BE842810A - Procede de nettoyage de disques semi-conducteurs polis - Google Patents

Procede de nettoyage de disques semi-conducteurs polis

Info

Publication number
BE842810A
BE842810A BE167808A BE167808A BE842810A BE 842810 A BE842810 A BE 842810A BE 167808 A BE167808 A BE 167808A BE 167808 A BE167808 A BE 167808A BE 842810 A BE842810 A BE 842810A
Authority
BE
Belgium
Prior art keywords
polished semiconductor
semiconductor discs
cleaning polished
cleaning
discs
Prior art date
Application number
BE167808A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE842810A publication Critical patent/BE842810A/fr

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00Cleaning of wafers, substrates or parts of devices
    • H10P70/10Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/15Cleaning before device manufacture, i.e. Begin-Of-Line process by wet cleaning only
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
BE167808A 1975-06-11 1976-06-10 Procede de nettoyage de disques semi-conducteurs polis BE842810A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2526052A DE2526052C2 (de) 1975-06-11 1975-06-11 Verfahren zum Reinigen polierter Halbleiterscheiben

Publications (1)

Publication Number Publication Date
BE842810A true BE842810A (fr) 1976-12-10

Family

ID=5948838

Family Applications (1)

Application Number Title Priority Date Filing Date
BE167808A BE842810A (fr) 1975-06-11 1976-06-10 Procede de nettoyage de disques semi-conducteurs polis

Country Status (7)

Country Link
JP (1) JPS51150972A (fr)
BE (1) BE842810A (fr)
DE (1) DE2526052C2 (fr)
DK (1) DK144776A (fr)
GB (1) GB1553695A (fr)
IT (1) IT1061334B (fr)
NL (1) NL7603267A (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4129457A (en) * 1977-05-23 1978-12-12 International Business Machines Corporation Post-polishing cleaning of semiconductor surfaces
JPS6040705B2 (ja) * 1978-06-26 1985-09-12 インタ−ナシヨナル・ビジネス・マシ−ンンズ・コ−ポレ−シヨン 電子回路の保護被覆形成方法
DE3328639A1 (de) * 1983-08-09 1985-02-21 Merck Patent Gmbh, 6100 Darmstadt Reinigungsmittel fuer mechanisch bearbeitete halbleitermaterialien
JPS60126838A (ja) * 1983-12-13 1985-07-06 Mitsubishi Monsanto Chem Co ひ化ガリウム単結晶ウエハの洗滌液および洗滌方法
DE3834396A1 (de) * 1988-10-10 1990-04-12 Telefunken Electronic Gmbh Verfahren zum entfernen von oberflaechenschichten
DE4103084A1 (de) * 1991-02-01 1992-08-13 Wacker Chemitronic Magazin zur halterung von scheibenfoermigen werkstuecken, insbesondere halbleiterscheiben, bei der nasschemischen oberflaechenbehandlung in fluessigkeitsbaedern
US5320706A (en) * 1991-10-15 1994-06-14 Texas Instruments Incorporated Removing slurry residue from semiconductor wafer planarization
US5911889A (en) * 1995-05-11 1999-06-15 Wacker Siltronic Gesellschaft Fur Halbleitermaterialien Aktiengesellschaft Method of removing damaged crystal regions from silicon wafers
US6074935A (en) * 1997-06-25 2000-06-13 Siemens Aktiengesellschaft Method of reducing the formation of watermarks on semiconductor wafers
RU2219002C1 (ru) * 2002-04-08 2003-12-20 Панчеха Юрий Степанович Способ очистки изделий

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3342652A (en) * 1964-04-02 1967-09-19 Ibm Chemical polishing of a semi-conductor substrate

Also Published As

Publication number Publication date
DK144776A (da) 1976-12-12
DE2526052C2 (de) 1983-04-21
NL7603267A (nl) 1976-12-14
IT1061334B (it) 1983-02-28
JPS5338592B2 (fr) 1978-10-16
DE2526052A1 (de) 1976-12-30
GB1553695A (en) 1979-09-26
JPS51150972A (en) 1976-12-24

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: WACKER-CHEMITRONIC GESELLSCHAFT FUR ELEKTRONIK-GR

Effective date: 19840610