BE532222A - - Google Patents

Info

Publication number
BE532222A
BE532222A BE532222DA BE532222A BE 532222 A BE532222 A BE 532222A BE 532222D A BE532222D A BE 532222DA BE 532222 A BE532222 A BE 532222A
Authority
BE
Belgium
Prior art keywords
hydride
decomposition
silicon
semiconductor material
silane
Prior art date
Application number
Other languages
English (en)
French (fr)
Publication of BE532222A publication Critical patent/BE532222A/fr

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
BE532222D BE532222A (de)

Publications (1)

Publication Number Publication Date
BE532222A true BE532222A (de)

Family

ID=164319

Family Applications (1)

Application Number Title Priority Date Filing Date
BE532222D BE532222A (de)

Country Status (1)

Country Link
BE (1) BE532222A (de)

Similar Documents

Publication Publication Date Title
US4237150A (en) Method of producing hydrogenated amorphous silicon film
US4368098A (en) Epitaxial composite and method of making
Jones Developments in metalorganic precursors for semiconductor growth from the vapour phase
KR940001249B1 (ko) 단결정 실리콘 기판과 단결정 막의 합성물 및 그 형성방법
US4404265A (en) Epitaxial composite and method of making
US4237151A (en) Thermal decomposition of silane to form hydrogenated amorphous Si film
US5268327A (en) Epitaxial compositions
EP0200766B1 (de) Verfahren zum epitaxialen aufwachsen kristalliner schichten in der gasphase
US6712908B2 (en) Purified silicon production system
US7276121B1 (en) Forming improved metal nitrides
JPS634625A (ja) 第2−6族半導体材料の低温金属有機物質化学蒸着
EP0240314A1 (de) Verfahren zur Ausbildung eines abgeschiedenen Films
JP3820198B2 (ja) 精製シリコンの製造装置
JPS60169563A (ja) テルル化金属の製造方法及び装置
JP3932017B2 (ja) 鉄シリサイド結晶の製造方法
BE751978A (fr) Ensembles epitaxiaux et leurs fabrication
JPS593099A (ja) 化合物半導体結晶成長法
EP0227692B1 (de) Dünne beschichtung auf basis eines rutheniumsalzes
JPS62247520A (ja) 気相処理装置
JPS5987814A (ja) 3−v族化合物半導体の製造方法
JPS5957909A (ja) アモルフアスシリコン膜の形成方法
BE562147A (de)
FR2724162A1 (fr) Procede de preparation de trisilane a partir de monosilane, par decharge electrique et piegeage cryogenique
Wiesmann Method of producing hydrogenated amorphous silicon film
FR2523113A1 (fr) Procede de regeneration des chlorosilanes et de l'hydrogene non entres en reaction lors de l'obtention de silicium semi-conducteur polycristallin; chlorosilanes et hydrogene regeneres par ledit procede