ATE526430T1 - Verfahren und vorrichtung zur herstellung von rein refraktiven optischen strukturen - Google Patents

Verfahren und vorrichtung zur herstellung von rein refraktiven optischen strukturen

Info

Publication number
ATE526430T1
ATE526430T1 AT07704762T AT07704762T ATE526430T1 AT E526430 T1 ATE526430 T1 AT E526430T1 AT 07704762 T AT07704762 T AT 07704762T AT 07704762 T AT07704762 T AT 07704762T AT E526430 T1 ATE526430 T1 AT E526430T1
Authority
AT
Austria
Prior art keywords
refractive optical
optical structures
purely refractive
white material
producing
Prior art date
Application number
AT07704762T
Other languages
English (en)
Inventor
Lez Leal Juan Maria Gonz
Original Assignee
Univ Cadiz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Cadiz filed Critical Univ Cadiz
Application granted granted Critical
Publication of ATE526430T1 publication Critical patent/ATE526430T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0623—Sulfides, selenides or tellurides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3435—Applying energy to the substrate during sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)
  • Glass Compositions (AREA)
  • Surface Treatment Of Optical Elements (AREA)
AT07704762T 2006-03-09 2007-01-31 Verfahren und vorrichtung zur herstellung von rein refraktiven optischen strukturen ATE526430T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ES200600592A ES2299335B2 (es) 2006-03-09 2006-03-09 Metodo para la fabricacion de estructuras opticas con funcionalidad puramente refractivas.
PCT/ES2007/000053 WO2007101895A1 (es) 2006-03-09 2007-01-31 Método y aparato para la fabricación de estructuras ópticas puramente refractivas

Publications (1)

Publication Number Publication Date
ATE526430T1 true ATE526430T1 (de) 2011-10-15

Family

ID=38474620

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07704762T ATE526430T1 (de) 2006-03-09 2007-01-31 Verfahren und vorrichtung zur herstellung von rein refraktiven optischen strukturen

Country Status (5)

Country Link
US (1) US20090176033A1 (de)
EP (1) EP2000558B1 (de)
AT (1) ATE526430T1 (de)
ES (1) ES2299335B2 (de)
WO (1) WO2007101895A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2333291B1 (es) * 2007-12-28 2011-05-27 Universidade De Santiago De Compostela Procedimiento de obtencion de redes de difraccion de fase en un sustrato mediante ablacion laser de un blanco.
FI126769B (en) * 2014-12-23 2017-05-15 Picodeon Ltd Oy Lighthouse type scanner with rotating mirror and annular focus
US20240318301A1 (en) * 2021-07-28 2024-09-26 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Apparatus for a thermal evaporation system and method of coating a coating region on a front surface of a substrate
EP4323561A1 (de) * 2021-07-28 2024-02-21 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren zum beschichten eines beschichtungsbereichs auf einer vorderseite eines substrats und vorrichtung für ein thermisches verdampfungssystem

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2040785B (en) * 1978-12-28 1983-01-26 Philips Electronic Associated Producing polymer glass asherical optical elements
US4701592A (en) * 1980-11-17 1987-10-20 Rockwell International Corporation Laser assisted deposition and annealing
FR2576147B1 (fr) * 1985-01-17 1987-11-27 Flicstein Jean Procede de depot et de cristallisation d'une couche mince de materiau organique au moyen d'un faisceau d'energie
US4743463A (en) * 1986-02-21 1988-05-10 Eastman Kodak Company Method for forming patterns on a substrate or support
US5053171A (en) * 1986-10-14 1991-10-01 Allergan, Inc. Manufacture of ophthalmic lenses by excimer laser
US5148322A (en) * 1989-11-09 1992-09-15 Omron Tateisi Electronics Co. Micro aspherical lens and fabricating method therefor and optical device
JP3080096B2 (ja) * 1990-06-13 2000-08-21 住友電気工業株式会社 大面積薄膜の作製方法
US5173441A (en) * 1991-02-08 1992-12-22 Micron Technology, Inc. Laser ablation deposition process for semiconductor manufacture
JP3255469B2 (ja) * 1992-11-30 2002-02-12 三菱電機株式会社 レーザ薄膜形成装置
GB2303379B (en) * 1992-11-30 1997-05-28 Mitsubishi Electric Corp Thin film forming apparatus using laser
JPH0870144A (ja) * 1994-08-26 1996-03-12 Sumitomo Electric Ind Ltd 超電導部品の作製方法
US5604635A (en) * 1995-03-08 1997-02-18 Brown University Research Foundation Microlenses and other optical elements fabricated by laser heating of semiconductor doped and other absorbing glasses
US6291797B1 (en) * 1996-08-13 2001-09-18 Nippon Sheet Glass Co., Ltd. Laser machining method for glass substrate, diffraction type optical device fabricated by the machining method, and method of manufacturing optical device
US5737123A (en) * 1996-09-17 1998-04-07 Donohoe; Vincent Adjustable-aspect video projection screen
US6327087B1 (en) * 1998-12-09 2001-12-04 Canon Kabushiki Kaisha Optical-thin-film material, process for its production, and optical device making use of the optical-thin-film material
WO2000044960A1 (en) * 1999-01-27 2000-08-03 The United States Of America, As Represented By The Secretary Of The Navy Matrix assisted pulsed laser evaporation direct write
US6668588B1 (en) 2002-06-06 2003-12-30 Amorphous Materials, Inc. Method for molding chalcogenide glass lenses

Also Published As

Publication number Publication date
EP2000558B1 (de) 2011-09-28
US20090176033A1 (en) 2009-07-09
EP2000558A4 (de) 2010-06-02
EP2000558A9 (de) 2009-03-11
ES2299335A1 (es) 2008-05-16
ES2299335B2 (es) 2010-10-13
EP2000558A2 (de) 2008-12-10
WO2007101895A1 (es) 2007-09-13

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Legal Events

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