ATE553157T1 - Harzzusammensetzung für optisches material, harzfilm für optisches material und lichtwellenleiter damit - Google Patents

Harzzusammensetzung für optisches material, harzfilm für optisches material und lichtwellenleiter damit

Info

Publication number
ATE553157T1
ATE553157T1 AT05790649T AT05790649T ATE553157T1 AT E553157 T1 ATE553157 T1 AT E553157T1 AT 05790649 T AT05790649 T AT 05790649T AT 05790649 T AT05790649 T AT 05790649T AT E553157 T1 ATE553157 T1 AT E553157T1
Authority
AT
Austria
Prior art keywords
optical material
resin composition
resin film
resin
film
Prior art date
Application number
AT05790649T
Other languages
English (en)
Inventor
Tomoaki Shibata
Tatsuya Makino
Masami Ochiai
Atsushi Takahashi
Toshihiko Takasaki
Original Assignee
Hitachi Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd filed Critical Hitachi Chemical Co Ltd
Application granted granted Critical
Publication of ATE553157T1 publication Critical patent/ATE553157T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/062—Copolymers with monomers not covered by C08L33/06
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/062—Copolymers with monomers not covered by C08L33/06
    • C08L33/068—Copolymers with monomers not covered by C08L33/06 containing glycidyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
    • C08L63/10—Epoxy resins modified by unsaturated compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/045—Light guides
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
    • C08L71/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
    • C08L71/12—Polyphenylene oxides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Graft Or Block Polymers (AREA)
  • Polymerisation Methods In General (AREA)
  • Epoxy Resins (AREA)
AT05790649T 2004-10-07 2005-10-07 Harzzusammensetzung für optisches material, harzfilm für optisches material und lichtwellenleiter damit ATE553157T1 (de)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
JP2004294703 2004-10-07
JP2004359796 2004-12-13
JP2004359797 2004-12-13
JP2005073809 2005-03-15
JP2005138406 2005-05-11
JP2005243430 2005-08-24
JP2005243433 2005-08-24
JP2005243432 2005-08-24
JP2005243431 2005-08-24
PCT/JP2005/018635 WO2006038691A1 (ja) 2004-10-07 2005-10-07 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路

Publications (1)

Publication Number Publication Date
ATE553157T1 true ATE553157T1 (de) 2012-04-15

Family

ID=36142761

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05790649T ATE553157T1 (de) 2004-10-07 2005-10-07 Harzzusammensetzung für optisches material, harzfilm für optisches material und lichtwellenleiter damit

Country Status (6)

Country Link
US (2) US7751678B2 (de)
EP (4) EP2368939A1 (de)
KR (2) KR101394683B1 (de)
AT (1) ATE553157T1 (de)
TW (1) TWI396698B (de)
WO (1) WO2006038691A1 (de)

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006038691A1 (ja) * 2004-10-07 2006-04-13 Hitachi Chemical Company, Ltd. 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路
JP5211423B2 (ja) * 2004-10-07 2013-06-12 日立化成株式会社 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路
KR100544824B1 (ko) * 2005-01-27 2006-01-24 주식회사 코오롱 프리즘층 형성용 조성물 및 이로부터 제조된 프리즘 필름
JP4894348B2 (ja) * 2005-05-11 2012-03-14 日立化成工業株式会社 フレキシブル光導波路及びその製造方法
JP4853181B2 (ja) * 2005-08-26 2012-01-11 大日本印刷株式会社 高屈折率ハードコート層
EP1995266A4 (de) * 2006-03-15 2012-02-08 Hitachi Chemical Co Ltd Phenoxyharz für optisches material, harzzusammensetzung für optisches material, harzfilm für optisches material und optischer wellenleiter damit
TW200811495A (en) 2006-07-18 2008-03-01 Jsr Corp Dry film for optical waveguide and method for manufacturing optical waveguide by using the dry film
EP2045629B1 (de) 2006-07-25 2013-09-04 Hitachi Chemical Company, Ltd. Harzzusammensetzung für optischen wellenleiter, harzfolie für optischen wellenleiter und optischer wellenleiter
JP4682955B2 (ja) * 2006-08-08 2011-05-11 Jsr株式会社 光導波路の製造方法
WO2008035658A1 (fr) * 2006-09-22 2008-03-27 Hitachi Chemical Company, Ltd. Procédé de fabrication de guide de lumière
JP5066926B2 (ja) * 2006-10-17 2012-11-07 日立化成工業株式会社 フレキシブル光導波路の製造方法
KR20090118920A (ko) 2007-02-14 2009-11-18 히다치 가세고교 가부시끼가이샤 광학재료용 수지 조성물, 광학재료용 수지 필름 및 이들을 이용한 광도파로
WO2008114696A1 (ja) * 2007-03-16 2008-09-25 Hitachi Chemical Company, Ltd. 光導波路用接着剤組成物、これを用いた光導波路用接着フィルムおよび光導波路用粘接着シート、ならびにこれらを用いた光学装置
CN101715467B (zh) * 2007-06-07 2014-03-19 可隆株式会社 生态光学片
JP2009036924A (ja) * 2007-07-31 2009-02-19 Nitto Denko Corp 光導波路フィルム、光基板およびこれらの製造方法
EP2189826A4 (de) * 2007-09-19 2011-05-25 Hitachi Chemical Co Ltd Verfahren zur herstellung eines lichtwellenleiters und in diesem verfahren hergestellter lichtwellenleiter
WO2009041439A1 (ja) * 2007-09-26 2009-04-02 Hitachi Chemical Company, Ltd. 光導波路及びその製造方法
KR20100090685A (ko) * 2007-11-15 2010-08-16 히다치 가세고교 가부시끼가이샤 광도파로용 수지 조성물 및 광도파로
US8632952B2 (en) 2007-11-20 2014-01-21 Hitachi Chemical Company, Ltd. Photosensitive resin composition, photosensitive resin cured matter, photosensitive resin film, photosensitive resin film cured matter and optical waveguide obtained by using the same
KR101545038B1 (ko) 2007-12-17 2015-08-17 히타치가세이가부시끼가이샤 광도파로 및 그 제조 방법
KR20090076754A (ko) * 2008-01-08 2009-07-13 주식회사 엘지화학 광학 필름, 위상차 필름, 보호 필름 및 이들을 포함하는액정 표시 장치
KR20090076753A (ko) 2008-01-08 2009-07-13 주식회사 엘지화학 투명한 수지 조성물
CN101925840B (zh) * 2008-01-24 2012-12-26 日立化成工业株式会社 包层形成用树脂组合物以及使用其的包层形成用树脂膜、使用它们的光波导和光模块
JP2009265519A (ja) * 2008-04-28 2009-11-12 Hitachi Cable Ltd フレキシブル光導波路およびその製造方法
US8613986B2 (en) 2008-04-30 2013-12-24 Lg Chem, Ltd. Optical film and information technology apparatus comprising the same
TWI379840B (en) * 2008-08-01 2012-12-21 Eternal Chemical Co Ltd Polymerizable composition and its uses
WO2010032809A1 (ja) * 2008-09-19 2010-03-25 日立化成工業株式会社 光導波路
JP5618510B2 (ja) * 2008-09-22 2014-11-05 キヤノン株式会社 光学材料および光学素子
US8716403B2 (en) 2008-12-10 2014-05-06 Electronics And Telecommunications Research Institute Prepolymer prepared by a condensation reaction and a polymer sheet obtained therefrom
JP5465453B2 (ja) 2009-03-26 2014-04-09 パナソニック株式会社 光導波路形成用エポキシ樹脂組成物、光導波路形成用硬化性フィルム、光伝送用フレキシブルプリント配線板、及び電子情報機器
US8787723B2 (en) 2009-04-30 2014-07-22 Hitachi Chemical Company, Ltd. Resin composition for forming optical waveguide, resin film for forming optical waveguide, and optical waveguide
TW201344273A (zh) * 2012-04-25 2013-11-01 Hon Hai Prec Ind Co Ltd 光纖耦合連接器
JP6026347B2 (ja) * 2013-04-23 2016-11-16 日東電工株式会社 感光性エポキシ樹脂組成物および光導波路コア層形成用硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
JP6034742B2 (ja) * 2013-04-26 2016-11-30 日東電工株式会社 光導波路用感光性エポキシ樹脂組成物、光導波路形成用硬化性フィルム、およびそれを用いた光導波路ならびに光・電気伝送用混載フレキシブルプリント配線板、およびその光導波路の製法
JP6274498B2 (ja) * 2013-11-08 2018-02-07 日東電工株式会社 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
JP6584050B2 (ja) 2013-11-08 2019-10-02 日東電工株式会社 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
JP6537061B2 (ja) 2014-10-28 2019-07-03 日東電工株式会社 光導波路用感光性樹脂組成物および光導波路コア層形成用光硬化性フィルム、ならびにそれを用いた光導波路、光・電気伝送用混載フレキシブルプリント配線板
US20180225649A1 (en) 2017-02-06 2018-08-09 American Express Travel Related Services Company, Inc. Charge splitting across multiple payment systems
WO2019074035A1 (ja) * 2017-10-13 2019-04-18 パナソニックIpマネジメント株式会社 光導波路コア用樹脂組成物、並びにそれを用いたドライフィルム、光導波路コア及び光電気複合配線板
US11275208B2 (en) * 2018-02-26 2022-03-15 Arizona Board Of Regents On Behalf Of The University Of Arizona Fabrication of polymer waveguide interconnect between chips with a gap and/or step
TWI811384B (zh) * 2018-06-20 2023-08-11 日商Dic股份有限公司 含酸基之(甲基)丙烯酸酯樹脂組成物、硬化性樹脂組成物、硬化物、及阻焊劑用樹脂材料
CN115407455A (zh) * 2021-05-28 2022-11-29 深南电路股份有限公司 一种柔性光波导板及其制作方法
KR20230130447A (ko) 2022-03-03 2023-09-12 해성디에스 주식회사 광도파로 제조 장치 및 광도파로 제조 방법
KR102632687B1 (ko) * 2023-09-15 2024-02-06 주식회사 더 케이앤씨 전동식 차량 높이 제한 개폐 시설물

Family Cites Families (60)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4479983A (en) * 1983-01-07 1984-10-30 International Business Machines Corporation Method and composition for applying coatings on printed circuit boards
JPS6130557A (ja) * 1984-07-23 1986-02-12 Nippon Kayaku Co Ltd 新規な(メタ)アクリル酸エステルおよびこのエステルを用いた紫外線硬化型樹脂組成物
US4634602A (en) * 1986-01-02 1987-01-06 Ppg Industries, Inc. Primer composition
US4756954A (en) 1986-01-22 1988-07-12 The Dow Chemical Company Epoxy resin laminating varnish and laminates prepared therefrom
JP2533859B2 (ja) * 1986-09-17 1996-09-11 旭化成工業株式会社 光学用感光性樹脂組成物
JPH0768339B2 (ja) 1987-02-04 1995-07-26 東都化成株式会社 ハロゲン含有ポリヒドロキシポリエ−テル樹脂の製造法
JPS63314224A (ja) * 1987-06-16 1988-12-22 Asahi Chem Ind Co Ltd 光学用感光性樹脂組成物
US5041470A (en) * 1989-03-03 1991-08-20 International Business Machines Corporation Flame retardant photocurable adhesive for wires and circuit boards
US5098766A (en) * 1989-03-03 1992-03-24 Ibm Corporation Encapsulated wire circuit board
JP2799401B2 (ja) 1989-08-18 1998-09-17 東都化成株式会社 塗料用エポキシ樹脂組成物
DE4007519A1 (de) * 1990-03-09 1991-09-12 Rheydt Kabelwerk Ag Durch uv-strahlen haertbare farbgebende harzmischung
US5204223A (en) * 1990-08-09 1993-04-20 Toyo Boseki Kabushiki Kaisha Photosensitive resin composition
JPH0764911B2 (ja) 1990-09-12 1995-07-12 日立化成工業株式会社 高分子量エポキシ樹脂の製造方法
JPH0759619B2 (ja) 1990-09-10 1995-06-28 日立化成工業株式会社 高分子量エポキシ樹脂の製造方法
US5233018A (en) 1990-09-28 1993-08-03 Nippon Telegraph And Telephone Corporation Perfluorinated polyimide, perfluorinated poly(amic acid), starting compounds therefor, and methods for preparing them
JP2643645B2 (ja) 1991-05-16 1997-08-20 日立化成工業株式会社 エポキシ樹脂組成物
JPH05281428A (ja) 1992-03-30 1993-10-29 Nippon Telegr & Teleph Corp <Ntt> 光インターコネクションボード及び光導波路
JPH06228274A (ja) 1993-02-04 1994-08-16 Nippon Telegr & Teleph Corp <Ntt> 耐熱性光学樹脂
US5519177A (en) * 1993-05-19 1996-05-21 Ibiden Co., Ltd. Adhesives, adhesive layers for electroless plating and printed circuit boards
JP3296458B2 (ja) 1994-03-01 2002-07-02 日本電信電話株式会社 高分子フィルム光導波路及びその製造方法
JP2917884B2 (ja) 1995-12-19 1999-07-12 東洋製罐株式会社 水性塗料
US6174604B1 (en) 1997-02-28 2001-01-16 The Furukawa Electric Co., Ltd. Optical-fiber core binder and optical fiber unit
JP3981968B2 (ja) * 1998-03-11 2007-09-26 Jsr株式会社 感放射線性樹脂組成物
JP4155422B2 (ja) 1998-03-24 2008-09-24 東都化成株式会社 熱可塑性ポリヒドロキシポリエーテル樹脂及びそれから成形した絶縁性フィルム
JP3811571B2 (ja) 1998-04-22 2006-08-23 東都化成株式会社 熱可塑性ポリヒドロキシポリエーテル樹脂及びそれから成形した絶縁性フィルム
JP2000007741A (ja) * 1998-06-25 2000-01-11 Kyoeisha Chem Co Ltd 耐擦傷性に優れた高屈折率樹脂組成物
JP3797223B2 (ja) 1999-11-29 2006-07-12 オムロン株式会社 耐光性マイクロレンズアレイおよびそれに使用する樹脂組成物
WO2001040836A1 (en) * 1999-12-02 2001-06-07 Gemfire Corporation Photodefinition of optical devices
JP2001305733A (ja) 2000-04-18 2001-11-02 Sumitomo Chem Co Ltd 感光性組成物の保存方法
JP4434427B2 (ja) 2000-04-27 2010-03-17 東都化成株式会社 熱可塑性ポリヒドロキシポリエーテル樹脂及びそれから成形した絶縁性フィルム
JP4385204B2 (ja) * 2000-04-28 2009-12-16 Dic株式会社 活性エネルギー線硬化型樹脂組成物
AU2001288081A1 (en) * 2000-09-20 2002-04-02 Hitachi Chemical Co. Ltd. Photosensitive element, method for forming resist pattern, and method for manufacturing printed wiring board
KR100578987B1 (ko) * 2000-09-27 2006-05-12 히다치 가세고교 가부시끼가이샤 레지스트 패턴, 그 제조방법 및 그 이용
US6929899B2 (en) * 2001-01-25 2005-08-16 E. I. Du Pont De Nemours And Company Fluorinated photopolymer composition and waveguide device
JP2002286953A (ja) * 2001-03-23 2002-10-03 Nippon Telegr & Teleph Corp <Ntt> 光導波路素子およびその製造方法
US7067226B2 (en) 2001-03-29 2006-06-27 Hitachi Chemical Co., Ltd. Photosensitive film for circuit formation and process for producing printed wiring board
JP2003026772A (ja) 2001-07-23 2003-01-29 Hitachi Chem Co Ltd 硬化性組成物及びそれを用いた硬化方法
JP2003048922A (ja) 2001-08-06 2003-02-21 Toagosei Co Ltd 活性エネルギー線硬化型樹脂シート形成剤
TW591040B (en) 2001-08-07 2004-06-11 Nippon Kayaku Kk Resin composition, solder resist composition and cured product thereof
JP2003048932A (ja) 2001-08-07 2003-02-21 Nippon Kayaku Co Ltd 樹脂組成物、ソルダーレジスト樹脂組成物及びこれらの硬化物
US7130517B2 (en) 2001-09-14 2006-10-31 Photon X, Llc Athermal polymer optical waveguide on polymer substrate
JP4186462B2 (ja) 2001-12-26 2008-11-26 Jsr株式会社 光導波路の形成方法
JP4196563B2 (ja) 2001-12-26 2008-12-17 Jsr株式会社 光導波路形成用放射線硬化性ドライフィルム、光導波路ならびに光導波路の製造方法
JP3823825B2 (ja) * 2001-12-27 2006-09-20 凸版印刷株式会社 高分子光導波路の製造方法
JP2003215374A (ja) 2002-01-21 2003-07-30 Hitachi Cable Ltd 光導波路テープキャリア及びその製造方法
KR100487025B1 (ko) * 2002-02-28 2005-05-11 주식회사 루밴틱스 광도파로용 광경화성 수지 조성물 및 이로부터 제조된광도파로
US7410746B2 (en) 2002-03-29 2008-08-12 Dai Nippon Printing Co., Ltd. Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
JP4052021B2 (ja) 2002-06-04 2008-02-27 帝人デュポンフィルム株式会社 配向ポリエステルフィルムおよびそれを用いた積層フィルム
JP2004033811A (ja) 2002-06-28 2004-02-05 Hitachi Chem Co Ltd 表面凹凸形成方法、それにより得られる光学フィルム及び拡散反射板並びに拡散反射板の製造方法
JP3945322B2 (ja) * 2002-06-27 2007-07-18 富士ゼロックス株式会社 光学素子およびその製造方法
JP2004191875A (ja) 2002-12-13 2004-07-08 Hitachi Chem Co Ltd 高分子光導波路及びその製造法
JP4426198B2 (ja) 2003-03-19 2010-03-03 日東電工株式会社 紫外線硬化型エポキシ樹脂組成物
JP2004294720A (ja) 2003-03-26 2004-10-21 Matsushita Electric Works Ltd 高分子光導波路及びその製造方法
US7295749B2 (en) * 2003-05-26 2007-11-13 Omron Corporation Curable resin composition, optical component and optical waveguide
US6996303B2 (en) * 2004-03-12 2006-02-07 Fujitsu Limited Flexible optical waveguides for backplane optical interconnections
JP2006023376A (ja) * 2004-07-06 2006-01-26 Bridgestone Corp 光デバイスの製造方法
JP2006028204A (ja) 2004-07-12 2006-02-02 Toppan Printing Co Ltd 異方性光散乱フィルム用組成物及び異方性光散乱フィルム
JP5211423B2 (ja) 2004-10-07 2013-06-12 日立化成株式会社 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路
WO2006038691A1 (ja) 2004-10-07 2006-04-13 Hitachi Chemical Company, Ltd. 光学材料用樹脂組成物、光学材料用樹脂フィルム及びこれを用いた光導波路
JP4729908B2 (ja) 2004-11-25 2011-07-20 パナソニック電工株式会社 エポキシ樹脂組成物、その製造方法、光導波路及び電子部品

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US20080260341A1 (en) 2008-10-23
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US20100266258A1 (en) 2010-10-21
KR101367583B1 (ko) 2014-02-25
EP2392619A1 (de) 2011-12-07
TW200621817A (en) 2006-07-01
EP1818366A4 (de) 2009-03-04
EP1818366A1 (de) 2007-08-15
TWI396698B (zh) 2013-05-21
EP2368939A1 (de) 2011-09-28
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US7751678B2 (en) 2010-07-06
KR20070108354A (ko) 2007-11-09

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