ATE497192T1 - Verfahren zur herstellung einer lithografiedruckform - Google Patents
Verfahren zur herstellung einer lithografiedruckformInfo
- Publication number
- ATE497192T1 ATE497192T1 AT05110919T AT05110919T ATE497192T1 AT E497192 T1 ATE497192 T1 AT E497192T1 AT 05110919 T AT05110919 T AT 05110919T AT 05110919 T AT05110919 T AT 05110919T AT E497192 T1 ATE497192 T1 AT E497192T1
- Authority
- AT
- Austria
- Prior art keywords
- precursor
- support
- lithographic printing
- gumming
- photopolymerizable layer
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000002243 precursor Substances 0.000 abstract 4
- 239000011248 coating agent Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 2
- 239000011230 binding agent Substances 0.000 abstract 1
- 150000001875 compounds Chemical class 0.000 abstract 1
- 238000010438 heat treatment Methods 0.000 abstract 1
- 230000005660 hydrophilic surface Effects 0.000 abstract 1
- 239000003505 polymerization initiator Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1075—Mechanical aspects of on-press plate preparation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
- B41N3/00—Preparing for use and conserving printing surfaces
- B41N3/08—Damping; Neutralising or similar differentiation treatments for lithographic printing formes; Gumming or finishing solutions, fountain solutions, correction or deletion fluids, or on-press development
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
- G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3057—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the processing units other than the developing unit, e.g. washing units
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/02—Cover layers; Protective layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/04—Intermediate layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
- B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05110919A EP1788444B1 (de) | 2005-11-18 | 2005-11-18 | Verfahren zur Herstellung einer Lithografiedruckform |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE497192T1 true ATE497192T1 (de) | 2011-02-15 |
Family
ID=36947597
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05110919T ATE497192T1 (de) | 2005-11-18 | 2005-11-18 | Verfahren zur herstellung einer lithografiedruckform |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7704679B2 (de) |
| EP (1) | EP1788444B1 (de) |
| CN (1) | CN101322076B (de) |
| AT (1) | ATE497192T1 (de) |
| DE (1) | DE602005026136D1 (de) |
| ES (1) | ES2358120T3 (de) |
| PL (1) | PL1788444T3 (de) |
| WO (1) | WO2007057349A1 (de) |
Families Citing this family (45)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1843203A1 (de) * | 2006-04-03 | 2007-10-10 | Agfa Graphics N.V. | Verfahren zur Herstellung einer Fotopolymerdruckform |
| JP2009069761A (ja) | 2007-09-18 | 2009-04-02 | Fujifilm Corp | 平版印刷版の製版方法 |
| US7763413B2 (en) | 2007-10-16 | 2010-07-27 | Eastman Kodak Company | Methods for imaging and processing negative-working imageable elements |
| US8323874B2 (en) | 2008-01-22 | 2012-12-04 | Eastman Kodak Company | Method of making lithographic printing plates |
| JP5264427B2 (ja) * | 2008-03-25 | 2013-08-14 | 富士フイルム株式会社 | 平版印刷版の作製方法 |
| PL2105799T3 (pl) | 2008-03-26 | 2012-07-31 | Agfa Nv | Sposób wytwarzania litograficznych płyt drukarskich |
| CN102099748B (zh) | 2008-07-16 | 2013-07-17 | 爱克发印艺公司 | 制备平版印版前体的方法和设备 |
| EP2186637B1 (de) | 2008-10-23 | 2012-05-02 | Agfa Graphics N.V. | Lithographiedruckplatte |
| EP2290447A1 (de) | 2009-08-25 | 2011-03-02 | Agfa Graphics N.V. | Satz zur Entwicklung einer Lithografiedruckplatte |
| US20120189770A1 (en) * | 2011-01-20 | 2012-07-26 | Moshe Nakash | Preparing lithographic printing plates by ablation imaging |
| JP5705584B2 (ja) | 2011-02-24 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| JP5705969B2 (ja) | 2011-03-28 | 2015-04-22 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| BR112014005196A2 (pt) * | 2011-09-08 | 2017-03-21 | Agfa Graphics Nv | método para fabricar uma chapa de impressão litográfica |
| JP5604398B2 (ja) | 2011-09-30 | 2014-10-08 | 富士フイルム株式会社 | 平版印刷版原版及び平版印刷版の作製方法 |
| JP5463346B2 (ja) | 2011-12-26 | 2014-04-09 | 富士フイルム株式会社 | 平版印刷版の製版方法 |
| IN2014DN07816A (de) * | 2012-06-05 | 2015-05-15 | Agfa Graphics Nv | |
| EP2755088B1 (de) * | 2013-01-11 | 2016-07-27 | Agfa Graphics NV | Verfahren zur Herstellung einer Flachdruckplatte |
| EP3431290B1 (de) | 2017-07-20 | 2021-09-08 | Agfa Nv | Lithografiedruckplattenvorläufer |
| EP3441223B1 (de) | 2017-08-07 | 2024-02-21 | Eco3 Bv | Lithographiedruckplattenvorläufer |
| EP3474073B1 (de) | 2017-10-17 | 2022-12-07 | Agfa Offset Bv | Methode zur herstellung einer druckplatte |
| ES2881270T3 (es) | 2017-12-08 | 2021-11-29 | Agfa Nv | Procedimiento de fabricación de una plancha de impresión litográfica |
| WO2019179996A1 (en) | 2018-03-22 | 2019-09-26 | Agfa Nv | A lithographic printing plate precursor |
| EP3793829B1 (de) | 2018-05-14 | 2023-07-12 | Agfa Offset Bv | Lithographiedruckplattenvorläufer |
| EP3587113B1 (de) | 2018-06-21 | 2023-01-04 | Agfa Offset Bv | Lithographiedruckplattenvorläufer |
| EP3587112B1 (de) | 2018-06-21 | 2024-04-03 | Eco3 Bv | Lithographiedruckplattenvorläufer |
| CN112638657A (zh) * | 2018-08-31 | 2021-04-09 | 富士胶片株式会社 | 平版印刷版原版、平版印刷版的制作方法、平版印刷方法及固化性组合物 |
| EP3637188A1 (de) | 2018-10-08 | 2020-04-15 | Agfa Nv | Sprudelnder entwicklervorläufer zur verarbeitung eines lithografischen druckplattenvorläufers |
| EP3650938A1 (de) | 2018-11-09 | 2020-05-13 | Agfa Nv | Lithographiedruckplattenvorläufer |
| WO2020120402A1 (en) | 2018-12-10 | 2020-06-18 | Agfa Nv | On-press processing of a uv or violet-sensitized lithographic printing plate |
| EP3686011A1 (de) | 2019-01-23 | 2020-07-29 | Agfa Nv | Lithographiedruckplattenvorläufer |
| EP3815900A1 (de) | 2019-10-31 | 2021-05-05 | Agfa Nv | Lithographiedruckplattenvorläufer und verfahren zur herstellung von hydrophoben harzpartikeln |
| EP3875271B1 (de) | 2020-03-04 | 2025-10-15 | Eco3 Bv | Lithographiedruckplattenvorläufer |
| EP3892469B1 (de) | 2020-04-10 | 2023-11-08 | Eco3 Bv | Lithographiedruckplattenvorläufer |
| EP3922462B1 (de) | 2020-06-08 | 2023-03-01 | Agfa Offset Bv | Lithografischer photopolymerer druckplattenvorläufer mit verbesserter tageslichtstabilität |
| EP3928983B1 (de) | 2020-06-24 | 2023-09-27 | Eco3 Bv | Lithografiedruckplattenvorläufer |
| WO2021259648A1 (en) | 2020-06-24 | 2021-12-30 | Agfa Offset Bv | A lithographic printing plate precursor |
| EP4171958B1 (de) | 2020-06-24 | 2025-08-13 | Eco3 Bv | Lithographiedruckplattenvorläufer, verfahren zur herstellung eines druckplattenvorläufers und verfahren zur herstellung einer druckplatte |
| EP3960455B1 (de) | 2020-08-31 | 2025-08-06 | Eco3 Bv | Lithografiedruckplattenvorläufer, verfahren zur herstellung eines lithografiedruckplattenvorläufers und verfahren zur herstellung einer lithografiedruckplatte |
| US12403686B2 (en) | 2020-10-09 | 2025-09-02 | Eco3 Bv | Lithographic printing plate precursor |
| EP4035897A1 (de) | 2021-01-28 | 2022-08-03 | Agfa Offset Bv | Lithografiedruckplattenvorläufer |
| EP4129682B1 (de) | 2021-08-05 | 2025-10-01 | Eco3 Bv | Lithografiedruckplattenvorläufer |
| EP4223534A1 (de) | 2022-02-07 | 2023-08-09 | Agfa Offset Bv | Lithografiedruckplattenvorläufer |
| EP4239411A1 (de) | 2022-03-04 | 2023-09-06 | Eco3 Bv | Verfahren und vorrichtung zum verarbeiten eine lithografiedruckplattenvorläufers |
| EP4382306A1 (de) | 2022-12-08 | 2024-06-12 | Eco3 Bv | Make-ready-verfahren für eine lithographische druckmaschine |
| EP4461539A1 (de) | 2023-05-10 | 2024-11-13 | Eco3 Bv | Negativ arbeitender lithographiedruckplattenvorläufer |
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|---|---|---|---|---|
| BE635804A (de) | 1962-03-21 | |||
| CH613059A5 (en) | 1975-06-30 | 1979-08-31 | Hoechst Ag | Method for producing a flat-bed printing forme |
| GB2036993B (en) * | 1978-02-06 | 1983-03-09 | Napp Systems Inc | Desensitizing solution and process for treating a diazo photosensitive printing plate |
| US4190345A (en) * | 1978-07-14 | 1980-02-26 | Scott Paper Company | Lithographic plate processing apparatus |
| US4252887A (en) | 1979-08-14 | 1981-02-24 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators |
| US4370406A (en) * | 1979-12-26 | 1983-01-25 | Richardson Graphics Company | Developers for photopolymer lithographic plates |
| US4459349A (en) | 1981-03-27 | 1984-07-10 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
| US4410621A (en) | 1981-04-03 | 1983-10-18 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin containing a combination of diphenyl-imiazolyl dimer and a heterocyclic mercaptan |
| JPS5956403A (ja) | 1982-09-27 | 1984-03-31 | Mitsubishi Chem Ind Ltd | 光重合性組成物 |
| DE3404366A1 (de) | 1984-02-08 | 1985-08-14 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches gemisch auf basis eines diazoniumsalz-polykondensationsprodukts und daraus hergestelltes lichtempfindliches aufzeichnungsmaterial |
| DE3410522A1 (de) | 1984-03-22 | 1985-10-03 | Hoechst Ag, 6230 Frankfurt | Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform |
| US4622286A (en) | 1985-09-16 | 1986-11-11 | E. I. Du Pont De Nemours And Company | Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer |
| DE3539992A1 (de) | 1985-11-12 | 1987-05-14 | Hoechst Ag | Einbrenngummierung fuer offsetdruckplatten |
| JPH065384B2 (ja) | 1986-06-12 | 1994-01-19 | 富士写真フイルム株式会社 | 感光性印刷版 |
| US4912021A (en) * | 1988-02-03 | 1990-03-27 | Hoechst Celanese Corporation | Developer-finisher compositions for lithographic plates |
| DE3832032A1 (de) | 1988-09-21 | 1990-03-22 | Hoechst Ag | Photopolymerisierbares gemisch und daraus hergestelltes aufzeichnungsmaterial |
| CN2075137U (zh) * | 1990-06-25 | 1991-04-17 | 立德印刷科技公司 | 平版印刷用复合版材 |
| US6010824A (en) | 1992-11-10 | 2000-01-04 | Tokyo Ohka Kogyo Co., Ltd. | Photosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the same |
| EP0747773A4 (de) | 1994-12-27 | 1997-06-18 | Mitsubishi Chem Corp | Verfahren und gerät zur behandlung eines entwicklers für pigmententhaltendem, silberhalogenidfreiem, lichtempfindlichem material sowie ein automatisches entwicklungsgerät |
| US5629354A (en) | 1995-02-28 | 1997-05-13 | Eastman Kodak Company | Photopolymerization initiator system comprising a spectral sensitizer and a polycarboxylic acid co-initiator |
| US5910395A (en) | 1995-04-27 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Negative-acting no-process printing plates |
| JPH09239942A (ja) | 1996-03-08 | 1997-09-16 | Fuji Photo Film Co Ltd | 湿し水不要平版印刷原版及びその製版方法 |
| US6514668B1 (en) | 1996-12-26 | 2003-02-04 | Mitsubishi Chemical Corporation | Photosensitive lithographic printing plate |
| EP0869393B1 (de) | 1997-03-31 | 2000-05-31 | Fuji Photo Film Co., Ltd. | Positiv-arbeitende photoempfindliche Zusammensetzung |
| US6218076B1 (en) | 1997-08-26 | 2001-04-17 | Showa Denko K.K. | Stabilizer for organic borate salts and photosensitive composition containing the same |
| US6232038B1 (en) | 1998-10-07 | 2001-05-15 | Mitsubishi Chemical Corporation | Photosensitive composition, image-forming material and image-forming method employing it |
| EP1025992B1 (de) | 1999-02-02 | 2003-07-23 | Agfa-Gevaert | Verfahren zur Herstellung positiv arbeitender Druckplatten |
| DE19915717A1 (de) | 1999-04-08 | 2000-10-12 | Agfa Gevaert Ag | Aufzeichnungsmaterial mit pigmentgefärbter strahlungsempfindlicher Schicht |
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-
2005
- 2005-11-18 EP EP05110919A patent/EP1788444B1/de not_active Expired - Lifetime
- 2005-11-18 ES ES05110919T patent/ES2358120T3/es not_active Expired - Lifetime
- 2005-11-18 PL PL05110919T patent/PL1788444T3/pl unknown
- 2005-11-18 AT AT05110919T patent/ATE497192T1/de not_active IP Right Cessation
- 2005-11-18 DE DE602005026136T patent/DE602005026136D1/de not_active Expired - Lifetime
-
2006
- 2006-11-09 CN CN2006800423137A patent/CN101322076B/zh not_active Expired - Fee Related
- 2006-11-09 WO PCT/EP2006/068306 patent/WO2007057349A1/en not_active Ceased
- 2006-11-09 US US12/093,600 patent/US7704679B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101322076B (zh) | 2011-03-16 |
| US20080254391A1 (en) | 2008-10-16 |
| CN101322076A (zh) | 2008-12-10 |
| EP1788444A1 (de) | 2007-05-23 |
| ES2358120T3 (es) | 2011-05-05 |
| WO2007057349A1 (en) | 2007-05-24 |
| US7704679B2 (en) | 2010-04-27 |
| DE602005026136D1 (de) | 2011-03-10 |
| PL1788444T3 (pl) | 2011-06-30 |
| EP1788444B1 (de) | 2011-01-26 |
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