ATE496910T1 - Oximesther-fotoinitiatoren - Google Patents
Oximesther-fotoinitiatorenInfo
- Publication number
- ATE496910T1 ATE496910T1 AT08749768T AT08749768T ATE496910T1 AT E496910 T1 ATE496910 T1 AT E496910T1 AT 08749768 T AT08749768 T AT 08749768T AT 08749768 T AT08749768 T AT 08749768T AT E496910 T1 ATE496910 T1 AT E496910T1
- Authority
- AT
- Austria
- Prior art keywords
- formula
- oximesther
- c20alkyl
- hydrogen
- direct bond
- Prior art date
Links
- 239000003999 initiator Substances 0.000 title 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract 3
- 239000001257 hydrogen Substances 0.000 abstract 3
- 150000002431 hydrogen Chemical class 0.000 abstract 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 abstract 2
- 238000006243 chemical reaction Methods 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 abstract 1
- 125000005647 linker group Chemical group 0.000 abstract 1
- 125000001624 naphthyl group Chemical group 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- C07D401/12—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings linked by a chain containing hetero atoms as chain links
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D417/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00
- C07D417/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings
- C07D417/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and sulfur atoms as the only ring hetero atoms, not provided for by group C07D415/00 containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B15/00—Acridine dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B55/00—Azomethine dyes
- C09B55/002—Monoazomethine dyes
- C09B55/003—Monoazomethine dyes with the -C=N- group attached to an heteroring
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B55/00—Azomethine dyes
- C09B55/005—Disazomethine dyes
- C09B55/006—Disazomethine dyes containing at least one heteroring
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B55/00—Azomethine dyes
- C09B55/008—Tri or polyazomethine dyes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B57/00—Other synthetic dyes of known constitution
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31855—Of addition polymer from unsaturated monomers
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Optics & Photonics (AREA)
- Polymerisation Methods In General (AREA)
- Indole Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Plural Heterocyclic Compounds (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP07108030 | 2007-05-11 | ||
| EP07110649 | 2007-06-20 | ||
| PCT/EP2008/055127 WO2008138733A1 (en) | 2007-05-11 | 2008-04-28 | Oxime ester photoinitiators |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE496910T1 true ATE496910T1 (de) | 2011-02-15 |
Family
ID=39620202
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT08749768T ATE496910T1 (de) | 2007-05-11 | 2008-04-28 | Oximesther-fotoinitiatoren |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US8349548B2 (de) |
| EP (1) | EP2144894B1 (de) |
| JP (1) | JP5535065B2 (de) |
| KR (1) | KR101604873B1 (de) |
| CN (1) | CN101687846B (de) |
| AT (1) | ATE496910T1 (de) |
| CA (1) | CA2684931A1 (de) |
| DE (1) | DE602008004757D1 (de) |
| TW (1) | TWI465433B (de) |
| WO (1) | WO2008138733A1 (de) |
Families Citing this family (59)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8580906B2 (en) | 2008-05-30 | 2013-11-12 | Advanced Softmaterials Inc. | Polyrotaxane, aqueous polyrotaxane dispersion composition, crosslinked body of polyrotaxane and polymer and method for producing the same |
| CN102112497B (zh) * | 2008-06-06 | 2013-04-10 | 巴斯夫欧洲公司 | 光引发剂混合物 |
| US8507725B2 (en) * | 2008-06-06 | 2013-08-13 | Basf Se | Oxime ester photoinitiators |
| EP2342237B1 (de) * | 2008-11-03 | 2014-04-23 | Basf Se | Fotoinitiatormischungen |
| JP5642150B2 (ja) | 2009-03-23 | 2014-12-17 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | フォトレジスト組成物 |
| KR101678028B1 (ko) * | 2009-06-17 | 2016-11-21 | 토요잉크Sc홀딩스주식회사 | 옥심에스테르 화합물, 라디칼 중합개시제, 중합성 조성물, 네가티브형 레지스트 및 화상 패턴 |
| US8569393B2 (en) | 2009-12-07 | 2013-10-29 | Agfa-Gevaert N.V. | UV-LED curable compositions and inks |
| AU2010330044B2 (en) | 2009-12-07 | 2014-08-28 | Agfa Graphics N.V. | Photoinitiators for UV-LED curable compositions and inks |
| JP5640722B2 (ja) * | 2010-02-05 | 2014-12-17 | Jsr株式会社 | 新規化合物及びそれを含有する感放射線性組成物 |
| KR20130040780A (ko) * | 2010-03-31 | 2013-04-24 | 다이요 홀딩스 가부시키가이샤 | 광경화성 수지 조성물 |
| JP2011252065A (ja) * | 2010-06-01 | 2011-12-15 | Fujifilm Corp | 顔料分散組成物、着色硬化性組成物、固体撮像素子用カラーフィルタ及びその製造方法、並びに固体撮像素子 |
| US9365515B2 (en) | 2011-12-07 | 2016-06-14 | Basf Se | Oxime ester photoinitiators |
| JP5976523B2 (ja) * | 2011-12-28 | 2016-08-23 | 富士フイルム株式会社 | 光学部材セット及びこれを用いた固体撮像素子 |
| JP5978670B2 (ja) * | 2012-03-15 | 2016-08-24 | 住友化学株式会社 | 着色硬化性樹脂組成物 |
| KR101968462B1 (ko) | 2012-05-09 | 2019-04-11 | 바스프 에스이 | 옥심 에스테르 광개시제 |
| KR20130139106A (ko) * | 2012-06-12 | 2013-12-20 | 삼성디스플레이 주식회사 | 커버 글라스 가공 방법 |
| CN104428713B (zh) * | 2012-07-09 | 2019-06-07 | 东丽株式会社 | 感光性树脂组合物、导电性配线保护膜和触摸面板构件 |
| JP6469669B2 (ja) * | 2013-07-08 | 2019-02-13 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | オキシムエステル光開始剤 |
| JP6530410B2 (ja) | 2013-09-10 | 2019-06-12 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | オキシムエステル光開始剤 |
| KR101435652B1 (ko) | 2014-01-17 | 2014-08-28 | 주식회사 삼양사 | 신규한 β-옥심에스테르 플루오렌 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| JP6464764B2 (ja) * | 2015-01-16 | 2019-02-06 | Jsr株式会社 | 感放射線性着色組成物、スペーサー、その形成方法及び液晶表示素子 |
| KR101824429B1 (ko) | 2015-01-26 | 2018-02-06 | 주식회사 삼양사 | 신규한 디옥심에스테르 화합물 및 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101824443B1 (ko) | 2015-04-09 | 2018-02-05 | 주식회사 삼양사 | 신규한 플루오렌일 옥심 에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101828927B1 (ko) | 2015-02-06 | 2018-02-14 | 주식회사 삼양사 | 신규한 옥심에스테르 화합물, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR101777845B1 (ko) | 2015-06-08 | 2017-09-12 | 주식회사 삼양사 | 신규한 플루오란텐 옥심 에스테르 유도체, 이를 포함하는 광중합 개시제 및 포토레지스트 조성물 |
| KR102613079B1 (ko) | 2015-07-17 | 2023-12-12 | 타코마테크놀러지 주식회사 | 옥심에스테르 화합물 및 이를 포함하는 감광성 수지 조성물 |
| KR102509606B1 (ko) | 2015-10-30 | 2023-03-14 | 주식회사 삼양사 | 신규한 퀴놀리닐 베타 옥심에스테르 유도체 화합물, 이를 포함하는 광중합 개시제, 및 포토레지스트 조성물 |
| JP6858591B2 (ja) * | 2016-03-01 | 2021-04-14 | 株式会社Ｄｎｐファインケミカル | カラーフィルタ用着色組成物、カラーフィルタ及び表示装置 |
| KR101991838B1 (ko) | 2016-12-28 | 2019-06-24 | 주식회사 삼양사 | 신규 1,3-벤조디아졸 베타-옥심 에스테르 화합물 및 이를 포함하는 조성물 |
| WO2018155547A1 (ja) * | 2017-02-23 | 2018-08-30 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、硬化パターンの製造方法、硬化物、層間絶縁膜、カバーコート層、表面保護膜、及び電子部品 |
| KR102545326B1 (ko) * | 2017-03-16 | 2023-06-21 | 가부시키가이샤 아데카 | 옥심에스테르 화합물 및 상기 화합물을 함유하는 광중합 개시제 |
| KR20200015487A (ko) * | 2017-06-06 | 2020-02-12 | 닛뽄 가야쿠 가부시키가이샤 | 광경화성 조성물 및 전자 부품용 접착제 |
| EP3683605B1 (de) | 2017-09-15 | 2022-07-06 | FUJIFILM Corporation | Zusammensetzung, film, laminat, infrarottransmissionsfilter, festkörperbildgebungsvorrichtung und infrarotsensor |
| WO2020031240A1 (ja) | 2018-08-06 | 2020-02-13 | 日立化成デュポンマイクロシステムズ株式会社 | 感光性樹脂組成物、パターン硬化膜の製造方法、硬化膜、層間絶縁膜、カバーコート層、表面保護膜及び電子部品 |
| JP7114724B2 (ja) | 2018-09-20 | 2022-08-08 | 富士フイルム株式会社 | 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法 |
| KR102652548B1 (ko) | 2019-06-27 | 2024-03-29 | 후지필름 가부시키가이샤 | 조성물, 막 및 광 센서 |
| US11364884B2 (en) * | 2019-07-02 | 2022-06-21 | Goodrich Corporation | Selective braking of carbon brakes to improve life |
| JP7237166B2 (ja) | 2019-08-29 | 2023-03-10 | 富士フイルム株式会社 | 組成物、膜、近赤外線カットフィルタ、パターン形成方法、積層体、固体撮像素子、赤外線センサ、画像表示装置、カメラモジュール、及び、化合物 |
| WO2021039253A1 (ja) | 2019-08-30 | 2021-03-04 | 富士フイルム株式会社 | 組成物、膜、光学フィルタ及びその製造方法、固体撮像素子、赤外線センサ、並びに、センサモジュール |
| JP7084550B2 (ja) * | 2020-03-03 | 2022-06-14 | 積水化学工業株式会社 | 液晶表示素子用シール剤、上下導通材料、表示素子 |
| EP4130147A4 (de) | 2020-03-30 | 2023-08-09 | FUJIFILM Corporation | Zusammensetzung, film und optischer sensor |
| EP4220859A4 (de) | 2020-09-28 | 2024-03-27 | FUJIFILM Corporation | Laminatherstellungsverfahren, antennen-in-paketherstellungsverfahren, laminat und zusammensetzung |
| EP4266094A4 (de) | 2020-12-16 | 2024-08-28 | FUJIFILM Corporation | Zusammensetzung, membran, optischer filter, festkörperbildaufnahmeelement, bildanzeigevorrichtung und infrarotstrahlsensor |
| WO2022130773A1 (ja) | 2020-12-17 | 2022-06-23 | 富士フイルム株式会社 | 組成物、膜、光学フィルタ、固体撮像素子、画像表示装置および赤外線センサ |
| CN112852284A (zh) * | 2021-02-25 | 2021-05-28 | 管善月 | 一种有机硅改性聚氨酯丙烯酸酯光固化涂料及其制备方法 |
| WO2022196599A1 (ja) | 2021-03-19 | 2022-09-22 | 富士フイルム株式会社 | 膜および光センサ |
| TW202248755A (zh) | 2021-03-22 | 2022-12-16 | 日商富士軟片股份有限公司 | 負型感光性樹脂組成物、硬化物、積層體、硬化物的製造方法以及半導體元件 |
| WO2022210175A1 (ja) | 2021-03-29 | 2022-10-06 | 富士フイルム株式会社 | 黒色感光性組成物、黒色感光性組成物の製造方法、硬化膜、カラーフィルタ、遮光膜、光学素子、固体撮像素子、ヘッドライトユニット |
| KR102627683B1 (ko) | 2021-08-31 | 2024-01-23 | 후지필름 가부시키가이샤 | 경화물의 제조 방법, 적층체의 제조 방법, 및, 반도체 디바이스의 제조 방법, 및, 처리액 |
| WO2023054142A1 (ja) | 2021-09-29 | 2023-04-06 | 富士フイルム株式会社 | 組成物、樹脂、膜および光センサ |
| EP4456133A4 (de) | 2021-12-23 | 2025-07-30 | Fujifilm Corp | Verbundkörperherstellungsverfahren, verbundkörper, laminatherstellungsverfahren, laminat, vorrichtungsherstellungsverfahren, vorrichtung und zusammensetzung zur bildung eines polyimidhaltigen vorläuferteils |
| EP4485074A4 (de) | 2022-02-24 | 2025-08-13 | Fujifilm Corp | Harzzusammensetzung, gehärteter artikel, laminat, verfahren zur herstellung des gehärteten artikels, verfahren zur herstellung des laminats und halbleiterbauelement |
| JPWO2023190064A1 (de) | 2022-03-29 | 2023-10-05 | ||
| JPWO2024043110A1 (de) | 2022-08-22 | 2024-02-29 | ||
| KR20250055605A (ko) | 2022-09-30 | 2025-04-24 | 후지필름 가부시키가이샤 | 수지 조성물, 경화물, 적층체, 경화물의 제조 방법, 적층체의 제조 방법, 반도체 디바이스의 제조 방법, 및, 반도체 디바이스 |
| TW202424051A (zh) | 2022-09-30 | 2024-06-16 | 日商富士軟片股份有限公司 | 樹脂組成物、硬化物、積層體、硬化物的製造方法、積層體的製造方法、半導體元件的製造方法及半導體元件 |
| KR20250056254A (ko) | 2022-09-30 | 2025-04-25 | 후지필름 가부시키가이샤 | 막의 제조 방법, 감광성 수지 조성물, 경화물의 제조 방법, 경화물, 및 적층체 |
| WO2024203080A1 (ja) | 2023-03-31 | 2024-10-03 | 富士フイルム株式会社 | 薬液、パターン形成方法 |
| CN119241469B (zh) * | 2024-09-29 | 2025-08-15 | 武汉尚赛光电科技有限公司 | 一种光引发剂、光聚合组合物及其应用 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1180846A (en) | 1967-08-08 | 1970-02-11 | Agfa Gevaert Nv | Photopolymerisation of Ethylenically Unsaturated Organic Compounds |
| FR2393345A1 (fr) | 1977-06-01 | 1978-12-29 | Agfa Gevaert Nv | Fabrication d'elements modifies sous forme d'images |
| GB2029423A (en) | 1978-08-25 | 1980-03-19 | Agfa Gevaert Nv | Photo-polymerisable materials and recording method |
| US4590145A (en) | 1985-06-28 | 1986-05-20 | Daicel Chemical Industries, Ltd. | Photopolymerization initiator comprised of thioxanthones and oxime esters |
| US5019482A (en) | 1987-08-12 | 1991-05-28 | Asahi Kasei Kogyo Kabushiki Kaisha | Polymer/oxime ester/coumarin compound photosensitive composition |
| SG77689A1 (en) | 1998-06-26 | 2001-01-16 | Ciba Sc Holding Ag | New o-acyloxime photoinitiators |
| EP1395615B1 (de) | 2001-06-11 | 2009-10-21 | Basf Se | Oxim ester photoinitiatoren mit kombinierter struktur |
| CA2505893A1 (en) | 2002-12-03 | 2004-06-17 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators with heteroaromatic groups |
| JP4565824B2 (ja) * | 2003-09-24 | 2010-10-20 | 株式会社Adeka | 二量体オキシムエステル化合物及び該化合物を有効成分とする光重合開始剤 |
| JP4342886B2 (ja) * | 2003-09-24 | 2009-10-14 | 凸版印刷株式会社 | 感光性組成物及び感光性着色組成物 |
| JP2005121940A (ja) * | 2003-10-17 | 2005-05-12 | Toyo Ink Mfg Co Ltd | 重合性組成物およびそれを用いたネガ型レジストおよびそれを用いた画像パターン形成方法。 |
| JP2005154494A (ja) * | 2003-11-21 | 2005-06-16 | Toyo Ink Mfg Co Ltd | 光ラジカル重合開始剤及びそれを用いた光ラジカル重合性組成物 |
| CN101805282B (zh) | 2004-02-23 | 2012-07-04 | 三菱化学株式会社 | 肟酯化合物、光聚合性组合物和使用该组合物的滤色器 |
| CA2575046A1 (en) | 2004-08-18 | 2006-02-23 | Ciba Specialty Chemicals Holding Inc. | Oxime ester photoinitiators |
| KR101402636B1 (ko) | 2005-12-01 | 2014-06-03 | 시바 홀딩 인크 | 옥심 에스테르 광개시제 |
| ATE458010T1 (de) * | 2005-12-20 | 2010-03-15 | Basf Se | Oximester-photoinitiatoren |
-
2008
- 2008-04-28 JP JP2010507873A patent/JP5535065B2/ja not_active Expired - Fee Related
- 2008-04-28 AT AT08749768T patent/ATE496910T1/de not_active IP Right Cessation
- 2008-04-28 EP EP08749768A patent/EP2144894B1/de not_active Not-in-force
- 2008-04-28 CA CA002684931A patent/CA2684931A1/en not_active Abandoned
- 2008-04-28 DE DE602008004757T patent/DE602008004757D1/de active Active
- 2008-04-28 US US12/598,601 patent/US8349548B2/en not_active Expired - Fee Related
- 2008-04-28 CN CN200880015586.1A patent/CN101687846B/zh not_active Expired - Fee Related
- 2008-04-28 KR KR1020097025803A patent/KR101604873B1/ko not_active Expired - Fee Related
- 2008-04-28 WO PCT/EP2008/055127 patent/WO2008138733A1/en not_active Ceased
- 2008-05-09 TW TW97117247A patent/TWI465433B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| CA2684931A1 (en) | 2008-11-20 |
| US20100086881A1 (en) | 2010-04-08 |
| JP5535065B2 (ja) | 2014-07-02 |
| WO2008138733A1 (en) | 2008-11-20 |
| KR20100017755A (ko) | 2010-02-16 |
| TWI465433B (zh) | 2014-12-21 |
| DE602008004757D1 (en) | 2011-03-10 |
| US8349548B2 (en) | 2013-01-08 |
| TW200904801A (en) | 2009-02-01 |
| KR101604873B1 (ko) | 2016-03-18 |
| CN101687846B (zh) | 2015-12-02 |
| EP2144894B1 (de) | 2011-01-26 |
| EP2144894A1 (de) | 2010-01-20 |
| CN101687846A (zh) | 2010-03-31 |
| JP2010527339A (ja) | 2010-08-12 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE496910T1 (de) | Oximesther-fotoinitiatoren | |
| ATE496027T1 (de) | Oximester-fotoinitiatoren | |
| ATE381540T1 (de) | Oximesther-fotoinitiatoren | |
| ATE458010T1 (de) | Oximester-photoinitiatoren | |
| CY1109441T1 (el) | Ενδιαμεσα προϊοντα για την παραγωγη διοξανιου-2-αλκυλκαρβαμικου | |
| CY1109414T1 (el) | Ν-σουλφονυλ πυρρολια και χρηση αυτων ως αναστολεις αποακετυλασης ιστονης | |
| EA200700699A1 (ru) | Ингибиторы взаимодействия между mdm2 и p53 | |
| ATE541865T1 (de) | Fotoinitiatormischungen | |
| DE602006015319D1 (de) | Sulfoniumsalzinitiatoren | |
| CY1105994T1 (el) | Aναδιαταγμενες πεντανολες, μεθοδος για την παραγωγη αυτων και η χρηση αυτων ως αντιφλεγμονωδων | |
| DK2032370T3 (da) | Reversible thermochrome sammensætninger | |
| TW200626631A (en) | Photosensitizer, photosensitive acid generating agent, and photocurable composition | |
| DE60000442D1 (de) | Aus beta-phosphorylierte nitroxiden abkömmige alkoxyamine, ihre verwendung fur radikal polymerisation | |
| TW200720399A (en) | Light-emitting element and iridium complex | |
| EA200300927A1 (ru) | Новый способ промышленного синтеза тетрасложных эфиров 5-[бис(карбоксиметил)амино]-3-карбоксиметил-4-циано-2-тиофенкарбоновой кислоты и применение для синтеза бивалентных солей ранелиновой кислоты и их гидратов | |
| GB0411929D0 (en) | Organic compounds | |
| TW200607828A (en) | Polymer, polymer film and polymer film device using same | |
| ATE349456T1 (de) | Herstellung von 2-18f-2-desoxy-d-glucose durch festphasensynthese | |
| WO2008117871A1 (ja) | 含窒素レドックス触媒 | |
| WO2008153027A1 (ja) | ピロロキノリン誘導体およびその用途 | |
| NO20074771L (no) | Polyoksyalkylen kjedeinneholdende lipidderivat og lipidhinnestruktur inneholdende slikt derivat | |
| WO2007007207A8 (en) | Pharmaceutical compositions of 3, 5 -bis (arylidene) -4 -piperidones and analogues there of for modulating cell proliferation | |
| EA200702290A1 (ru) | Мотилидные соединения | |
| ATE345335T1 (de) | Acetale, ihre verwendung als riechstoffe und verfahren zu ihrer herstellung | |
| BRPI0512558A (pt) | compostos quìmicos |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |