体記憶装置
TWI469408B (zh) * 2012-05-07 2015-01-11 Univ Feng Chia 超薄與多層結構相變化記憶體元件
US8847187B2 (en) * 2012-12-03 2014-09-30 Intermolecular, Inc. Method of forming anneal-resistant embedded resistor for non-volatile memory application
US9059130B2 (en) * 2012-12-31 2015-06-16 International Business Machines Corporation Phase changing on-chip thermal heat sink
WO2014164268A1 (en) * 2013-03-13 2014-10-09 Board Of Trustees Of Michigan State University Voltage-controlled resistor based on phase transition materials
GB2515568B (en) * 2013-06-28 2016-05-18 Ibm Resistive random-access memory cells
CN104733610B (zh) * 2013-12-23 2017-12-15 杭州华为数字技术有限公司 金属掺杂锗碲基阻变存储材料及制备方法和阻变单元器件
US11333558B2 (en) * 2018-11-06 2022-05-17 Globalfoundries U.S. Inc. Boolean temperature sensing using phase transition material
US12150392B2 (en) 2020-12-22 2024-11-19 International Business Machines Corporation Transfer length phase change material (PCM) based bridge cell
US11430514B2 (en) 2021-01-12 2022-08-30 International Business Machines Corporation Setting an upper bound on RRAM resistance
JP2023044946A (ja) * 2021-09-21 2023-04-03 キオクシア株式会社 半導体記憶装置

Family Cites Families (15)

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Publication number Priority date Publication date Assignee Title
US5296716A (en) * 1991-01-18 1994-03-22 Energy Conversion Devices, Inc. Electrically erasable, directly overwritable, multibit single cell memory elements and arrays fabricated therefrom
US5789758A (en) * 1995-06-07 1998-08-04 Micron Technology, Inc. Chalcogenide memory cell with a plurality of chalcogenide electrodes
US5825046A (en) * 1996-10-28 1998-10-20 Energy Conversion Devices, Inc. Composite memory material comprising a mixture of phase-change memory material and dielectric material
US5933365A (en) * 1997-06-19 1999-08-03 Energy Conversion Devices, Inc. Memory element with energy control mechanism
US5912839A (en) * 1998-06-23 1999-06-15 Energy Conversion Devices, Inc. Universal memory element and method of programming same
US6075719A (en) * 1999-06-22 2000-06-13 Energy Conversion Devices, Inc. Method of programming phase-change memory element
US6339544B1 (en) * 2000-09-29 2002-01-15 Intel Corporation Method to enhance performance of thermal resistor device
US6531371B2 (en) * 2001-06-28 2003-03-11 Sharp Laboratories Of America, Inc. Electrically programmable resistance cross point memory
US6570784B2 (en) * 2001-06-29 2003-05-27 Ovonyx, Inc. Programming a phase-change material memory
US6590807B2 (en) * 2001-08-02 2003-07-08 Intel Corporation Method for reading a structural phase-change memory
DE60130586T2 (de) * 2001-08-13 2008-06-19 Advanced Micro Devices, Inc., Sunnyvale Speicherzelle
JP3749847B2 (ja) * 2001-09-27 2006-03-01 株式会社東芝 相変化型不揮発性記憶装置及びその駆動回路
US6545903B1 (en) * 2001-12-17 2003-04-08 Texas Instruments Incorporated Self-aligned resistive plugs for forming memory cell with phase change material
US6625054B2 (en) * 2001-12-28 2003-09-23 Intel Corporation Method and apparatus to program a phase change memory
US6778420B2 (en) * 2002-09-25 2004-08-17 Ovonyx, Inc. Method of operating programmable resistant element

Also Published As

Publication number Publication date
DE602005024415D1 (de) 2010-12-09
WO2005093839A2 (en) 2005-10-06
JP2007531260A (ja) 2007-11-01
KR20070004779A (ko) 2007-01-09
EP1787329A2 (de) 2007-05-23
CN101167188A (zh) 2008-04-23
EP1787329B1 (de) 2010-10-27
CN100594613C (zh) 2010-03-17
US20080285333A1 (en) 2008-11-20
TW200603271A (en) 2006-01-16
US8115239B2 (en) 2012-02-14
WO2005093839A3 (en) 2007-03-29

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