ATE545156T1 - Einzelelektrontransistoren und verfahren zur herstellung in welchen ein vorspringendes teil das raum zwischen die elektroden definiert - Google Patents

Einzelelektrontransistoren und verfahren zur herstellung in welchen ein vorspringendes teil das raum zwischen die elektroden definiert

Info

Publication number
ATE545156T1
ATE545156T1 AT02759144T AT02759144T ATE545156T1 AT E545156 T1 ATE545156 T1 AT E545156T1 AT 02759144 T AT02759144 T AT 02759144T AT 02759144 T AT02759144 T AT 02759144T AT E545156 T1 ATE545156 T1 AT E545156T1
Authority
AT
Austria
Prior art keywords
electrodes
projecting feature
electrode
production
space
Prior art date
Application number
AT02759144T
Other languages
English (en)
Inventor
Louis C Brousseau Iii
Original Assignee
Quantum Logic Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Quantum Logic Devices Inc filed Critical Quantum Logic Devices Inc
Application granted granted Critical
Publication of ATE545156T1 publication Critical patent/ATE545156T1/de

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N99/00—Subject matter not provided for in other groups of this subclass
    • H10N99/05—Devices based on quantum mechanical effects, e.g. quantum interference devices or metal single-electron transistors
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
    • H10D30/402—Single electron transistors; Coulomb blockade transistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/962—Quantum dots and lines
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S977/00—Nanotechnology
    • Y10S977/902—Specified use of nanostructure
    • Y10S977/932—Specified use of nanostructure for electronic or optoelectronic application
    • Y10S977/936—Specified use of nanostructure for electronic or optoelectronic application in a transistor or 3-terminal device
    • Y10S977/937—Single electron transistor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y10T428/2462—Composite web or sheet with partial filling of valleys on outer surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24628—Nonplanar uniform thickness material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24628—Nonplanar uniform thickness material
    • Y10T428/24669—Aligned or parallel nonplanarities
    • Y10T428/24678—Waffle-form

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thin Film Transistor (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
AT02759144T 2001-07-13 2002-07-12 Einzelelektrontransistoren und verfahren zur herstellung in welchen ein vorspringendes teil das raum zwischen die elektroden definiert ATE545156T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/905,471 US6653653B2 (en) 2001-07-13 2001-07-13 Single-electron transistors and fabrication methods in which a projecting feature defines spacing between electrodes
PCT/US2002/022260 WO2003007385A1 (en) 2001-07-13 2002-07-12 Single-electron transistors and fabrication methods in which a projecting feature defines spacing between electrodes

Publications (1)

Publication Number Publication Date
ATE545156T1 true ATE545156T1 (de) 2012-02-15

Family

ID=25420883

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02759144T ATE545156T1 (de) 2001-07-13 2002-07-12 Einzelelektrontransistoren und verfahren zur herstellung in welchen ein vorspringendes teil das raum zwischen die elektroden definiert

Country Status (6)

Country Link
US (2) US6653653B2 (de)
EP (1) EP1407493B1 (de)
JP (1) JP4343683B2 (de)
AT (1) ATE545156T1 (de)
TW (1) TW558740B (de)
WO (1) WO2003007385A1 (de)

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US7662731B2 (en) 2004-03-12 2010-02-16 Japan Science And Technology Agency Quantum dot manipulating method and quantum dot production/manipulation apparatus
US6946693B1 (en) 2004-04-27 2005-09-20 Wisconsin Alumni Research Foundation Electromechanical electron transfer devices
US20080050659A1 (en) * 2004-09-30 2008-02-28 Japan Science And Technology Agency Method of Patterning Self-Organizing Material, Patterned Substrate of Self-Organizing Material and Method of Producing the Same, and Photomask Using Patterned Substrate of Self-Organizing Material
JP4613314B2 (ja) * 2005-05-26 2011-01-19 独立行政法人産業技術総合研究所 単結晶の製造方法
KR100723410B1 (ko) * 2005-08-17 2007-05-30 삼성전자주식회사 자기정렬된 메탈쉴드를 구비한 저항성 탐침의 제조방법
KR100777973B1 (ko) * 2006-07-13 2007-11-29 한국표준과학연구원 다중선형전극 센서 유닛으로 이루어진 바이오센서
JP5306377B2 (ja) * 2008-02-11 2013-10-02 クコー ピーティーワイ リミテッド 電子又はホールスピンの制御及び読み取り
US8378895B2 (en) * 2010-04-08 2013-02-19 Wisconsin Alumni Research Foundation Coupled electron shuttle providing electrical rectification
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Also Published As

Publication number Publication date
EP1407493A1 (de) 2004-04-14
EP1407493B1 (de) 2012-02-08
US20040113144A1 (en) 2004-06-17
US6653653B2 (en) 2003-11-25
JP4343683B2 (ja) 2009-10-14
JP2004535677A (ja) 2004-11-25
WO2003007385A1 (en) 2003-01-23
US20030012930A1 (en) 2003-01-16
TW558740B (en) 2003-10-21

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