ATE496103T1 - Polierzusammensetzung und polierverfahren - Google Patents

Polierzusammensetzung und polierverfahren

Info

Publication number
ATE496103T1
ATE496103T1 AT07253000T AT07253000T ATE496103T1 AT E496103 T1 ATE496103 T1 AT E496103T1 AT 07253000 T AT07253000 T AT 07253000T AT 07253000 T AT07253000 T AT 07253000T AT E496103 T1 ATE496103 T1 AT E496103T1
Authority
AT
Austria
Prior art keywords
group
composition
polishing
anionic surfactant
polishing composition
Prior art date
Application number
AT07253000T
Other languages
English (en)
Inventor
Atsunori Kawamura
Masayuki Hattori
Original Assignee
Fujimi Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2006211454A external-priority patent/JP5314839B2/ja
Priority claimed from JP2006211453A external-priority patent/JP2008041781A/ja
Application filed by Fujimi Inc filed Critical Fujimi Inc
Application granted granted Critical
Publication of ATE496103T1 publication Critical patent/ATE496103T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • C09K3/1454—Abrasive powders, suspensions and pastes for polishing
    • C09K3/1472—Non-aqueous liquid suspensions
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/402—Chemomechanical polishing [CMP] of semiconductor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Disintegrating Or Milling (AREA)
AT07253000T 2006-08-02 2007-07-31 Polierzusammensetzung und polierverfahren ATE496103T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006211454A JP5314839B2 (ja) 2006-08-02 2006-08-02 研磨用組成物及び研磨方法
JP2006211453A JP2008041781A (ja) 2006-08-02 2006-08-02 研磨用組成物及び研磨方法

Publications (1)

Publication Number Publication Date
ATE496103T1 true ATE496103T1 (de) 2011-02-15

Family

ID=38961937

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07253000T ATE496103T1 (de) 2006-08-02 2007-07-31 Polierzusammensetzung und polierverfahren

Country Status (7)

Country Link
US (1) US8080476B2 (de)
EP (1) EP1894978B1 (de)
KR (1) KR101477796B1 (de)
AT (1) ATE496103T1 (de)
DE (1) DE602007012026D1 (de)
SG (1) SG139699A1 (de)
TW (1) TWI417371B (de)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009164186A (ja) * 2007-12-28 2009-07-23 Fujimi Inc 研磨用組成物
JP2009164188A (ja) * 2007-12-28 2009-07-23 Fujimi Inc 研磨用組成物
JP2009187984A (ja) * 2008-02-01 2009-08-20 Fujimi Inc 研磨用組成物及びそれを用いた研磨方法
US8506661B2 (en) * 2008-10-24 2013-08-13 Air Products & Chemicals, Inc. Polishing slurry for copper films
US8551887B2 (en) 2009-12-22 2013-10-08 Air Products And Chemicals, Inc. Method for chemical mechanical planarization of a copper-containing substrate
JP5587620B2 (ja) * 2010-01-25 2014-09-10 株式会社フジミインコーポレーテッド 研磨用組成物及びそれを用いた研磨方法
JP6077209B2 (ja) 2011-11-25 2017-02-08 株式会社フジミインコーポレーテッド 研磨用組成物
JP5838083B2 (ja) * 2011-12-09 2015-12-24 株式会社フジミインコーポレーテッド 研磨用組成物並びにそれを用いた研磨方法及び基板の製造方法
SG11201502768UA (en) 2012-11-02 2015-05-28 Fujimi Inc Polishing composition
CN103817603A (zh) * 2014-02-28 2014-05-28 张家港市互惠光电有限公司 一种板材角部加工用护套
WO2017163847A1 (ja) * 2016-03-25 2017-09-28 株式会社フジミインコーポレーテッド 研磨用組成物ならびに研磨方法および半導体基板の製造方法
KR20200038014A (ko) * 2018-10-02 2020-04-10 주식회사 케이씨텍 표면처리 조성물 및 그것을 이용한 표면처리 방법

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5428721A (en) * 1990-02-07 1995-06-27 Kabushiki Kaisha Toshiba Data processing apparatus for editing image by using image conversion
JP3024823B2 (ja) * 1991-06-24 2000-03-27 花王株式会社 洗浄剤組成物
US5391721A (en) * 1993-02-04 1995-02-21 Wormald U.S., Inc. Aqueous film forming foam concentrates for hydrophilic combustible liquids and method for modifying viscosity of same
US5391258A (en) * 1993-05-26 1995-02-21 Rodel, Inc. Compositions and methods for polishing
US5575885A (en) * 1993-12-14 1996-11-19 Kabushiki Kaisha Toshiba Copper-based metal polishing solution and method for manufacturing semiconductor device
JP3397501B2 (ja) * 1994-07-12 2003-04-14 株式会社東芝 研磨剤および研磨方法
US5858813A (en) * 1996-05-10 1999-01-12 Cabot Corporation Chemical mechanical polishing slurry for metal layers and films
US6025611A (en) * 1996-09-20 2000-02-15 The Board Of Regents Of The University Of Nebraska Boron-carbide and boron rich rhobohedral based transistors and tunnel diodes
US5954997A (en) * 1996-12-09 1999-09-21 Cabot Corporation Chemical mechanical polishing slurry useful for copper substrates
US6126853A (en) * 1996-12-09 2000-10-03 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6309560B1 (en) 1996-12-09 2001-10-30 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US5759917A (en) * 1996-12-30 1998-06-02 Cabot Corporation Composition for oxide CMP
US6432828B2 (en) * 1998-03-18 2002-08-13 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper substrates
US6423678B1 (en) * 1998-05-05 2002-07-23 Amway Corporation Alcohol ethoxylate-peg ether of glycerin
CA2342332A1 (en) 1998-08-31 2000-03-09 Hiroki Terazaki Abrasive liquid for metal and method for polishing
JP4053165B2 (ja) * 1998-12-01 2008-02-27 株式会社フジミインコーポレーテッド 研磨用組成物およびそれを用いた研磨方法
EP1833085A1 (de) 1998-12-28 2007-09-12 Hitachi Chemical Company, Ltd. Materialien für eine Reinigungsflüssigkeit für Metall, Reinigungsflüssigkeit für Metall, Herstellungsverfahren dafür und Reinigungsverfahren damit
US7208049B2 (en) * 2003-10-20 2007-04-24 Air Products And Chemicals, Inc. Process solutions containing surfactants used as post-chemical mechanical planarization treatment
US6479442B1 (en) * 1999-05-05 2002-11-12 Access Business Group International Llc Hydrotrope and skin conditioning agents for use in liquid detergent compositions
ATE405618T1 (de) * 1999-08-13 2008-09-15 Cabot Microelectronics Corp Chemisch-mechanische poliersysteme und verfahren zu ihrer verwendung
TW501197B (en) 1999-08-17 2002-09-01 Hitachi Chemical Co Ltd Polishing compound for chemical mechanical polishing and method for polishing substrate
KR100512453B1 (ko) 1999-08-26 2005-09-07 히다치 가세고교 가부시끼가이샤 화학기계연마용 연마제 및 연마방법
JP2001269859A (ja) * 2000-03-27 2001-10-02 Jsr Corp 化学機械研磨用水系分散体
JP2002075927A (ja) 2000-08-24 2002-03-15 Fujimi Inc 研磨用組成物およびそれを用いた研磨方法
JP2002110596A (ja) * 2000-10-02 2002-04-12 Mitsubishi Electric Corp 半導体加工用研磨剤およびこれに用いる分散剤、並びに上記半導体加工用研磨剤を用いた半導体装置の製造方法
JP2002164307A (ja) * 2000-11-24 2002-06-07 Fujimi Inc 研磨用組成物およびそれを用いた研磨方法
JP2002231666A (ja) * 2001-01-31 2002-08-16 Fujimi Inc 研磨用組成物およびそれを用いた研磨方法
JP3849091B2 (ja) * 2001-02-28 2006-11-22 Ｊｓｒ株式会社 化学機械研磨用水系分散体
SG144688A1 (en) * 2001-07-23 2008-08-28 Fujimi Inc Polishing composition and polishing method employing it
AU2002334406A1 (en) 2001-09-03 2003-03-18 Showa Denko K.K. Polishing composition
US20030219982A1 (en) * 2002-05-23 2003-11-27 Hitachi Chemical Co., Ltd CMP (chemical mechanical polishing) polishing liquid for metal and polishing method
TW200401358A (en) 2002-06-07 2004-01-16 Showa Denko Kk Metal polish composition, polishing method using the composition and method for producing wafer using the polishing method
US6936543B2 (en) * 2002-06-07 2005-08-30 Cabot Microelectronics Corporation CMP method utilizing amphiphilic nonionic surfactants
JP4083502B2 (ja) * 2002-08-19 2008-04-30 株式会社フジミインコーポレーテッド 研磨方法及びそれに用いられる研磨用組成物
JP3981616B2 (ja) * 2002-10-02 2007-09-26 株式会社フジミインコーポレーテッド 研磨用組成物
JP2004172606A (ja) * 2002-11-08 2004-06-17 Sumitomo Chem Co Ltd 金属研磨材組成物及び研磨方法
JP4350364B2 (ja) * 2002-12-12 2009-10-21 昭和電工株式会社 洗浄剤組成物、半導体ウェーハの洗浄方法および製造方法
JP2004349426A (ja) * 2003-05-21 2004-12-09 Jsr Corp Ｓｔｉ用化学機械研磨方法
JP2004134751A (ja) * 2003-07-28 2004-04-30 Hitachi Chem Co Ltd 研磨剤及び基板の研磨方法
US7485162B2 (en) * 2003-09-30 2009-02-03 Fujimi Incorporated Polishing composition
JP2005294798A (ja) * 2004-03-08 2005-10-20 Asahi Glass Co Ltd 研磨剤および研磨方法
JP2006086462A (ja) * 2004-09-17 2006-03-30 Fujimi Inc 研磨用組成物およびそれを用いた配線構造体の製造法

Also Published As

Publication number Publication date
DE602007012026D1 (de) 2011-03-03
EP1894978A3 (de) 2009-10-21
KR101477796B1 (ko) 2014-12-30
TW200831652A (en) 2008-08-01
EP1894978A2 (de) 2008-03-05
EP1894978B1 (de) 2011-01-19
TWI417371B (zh) 2013-12-01
SG139699A1 (en) 2008-02-29
KR20080012229A (ko) 2008-02-11
US20080032505A1 (en) 2008-02-07
US8080476B2 (en) 2011-12-20

Similar Documents

Publication Publication Date Title
ATE496103T1 (de) Polierzusammensetzung und polierverfahren
TWI773809B (zh) 於製造一半導體裝置時用於從一矽-鍺/矽堆疊相對矽-鍺合金選擇性移除矽的蝕刻組合物
TWI683038B (zh) 於製造一半導體裝置時用於從一矽-鍺/矽堆疊選擇性移除矽-鍺合金的蝕刻組合物
US7851426B2 (en) Cleaning liquid and cleaning method using the same
US10988718B2 (en) Tungsten post-CMP cleaning composition
EP1336650B1 (de) Waschflüssigkeitzusammensetzung für ein Halbleitersubstrat
KR20220024514A (ko) 반도체 소자의 제조 동안 p-도핑된 실리콘 및 실리콘-게르마늄보다 폴리실리콘을 선택적으로 제거하기 위한 액체 조성물
TW201938844A (zh) 於製造一半導體裝置時用於從一矽-鍺/鍺堆疊選擇性移除矽-鍺合金的蝕刻溶液
EP1542266A4 (de) Halbleiterschleif prozess zu seiner herstellung und polierverfahren
TW200621958A (en) CMP polishing agent and polishing method of substrate
TW200701352A (en) Compositions for processing of semiconductor substrates
KR102773140B1 (ko) 포스트 화학적-기계적-폴리싱 세정을 위한 조성물
US6911393B2 (en) Composition and method for copper chemical mechanical planarization
CN115044375A (zh) 蚀刻组合物
EP1724819A4 (de) Poliermittel und polierverfahren
SG142273A1 (en) Polishing composition and polishing method
TW201231725A (en) Etchant composition for copper-containing material and method for etching copper-containing material
TWI782248B (zh) 鉿氧化物的腐蝕抑制劑
KR102242951B1 (ko) 실리콘 산화막 에칭액
MY155495A (en) Polishing composition and polishing method using the same
KR102702146B1 (ko) 연마용 조성물 및 실리콘 기판의 연마 방법
JPWO2013157442A1 (ja) 研磨用組成物
CN101912855B (zh) 蓝宝石衬底材料抛光后表面洁净方法
Wei et al. Cleaning methodology of small residue defect with surfactant in copper chemical mechanical polishing post-cleaning
TW201920616A (zh) 於製造一半導體裝置時用於相對氮化鈦選擇性移除氮化鉭的蝕刻組合物

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties