ATE521909T1 - Antireflexbeschichtung im sichtbaren bereich für lichteinfall in weitem winkel - Google Patents

Antireflexbeschichtung im sichtbaren bereich für lichteinfall in weitem winkel

Info

Publication number
ATE521909T1
ATE521909T1 AT05251962T AT05251962T ATE521909T1 AT E521909 T1 ATE521909 T1 AT E521909T1 AT 05251962 T AT05251962 T AT 05251962T AT 05251962 T AT05251962 T AT 05251962T AT E521909 T1 ATE521909 T1 AT E521909T1
Authority
AT
Austria
Prior art keywords
wide angle
reflective coating
visible area
angle light
range
Prior art date
Application number
AT05251962T
Other languages
English (en)
Inventor
Issei Tanaka
Tsuyoshi Murata
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE521909T1 publication Critical patent/ATE521909T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • G02B1/116—Multilayers including electrically conducting layers
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0018—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means for preventing ghost images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Optical Filters (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Glass (AREA)
AT05251962T 2004-03-30 2005-03-30 Antireflexbeschichtung im sichtbaren bereich für lichteinfall in weitem winkel ATE521909T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004099131A JP4433390B2 (ja) 2004-03-30 2004-03-30 反射防止膜並びにこの反射防止膜を有する光学素子及び光学系

Publications (1)

Publication Number Publication Date
ATE521909T1 true ATE521909T1 (de) 2011-09-15

Family

ID=34909437

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05251962T ATE521909T1 (de) 2004-03-30 2005-03-30 Antireflexbeschichtung im sichtbaren bereich für lichteinfall in weitem winkel

Country Status (6)

Country Link
US (1) US7256948B2 (de)
EP (1) EP1584954B1 (de)
JP (1) JP4433390B2 (de)
CN (1) CN1677132A (de)
AT (1) ATE521909T1 (de)
TW (1) TWI375048B (de)

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US20080002259A1 (en) 2004-09-16 2008-01-03 Hitoshi Ishizawa Mgf2 Optical Thin Film Including Amorphous Silicon Oxide Binder, Optical Element Provided With the Same, and Method for Producing Mgf2 Optical Thin Film
JP4978836B2 (ja) * 2007-03-19 2012-07-18 株式会社ニコン ズームレンズ、光学機器、および結像方法
JP4984231B2 (ja) * 2007-03-22 2012-07-25 株式会社ニコン ズームレンズ、光学機器、および結像方法
JP5213424B2 (ja) * 2007-12-10 2013-06-19 キヤノン株式会社 光学系及びそれを有する光学機器
KR20090071417A (ko) 2007-12-27 2009-07-01 호야 가부시키가이샤 반사방지막, 광학부품, 교환 렌즈 및 촬상장치
JP5777682B2 (ja) * 2008-08-29 2015-09-09 キヤノン株式会社 光学素子及びその製造方法、光学系、光学機器
JP5218902B2 (ja) * 2008-09-10 2013-06-26 株式会社ニコン 広角レンズおよび撮像装置
CN102193175B (zh) * 2010-03-08 2016-01-20 株式会社尼康 变焦镜头系统和光学设备
US8830592B2 (en) * 2010-06-23 2014-09-09 Nikon Corporation Zoom lens, imaging apparatus, and method for manufacturing zoom lens
JP5338860B2 (ja) * 2011-06-27 2013-11-13 株式会社ニコン 光学系、この光学系を有する光学機器、及び、光学系の製造方法
JP5338861B2 (ja) * 2011-06-27 2013-11-13 株式会社ニコン 光学系、この光学系を有する光学機器、及び、光学系の製造方法
US9625689B2 (en) 2010-09-17 2017-04-18 Nikon Corporation Optical system, optical apparatus equipped therewith, and method for manufacturing optical system
JP5614214B2 (ja) * 2010-10-01 2014-10-29 リコーイメージング株式会社 反射防止膜及び反射防止膜を有する光学部材
JP5936444B2 (ja) 2011-07-26 2016-06-22 キヤノン株式会社 光学素子、それを用いた光学系および光学機器
JP5662982B2 (ja) 2011-10-28 2015-02-04 Hoya株式会社 反射防止膜および光学素子
CN104024914B (zh) * 2011-12-28 2017-04-12 株式会社尼康 目镜镜头、配备有其的取景器光学系统和光学设备，和用于制造目镜镜头的方法
JP5885595B2 (ja) 2012-06-12 2016-03-15 キヤノン株式会社 反射防止膜、および、それを有する光学素子、光学系、光学機器
US20150192763A1 (en) * 2014-01-06 2015-07-09 Flir Systems, Inc. Coatings for use with long wavelength detection, optical system including the same, and associated methods
JP6991706B2 (ja) * 2016-11-30 2022-02-03 キヤノン株式会社 光学素子およびそれを有する光学系
US11054108B2 (en) 2017-01-17 2021-07-06 Signify Holding B.V. Adjustable spot light position generation
CN116755214A (zh) 2020-08-03 2023-09-15 大立光电股份有限公司 光学镜头、取像装置及电子装置
KR102890216B1 (ko) 2020-10-23 2025-11-24 에씰로 앙터나시오날 제한된 유령 이미지 가시성을 가진 투과 광학 시스템, 투과 광학 시스템의 유령 이미지 가시성을 평가하기 위한 시스템 및 방법
US12481086B2 (en) * 2021-08-03 2025-11-25 Largan Precision Co., Ltd. Optical lens assembly and optical module

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US4128303A (en) * 1976-04-05 1978-12-05 Kabushiki Kaisha Hoya Lens Anti reflection coating with a composite middle layer
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JPH07104442B2 (ja) * 1989-04-06 1995-11-13 旭硝子株式会社 フッ化マグネシウム膜及び低反射膜の製造方法
JP2991554B2 (ja) * 1990-11-09 1999-12-20 旭光学工業株式会社 広波長域ゴースト防止光学系
JPH063501A (ja) 1992-06-23 1994-01-14 Dainippon Printing Co Ltd 多孔質光学材料
JPH10221502A (ja) 1997-02-07 1998-08-21 Nikon Corp 光学薄膜の製造方法および光学薄膜
US5993898A (en) * 1997-05-19 1999-11-30 Nikon Corporation Fabrication method and structure for multilayer optical anti-reflection coating, and optical component and optical system using multilayer optical anti-reflection coating
JPH11167003A (ja) * 1997-12-02 1999-06-22 Nikon Corp ２波長反射防止膜
EP0994368A3 (de) 1998-10-13 2000-05-03 Nikon Corporation Antireflektionsschichten, optische Elementen und diese vewendendes, verkleinerndes Projektionsbelichtungssystem
JP2000357654A (ja) 1998-10-13 2000-12-26 Nikon Corp 反射防止膜、光学素子、露光装置、及び電子物品
JP2000249820A (ja) 1999-02-26 2000-09-14 Canon Inc フィルターおよびレンズ鏡筒
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EP1152263A4 (de) 1999-09-30 2003-08-20 Nikon Corp Optische vorrichtung mit dünnen vielschichtsystem und deren verwendung zur ausrichtung
JP2002062406A (ja) * 2000-08-23 2002-02-28 Dainippon Printing Co Ltd 反射防止フィルム
WO2002018982A1 (en) * 2000-08-30 2002-03-07 Nikon Corporation Method of forming optical thin film and optical element provided with optical thin film
DE10064143A1 (de) * 2000-12-15 2002-06-20 Zeiss Carl Reflexionsminderungsbeschichtung für Ultraviolettlicht bei großen Einfallswinkeln
DE10101017A1 (de) * 2001-01-05 2002-07-11 Zeiss Carl Reflexionsminderungsbeschichtung für Ultraviolettlicht
AU2002243037A1 (en) * 2001-04-10 2002-10-28 Fuji Photo Film Co., Ltd. Antireflection film, polarizing plate, and apparatus for displaying an image
JP4284006B2 (ja) 2001-04-10 2009-06-24 富士フイルム株式会社 反射防止フィルム、偏光板および画像表示装置
JP3673731B2 (ja) * 2001-05-22 2005-07-20 キヤノン株式会社 露光装置及び方法
JP2004302113A (ja) 2003-03-31 2004-10-28 Nikon Corp 反射防止膜、光学部材、光学系及び投影露光装置、並びに反射防止膜の製造方法
JP2005114881A (ja) 2003-10-06 2005-04-28 Nikon Corp 投影光学系、露光装置、および露光方法

Also Published As

Publication number Publication date
TW200538753A (en) 2005-12-01
US20050225878A1 (en) 2005-10-13
CN1677132A (zh) 2005-10-05
TWI375048B (en) 2012-10-21
EP1584954A3 (de) 2005-12-14
EP1584954B1 (de) 2011-08-24
JP4433390B2 (ja) 2010-03-17
US7256948B2 (en) 2007-08-14
JP2005284040A (ja) 2005-10-13
EP1584954A2 (de) 2005-10-12

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