ATE537134T1 - Fluorhaltige verbindung mit hochfluorierter norbornanstruktur, fluorhaltiges polymer und verfahren zu deren herstellung - Google Patents

Fluorhaltige verbindung mit hochfluorierter norbornanstruktur, fluorhaltiges polymer und verfahren zu deren herstellung

Info

Publication number
ATE537134T1
ATE537134T1 AT07768153T AT07768153T ATE537134T1 AT E537134 T1 ATE537134 T1 AT E537134T1 AT 07768153 T AT07768153 T AT 07768153T AT 07768153 T AT07768153 T AT 07768153T AT E537134 T1 ATE537134 T1 AT E537134T1
Authority
AT
Austria
Prior art keywords
fluorine
compound
production
norboron
highly fluorinated
Prior art date
Application number
AT07768153T
Other languages
English (en)
Inventor
Yasuhisa Matsukawa
Daisuke Shirakawa
Eisuke Murotani
Naoko Shirota
Yoko Takebe
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Application granted granted Critical
Publication of ATE537134T1 publication Critical patent/ATE537134T1/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/385Saturated compounds containing a keto group being part of a ring
    • C07C49/457Saturated compounds containing a keto group being part of a ring containing halogen
    • C07C49/467Saturated compounds containing a keto group being part of a ring containing halogen polycyclic
    • C07C49/473Saturated compounds containing a keto group being part of a ring containing halogen polycyclic a keto group being part of a condensed ring system
    • C07C49/477Saturated compounds containing a keto group being part of a ring containing halogen polycyclic a keto group being part of a condensed ring system having two rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/132Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group
    • C07C29/136Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH
    • C07C29/143Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH of ketones
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C29/00Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
    • C07C29/132Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group
    • C07C29/136Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH
    • C07C29/147Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by reduction of an oxygen containing functional group of >C=O containing groups, e.g. —COOH of carboxylic acids or derivatives thereof
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C31/00Saturated compounds having hydroxy or O-metal groups bound to acyclic carbon atoms
    • C07C31/34Halogenated alcohols
    • C07C31/44Halogenated alcohols containing saturated rings
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C35/00Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C35/48Halogenated derivatives
    • C07C35/52Alcohols with a condensed ring system
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/51Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by pyrolysis, rearrangement or decomposition
    • C07C45/54Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by pyrolysis, rearrangement or decomposition of compounds containing doubly bound oxygen atoms, e.g. esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C61/00Compounds having carboxyl groups bound to carbon atoms of rings other than six-membered aromatic rings
    • C07C61/16Unsaturated compounds
    • C07C61/40Unsaturated compounds containing halogen
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C67/00Preparation of carboxylic acid esters
    • C07C67/14Preparation of carboxylic acid esters from carboxylic acid halides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62Halogen-containing esters
    • C07C69/65Halogen-containing esters of unsaturated acids
    • C07C69/653Acrylic acid esters; Methacrylic acid esters; Haloacrylic acid esters; Halomethacrylic acid esters
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/74Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring
    • C07C69/753Esters of carboxylic acids having an esterified carboxyl group bound to a carbon atom of a ring other than a six-membered aromatic ring of polycyclic acids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/22Esters containing halogen
    • C08F220/24Esters containing halogen containing perhaloalkyl radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00Systems containing two condensed rings
    • C07C2602/36Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AT07768153T 2006-07-11 2007-07-04 Fluorhaltige verbindung mit hochfluorierter norbornanstruktur, fluorhaltiges polymer und verfahren zu deren herstellung ATE537134T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006190484 2006-07-11
PCT/JP2007/063401 WO2008007594A1 (en) 2006-07-11 2007-07-04 Fluorine-containing compound having highly fluorinated norbornane structure, fluorine-containing polymer, and their production methods

Publications (1)

Publication Number Publication Date
ATE537134T1 true ATE537134T1 (de) 2011-12-15

Family

ID=38923156

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07768153T ATE537134T1 (de) 2006-07-11 2007-07-04 Fluorhaltige verbindung mit hochfluorierter norbornanstruktur, fluorhaltiges polymer und verfahren zu deren herstellung

Country Status (7)

Country Link
US (2) US8134033B2 (de)
EP (1) EP2039672B1 (de)
JP (1) JPWO2008007594A1 (de)
CN (2) CN101489969A (de)
AT (1) ATE537134T1 (de)
TW (1) TW200813099A (de)
WO (1) WO2008007594A1 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018008462A1 (ja) * 2016-07-04 2018-01-11 ナミックス株式会社 接着剤組成物、硬化物、精密部品

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1286027B1 (it) 1996-06-10 1998-07-07 Ausimont Spa Rivestimenti protettivi a base di perfluoropolieteri funzionalizzati
JP4802367B2 (ja) 1999-03-23 2011-10-26 旭硝子株式会社 液相フッ素化による含フッ素化合物の製造方法
US6414167B1 (en) * 2000-06-19 2002-07-02 Central Glass Company, Limited Octafluorotricyclodecane derivatives and processes for producing same
JP2002080431A (ja) * 2000-06-19 2002-03-19 Central Glass Co Ltd オクタフルオロトリシクロデカン誘導体およびその製造方法
DE60140679D1 (de) 2000-08-30 2010-01-14 Asahi Glass Co Ltd Verfahren zur herstellung von fluorierten ketonen
JP3904064B2 (ja) * 2001-02-28 2007-04-11 信越化学工業株式会社 高分子化合物、レジスト材料及びパターン形成方法
TWI300790B (en) * 2001-02-28 2008-09-11 Shinetsu Chemical Co Polymers, Resist Compositions and Patterning Process
JP4233314B2 (ja) * 2002-11-29 2009-03-04 東京応化工業株式会社 レジスト組成物および溶解制御剤
JP4302585B2 (ja) * 2003-10-08 2009-07-29 信越化学工業株式会社 重合性化合物、高分子化合物及びポジ型レジスト材料並びにこれを用いたパターン形成方法
US7232641B2 (en) * 2003-10-08 2007-06-19 Shin-Etsu Chemical Co., Ltd. Polymerizable compound, polymer, positive-resist composition, and patterning process using the same
JP2005272741A (ja) 2004-03-26 2005-10-06 Daikin Ind Ltd ノルボルナン基を有する含フッ素単量体、含フッ素重合体および表面処理剤
WO2007066481A1 (ja) 2005-12-05 2007-06-14 Daikin Industries, Ltd. α,β-不飽和エステル基を含有する含フッ素ノルボルネン誘導体または含フッ素ノルボルナン誘導体を含む硬化性含フッ素ポリマー組成物
JP4187753B2 (ja) 2006-04-10 2008-11-26 株式会社リコー 不揮発性メモリ
JPWO2007119803A1 (ja) * 2006-04-13 2009-08-27 旭硝子株式会社 イマージョンリソグラフィー用レジスト材料
EP2009499A4 (de) * 2006-04-20 2010-11-17 Asahi Glass Co Ltd Material einer resistschutzmembran für die immersionslithographie
JP2009203247A (ja) 2006-06-16 2009-09-10 Asahi Glass Co Ltd 含フッ素重合体溶液組成物

Also Published As

Publication number Publication date
US8134033B2 (en) 2012-03-13
CN102603507A (zh) 2012-07-25
EP2039672A4 (de) 2010-07-14
CN101489969A (zh) 2009-07-22
US20090192330A1 (en) 2009-07-30
EP2039672B1 (de) 2011-12-14
JPWO2008007594A1 (ja) 2009-12-10
EP2039672A1 (de) 2009-03-25
TW200813099A (en) 2008-03-16
WO2008007594A1 (en) 2008-01-17
US20120065347A1 (en) 2012-03-15

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