ATE503043T1 - Anode zur galvanisierung - Google Patents

Anode zur galvanisierung

Info

Publication number
ATE503043T1
ATE503043T1 AT03813909T AT03813909T ATE503043T1 AT E503043 T1 ATE503043 T1 AT E503043T1 AT 03813909 T AT03813909 T AT 03813909T AT 03813909 T AT03813909 T AT 03813909T AT E503043 T1 ATE503043 T1 AT E503043T1
Authority
AT
Austria
Prior art keywords
anode
galvanization
electroplating
shield
reduced
Prior art date
Application number
AT03813909T
Other languages
English (en)
Inventor
Joerg Wurm
Stephane Menard
Original Assignee
Metakem Ges Fuer Schichtchemie Der Metalle Mbh
Micropulse Plating Concepts
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Metakem Ges Fuer Schichtchemie Der Metalle Mbh, Micropulse Plating Concepts filed Critical Metakem Ges Fuer Schichtchemie Der Metalle Mbh
Application granted granted Critical
Publication of ATE503043T1 publication Critical patent/ATE503043T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Magnetic Heads (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
AT03813909T 2002-12-23 2003-12-23 Anode zur galvanisierung ATE503043T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10261493A DE10261493A1 (de) 2002-12-23 2002-12-23 Anode zur Galvanisierung
PCT/EP2003/014785 WO2004059045A2 (de) 2002-12-23 2003-12-23 Anode zur galvanisierung

Publications (1)

Publication Number Publication Date
ATE503043T1 true ATE503043T1 (de) 2011-04-15

Family

ID=32478077

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03813909T ATE503043T1 (de) 2002-12-23 2003-12-23 Anode zur galvanisierung

Country Status (10)

Country Link
US (1) US7943032B2 (de)
EP (1) EP1581673B1 (de)
JP (1) JP4346551B2 (de)
KR (1) KR101077000B1 (de)
CN (1) CN101027432B (de)
AT (1) ATE503043T1 (de)
AU (1) AU2003296716A1 (de)
DE (2) DE10261493A1 (de)
ES (1) ES2363278T3 (de)
WO (1) WO2004059045A2 (de)

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JP5156175B2 (ja) * 2004-10-29 2013-03-06 Ｆｄｋエナジー株式会社 ニッケル光沢メッキを施した電池
EP1712660A1 (de) 2005-04-12 2006-10-18 Enthone Inc. Unlösliche Anode
EP1717351A1 (de) * 2005-04-27 2006-11-02 Enthone Inc. Galvanikbad
DE102005051632B4 (de) 2005-10-28 2009-02-19 Enthone Inc., West Haven Verfahren zum Beizen von nicht leitenden Substratoberflächen und zur Metallisierung von Kunststoffoberflächen
WO2007056267A2 (en) * 2005-11-04 2007-05-18 The Trustees Of Columbia University In The City Of New York Thermally actuated valves, photovoltaic cells and arrays comprising same, and methods for producing same
USD583779S1 (en) * 2006-07-13 2008-12-30 Ebara Corporation Electrolytic plating anode
EP2009147A1 (de) * 2007-06-20 2008-12-31 METAKEM Gesellschaft für Schichtchemie der Metalle GmbH Anodenanordnung zum Galvanisieren
TWI384094B (zh) * 2008-02-01 2013-02-01 Zhen Ding Technology Co Ltd 電鍍用陽極裝置及包括該陽極裝置之電鍍裝置
FR2927909B1 (fr) * 2008-02-26 2010-03-26 Serme Cache souple pour support galvanique, support et procede de mise en oeuvre
EP2123799B1 (de) 2008-04-22 2015-04-22 Rohm and Haas Electronic Materials LLC Verfahren zum Nachfüllen von Indiumionen in Indium-Elektroplattierzusammensetzungen
DE202008006707U1 (de) 2008-05-16 2008-08-07 Saueressig Gmbh & Co. Vorrichtung zum Glavanisieren von Werkstücken
US8236163B2 (en) * 2009-09-18 2012-08-07 United Technologies Corporation Anode media for use in electroplating processes, and methods of cleaning thereof
TWI422714B (zh) * 2010-11-24 2014-01-11 Intech Electronics Co Ltd 電鍍裝置及其電鍍槽中的電極板結構
CN102477576A (zh) * 2010-11-30 2012-05-30 加贺开发科技有限公司 电镀装置及其电镀槽中的电极板结构
CN103820839A (zh) * 2014-01-14 2014-05-28 杭州三耐环保科技有限公司 一种高效抑制电积酸雾的阴阳极板结构及其实现方法
CN104073862A (zh) * 2014-07-11 2014-10-01 张钰 一种用于碱性锌镍合金电镀的不溶性阳极装置
US10428439B2 (en) * 2015-11-16 2019-10-01 Intel Corporation Predictive capability for electroplating shield design
TWI841670B (zh) * 2019-01-24 2024-05-11 德商德國艾托特克公司 用於電解鋅-鎳合金沉積之膜陽極系統
CN110029381B (zh) * 2019-04-25 2020-12-15 首钢集团有限公司 一种高镀锡量镀锡板的生产方法
US12209323B2 (en) 2020-12-08 2025-01-28 Honeywell International Inc. Electroplating shield device and methods of fabricating the same
TWI806328B (zh) * 2020-12-31 2023-06-21 葉濤 不溶性陽極酸性硫酸鹽電鍍銅的優化製程及裝置
CN113106527B (zh) * 2021-04-19 2024-09-10 深圳铱创科技有限公司 不溶性阳极及脉冲电镀设备
US12428745B2 (en) * 2021-12-02 2025-09-30 Dipsol Chemicals Co., Ltd. Method and system for electroplating parts with metal

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Also Published As

Publication number Publication date
AU2003296716A8 (en) 2004-07-22
DE50313572D1 (de) 2011-05-05
KR101077000B1 (ko) 2011-10-26
EP1581673A2 (de) 2005-10-05
JP4346551B2 (ja) 2009-10-21
CN101027432A (zh) 2007-08-29
ES2363278T3 (es) 2011-07-28
US20060124454A1 (en) 2006-06-15
EP1581673B1 (de) 2011-03-23
AU2003296716A1 (en) 2004-07-22
WO2004059045A3 (de) 2005-02-24
DE10261493A1 (de) 2004-07-08
US7943032B2 (en) 2011-05-17
KR20050085863A (ko) 2005-08-29
WO2004059045A2 (de) 2004-07-15
JP2006511712A (ja) 2006-04-06
CN101027432B (zh) 2010-09-29

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