ATE521017T1 - Verfahren zur feinlinien-resist-entfernung - Google Patents

Verfahren zur feinlinien-resist-entfernung

Info

Publication number
ATE521017T1
ATE521017T1 AT06743068T AT06743068T ATE521017T1 AT E521017 T1 ATE521017 T1 AT E521017T1 AT 06743068 T AT06743068 T AT 06743068T AT 06743068 T AT06743068 T AT 06743068T AT E521017 T1 ATE521017 T1 AT E521017T1
Authority
AT
Austria
Prior art keywords
fine line
resist removal
line resist
substrate
stripping
Prior art date
Application number
AT06743068T
Other languages
English (en)
Inventor
Christian Sparing
Dirk Tews
Neal Wood
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Application granted granted Critical
Publication of ATE521017T1 publication Critical patent/ATE521017T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
AT06743068T 2005-06-03 2006-05-26 Verfahren zur feinlinien-resist-entfernung ATE521017T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP05012012A EP1729179A1 (de) 2005-06-03 2005-06-03 Verfahren zur Entschichtung von feinen Resiststrukturen
PCT/EP2006/005041 WO2006128642A1 (en) 2005-06-03 2006-05-26 Method for fine line resist stripping

Publications (1)

Publication Number Publication Date
ATE521017T1 true ATE521017T1 (de) 2011-09-15

Family

ID=35429179

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06743068T ATE521017T1 (de) 2005-06-03 2006-05-26 Verfahren zur feinlinien-resist-entfernung

Country Status (7)

Country Link
EP (2) EP1729179A1 (de)
JP (1) JP2008542830A (de)
KR (1) KR101409496B1 (de)
CN (1) CN101185034A (de)
AT (1) ATE521017T1 (de)
TW (1) TWI356286B (de)
WO (1) WO2006128642A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011037300A1 (ko) * 2009-09-25 2011-03-31 주식회사 엘지화학 포토레지스트 스트리퍼 조성물 및 이를 이용한 포토레지스트 박리방법
KR101008373B1 (ko) * 2009-11-26 2011-01-13 주식회사 엘지화학 포토레지스트 스트리퍼 조성물 및 이를 이용한 포토레지스트 박리방법
KR101679030B1 (ko) * 2009-12-16 2016-11-23 주식회사 동진쎄미켐 레지스트 제거용 조성물
CN102200700B (zh) * 2011-06-08 2012-08-22 绵阳艾萨斯电子材料有限公司 剥离液及其制备方法与应用
EP2645830B1 (de) 2012-03-29 2014-10-08 Atotech Deutschland GmbH Herstellungsverfahren für Schaltungen mit feinen Linien
KR101420571B1 (ko) * 2013-07-05 2014-07-16 주식회사 동진쎄미켐 드라이필름 레지스트 박리제 조성물 및 이를 이용한 드라이필름 레지스트의 제거방법
KR101821663B1 (ko) 2016-02-26 2018-01-24 삼영순화(주) 포토레지스트 박리액 조성물
CN108375879A (zh) * 2017-10-26 2018-08-07 信丰正天伟电子科技有限公司 一种线路板印制成像后的干膜剥除剂
JPWO2019111479A1 (ja) * 2017-12-07 2020-12-10 株式会社Ｊｃｕ レジストの剥離液
CN110597026B (zh) * 2019-09-26 2022-11-29 上海富柏化工有限公司 一种软性电路板干膜清除工艺

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3501675A1 (de) * 1985-01-19 1986-07-24 Merck Patent Gmbh, 6100 Darmstadt Mittel und verfahren zur entfernung von fotoresist- und stripperresten von halbleitersubstraten
US5102777A (en) 1990-02-01 1992-04-07 Ardrox Inc. Resist stripping
DE4141403A1 (de) * 1991-12-16 1993-06-17 Hoechst Ag Verfahren zum entschichten von lichtvernetzten photoresistschablonen
JPH07115048A (ja) * 1993-10-15 1995-05-02 Sony Corp 剥離方法
JPH07140676A (ja) * 1993-11-16 1995-06-02 Ibiden Co Ltd エポキシ樹脂系フォトソルダーレジストの剥離液
GB9404301D0 (en) 1994-03-04 1994-04-20 Atotech Uk Limited Stripper compositions and their use
JPH08248645A (ja) * 1995-03-10 1996-09-27 Mitsubishi Rayon Co Ltd レジスト硬化膜の剥離液
JP2000284506A (ja) 1999-03-31 2000-10-13 Sharp Corp フォトレジスト剥離剤組成物および剥離方法
JP3372903B2 (ja) * 1999-06-21 2003-02-04 ニチゴー・モートン株式会社 フォトレジスト剥離剤
CN1441043A (zh) * 2002-02-06 2003-09-10 希普利公司 清洁用组合物
JP2003318512A (ja) * 2002-04-24 2003-11-07 Matsushita Electric Ind Co Ltd プリント配線板の製造方法及び製造装置
JP2004177740A (ja) * 2002-11-28 2004-06-24 Asahi Kasei Electronics Co Ltd レジスト剥離液

Also Published As

Publication number Publication date
CN101185034A (zh) 2008-05-21
KR20080016804A (ko) 2008-02-22
EP1729179A1 (de) 2006-12-06
TW200710609A (en) 2007-03-16
EP1904898B1 (de) 2011-08-17
TWI356286B (en) 2012-01-11
JP2008542830A (ja) 2008-11-27
KR101409496B1 (ko) 2014-07-02
EP1904898A1 (de) 2008-04-02
WO2006128642A1 (en) 2006-12-07

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Legal Events

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