ATE550132T1 - Laserbasiertes verfahren und system zur verarbeitung von gezielt ausgerichtetem oberflächenmaterial und daraus hergestellter artikel - Google Patents
Laserbasiertes verfahren und system zur verarbeitung von gezielt ausgerichtetem oberflächenmaterial und daraus hergestellter artikelInfo
- Publication number
- ATE550132T1 ATE550132T1 AT05773635T AT05773635T ATE550132T1 AT E550132 T1 ATE550132 T1 AT E550132T1 AT 05773635 T AT05773635 T AT 05773635T AT 05773635 T AT05773635 T AT 05773635T AT E550132 T1 ATE550132 T1 AT E550132T1
- Authority
- AT
- Austria
- Prior art keywords
- surface material
- targeted surface
- targeted
- laser
- based method
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/361—Removing material for deburring or mechanical trimming
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
- G06K1/00—Methods or arrangements for marking the record carrier in digital fashion
- G06K1/12—Methods or arrangements for marking the record carrier in digital fashion otherwise than by punching
- G06K1/126—Methods or arrangements for marking the record carrier in digital fashion otherwise than by punching by photographic or thermographic registration
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
- B23K26/0624—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses using ultrashort pulses, i.e. pulses of 1 ns or less
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/067—Dividing the beam into multiple beams, e.g. multi-focusing
- B23K26/0676—Dividing the beam into multiple beams, e.g. multi-focusing into dependently operating sub-beams, e.g. an array of spots with fixed spatial relationship or for performing simultaneously identical operations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/355—Texturing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
- B41M5/24—Ablative recording, e.g. by burning marks; Spark recording
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W46/00—Marks applied to devices, e.g. for alignment or identification
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/50—Inorganic materials other than metals or composite materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y80/00—Products made by additive manufacturing
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0266—Marks, test patterns or identification means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W46/00—Marks applied to devices, e.g. for alignment or identification
- H10W46/101—Marks applied to devices, e.g. for alignment or identification characterised by the type of information, e.g. logos or symbols
- H10W46/103—Marks applied to devices, e.g. for alignment or identification characterised by the type of information, e.g. logos or symbols alphanumeric information, e.g. words, letters or serial numbers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W46/00—Marks applied to devices, e.g. for alignment or identification
- H10W46/101—Marks applied to devices, e.g. for alignment or identification characterised by the type of information, e.g. logos or symbols
- H10W46/106—Marks applied to devices, e.g. for alignment or identification characterised by the type of information, e.g. logos or symbols digital information, e.g. bar codes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W46/00—Marks applied to devices, e.g. for alignment or identification
- H10W46/301—Marks applied to devices, e.g. for alignment or identification for alignment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W46/00—Marks applied to devices, e.g. for alignment or identification
- H10W46/401—Marks applied to devices, e.g. for alignment or identification for identification or tracking
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W46/00—Marks applied to devices, e.g. for alignment or identification
- H10W46/501—Marks applied to devices, e.g. for alignment or identification for use before dicing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Theoretical Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58426804P | 2004-06-30 | 2004-06-30 | |
| US11/152,509 US20060000814A1 (en) | 2004-06-30 | 2005-06-14 | Laser-based method and system for processing targeted surface material and article produced thereby |
| PCT/US2005/021955 WO2006012124A2 (en) | 2004-06-30 | 2005-06-21 | Laser-based method and system for processing targeted surface material and article produced thereby |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE550132T1 true ATE550132T1 (de) | 2012-04-15 |
Family
ID=35512828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT05773635T ATE550132T1 (de) | 2004-06-30 | 2005-06-21 | Laserbasiertes verfahren und system zur verarbeitung von gezielt ausgerichtetem oberflächenmaterial und daraus hergestellter artikel |
Country Status (6)
| Country | Link |
|---|---|
| US (3) | US20060000814A1 (de) |
| EP (1) | EP1779286B1 (de) |
| JP (1) | JP2008504964A (de) |
| KR (1) | KR101278433B1 (de) |
| AT (1) | ATE550132T1 (de) |
| WO (1) | WO2006012124A2 (de) |
Families Citing this family (131)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7838794B2 (en) | 1999-12-28 | 2010-11-23 | Gsi Group Corporation | Laser-based method and system for removing one or more target link structures |
| US6951995B2 (en) | 2002-03-27 | 2005-10-04 | Gsi Lumonics Corp. | Method and system for high-speed, precise micromachining an array of devices |
| US7563695B2 (en) * | 2002-03-27 | 2009-07-21 | Gsi Group Corporation | Method and system for high-speed precise laser trimming and scan lens for use therein |
| US7119351B2 (en) * | 2002-05-17 | 2006-10-10 | Gsi Group Corporation | Method and system for machine vision-based feature detection and mark verification in a workpiece or wafer marking system |
| US8653409B1 (en) * | 2004-06-23 | 2014-02-18 | Board Of Governors For Higher Education, State Of Rhode Island And Providence Plantations | Selective surface smoothing using lasers |
| US20060000814A1 (en) | 2004-06-30 | 2006-01-05 | Bo Gu | Laser-based method and system for processing targeted surface material and article produced thereby |
| US7705268B2 (en) | 2004-11-11 | 2010-04-27 | Gsi Group Corporation | Method and system for laser soft marking |
| US7466466B2 (en) * | 2005-05-11 | 2008-12-16 | Gsi Group Corporation | Optical scanning method and system and method for correcting optical aberrations introduced into the system by a beam deflector |
| GB0509727D0 (en) * | 2005-05-13 | 2005-06-22 | Renishaw Plc | Method and apparatus for scale manufacture |
| US7655003B2 (en) | 2005-06-22 | 2010-02-02 | Smith & Nephew, Inc. | Electrosurgical power control |
| FI20060358A7 (fi) * | 2006-04-12 | 2007-10-13 | Picodeon Ltd Oy | Menetelmä ablaatiokynnyksen säätämiseksi |
| CN101287983A (zh) * | 2005-08-16 | 2008-10-15 | 埃美格科学仪器公司 | 原子探针、原子探针样本和相关方法 |
| US9138913B2 (en) * | 2005-09-08 | 2015-09-22 | Imra America, Inc. | Transparent material processing with an ultrashort pulse laser |
| US7626138B2 (en) | 2005-09-08 | 2009-12-01 | Imra America, Inc. | Transparent material processing with an ultrashort pulse laser |
| CN1958209A (zh) * | 2005-11-03 | 2007-05-09 | 鸿富锦精密工业(深圳)有限公司 | 一种激光成形加工装置 |
| US20070117227A1 (en) * | 2005-11-23 | 2007-05-24 | Gsi Group Corporation | Method And System for Iteratively, Selectively Tuning A Parameter Of A Doped Workpiece Using A Pulsed Laser |
| US20070125863A1 (en) * | 2005-12-05 | 2007-06-07 | Jakoboski Timothy A | System and method for employing infrared illumination for machine vision |
| US8846551B2 (en) | 2005-12-21 | 2014-09-30 | University Of Virginia Patent Foundation | Systems and methods of laser texturing of material surfaces and their applications |
| WO2008091242A2 (en) * | 2005-12-21 | 2008-07-31 | Uva Patent Foundation | Systems and methods of laser texturing and crystallization of material surfaces |
| TWI504963B (zh) * | 2006-01-30 | 2015-10-21 | Electro Scient Ind Inc | 消色差掃描透鏡 |
| DE102006019118B4 (de) * | 2006-04-25 | 2011-08-18 | Epcos Ag, 81669 | Bauelement mit optischer Markierung und Verfahren zur Herstellung |
| US8198566B2 (en) * | 2006-05-24 | 2012-06-12 | Electro Scientific Industries, Inc. | Laser processing of workpieces containing low-k dielectric material |
| US20070106416A1 (en) | 2006-06-05 | 2007-05-10 | Griffiths Joseph J | Method and system for adaptively controlling a laser-based material processing process and method and system for qualifying same |
| US7951412B2 (en) * | 2006-06-07 | 2011-05-31 | Medicinelodge Inc. | Laser based metal deposition (LBMD) of antimicrobials to implant surfaces |
| US20080000887A1 (en) * | 2006-06-28 | 2008-01-03 | Seagate Technology Llc | Method of laser honing |
| WO2008091380A2 (en) * | 2006-08-22 | 2008-07-31 | Gsi Group Corporation | System and method for employing a resonant scanner in an x-y high speed drilling system |
| US7732731B2 (en) * | 2006-09-15 | 2010-06-08 | Gsi Group Corporation | Method and system for laser processing targets of different types on a workpiece |
| US10876193B2 (en) | 2006-09-29 | 2020-12-29 | University Of Rochester | Nanostructured materials, methods, and applications |
| US20080216926A1 (en) * | 2006-09-29 | 2008-09-11 | Chunlei Guo | Ultra-short duration laser methods for the nanostructuring of materials |
| US20080299408A1 (en) * | 2006-09-29 | 2008-12-04 | University Of Rochester | Femtosecond Laser Pulse Surface Structuring Methods and Materials Resulting Therefrom |
| FR2906646B1 (fr) * | 2006-10-03 | 2009-01-30 | Microcomposants De Haute Secur | Procede de marquage individuel de circuits integres et circuit integre marque selon ce procede. |
| US8420978B2 (en) * | 2007-01-18 | 2013-04-16 | The Board Of Trustees Of The University Of Illinois | High throughput, low cost dual-mode patterning method for large area substrates |
| WO2008091898A1 (en) * | 2007-01-23 | 2008-07-31 | Imra America, Inc. | Ultrashort laser micro-texture printing |
| JP5009639B2 (ja) * | 2007-02-09 | 2012-08-22 | 株式会社リコー | レーザ書換システム |
| US7893385B2 (en) * | 2007-03-01 | 2011-02-22 | James Neil Rodgers | Method for enhancing gain and range of an RFID antenna |
| US20100143744A1 (en) * | 2007-03-09 | 2010-06-10 | University Of Virginia Patent Foundation | Systems and Methods of Laser Texturing of Material Surfaces and their Applications |
| KR20110082542A (ko) * | 2008-10-03 | 2011-07-19 | 어플라이드 머티어리얼스, 인코포레이티드 | 래버코트 예비 세정 및 예열 |
| US20100119808A1 (en) * | 2008-11-10 | 2010-05-13 | Xinghua Li | Method of making subsurface marks in glass |
| US8552336B2 (en) * | 2008-12-23 | 2013-10-08 | Triune Ip Llc | Micro matrix data marking |
| US8187983B2 (en) | 2009-04-16 | 2012-05-29 | Micron Technology, Inc. | Methods for fabricating semiconductor components using thinning and back side laser processing |
| JP2010274328A (ja) * | 2009-04-30 | 2010-12-09 | Mitsuboshi Diamond Industrial Co Ltd | レーザ加工方法及びレーザ加工装置 |
| TWI594828B (zh) | 2009-05-28 | 2017-08-11 | 伊雷克托科學工業股份有限公司 | 應用於雷射處理工件中的特徵的聲光偏轉器及相關雷射處理方法 |
| DE102009039417B4 (de) * | 2009-08-31 | 2015-09-24 | GLOBALFOUNDRIES Dresden Module One Ltd. Liability Company & Co. KG | UV-Strahlungsüberwachung in der Halbleiterverarbeitung unter Anwendung eines temperaturabhänigen Signals |
| WO2011066548A1 (en) * | 2009-11-30 | 2011-06-03 | Uvt Tech Systems, Inc. | Laser doping |
| WO2011076230A1 (en) * | 2009-12-22 | 2011-06-30 | Aktiebolaget Skf | Method of laser marking a bearing component with visually undetectable mark; bearing component with such marking; method of authentification such marking |
| JP5424863B2 (ja) * | 2009-12-26 | 2014-02-26 | 京セラ株式会社 | ドリルの識別記号付与方法 |
| US8451873B2 (en) | 2010-02-11 | 2013-05-28 | Electro Scientific Industries, Inc. | Method and apparatus for reliably laser marking articles |
| CN101862900B (zh) * | 2010-05-28 | 2012-10-10 | 北京数码大方科技有限公司 | 焊接方法及焊接设备 |
| US8389895B2 (en) | 2010-06-25 | 2013-03-05 | Electro Scientifix Industries, Inc. | Method and apparatus for reliably laser marking articles |
| US8263899B2 (en) * | 2010-07-01 | 2012-09-11 | Sunpower Corporation | High throughput solar cell ablation system |
| US8604380B2 (en) * | 2010-08-19 | 2013-12-10 | Electro Scientific Industries, Inc. | Method and apparatus for optimally laser marking articles |
| US9023461B2 (en) * | 2010-10-21 | 2015-05-05 | Electro Scientific Industries, Inc. | Apparatus for optically laser marking articles |
| CN110039173B (zh) * | 2010-10-22 | 2021-03-23 | 伊雷克托科学工业股份有限公司 | 用于光束抖动和刮削的镭射加工系统和方法 |
| CN102545017B (zh) * | 2010-12-14 | 2015-07-15 | 澳门科技大学 | 一种用于芘荧光光谱检测的拉曼激光源的实现方法和装置 |
| US8942071B2 (en) | 2011-02-04 | 2015-01-27 | Lucinda Price | Color storage and transmission systems and methods |
| EP2683520A4 (de) * | 2011-03-10 | 2016-05-11 | Electro Scient Ind Inc | Verfahren und vorrichtung zur zuverlässigen lasermarkierung von artikeln |
| EP2683518A1 (de) * | 2011-03-10 | 2014-01-15 | Electro Scientific Industries, Inc. | Verfahren und vorrichtung zur zuverlässigen lasermarkierung von artikeln |
| TWI583478B (zh) * | 2011-03-21 | 2017-05-21 | 伊雷克托科學工業股份有限公司 | 經過陽極氧化之鋁質物品 |
| TWI640384B (zh) * | 2011-03-21 | 2018-11-11 | 美商伊雷克托科學工業股份有限公司 | 在物品上建立標記的方法、雷射標記裝置、具有標記的物品、具有標記的經陽極氧化的物品及經陽極氧化的物品 |
| FR2974746B1 (fr) * | 2011-05-02 | 2014-07-18 | Snecma | Procede de nettoyage et de decapage d'une aube de turbomoteur au moyen d'un laser impulsionnel |
| US10131086B2 (en) | 2011-06-30 | 2018-11-20 | University Of Virginia Patent Foundation | Micro-structure and nano-structure replication methods and article of manufacture |
| JP5879806B2 (ja) * | 2011-08-09 | 2016-03-08 | 富士電機株式会社 | Ntd半導体基板へのレーザー印字方法 |
| KR20130039955A (ko) | 2011-10-13 | 2013-04-23 | 현대자동차주식회사 | 용접용 레이저 장치 |
| KR20210062724A (ko) | 2011-10-21 | 2021-05-31 | 아메리칸 레이저 엔터프라이지즈, 엘엘씨 | 구성요소에서 코팅을 제거하는 방법 및 시스템 |
| KR101327889B1 (ko) * | 2011-12-01 | 2013-11-11 | 서울대학교산학협력단 | 금속성 미세구조물 및 그의 가공 방법 |
| DE102012211986B3 (de) * | 2012-07-10 | 2013-08-29 | Rofin-Baasel Lasertech Gmbh & Co. Kg | Verfahren zum Markieren von Bauteilen eines Triebwerkes für ein Flugzeug |
| KR20150073973A (ko) * | 2012-10-22 | 2015-07-01 | 일렉트로 싸이언티픽 인더스트리이즈 인코포레이티드 | 물품을 마킹하기 위한 방법 및 장치 |
| FR2998505B1 (fr) * | 2012-11-26 | 2015-02-06 | Akeo Plus | Procede et systeme de marquage d’une surface par traitement laser |
| JP5715113B2 (ja) * | 2012-12-14 | 2015-05-07 | 株式会社片岡製作所 | レーザ加工機 |
| CN104884205A (zh) * | 2012-12-20 | 2015-09-02 | 伊雷克托科学工业股份有限公司 | 经由激光微加工形成影像的方法 |
| JP6453303B2 (ja) * | 2013-03-15 | 2019-01-16 | エレクトロ サイエンティフィック インダストリーズ インコーポレーテッド | レーザビーム位置決めシステムのためのフェーズドアレイステアリング |
| IL227458A0 (en) * | 2013-07-11 | 2013-12-31 | Technion Res & Dev Foundation | A method and cave for transmitting light |
| FR3010924B1 (fr) * | 2013-09-20 | 2015-11-06 | Essilor Int | Dispositif et procede de marquage laser d'une lentille ophtalmique |
| DE102014200742B4 (de) | 2014-01-16 | 2021-09-30 | Friedrich-Schiller-Universität Jena | Verfahren zum Entspiegeln eines optischen Elements, optisches Element und Terahertz-System |
| US9424503B2 (en) * | 2014-08-11 | 2016-08-23 | Brian Kieser | Structurally encoded component and method of manufacturing structurally encoded component |
| CN106471140B (zh) | 2014-07-03 | 2019-02-05 | 新日铁住金株式会社 | 激光加工装置 |
| WO2016094827A1 (en) * | 2014-12-12 | 2016-06-16 | Velo3D, Inc. | Feedback control systems for three-dimensional printing |
| CN205764438U (zh) * | 2015-02-09 | 2016-12-07 | 司浦爱激光技术英国有限公司 | 激光焊缝和包括激光焊缝的物品 |
| JP2016172285A (ja) * | 2015-03-16 | 2016-09-29 | 株式会社リコー | 保護囲い、レーザ照射システム |
| JP6878306B2 (ja) * | 2015-05-20 | 2021-05-26 | クアンタム−エスアイ インコーポレイテッドQuantum−Si Incorporated | パルスレーザ及び生物分析システム |
| US11466316B2 (en) * | 2015-05-20 | 2022-10-11 | Quantum-Si Incorporated | Pulsed laser and bioanalytic system |
| US10605730B2 (en) | 2015-05-20 | 2020-03-31 | Quantum-Si Incorporated | Optical sources for fluorescent lifetime analysis |
| DE102016000184A1 (de) * | 2016-01-11 | 2017-07-27 | Zwiesel Kristallglas Ag | Laserfilamentieren |
| DE102016201088A1 (de) * | 2016-01-26 | 2017-07-27 | Dr. Johannes Heidenhain Gmbh | Verfahren zum Bearbeiten einer Maßverkörperung |
| CN105904095B (zh) * | 2016-06-23 | 2018-01-30 | 济南邦德激光股份有限公司 | 一种打标机 |
| US11691343B2 (en) | 2016-06-29 | 2023-07-04 | Velo3D, Inc. | Three-dimensional printing and three-dimensional printers |
| CN109862991A (zh) * | 2016-07-28 | 2019-06-07 | 伊雷克托科学工业股份有限公司 | 镭射处理设备和镭射处理工件的方法 |
| WO2018064349A1 (en) | 2016-09-30 | 2018-04-05 | Velo3D, Inc. | Three-dimensional objects and their formation |
| CN116466494A (zh) | 2016-12-16 | 2023-07-21 | 宽腾矽公司 | 紧密的光束整形及操纵总成 |
| CA3047133A1 (en) | 2016-12-16 | 2018-06-21 | Quantum-Si Incorporated | Compact mode-locked laser module |
| US20180250744A1 (en) | 2017-03-02 | 2018-09-06 | Velo3D, Inc. | Three-dimensional printing of three-dimensional objects |
| JP6802094B2 (ja) * | 2017-03-13 | 2020-12-16 | 株式会社ディスコ | レーザー加工装置 |
| JP6781649B2 (ja) * | 2017-03-13 | 2020-11-04 | 株式会社ディスコ | レーザー加工装置 |
| JP6781650B2 (ja) * | 2017-03-13 | 2020-11-04 | 株式会社ディスコ | レーザー加工装置 |
| JP6802093B2 (ja) * | 2017-03-13 | 2020-12-16 | 株式会社ディスコ | レーザー加工方法およびレーザー加工装置 |
| US10610963B2 (en) * | 2017-05-17 | 2020-04-07 | General Electric Company | Surface treatment of turbomachinery |
| EP3416210B1 (de) | 2017-06-12 | 2020-12-02 | Robert Bosch GmbH | Verfahren zum schneiden einer separatorfolie und batteriezelle |
| US11220450B2 (en) | 2018-02-06 | 2022-01-11 | Tesla, Inc. | Process to make textured glass |
| CA3100987A1 (en) | 2018-06-15 | 2019-12-19 | Quantum-Si Incorporated | Data acquisition control for advanced analytic instruments having pulsed optical sources |
| US11342256B2 (en) | 2019-01-24 | 2022-05-24 | Applied Materials, Inc. | Method of fine redistribution interconnect formation for advanced packaging applications |
| IT201900006736A1 (it) | 2019-05-10 | 2020-11-10 | Applied Materials Inc | Procedimenti di fabbricazione di package |
| IT201900006740A1 (it) | 2019-05-10 | 2020-11-10 | Applied Materials Inc | Procedimenti di strutturazione di substrati |
| EP4411347A3 (de) | 2019-06-14 | 2024-10-30 | Quantum-Si Incorporated | Scheibengitterkoppler mit erhöhter strahlausrichtungsempfindlichkeit |
| US11931855B2 (en) | 2019-06-17 | 2024-03-19 | Applied Materials, Inc. | Planarization methods for packaging substrates |
| JP7250637B2 (ja) * | 2019-07-01 | 2023-04-03 | 株式会社ディスコ | 加工装置及びチャックテーブル |
| KR20230047214A (ko) | 2019-07-26 | 2023-04-06 | 벨로3디, 인크. | 3차원 물체 형상화에 대한 품질 보증 |
| US20210035767A1 (en) * | 2019-07-29 | 2021-02-04 | Applied Materials, Inc. | Methods for repairing a recess of a chamber component |
| JP7205413B2 (ja) * | 2019-08-07 | 2023-01-17 | 株式会社Sumco | レーザマーク付きシリコンウェーハの製造方法 |
| US11862546B2 (en) | 2019-11-27 | 2024-01-02 | Applied Materials, Inc. | Package core assembly and fabrication methods |
| CN115210969A (zh) | 2020-01-14 | 2022-10-18 | 宽腾矽公司 | 调幅激光器 |
| US20210285084A1 (en) * | 2020-03-10 | 2021-09-16 | Jvis-Usa, Llc | Laser-Based Method and System for Marking a Workpiece |
| US11257790B2 (en) | 2020-03-10 | 2022-02-22 | Applied Materials, Inc. | High connectivity device stacking |
| KR102461737B1 (ko) | 2020-03-18 | 2022-11-02 | 서울대학교 산학협력단 | 하이브리드 레이저-연마 가공기 및 이를 이용한 레이저-연마 가공 방법 |
| US11454884B2 (en) | 2020-04-15 | 2022-09-27 | Applied Materials, Inc. | Fluoropolymer stamp fabrication method |
| US11400545B2 (en) | 2020-05-11 | 2022-08-02 | Applied Materials, Inc. | Laser ablation for package fabrication |
| US11232951B1 (en) | 2020-07-14 | 2022-01-25 | Applied Materials, Inc. | Method and apparatus for laser drilling blind vias |
| US11676832B2 (en) * | 2020-07-24 | 2023-06-13 | Applied Materials, Inc. | Laser ablation system for package fabrication |
| US11521937B2 (en) | 2020-11-16 | 2022-12-06 | Applied Materials, Inc. | Package structures with built-in EMI shielding |
| US11404318B2 (en) | 2020-11-20 | 2022-08-02 | Applied Materials, Inc. | Methods of forming through-silicon vias in substrates for advanced packaging |
| EP4262635A4 (de) | 2020-12-18 | 2024-04-24 | Spine Wave, Inc. | Expandierbare tlif-vorrichtung und zugehörige einsetz- und pfropfungsinstrumente |
| AT524312B1 (de) * | 2020-12-22 | 2022-05-15 | Hofall Holding 1 Gmbh | Verfahren zur Herstellung eines oberflächenmodifizierten Metallimplantats |
| FR3121060B1 (fr) * | 2021-03-29 | 2024-08-23 | Qiova | Procédé et dispositif pour former une figure sur ou dans une pièce |
| US11705365B2 (en) | 2021-05-18 | 2023-07-18 | Applied Materials, Inc. | Methods of micro-via formation for advanced packaging |
| CN113263027B (zh) * | 2021-05-26 | 2022-05-24 | 金顿激光科技(佛山)有限公司 | 一种基于激光清洗参数优化的激光控制方法及系统 |
| EP4116030A1 (de) * | 2021-07-09 | 2023-01-11 | Aix-Marseille Université | Verfahren zum optischen schreiben in einem halbleitermaterial, entsprechendes computerprogrammprodukt, speichermedium und schreibvorrichtung |
| DE102021208384A1 (de) * | 2021-08-03 | 2023-02-09 | Siemens Energy Global GmbH & Co. KG | Additives Herstellungsverfahren mit gepulster Bestrahlung für Bauteil mit definierter Oberflächentextur |
| KR102447555B1 (ko) * | 2021-08-19 | 2022-09-23 | 단국대학교 산학협력단 | 수조의 둘레를 따른 광원의 선회 및 틸팅을 이용하는 3d 프린터 |
| US12183684B2 (en) | 2021-10-26 | 2024-12-31 | Applied Materials, Inc. | Semiconductor device packaging methods |
| WO2024006968A2 (en) * | 2022-06-30 | 2024-01-04 | University Of Virginia Patent Foundation | Microtexturized substrates and methods for producing the same |
| US12029653B1 (en) | 2023-06-14 | 2024-07-09 | Spine Wave, Inc. | Medical implant having a textured tissue contact surface |
| KR102833196B1 (ko) | 2023-11-21 | 2025-07-10 | 경상국립대학교산학협력단 | 베셀 빔을 이용한 레이저 가공을 위한 광 스캐닝 시스템 |
Family Cites Families (206)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3763454A (en) | 1972-02-22 | 1973-10-02 | Tektronix Inc | Thermal switch |
| US6603988B2 (en) * | 2001-04-13 | 2003-08-05 | Kelsey, Inc. | Apparatus and method for delivering ablative laser energy and determining the volume of tumor mass destroyed |
| DE2918100A1 (de) | 1979-05-04 | 1980-11-13 | Siemens Ag | Automatisiertes justieren in der feinwerktechnik |
| CH643941A5 (en) | 1979-11-16 | 1984-06-29 | Elesta Ag Elektronik Bad Ragaz | Method and device for producing optical scales, and scale produced according to the method |
| DE3036005A1 (de) * | 1980-09-24 | 1982-05-06 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zur herstellung einer codescheibe fuer optische winkelschrittgeber bzw. winkelcodierer |
| US4399345A (en) * | 1981-06-09 | 1983-08-16 | Analog Devices, Inc. | Laser trimming of circuit elements on semiconductive substrates |
| US4483005A (en) | 1981-09-24 | 1984-11-13 | Teradyne, Inc. | Affecting laser beam pulse width |
| DE3226543A1 (de) | 1982-07-15 | 1984-01-19 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum justieren von feinwerktechnischen teilen |
| US4423401A (en) | 1982-07-21 | 1983-12-27 | Tektronix, Inc. | Thin-film electrothermal device |
| DE3324551A1 (de) * | 1983-07-07 | 1985-01-17 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH, 8263 Burghausen | Verfahren zur kennzeichnung von halbleiteroberflaechen durch laserstrahlung |
| US4532402A (en) * | 1983-09-02 | 1985-07-30 | Xrl, Inc. | Method and apparatus for positioning a focused beam on an integrated circuit |
| JPS60250211A (ja) | 1984-05-28 | 1985-12-10 | Inoue Japax Res Inc | 磁気スケ−ルの製造方法 |
| AT392536B (de) | 1984-07-06 | 1991-04-25 | R S F Elektronik Ohg Rechtsfor | Lineares, inkrementales messsystem |
| AT396631B (de) | 1984-07-06 | 1993-10-25 | Rsf Elektronik Gmbh | Inkrementales messsystem |
| ATE53117T1 (de) * | 1984-07-18 | 1990-06-15 | Rsf Elektronik Gmbh | Lineares messsystem. |
| US4594263A (en) * | 1984-12-17 | 1986-06-10 | Motorola, Inc. | Laser marking method and ablative coating for use therein |
| AT397308B (de) * | 1985-07-10 | 1994-03-25 | Rsf Elektronik Gmbh | Messsystem für die messung von längen und winkeln |
| GB8616240D0 (en) * | 1986-07-03 | 1986-08-13 | Renishaw Plc | Opto-electronic scale reading apparatus |
| US4935801A (en) * | 1987-01-27 | 1990-06-19 | Inmos Corporation | Metallic fuse with optically absorptive layer |
| US4826785A (en) * | 1987-01-27 | 1989-05-02 | Inmos Corporation | Metallic fuse with optically absorptive layer |
| WO1988006713A1 (en) * | 1987-03-06 | 1988-09-07 | Renishaw Plc | Position determination apparatus |
| PL155358B1 (en) | 1987-11-26 | 1991-11-29 | Polska Akademia Nauk Instytut Podstawowych Problemow Techniki | Method of bending metal workpieces |
| US5064290A (en) | 1987-12-12 | 1991-11-12 | Renishaw Plc | Opto-electronic scale-reading apparatus wherein phase-separated secondary orders of diffraction are generated |
| GB8821837D0 (en) * | 1988-09-16 | 1988-10-19 | Renishaw Plc | Scale for use with opto-electronic scale reading apparatus |
| US5059764A (en) * | 1988-10-31 | 1991-10-22 | Spectra-Physics, Inc. | Diode-pumped, solid state laser-based workstation for precision materials processing and machining |
| YU208988A (en) | 1988-11-10 | 1990-12-31 | Inst Jozef Stefan | Device for rasters making |
| JP3150322B2 (ja) * | 1990-05-18 | 2001-03-26 | 株式会社日立製作所 | レーザによる配線切断加工方法及びレーザ加工装置 |
| JPH04263455A (ja) * | 1991-02-18 | 1992-09-18 | Sharp Corp | 半導体パッケージのレーザマーク消去方法及びその装置 |
| US5537276A (en) * | 1991-04-09 | 1996-07-16 | Matsushita Electric Industrial Co., Ltd. | Magnetic head installed on a rotary drum and method for adjusting the head height |
| US5058856A (en) | 1991-05-08 | 1991-10-22 | Hewlett-Packard Company | Thermally-actuated microminiature valve |
| US5300756A (en) * | 1991-10-22 | 1994-04-05 | General Scanning, Inc. | Method for severing integrated-circuit connection paths by a phase-plate-adjusted laser beam |
| JPH05169286A (ja) | 1991-12-25 | 1993-07-09 | Fuji Electric Co Ltd | レーザ目盛付け装置 |
| US5460034A (en) * | 1992-07-21 | 1995-10-24 | The United States Of America As Represented By The Secretary Of The Air Force | Method for measuring and analyzing surface roughness on semiconductor laser etched facets |
| US5265114C1 (en) | 1992-09-10 | 2001-08-21 | Electro Scient Ind Inc | System and method for selectively laser processing a target structure of one or more materials of a multimaterial multilayer device |
| FI92112C (fi) * | 1992-11-09 | 1994-09-26 | Partek Cargotec Oy | Menetelmä taustastaan tummempina erottuvien alueiden muodostamiseksi kirkkaaseen metallipintaan ja tällä tavoin värjättyjä alueita käsittävä metallipinta |
| US5703341A (en) | 1993-11-23 | 1997-12-30 | Lockheed Martin Energy Systems, Inc. | Method for adhesion of metal films to ceramics |
| KR100363410B1 (ko) * | 1994-03-10 | 2003-02-11 | 메사추세츠 인스티튜트 오브 테크놀로지 | 상호접속용도전링크제조방법 |
| US5400350A (en) * | 1994-03-31 | 1995-03-21 | Imra America, Inc. | Method and apparatus for generating high energy ultrashort pulses |
| US5656186A (en) * | 1994-04-08 | 1997-08-12 | The Regents Of The University Of Michigan | Method for controlling configuration of laser induced breakdown and ablation |
| WO1996010833A1 (en) | 1994-10-04 | 1996-04-11 | Philips Electronics N.V. | Method of adjusting the switch-gap in a reed switch |
| DE4436897A1 (de) * | 1994-10-15 | 1996-04-18 | Elastogran Gmbh | Verfahren zur Beschriftung von Formkörpern |
| DE19608937C2 (de) | 1995-03-10 | 1998-01-15 | Heidenhain Gmbh Dr Johannes | Verfahren zum Herstellen eines Markierungsträgers |
| US5696782A (en) | 1995-05-19 | 1997-12-09 | Imra America, Inc. | High power fiber chirped pulse amplification systems based on cladding pumped rare-earth doped fibers |
| US5722989A (en) * | 1995-05-22 | 1998-03-03 | The Regents Of The University Of California | Microminiaturized minimally invasive intravascular micro-mechanical systems powered and controlled via fiber-optic cable |
| US5701319A (en) | 1995-10-20 | 1997-12-23 | Imra America, Inc. | Method and apparatus for generating ultrashort pulses with adjustable repetition rates from passively modelocked fiber lasers |
| US5932119A (en) * | 1996-01-05 | 1999-08-03 | Lazare Kaplan International, Inc. | Laser marking system |
| US5867305A (en) * | 1996-01-19 | 1999-02-02 | Sdl, Inc. | Optical amplifier with high energy levels systems providing high peak powers |
| DE19611983C1 (de) | 1996-03-26 | 1997-07-31 | Zeiss Carl Jena Gmbh | Bandförmiges, elastisch biegbares Maßband für Längen- oder Winkelmeßeinrichtungen |
| US5808268A (en) * | 1996-07-23 | 1998-09-15 | International Business Machines Corporation | Method for marking substrates |
| US6114118A (en) | 1996-09-20 | 2000-09-05 | Texas A&M University System | Method of identification of animals resistant or susceptible to disease such as ruminant brucellosis, tuberculosis, paratuberculosis and salmonellosis |
| EP0930611A4 (de) | 1996-09-26 | 2003-02-12 | Sanyo Electric Co | Aufzeichnungsträger und wiedergabegerät dafür |
| US6168744B1 (en) | 1996-10-08 | 2001-01-02 | Board Of Trustees University Of Arkansas | Process for sequential multi beam laser processing of materials |
| US6212310B1 (en) * | 1996-10-22 | 2001-04-03 | Sdl, Inc. | High power fiber gain media system achieved through power scaling via multiplexing |
| US5998759A (en) | 1996-12-24 | 1999-12-07 | General Scanning, Inc. | Laser processing |
| US6025256A (en) * | 1997-01-06 | 2000-02-15 | Electro Scientific Industries, Inc. | Laser based method and system for integrated circuit repair or reconfiguration |
| JP3076258B2 (ja) * | 1997-01-30 | 2000-08-14 | 日本電気アイシーマイコンシステム株式会社 | 入力初段回路 |
| US6151338A (en) | 1997-02-19 | 2000-11-21 | Sdl, Inc. | High power laser optical amplifier system |
| US5812569A (en) | 1997-03-21 | 1998-09-22 | Lumonics, Inc. | Stabilization of the output energy of a pulsed solid state laser |
| US6208458B1 (en) * | 1997-03-21 | 2001-03-27 | Imra America, Inc. | Quasi-phase-matched parametric chirped pulse amplification systems |
| US6709720B2 (en) * | 1997-03-21 | 2004-03-23 | Kabushiki Kaisha Yaskawa Denki | Marking method and marking material |
| US6181463B1 (en) * | 1997-03-21 | 2001-01-30 | Imra America, Inc. | Quasi-phase-matched parametric chirped pulse amplification systems |
| JPH10289461A (ja) * | 1997-04-15 | 1998-10-27 | Hitachi Ltd | 情報記録再生装置及び情報記録方法 |
| US6198568B1 (en) * | 1997-04-25 | 2001-03-06 | Imra America, Inc. | Use of Chirped Quasi-phase-matched materials in chirped pulse amplification systems |
| JP4500374B2 (ja) | 1997-05-27 | 2010-07-14 | ジェイディーエス ユニフエイズ コーポレーション | レーザーマーキングシステムおよびエネルギー制御方法 |
| US6012510A (en) | 1997-05-28 | 2000-01-11 | Aavid Engineering, Inc. | Torsion bar clamp apparatus and method for improving thermal and mechanical contact between stacked electronic components |
| US6670222B1 (en) | 1997-06-14 | 2003-12-30 | Jds Uniphase Corporation | Texturing of a die pad surface for enhancing bonding strength in the surface attachment |
| US5818630A (en) | 1997-06-25 | 1998-10-06 | Imra America, Inc. | Single-mode amplifiers and compressors based on multi-mode fibers |
| US6646967B1 (en) | 1997-08-12 | 2003-11-11 | Denon Digital Llc | Method for making copy protected optical discs |
| DE19736110C2 (de) * | 1997-08-21 | 2001-03-01 | Hannover Laser Zentrum | Verfahren und Vorrichtung zur grat- und schmelzfreien Mikrobearbeitung von Werkstücken |
| CN1214549A (zh) | 1997-09-12 | 1999-04-21 | 西门子公司 | 改进的激光熔丝连接及其制造方法 |
| US6316807B1 (en) | 1997-12-05 | 2001-11-13 | Naoto Fujishima | Low on-resistance trench lateral MISFET with better switching characteristics and method for manufacturing same |
| CN101094565A (zh) * | 1997-12-11 | 2007-12-26 | 伊比登株式会社 | 多层印刷电路板的制造方法 |
| JP3528612B2 (ja) * | 1998-02-02 | 2004-05-17 | 株式会社日立製作所 | 光ディスク装置 |
| JP3874528B2 (ja) * | 1998-03-11 | 2007-01-31 | 株式会社小松製作所 | 半導体ウエハのレーザマーキング方法 |
| JP3052928B2 (ja) * | 1998-04-01 | 2000-06-19 | 日本電気株式会社 | レーザ加工装置 |
| JPH11296911A (ja) | 1998-04-07 | 1999-10-29 | Sony Corp | 光ディスク、トラッキング制御装置、トラッキング制御方法、フォーカス制御装置及びフォーカス制御方法 |
| JP3931288B2 (ja) * | 1998-04-17 | 2007-06-13 | 株式会社安川電機 | レーザマーキング装置およびマーキング方法 |
| US6275250B1 (en) * | 1998-05-26 | 2001-08-14 | Sdl, Inc. | Fiber gain medium marking system pumped or seeded by a modulated laser diode source and method of energy control |
| JPH11345880A (ja) | 1998-06-01 | 1999-12-14 | Fujitsu Ltd | 半導体装置及びその製造方法 |
| US6057180A (en) * | 1998-06-05 | 2000-05-02 | Electro Scientific Industries, Inc. | Method of severing electrically conductive links with ultraviolet laser output |
| US6339604B1 (en) * | 1998-06-12 | 2002-01-15 | General Scanning, Inc. | Pulse control in laser systems |
| US6181728B1 (en) * | 1998-07-02 | 2001-01-30 | General Scanning, Inc. | Controlling laser polarization |
| US6144118A (en) | 1998-09-18 | 2000-11-07 | General Scanning, Inc. | High-speed precision positioning apparatus |
| US6636477B1 (en) | 1998-10-07 | 2003-10-21 | Hitachi, Ltd. | Information recording medium and information recording device |
| US6518140B2 (en) * | 1998-11-07 | 2003-02-11 | Samsung Electronics Co., Ltd. | Manufacturing methods for defect removable semiconductor devices |
| US6423613B1 (en) * | 1998-11-10 | 2002-07-23 | Micron Technology, Inc. | Low temperature silicon wafer bond process with bulk material bond strength |
| DE19854318A1 (de) * | 1998-11-25 | 2000-05-31 | Heidenhain Gmbh Dr Johannes | Längenmeßeinrichtung |
| IL127388A0 (en) | 1998-12-03 | 1999-10-28 | Universal Crystal Ltd | Material processing applications of lasers using optical breakdown |
| US6333485B1 (en) * | 1998-12-11 | 2001-12-25 | International Business Machines Corporation | Method for minimizing sample damage during the ablation of material using a focused ultrashort pulsed beam |
| US6300590B1 (en) | 1998-12-16 | 2001-10-09 | General Scanning, Inc. | Laser processing |
| US6172325B1 (en) * | 1999-02-10 | 2001-01-09 | Electro Scientific Industries, Inc. | Laser processing power output stabilization apparatus and method employing processing position feedback |
| US6710284B1 (en) * | 1999-02-26 | 2004-03-23 | Micron Technology, Inc. | Laser marking techniques for bare semiconductor die |
| DE19912310B4 (de) | 1999-03-19 | 2007-11-29 | Dr. Johannes Heidenhain Gmbh | Positionsmeßeinrichtung |
| US6341029B1 (en) * | 1999-04-27 | 2002-01-22 | Gsi Lumonics, Inc. | Method and apparatus for shaping a laser-beam intensity profile by dithering |
| US6285002B1 (en) | 1999-05-10 | 2001-09-04 | Bryan Kok Ann Ngoi | Three dimensional micro machining with a modulated ultra-short laser pulse |
| US6555781B2 (en) * | 1999-05-10 | 2003-04-29 | Nanyang Technological University | Ultrashort pulsed laser micromachining/submicromachining using an acoustooptic scanning device with dispersion compensation |
| US6734387B2 (en) * | 1999-05-27 | 2004-05-11 | Spectra Physics Lasers, Inc. | Method and apparatus for micro-machining of articles that include polymeric materials |
| DE60013300D1 (de) | 1999-06-03 | 2004-09-30 | Shelljet Pty Ltd | Kernorientierung |
| US6643082B1 (en) | 1999-06-08 | 2003-11-04 | Seagate Technology Llc | Servo sector format for a patterned media |
| KR100322601B1 (ko) | 1999-06-18 | 2002-03-18 | 윤종용 | 광디스크 기록 방법, 광디스크 기록 장치의 제어 방법 및 이에 적합한 광디스크 기록 장치 |
| JP3393469B2 (ja) | 1999-07-15 | 2003-04-07 | 日本電気株式会社 | 薄膜半導体素子の製造方法及び薄膜半導体形成装置 |
| US7014885B1 (en) * | 1999-07-19 | 2006-03-21 | The United States Of America As Represented By The Secretary Of The Navy | Direct-write laser transfer and processing |
| WO2001006498A1 (en) * | 1999-07-21 | 2001-01-25 | Hitachi Maxell, Ltd. | Read/write head and magnetic recording device |
| US6776340B2 (en) * | 1999-07-23 | 2004-08-17 | Tri Star Technologies, A General Partnership | Duplicate laser marking discrete consumable articles |
| US6472295B1 (en) | 1999-08-27 | 2002-10-29 | Jmar Research, Inc. | Method and apparatus for laser ablation of a target material |
| US20010027965A1 (en) | 1999-10-07 | 2001-10-11 | Mccay Mary Helen | Method for gas assisted energy beam engraving of a target object |
| DE19948705A1 (de) | 1999-10-09 | 2001-04-12 | Zeiss Carl Jena Gmbh | Absteckvorrichtung |
| US6603136B1 (en) * | 1999-10-15 | 2003-08-05 | Videojet Systems International | Laser marker focal length setting device |
| GB9924332D0 (en) * | 1999-10-15 | 1999-12-15 | Renishaw Plc | Producing a scale for use in opto-electronic scale reading apparatus |
| JP2001126328A (ja) | 1999-10-29 | 2001-05-11 | Sony Corp | 光磁気記録媒体 |
| JP4373547B2 (ja) * | 1999-10-29 | 2009-11-25 | 京セラ株式会社 | 多数個取り配線基板 |
| US6340806B1 (en) * | 1999-12-28 | 2002-01-22 | General Scanning Inc. | Energy-efficient method and system for processing target material using an amplified, wavelength-shifted pulse train |
| US7838794B2 (en) | 1999-12-28 | 2010-11-23 | Gsi Group Corporation | Laser-based method and system for removing one or more target link structures |
| US6281471B1 (en) | 1999-12-28 | 2001-08-28 | Gsi Lumonics, Inc. | Energy-efficient, laser-based method and system for processing target material |
| US20040134894A1 (en) * | 1999-12-28 | 2004-07-15 | Bo Gu | Laser-based system for memory link processing with picosecond lasers |
| US7723642B2 (en) | 1999-12-28 | 2010-05-25 | Gsi Group Corporation | Laser-based system for memory link processing with picosecond lasers |
| DE10000469C2 (de) | 2000-01-07 | 2003-07-03 | Schott Spezialglas Gmbh | Verfahren zum fortlaufenden Ablängen von Zuschnitten aus einem kontinuierlich bewegten Endlosmaterial und zugehörige Vorrichtung |
| WO2003052890A1 (en) | 2001-12-17 | 2003-06-26 | Electro Scientific Industries, Inc. | Processing a memory link with a set of at least two laser pulses |
| WO2001051243A2 (en) * | 2000-01-10 | 2001-07-19 | Electro Scientific Industries, Inc. | Laser system and method for processing a memory link with a burst of laser pulses having ultrashort pulsewidths |
| US6552301B2 (en) * | 2000-01-25 | 2003-04-22 | Peter R. Herman | Burst-ultrafast laser machining method |
| JP3982136B2 (ja) * | 2000-02-04 | 2007-09-26 | セイコーエプソン株式会社 | レーザ加工方法及びその装置 |
| US6423935B1 (en) * | 2000-02-18 | 2002-07-23 | The Regents Of The University Of California | Identification marking by means of laser peening |
| US6433303B1 (en) | 2000-03-31 | 2002-08-13 | Matsushita Electric Industrial Co., Ltd. | Method and apparatus using laser pulses to make an array of microcavity holes |
| US6604825B2 (en) * | 2000-04-03 | 2003-08-12 | Ming Lai | Hybrid tracking system |
| US6610351B2 (en) * | 2000-04-12 | 2003-08-26 | Quantag Systems, Inc. | Raman-active taggants and their recognition |
| JP3786343B2 (ja) | 2000-05-12 | 2006-06-14 | 日本ビクター株式会社 | 光ディスク再生装置 |
| US6662063B2 (en) | 2000-05-16 | 2003-12-09 | Gsi Lumonics Corporation | Method and subsystem for determining a sequence in which microstructures are to be processed at a laser-processing site |
| US6483071B1 (en) * | 2000-05-16 | 2002-11-19 | General Scanning Inc. | Method and system for precisely positioning a waist of a material-processing laser beam to process microstructures within a laser-processing site |
| US6495791B2 (en) | 2000-05-16 | 2002-12-17 | General Scanning, Inc. | Method and subsystem for generating a trajectory to be followed by a motor-driven stage when processing microstructures at a laser-processing site |
| JP4310890B2 (ja) | 2000-06-01 | 2009-08-12 | ソニー株式会社 | 光ディスク装置、光ディスクのアクセス方法及び光ディスク |
| JP4579376B2 (ja) * | 2000-06-19 | 2010-11-10 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| KR100626712B1 (ko) * | 2000-06-23 | 2006-09-22 | 한라공조주식회사 | 자동차용 박형 공기조화장치 |
| US6673692B2 (en) * | 2000-06-28 | 2004-01-06 | Micron Technology, Inc. | Method and apparatus for marking microelectronic dies and microelectronic devices |
| US6432796B1 (en) * | 2000-06-28 | 2002-08-13 | Micron Technology, Inc. | Method and apparatus for marking microelectronic dies and microelectronic devices |
| AU2001271982A1 (en) * | 2000-07-12 | 2002-01-21 | Electro Scientific Industries, Inc. | Uv laser system and method for single pulse severing of ic fuses |
| US7211214B2 (en) * | 2000-07-18 | 2007-05-01 | Princeton University | Laser assisted direct imprint lithography |
| JP2002043251A (ja) * | 2000-07-25 | 2002-02-08 | Fujitsu Ltd | 半導体装置の製造方法及び半導体装置 |
| US6539143B1 (en) | 2000-07-31 | 2003-03-25 | Sarcon Microsystems, Inc. | Optical switching system |
| TW556185B (en) * | 2000-08-17 | 2003-10-01 | Matsushita Electric Industrial Co Ltd | Optical information recording medium and the manufacturing method thereof, record reproduction method and record reproduction device |
| TW503188B (en) | 2000-08-29 | 2002-09-21 | Sumitomo Heavy Industries | Marking method, device the optical member marked |
| US6642475B2 (en) | 2000-09-08 | 2003-11-04 | David Benderly | Etched article and method of etching |
| US7157038B2 (en) | 2000-09-20 | 2007-01-02 | Electro Scientific Industries, Inc. | Ultraviolet laser ablative patterning of microstructures in semiconductors |
| US6503316B1 (en) * | 2000-09-22 | 2003-01-07 | Dmc2 Degussa Metals Catalysts Cerdec Ag | Bismuth-containing laser markable compositions and methods of making and using same |
| US6660964B1 (en) | 2000-09-22 | 2003-12-09 | David Benderly | Optical modification of laser beam cross section in object marking systems |
| JP4008649B2 (ja) * | 2000-09-27 | 2007-11-14 | 沖電気工業株式会社 | 光学装置 |
| JP3814476B2 (ja) | 2000-09-28 | 2006-08-30 | 日本ビクター株式会社 | 情報記録方法及び情報記録装置 |
| JP2002117539A (ja) * | 2000-10-10 | 2002-04-19 | Tdk Corp | 光記録媒体 |
| JP3602465B2 (ja) | 2000-10-10 | 2004-12-15 | Necエレクトロニクス株式会社 | 半導体装置、半導体装置の評価解析方法及び半導体装置の加工装置 |
| JP2002131883A (ja) | 2000-10-27 | 2002-05-09 | Hitachi Ltd | フォトマスクの製造方法およびフォトマスク |
| TW464585B (en) | 2000-11-22 | 2001-11-21 | Hannstar Display Corp | Laser aided pressing device and the adjusting method of pressing position |
| KR100752547B1 (ko) | 2000-12-29 | 2007-08-29 | 엘지.필립스 엘시디 주식회사 | 액정표시장치용 어레이 기판의 아이디 마크 및 그의 형성방법 |
| KR100500469B1 (ko) | 2001-01-12 | 2005-07-12 | 삼성전자주식회사 | 정렬마크와 이를 이용하는 노광정렬시스템 및 그 정렬방법 |
| JP2002237036A (ja) | 2001-02-08 | 2002-08-23 | Hitachi Ltd | 情報記録方法、再生方法及び情報記録装置 |
| US6639177B2 (en) | 2001-03-29 | 2003-10-28 | Gsi Lumonics Corporation | Method and system for processing one or more microstructures of a multi-material device |
| US20070173075A1 (en) | 2001-03-29 | 2007-07-26 | Joohan Lee | Laser-based method and system for processing a multi-material device having conductive link structures |
| US6656815B2 (en) | 2001-04-04 | 2003-12-02 | International Business Machines Corporation | Process for implanting a deep subcollector with self-aligned photo registration marks |
| US6665243B2 (en) | 2001-04-11 | 2003-12-16 | Zoran Corporation | Method and apparatus for recording a compact disc at a sub-1X speeds |
| DE10122335C1 (de) * | 2001-05-08 | 2002-07-25 | Schott Glas | Verfahren und Vorrichtung zum Markieren von Glas mit einem Laser |
| DE10125206B4 (de) * | 2001-05-14 | 2005-03-10 | Forschungsverbund Berlin Ev | Verfahren zur direkten Mikrostrukturierung von Materialien |
| DE20108393U1 (de) | 2001-05-18 | 2001-07-26 | Z-Laser Optoelektronik GmbH, 79098 Freiburg | Markiervorrichtung |
| US7442629B2 (en) * | 2004-09-24 | 2008-10-28 | President & Fellows Of Harvard College | Femtosecond laser-induced formation of submicrometer spikes on a semiconductor substrate |
| US7390689B2 (en) * | 2001-05-25 | 2008-06-24 | President And Fellows Of Harvard College | Systems and methods for light absorption and field emission using microstructured silicon |
| EP1278240A2 (de) * | 2001-07-10 | 2003-01-22 | Koninklijke Philips Electronics N.V. | Verfahren zur Transferierung von einem Bauelement auf einen Verbindungsträger durch Löten ohne zusätzliches Lötmaterial |
| US6738396B2 (en) * | 2001-07-24 | 2004-05-18 | Gsi Lumonics Ltd. | Laser based material processing methods and scalable architecture for material processing |
| US7065121B2 (en) * | 2001-07-24 | 2006-06-20 | Gsi Group Ltd. | Waveguide architecture, waveguide devices for laser processing and beam control, and laser processing applications |
| US6785304B2 (en) * | 2001-07-24 | 2004-08-31 | Gsi Lumonics, Inc. | Waveguide device with mode control and pump light confinement and method of using same |
| CA2458517C (en) * | 2001-09-10 | 2016-12-20 | My2Centences, Llc. | Method and system for creating a collaborative work over a digital network |
| JP2003305585A (ja) * | 2001-09-11 | 2003-10-28 | Seiko Epson Corp | レーザー加工方法および加工装置 |
| SG122749A1 (en) * | 2001-10-16 | 2006-06-29 | Inst Data Storage | Method of laser marking and apparatus therefor |
| US6677552B1 (en) * | 2001-11-30 | 2004-01-13 | Positive Light, Inc. | System and method for laser micro-machining |
| KR100431179B1 (ko) * | 2001-12-04 | 2004-05-12 | 삼성전기주식회사 | 온도보상 수정발진기 및 그 출력주파수조정방법 |
| US6664173B2 (en) | 2002-01-09 | 2003-12-16 | Intel Corporation | Hardmask gate patterning technique for all transistors using spacer gate approach for critical dimension control |
| GB0201101D0 (en) * | 2002-01-18 | 2002-03-06 | Renishaw Plc | Laser marking |
| WO2003065122A1 (en) * | 2002-01-31 | 2003-08-07 | Scandinavian Micro Biodevices A/S | Method of joining a workpiece and a microstructure by light exposure |
| US6762072B2 (en) * | 2002-03-06 | 2004-07-13 | Robert Bosch Gmbh | SI wafer-cap wafer bonding method using local laser energy, device produced by the method, and system used in the method |
| US20060199354A1 (en) | 2002-03-27 | 2006-09-07 | Bo Gu | Method and system for high-speed precise laser trimming and electrical device produced thereby |
| US7358157B2 (en) * | 2002-03-27 | 2008-04-15 | Gsi Group Corporation | Method and system for high-speed precise laser trimming, scan lens system for use therein and electrical device produced thereby |
| US6951995B2 (en) | 2002-03-27 | 2005-10-04 | Gsi Lumonics Corp. | Method and system for high-speed, precise micromachining an array of devices |
| US7563695B2 (en) | 2002-03-27 | 2009-07-21 | Gsi Group Corporation | Method and system for high-speed precise laser trimming and scan lens for use therein |
| US7119351B2 (en) | 2002-05-17 | 2006-10-10 | Gsi Group Corporation | Method and system for machine vision-based feature detection and mark verification in a workpiece or wafer marking system |
| US20040000540A1 (en) * | 2002-05-23 | 2004-01-01 | Soboyejo Winston O. | Laser texturing of surfaces for biomedical implants |
| US6719621B2 (en) | 2002-05-31 | 2004-04-13 | Townsend Engineering Company | Method and means for stuffing natural casings with sausage emulsion |
| US6797324B2 (en) | 2002-05-31 | 2004-09-28 | Nicholas J. Pollara | Glass printing process |
| US20030224581A1 (en) | 2002-06-03 | 2003-12-04 | Robert Bosch Gmbh | Flip chip packaging process using laser-induced metal bonding technology, system utilizing the method, and device created by the method |
| SG108299A1 (en) * | 2002-06-11 | 2005-01-28 | Inst Data Storage | Method and apparatus for forming periodic structures |
| US6635846B1 (en) | 2002-08-02 | 2003-10-21 | Albert S. Rieck | Selective laser compounding for vitrescent markings |
| JP2004066293A (ja) | 2002-08-06 | 2004-03-04 | Namiki Precision Jewel Co Ltd | レーザ加工方法 |
| US6661106B1 (en) | 2002-08-13 | 2003-12-09 | International Business Machines Corporation | Alignment mark structure for laser fusing and method of use |
| US6864190B2 (en) * | 2002-10-17 | 2005-03-08 | National Research Council Of Canada | Laser chemical fabrication of nanostructures |
| US6974207B2 (en) | 2002-11-19 | 2005-12-13 | Lexmark International, Inc. | Laser welding methods and structures and control therefor including welded inkjet printheads |
| JP4033784B2 (ja) | 2003-02-20 | 2008-01-16 | 清水建設株式会社 | 親水性一液型ポリウレタンプレポリマーから成る止水材の高圧注入止水工法及び止水材 |
| US6979798B2 (en) | 2003-03-07 | 2005-12-27 | Gsi Lumonics Corporation | Laser system and method for material processing with ultra fast lasers |
| US20050029240A1 (en) * | 2003-08-07 | 2005-02-10 | Translume, Inc. | Dual light source machining method and system |
| JP2005203286A (ja) * | 2004-01-16 | 2005-07-28 | Sanyo Electric Co Ltd | 表示パネルの製造方法および表示パネル |
| US7744804B2 (en) | 2004-03-12 | 2010-06-29 | Orient Chemical Industries, Ltd. | Laser-transmissible composition and method of laser welding |
| US7005603B2 (en) * | 2004-04-02 | 2006-02-28 | Hewlett-Packard Development Company, L.P. | Laser marking |
| US20060000814A1 (en) | 2004-06-30 | 2006-01-05 | Bo Gu | Laser-based method and system for processing targeted surface material and article produced thereby |
| US7705268B2 (en) | 2004-11-11 | 2010-04-27 | Gsi Group Corporation | Method and system for laser soft marking |
| US20060189091A1 (en) | 2004-11-11 | 2006-08-24 | Bo Gu | Method and system for laser hard marking |
| US20060151704A1 (en) | 2004-12-30 | 2006-07-13 | Cordingley James J | Laser-based material processing methods, system and subsystem for use therein for precision energy control |
| US20060191884A1 (en) | 2005-01-21 | 2006-08-31 | Johnson Shepard D | High-speed, precise, laser-based material processing method and system |
| US7466466B2 (en) | 2005-05-11 | 2008-12-16 | Gsi Group Corporation | Optical scanning method and system and method for correcting optical aberrations introduced into the system by a beam deflector |
| US20070117227A1 (en) | 2005-11-23 | 2007-05-24 | Gsi Group Corporation | Method And System for Iteratively, Selectively Tuning A Parameter Of A Doped Workpiece Using A Pulsed Laser |
| US20070215575A1 (en) | 2006-03-15 | 2007-09-20 | Bo Gu | Method and system for high-speed, precise, laser-based modification of one or more electrical elements |
| US20070106416A1 (en) | 2006-06-05 | 2007-05-10 | Griffiths Joseph J | Method and system for adaptively controlling a laser-based material processing process and method and system for qualifying same |
| US7732731B2 (en) | 2006-09-15 | 2010-06-08 | Gsi Group Corporation | Method and system for laser processing targets of different types on a workpiece |
-
2005
- 2005-06-14 US US11/152,509 patent/US20060000814A1/en not_active Abandoned
- 2005-06-21 KR KR1020077002121A patent/KR101278433B1/ko not_active Expired - Lifetime
- 2005-06-21 WO PCT/US2005/021955 patent/WO2006012124A2/en not_active Ceased
- 2005-06-21 EP EP05773635A patent/EP1779286B1/de not_active Expired - Lifetime
- 2005-06-21 AT AT05773635T patent/ATE550132T1/de active
- 2005-06-21 JP JP2007519283A patent/JP2008504964A/ja active Pending
-
2006
- 2006-10-27 US US11/514,660 patent/US7469831B2/en not_active Expired - Lifetime
-
2007
- 2007-05-10 US US11/801,706 patent/US20080073438A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| KR20070036784A (ko) | 2007-04-03 |
| WO2006012124A3 (en) | 2006-08-10 |
| WO2006012124A2 (en) | 2006-02-02 |
| EP1779286A2 (de) | 2007-05-02 |
| WO2006012124A8 (en) | 2006-03-23 |
| EP1779286A4 (de) | 2008-12-03 |
| US20080073438A1 (en) | 2008-03-27 |
| KR101278433B1 (ko) | 2013-06-24 |
| US20080011852A1 (en) | 2008-01-17 |
| US7469831B2 (en) | 2008-12-30 |
| EP1779286B1 (de) | 2012-03-21 |
| US20060000814A1 (en) | 2006-01-05 |
| JP2008504964A (ja) | 2008-02-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE550132T1 (de) | Laserbasiertes verfahren und system zur verarbeitung von gezielt ausgerichtetem oberflächenmaterial und daraus hergestellter artikel | |
| DE69500997D1 (de) | Verfahren zum konfigurationsteuern von laserinduziertem zerstören und abtragen | |
| MY137997A (en) | Manufacturing method of laser processed parts, and pressure-sensitive adhesive sheet for laser processing used for the same | |
| CN105531072B (zh) | 借助脉冲激光射线对工件进行去料切割的方法 | |
| ATE549946T1 (de) | Verfahren zur verarbeitung von nahrungsmittelmaterial mit einem impulslaserstrahl | |
| Dumitru et al. | Laser processing of hardmetals: Physical basics and applications | |
| MY184075A (en) | Method of material processing by laser filamentation | |
| ATE339527T1 (de) | Verfahren zum glätten und polieren von oberflächen durch bearbeitung mit energetischer strahlung | |
| WO2007016557A3 (en) | Via hole machining for microwave monolithic integrated circuits | |
| TW200613081A (en) | Laser processing method and semiconductor chip | |
| KR20060030057A (ko) | 유리의 절단 방법 및 그 장치 | |
| JP2013528109A5 (de) | ||
| WO2012135039A3 (en) | Laser direct ablation with picosecond laser pulses at high pulse repetition frequencies | |
| DE59403740D1 (de) | Verfahren zur materialbearbeitung mit diodenstrahlung | |
| CN104884205A (zh) | 经由激光微加工形成影像的方法 | |
| JP2004268104A5 (de) | ||
| JP2010064144A (ja) | レーザマーキング方法 | |
| FI20070889A7 (fi) | Pinnankäsittelymenetelmä | |
| JP2003088976A5 (de) | ||
| WO2019030522A3 (en) | Laser processing | |
| Heberle et al. | Ultrashort pulse laser cutting of intraocular lens polymers | |
| JP2022504439A5 (de) | ||
| Jagdheesh et al. | The Effects of Pulse Period on Nanosecond Laser Microfabrication. | |
| Patel et al. | Parametric optimization of laser engraving process for different material using grey relational technique-a review | |
| Liu et al. | Manufacturing of hourglass-shaped through holes with varying diameters at different depths by dual-pulse laser drilling and laser-induced plasma-hole interaction |