ATE527313T1 - Optisches material, enthaltend photohärtbares fluorpolymer, und photohärtbares fluorharz enthaltende zusammensetzung - Google Patents
Optisches material, enthaltend photohärtbares fluorpolymer, und photohärtbares fluorharz enthaltende zusammensetzungInfo
- Publication number
- ATE527313T1 ATE527313T1 AT03788052T AT03788052T ATE527313T1 AT E527313 T1 ATE527313 T1 AT E527313T1 AT 03788052 T AT03788052 T AT 03788052T AT 03788052 T AT03788052 T AT 03788052T AT E527313 T1 ATE527313 T1 AT E527313T1
- Authority
- AT
- Austria
- Prior art keywords
- structural unit
- photohardenable
- materials
- fluorine
- optical
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/045—Light guides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
- C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
- C08F20/10—Esters
- C08F20/22—Esters containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
- C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
- C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1221—Basic optical elements, e.g. light-guiding paths made from organic materials
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12035—Materials
- G02B2006/12069—Organic material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/1219—Polymerisation
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Polymers & Plastics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Wood Science & Technology (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Optical Integrated Circuits (AREA)
- Epoxy Compounds (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002235924 | 2002-08-13 | ||
| PCT/JP2003/010038 WO2004016689A1 (ja) | 2002-08-13 | 2003-08-07 | 光硬化性含フッ素ポリマーを含む光学材料および光硬化性含フッ素樹脂組成物 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE527313T1 true ATE527313T1 (de) | 2011-10-15 |
Family
ID=31884392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03788052T ATE527313T1 (de) | 2002-08-13 | 2003-08-07 | Optisches material, enthaltend photohärtbares fluorpolymer, und photohärtbares fluorharz enthaltende zusammensetzung |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20050265685A1 (de) |
| EP (1) | EP1548062B1 (de) |
| JP (2) | JP4604719B2 (de) |
| KR (1) | KR100792096B1 (de) |
| CN (1) | CN100393797C (de) |
| AT (1) | ATE527313T1 (de) |
| AU (1) | AU2003254841A1 (de) |
| TW (1) | TWI250999B (de) |
| WO (1) | WO2004016689A1 (de) |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7561774B2 (en) * | 2003-03-12 | 2009-07-14 | Sanyo Electric Co., Ltd. | Optical waveguide |
| US7275397B2 (en) * | 2004-05-21 | 2007-10-02 | Corning Incorporated | Method of molding a silica article |
| JP4524150B2 (ja) * | 2004-08-02 | 2010-08-11 | 富士フイルム株式会社 | 反射防止フィルム、偏光板、画像表示装置、および反射防止フィルムの製造方法 |
| JP4600054B2 (ja) * | 2005-01-26 | 2010-12-15 | 宇部興産株式会社 | ビフェニル誘導体の製法 |
| WO2006099380A2 (en) * | 2005-03-11 | 2006-09-21 | E.I. Dupont De Nemours And Company | Photoimageable, thermosettable fluorinated resists |
| JPWO2008123302A1 (ja) * | 2007-03-30 | 2010-07-15 | ダイキン工業株式会社 | 含フッ素体積型ホログラム記録用感光性組成物ならびにそれを用いた含フッ素体積型ホログラム記録用感光性媒体および含フッ素体積型ホログラム |
| US8192898B2 (en) * | 2007-03-30 | 2012-06-05 | Daikin Industries, Ltd. | Composition for fluorine-containing volume holographic data recording material and fluorine-containing volume holographic data recording media made of same |
| JP5224130B2 (ja) * | 2008-03-10 | 2013-07-03 | ナガセケムテックス株式会社 | 撥液性樹脂組成物 |
| JP2010180362A (ja) * | 2009-02-06 | 2010-08-19 | Asahi Kasei Corp | 多官能エポキシポリマーの製造方法 |
| WO2010128969A1 (en) * | 2009-05-08 | 2010-11-11 | Hewlett-Packard Development Company, L.P. | Functionalized perfluoropolyether material as a hydrophobic coating |
| WO2011021670A1 (ja) * | 2009-08-20 | 2011-02-24 | 旭硝子株式会社 | 光硬化性含フッ素重合体組成物 |
| CN101900941B (zh) * | 2010-08-12 | 2011-12-28 | 吉林大学 | 高含氟负性光刻胶及其在聚合物光波导器件中的应用 |
| JP2014016357A (ja) * | 2011-03-28 | 2014-01-30 | Nitto Denko Corp | Sprセンサセルおよびsprセンサ |
| JP5395129B2 (ja) * | 2011-03-28 | 2014-01-22 | 日東電工株式会社 | Sprセンサセルおよびsprセンサ |
| JP5425141B2 (ja) * | 2011-03-28 | 2014-02-26 | 日東電工株式会社 | Sprセンサセルおよびsprセンサ |
| FR2973367B1 (fr) * | 2011-03-30 | 2020-02-21 | Saint Gobain Technical Fabrics Europe | Fil de verre pourvu d'un revetement a base de polymere et ecran contenant ledit fil. |
| CN103874731B (zh) | 2011-09-07 | 2017-02-15 | 微量化学公司 | 用于在低表面能基底上制造浮雕图案的环氧制剂和方法 |
| US11635688B2 (en) | 2012-03-08 | 2023-04-25 | Kayaku Advanced Materials, Inc. | Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates |
| JP5905325B2 (ja) * | 2012-04-25 | 2016-04-20 | 日東電工株式会社 | 光導波路形成用エポキシ樹脂組成物および光導波路形成用硬化性フィルム、ならびに光伝送用フレキシブルプリント基板、およびその製法 |
| JP2014052525A (ja) * | 2012-09-07 | 2014-03-20 | Nitto Denko Corp | ポリマー光導波路の製造方法 |
| CN104813232A (zh) * | 2012-09-28 | 2015-07-29 | 纳幕尔杜邦公司 | 包含具有其上设置可成像的可交联含氟聚合物膜的基板的可成像制品,以及由其制备的成像制品 |
| CN103013287B (zh) * | 2012-11-23 | 2015-04-22 | 中科院广州化学有限公司 | 一种含氟环氧型复合阳离子光固化涂料及制备方法和应用 |
| WO2015016329A1 (ja) * | 2013-08-02 | 2015-02-05 | ダイキン工業株式会社 | 重合性官能基及び架橋性官能基からなる群より選択される少なくとも1種の基を含有する含フッ素重合体を含む組成物及び塗装物品 |
| JP6332590B2 (ja) * | 2013-11-08 | 2018-05-30 | 日東電工株式会社 | 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板 |
| JP6274498B2 (ja) * | 2013-11-08 | 2018-02-07 | 日東電工株式会社 | 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板 |
| JP2015127697A (ja) * | 2013-11-28 | 2015-07-09 | 日東電工株式会社 | 光導波路ならびに該光導波路を用いたsprセンサセルおよび比色センサセル |
| JP6807752B2 (ja) * | 2014-06-03 | 2021-01-06 | ザ ケマーズ カンパニー エフシー リミテッド ライアビリティ カンパニー | 光架橋フルオロポリマーを含む保護層 |
| KR102237112B1 (ko) * | 2014-07-30 | 2021-04-08 | 엘지이노텍 주식회사 | 발광 소자 및 이를 구비한 광원 모듈 |
| US20170242189A1 (en) * | 2014-09-02 | 2017-08-24 | Kyushu University | Low-resistance cladding material and electro-optic polymer optical waveguide |
| CN106397649A (zh) * | 2015-07-28 | 2017-02-15 | 上海交通大学 | 含氟共聚物及其组合物、具有微棱镜阵列的聚合物的制备方法 |
| CN106187953B (zh) * | 2016-07-29 | 2018-06-29 | 湖北固润科技股份有限公司 | 一种阳离子聚合单体及合成和应用 |
| WO2020080523A1 (ja) * | 2018-10-18 | 2020-04-23 | ダイキン工業株式会社 | 含フッ素エラストマー、架橋性組成物および成形品 |
| CN109581586B (zh) * | 2019-01-10 | 2021-03-23 | 上海理工大学 | 一种结构紧凑型氮化硅波分复用光子芯片 |
| WO2020230715A1 (ja) * | 2019-05-16 | 2020-11-19 | 住友化学株式会社 | 電子部品及びその製造方法 |
| JP6998362B2 (ja) * | 2019-05-16 | 2022-01-18 | 住友化学株式会社 | 電子部品及びその製造方法 |
| JP7315695B2 (ja) * | 2019-11-15 | 2023-07-26 | 三井化学株式会社 | 積層体、積層体の製造方法、防曇膜形成用組成物、防曇膜及び防曇膜形成用組成物セット |
| US12305063B2 (en) | 2020-05-14 | 2025-05-20 | 3M Innovative Properties Company | Fluorinated coupling agents and fluorinated (co)polymer layers made using the same |
| WO2021229340A1 (en) | 2020-05-14 | 2021-11-18 | 3M Innovative Properties Company | Fluorinated photoinitiators and fluorinated (co)polymer layers made using the same |
| US12517285B2 (en) | 2020-05-14 | 2026-01-06 | 3M Innovative Properties Company | Multilayer optical films comprising at least one fluorinated (co)polymer layer made using a fluorinated photoinitiator, and methods of making and using the same |
| CN114907290B (zh) * | 2021-02-07 | 2023-11-28 | 中国科学院理化技术研究所 | 一种低折射率的含氟环氧树脂及其合成方法和应用 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100320251B1 (ko) * | 1994-06-09 | 2002-01-12 | 이노우에 노리유끼 | 불소 함유 올레핀 |
| JPH09157578A (ja) * | 1995-12-08 | 1997-06-17 | Daikin Ind Ltd | 含フッ素塗料用材料およびそれを用いた被覆方法 |
| DE19542501A1 (de) * | 1995-11-15 | 1997-05-22 | Bayer Ag | Peroxidisch vernetzbare Fluorkautschuke, ein Verfahren zu deren Herstellung und deren Verwendung |
| JP4378786B2 (ja) * | 1998-04-30 | 2009-12-09 | Jsr株式会社 | 反射防止膜 |
| WO2000002873A1 (en) * | 1998-07-09 | 2000-01-20 | Jsr Corporation | Oxetane compounds, oxetane copolymer, and process for producing oxetane compounds |
| JP4200548B2 (ja) * | 1998-07-09 | 2008-12-24 | Jsr株式会社 | オキセタン化合物およびその製造方法 |
| US6790587B1 (en) * | 1999-05-04 | 2004-09-14 | E. I. Du Pont De Nemours And Company | Fluorinated polymers, photoresists and processes for microlithography |
| TW588220B (en) * | 2000-04-04 | 2004-05-21 | Daikin Ind Ltd | Novel fluorine-containing polymer having group reactive with acid and chemically amplifying type photo resist composition prepared by using same |
| DE60118965T2 (de) * | 2000-08-29 | 2007-09-06 | Daikin Industries, Ltd. | Härtbares fluoropolymer, härtbare harzzusammensetzungen diese enthaltend und antireflexionsfilm |
| TW588221B (en) * | 2000-09-07 | 2004-05-21 | Shinetsu Chemical Co | Polymers, resist compositions and patterning process |
| JP4192600B2 (ja) * | 2001-03-08 | 2008-12-10 | ダイキン工業株式会社 | 含フッ素光導波路用材料 |
| JP2002372601A (ja) * | 2001-04-13 | 2002-12-26 | Fuji Photo Film Co Ltd | 反射防止フィルムおよび画像表示装置と含フッ素共重合体 |
| KR100486245B1 (ko) * | 2001-12-19 | 2005-05-03 | 삼성전자주식회사 | 하이드레이트 구조를 가지는 플루오르 함유 감광성 폴리머및 이를 포함하는 레지스트 조성물 |
| US6911509B1 (en) * | 2004-02-17 | 2005-06-28 | The Penn State Research Foundation | Functional fluoropolymers and process therefor |
| JP5418602B2 (ja) * | 2009-11-24 | 2014-02-19 | ダイキン工業株式会社 | 硬化性樹脂組成物 |
| WO2011065155A1 (ja) * | 2009-11-24 | 2011-06-03 | ダイキン工業株式会社 | 硬化性樹脂組成物 |
| WO2012133557A1 (ja) * | 2011-03-30 | 2012-10-04 | ダイキン工業株式会社 | 光学素子封止用含フッ素樹脂組成物、及び、硬化物 |
-
2003
- 2003-08-07 AU AU2003254841A patent/AU2003254841A1/en not_active Abandoned
- 2003-08-07 KR KR1020057002232A patent/KR100792096B1/ko not_active Expired - Fee Related
- 2003-08-07 WO PCT/JP2003/010038 patent/WO2004016689A1/ja not_active Ceased
- 2003-08-07 JP JP2004528850A patent/JP4604719B2/ja not_active Expired - Fee Related
- 2003-08-07 EP EP03788052A patent/EP1548062B1/de not_active Expired - Lifetime
- 2003-08-07 US US10/524,259 patent/US20050265685A1/en not_active Abandoned
- 2003-08-07 CN CNB038192632A patent/CN100393797C/zh not_active Expired - Fee Related
- 2003-08-07 AT AT03788052T patent/ATE527313T1/de not_active IP Right Cessation
- 2003-08-12 TW TW092122168A patent/TWI250999B/zh not_active IP Right Cessation
-
2009
- 2009-12-17 JP JP2009286815A patent/JP5293588B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| TW200417556A (en) | 2004-09-16 |
| TWI250999B (en) | 2006-03-11 |
| CN1675303A (zh) | 2005-09-28 |
| KR20050073444A (ko) | 2005-07-13 |
| JP2010084150A (ja) | 2010-04-15 |
| EP1548062B1 (de) | 2011-10-05 |
| AU2003254841A1 (en) | 2004-03-03 |
| KR100792096B1 (ko) | 2008-01-04 |
| JP5293588B2 (ja) | 2013-09-18 |
| CN100393797C (zh) | 2008-06-11 |
| JPWO2004016689A1 (ja) | 2005-12-02 |
| JP4604719B2 (ja) | 2011-01-05 |
| WO2004016689A1 (ja) | 2004-02-26 |
| US20050265685A1 (en) | 2005-12-01 |
| EP1548062A1 (de) | 2005-06-29 |
| EP1548062A4 (de) | 2008-09-24 |
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