ATE517850T1 - Plasmabrenner zur herstellung von synthetischem siliciumdioxid - Google Patents

Plasmabrenner zur herstellung von synthetischem siliciumdioxid

Info

Publication number
ATE517850T1
ATE517850T1 AT06848223T AT06848223T ATE517850T1 AT E517850 T1 ATE517850 T1 AT E517850T1 AT 06848223 T AT06848223 T AT 06848223T AT 06848223 T AT06848223 T AT 06848223T AT E517850 T1 ATE517850 T1 AT E517850T1
Authority
AT
Austria
Prior art keywords
plasma torch
plasma
injection nozzles
chemical injection
addition
Prior art date
Application number
AT06848223T
Other languages
English (en)
Inventor
Mikhail Guskov
Mohd Aslami
Dau Wu
Original Assignee
Silica Tech Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silica Tech Llc filed Critical Silica Tech Llc
Application granted granted Critical
Publication of ATE517850T1 publication Critical patent/ATE517850T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C03B37/0142—Reactant deposition burners
    • C03B37/01426—Plasma deposition burners or torches
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/42—Plasma torches using an arc with provisions for introducing materials into the plasma, e.g. powder or liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/81—Constructional details of the feed line, e.g. heating, insulation, material, manifolds, filters
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Electromagnetism (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Plasma Technology (AREA)
  • Silicon Compounds (AREA)
  • Chemical Vapour Deposition (AREA)
  • Glass Melting And Manufacturing (AREA)
AT06848223T 2005-12-29 2006-12-28 Plasmabrenner zur herstellung von synthetischem siliciumdioxid ATE517850T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US75428105P 2005-12-29 2005-12-29
US11/646,362 US7861557B2 (en) 2005-12-29 2006-12-28 Plasma torch for making synthetic silica
PCT/US2006/049389 WO2007079127A2 (en) 2005-12-29 2006-12-28 Plasma torch for making synthetic silica

Publications (1)

Publication Number Publication Date
ATE517850T1 true ATE517850T1 (de) 2011-08-15

Family

ID=38137341

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06848223T ATE517850T1 (de) 2005-12-29 2006-12-28 Plasmabrenner zur herstellung von synthetischem siliciumdioxid

Country Status (9)

Country Link
US (1) US7861557B2 (de)
EP (1) EP1968907B1 (de)
JP (1) JP2009522199A (de)
CN (1) CN101389573B (de)
AT (1) ATE517850T1 (de)
BR (1) BRPI0620801A2 (de)
CA (1) CA2635645A1 (de)
RU (1) RU2391298C2 (de)
WO (1) WO2007079127A2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE202008017383U1 (de) 2008-12-19 2009-08-20 J-Fiber Gmbh Glas, insbesondere Glasfaser-Preform
DE102009010497A1 (de) 2008-12-19 2010-08-05 J-Fiber Gmbh Mehrdüsiger rohrförmiger Plasma-Abscheidebrenner zur Herstellung von Vorformen als Halbzeuge für optische Fasern
DE102010050082B4 (de) * 2010-09-15 2017-04-27 J-Plasma Gmbh Brenner
RU2542952C2 (ru) * 2013-04-15 2015-02-27 Открытое акционерное общество "Ракетно-космическая корпорация "Энергия" имени С.П. Королева" Коммутатор напряжения с защитой от перегрузки по току
CN105271701B (zh) * 2015-11-16 2017-08-29 江苏通鼎光棒有限公司 一种在ovd沉积过程中保护喷灯导轨的装置及方法
US10773990B2 (en) * 2016-10-21 2020-09-15 Corning Incorporated Purge device for an optical fiber draw system
WO2019238808A1 (de) 2018-06-15 2019-12-19 Solar Silicon Gmbh Verfahren zur herstellung von elementarem silizium
WO2020090890A1 (ja) * 2018-11-02 2020-05-07 学校法人日本大学 磁化プラズモイド射出装置
CN111843139B (zh) * 2019-04-26 2025-01-21 中天科技精密材料有限公司 等离子喷灯及其应用方法
CN110342808B (zh) * 2019-07-15 2021-09-21 富通集团（嘉善）通信技术有限公司 光纤预制棒的制造工艺
CN112441736B (zh) * 2019-08-30 2023-10-03 中天科技精密材料有限公司 光纤预制棒及其制备方法、等离子沉积设备
JP7428632B2 (ja) 2020-12-14 2024-02-06 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置
CN112479216A (zh) * 2021-01-24 2021-03-12 刘冠诚 一种节能环保纳米二氧化硅生产装置及工艺
CN117682751A (zh) * 2023-11-23 2024-03-12 中建材玻璃新材料研究院集团有限公司 一种高纯石英玻璃的制备方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4162908A (en) * 1975-08-16 1979-07-31 Heraeus Quarzschmelze Gmbh Method of producing synthetic quartz glass, apparatus for the practice of the method, and use of the synthetic quartz glass
US4440558A (en) * 1982-06-14 1984-04-03 International Telephone And Telegraph Corporation Fabrication of optical preforms by axial chemical vapor deposition
JP2505489B2 (ja) * 1987-09-18 1996-06-12 三菱重工業株式会社 プラズマト―チ放射光の減光方法
JPH0189872U (de) * 1987-12-09 1989-06-13
JP2908912B2 (ja) * 1991-08-30 1999-06-23 日本電子株式会社 誘導プラズマ発生装置におけるプラズマ着火方法
NO174450C (no) * 1991-12-12 1994-05-04 Kvaerner Eng Anordning ved plasmabrenner for kjemiske prosesser
US5420391B1 (en) * 1994-06-20 1998-06-09 Metcon Services Ltd Plasma torch with axial injection of feedstock
US5925266A (en) * 1997-10-15 1999-07-20 The Perkin-Elmer Corporation Mounting apparatus for induction coupled plasma torch
US6253580B1 (en) * 1997-12-19 2001-07-03 Fibercore, Inc. Method of making a tubular member for optical fiber production using plasma outside vapor deposition
AU750390B2 (en) * 1998-04-10 2002-07-18 Fibercore, Inc. Method of making an optical fiber preform
US6536240B1 (en) * 1998-04-10 2003-03-25 Mikhail Ivanovich Gouskov Method of making an optical fiber preform via multiple plasma depositing and sintering steps
US6215092B1 (en) * 1999-06-08 2001-04-10 Alcatel Plasma overcladding process and apparatus having multiple plasma torches
EP1213950A2 (de) 2000-12-06 2002-06-12 Alcatel Modifizierter Plasmabrenner zur Erzeugung einer höheren Enthalpie
JP2003194723A (ja) * 2001-12-27 2003-07-09 Rikogaku Shinkokai プラズマトーチ

Also Published As

Publication number Publication date
BRPI0620801A2 (pt) 2012-06-05
US7861557B2 (en) 2011-01-04
WO2007079127A3 (en) 2007-09-07
CN101389573B (zh) 2011-11-16
WO2007079127A2 (en) 2007-07-12
US20070169516A1 (en) 2007-07-26
EP1968907B1 (de) 2011-07-27
RU2008131073A (ru) 2010-02-10
RU2391298C2 (ru) 2010-06-10
CN101389573A (zh) 2009-03-18
JP2009522199A (ja) 2009-06-11
CA2635645A1 (en) 2007-07-12
WO2007079127B1 (en) 2007-11-01
EP1968907A2 (de) 2008-09-17

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