ATE536263T1 - Verfahren zur plasmaverstärkten verbindung und durch plasmaverstärkte verbindung erzeugte verbundstrukturen - Google Patents
Verfahren zur plasmaverstärkten verbindung und durch plasmaverstärkte verbindung erzeugte verbundstrukturenInfo
- Publication number
- ATE536263T1 ATE536263T1 AT05809060T AT05809060T ATE536263T1 AT E536263 T1 ATE536263 T1 AT E536263T1 AT 05809060 T AT05809060 T AT 05809060T AT 05809060 T AT05809060 T AT 05809060T AT E536263 T1 ATE536263 T1 AT E536263T1
- Authority
- AT
- Austria
- Prior art keywords
- plasma
- reinforced bonding
- composite structures
- structures produced
- bonding
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1601—Production of bubble jet print heads
- B41J2/1603—Production of bubble jet print heads of the front shooter type
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1623—Manufacturing processes bonding and adhesion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/22—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of impact or pressure on a printing material or impression-transfer material
- B41J2/23—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of impact or pressure on a printing material or impression-transfer material using print wires
- B41J2/235—Print head assemblies
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
- B81B7/02—Microstructural systems; Auxiliary parts of microstructural devices or systems containing distinct electrical or optical devices of particular relevance for their function, e.g. microelectro-mechanical systems [MEMS]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P90/00—Preparation of wafers not covered by a single main group of this subclass, e.g. wafer reinforcement
- H10P90/19—Preparing inhomogeneous wafers
- H10P90/1904—Preparing vertically inhomogeneous wafers
- H10P90/1906—Preparing SOI wafers
- H10P90/1914—Preparing SOI wafers using bonding
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/30—Die-attach connectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W72/00—Interconnections or connectors in packages
- H10W72/071—Connecting or disconnecting
- H10W72/073—Connecting or disconnecting of die-attach connectors
- H10W72/07331—Connecting techniques
- H10W72/07337—Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Micromachines (AREA)
- Ceramic Products (AREA)
- Die Bonding (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US62206204P | 2004-10-26 | 2004-10-26 | |
| US10/977,141 US7563691B2 (en) | 2004-10-29 | 2004-10-29 | Method for plasma enhanced bonding and bonded structures formed by plasma enhanced bonding |
| PCT/US2005/035772 WO2006047052A1 (en) | 2004-10-26 | 2005-10-04 | Method for plasma enhanced bonding and bonded structures formed by plasma enhanced bonding |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE536263T1 true ATE536263T1 (de) | 2011-12-15 |
Family
ID=35741794
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05809060T ATE536263T1 (de) | 2004-10-26 | 2005-10-04 | Verfahren zur plasmaverstärkten verbindung und durch plasmaverstärkte verbindung erzeugte verbundstrukturen |
Country Status (7)
| Country | Link |
|---|---|
| EP (1) | EP1812238B1 (de) |
| JP (1) | JP2008518470A (de) |
| KR (1) | KR101232504B1 (de) |
| CN (1) | CN101048285B (de) |
| AT (1) | ATE536263T1 (de) |
| AU (1) | AU2005299977B2 (de) |
| WO (1) | WO2006047052A1 (de) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2231408B1 (de) * | 2008-01-09 | 2014-06-25 | Hewlett-Packard Development Company, L.P. | Fluidausstosspatrone und verfahren |
| CN109664616A (zh) * | 2018-11-29 | 2019-04-23 | 佛山市南海永恒头盔制造有限公司 | 异形物体表面印刷喷头 |
| KR20240129207A (ko) * | 2022-03-30 | 2024-08-27 | 야마하 로보틱스 홀딩스 가부시키가이샤 | 전자 부품 세정 방법 |
| KR20230155005A (ko) | 2022-03-30 | 2023-11-09 | 야마하 로보틱스 홀딩스 가부시키가이샤 | 웨이퍼 세정 장치 및 본딩 시스템 |
| WO2023188128A1 (ja) * | 2022-03-30 | 2023-10-05 | ヤマハロボティクスホールディングス株式会社 | 電子部品洗浄装置 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4337239A1 (de) * | 1993-10-30 | 1995-05-04 | Bayerische Motoren Werke Ag | Vorrichtung zur Steuerung der Kraftstoffeinspritzmenge bei Brennkraftmaschinen in Abhängigkeit vom Luftfluß in die Zylinder |
| DE69429848T2 (de) * | 1993-11-01 | 2002-09-26 | Matsushita Electric Industrial Co., Ltd. | Elektronische Anordnung und Verfahren zur Herstellung |
| JP3294934B2 (ja) * | 1994-03-11 | 2002-06-24 | キヤノン株式会社 | 半導体基板の作製方法及び半導体基板 |
| JPH09314835A (ja) * | 1996-05-31 | 1997-12-09 | Kyocera Corp | インクジェットヘッドとその製造方法 |
| US6902987B1 (en) * | 2000-02-16 | 2005-06-07 | Ziptronix, Inc. | Method for low temperature bonding and bonded structure |
| JP3796394B2 (ja) * | 2000-06-21 | 2006-07-12 | キヤノン株式会社 | 圧電素子の製造方法および液体噴射記録ヘッドの製造方法 |
| JP4682415B2 (ja) * | 2000-11-06 | 2011-05-11 | 富士電機システムズ株式会社 | 陽極接合方法 |
| US6555480B2 (en) * | 2001-07-31 | 2003-04-29 | Hewlett-Packard Development Company, L.P. | Substrate with fluidic channel and method of manufacturing |
| US6793759B2 (en) * | 2001-10-09 | 2004-09-21 | Dow Corning Corporation | Method for creating adhesion during fabrication of electronic devices |
| US6679587B2 (en) * | 2001-10-31 | 2004-01-20 | Hewlett-Packard Development Company, L.P. | Fluid ejection device with a composite substrate |
| US20030136505A1 (en) * | 2002-01-18 | 2003-07-24 | Wimmer Phillip L. | Method of preparing a surface for adhesion |
| JP2003273312A (ja) * | 2002-03-12 | 2003-09-26 | Taiyo Yuden Co Ltd | シリコンセラミックス複合モジュールの製造方法 |
-
2005
- 2005-10-04 WO PCT/US2005/035772 patent/WO2006047052A1/en not_active Ceased
- 2005-10-04 JP JP2007538948A patent/JP2008518470A/ja active Pending
- 2005-10-04 CN CN2005800364986A patent/CN101048285B/zh not_active Expired - Fee Related
- 2005-10-04 AT AT05809060T patent/ATE536263T1/de active
- 2005-10-04 AU AU2005299977A patent/AU2005299977B2/en not_active Ceased
- 2005-10-04 KR KR1020077009917A patent/KR101232504B1/ko not_active Expired - Fee Related
- 2005-10-04 EP EP05809060A patent/EP1812238B1/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO2006047052A1 (en) | 2006-05-04 |
| KR20070083885A (ko) | 2007-08-24 |
| EP1812238B1 (de) | 2011-12-07 |
| AU2005299977B2 (en) | 2010-09-30 |
| AU2005299977A1 (en) | 2006-05-04 |
| CN101048285A (zh) | 2007-10-03 |
| CN101048285B (zh) | 2011-06-08 |
| JP2008518470A (ja) | 2008-05-29 |
| EP1812238A1 (de) | 2007-08-01 |
| KR101232504B1 (ko) | 2013-02-12 |
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