BR9205457A - Método e sistema para remover contaminantes de um substrato solido escolhido - Google Patents

Método e sistema para remover contaminantes de um substrato solido escolhido

Info

Publication number
BR9205457A
BR9205457A BR9205457A BR9205457A BR9205457A BR 9205457 A BR9205457 A BR 9205457A BR 9205457 A BR9205457 A BR 9205457A BR 9205457 A BR9205457 A BR 9205457A BR 9205457 A BR9205457 A BR 9205457A
Authority
BR
Brazil
Prior art keywords
hydrogen peroxide
final reaction
reaction bath
initial
contaminants
Prior art date
Application number
BR9205457A
Other languages
English (en)
Inventor
Thomas B Stanford
Richard C George
Jennifer I Shinno
Dhiren C Mehta
Gifford W Rodine
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of BR9205457A publication Critical patent/BR9205457A/pt

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K1/00Soldering, e.g. brazing, or unsoldering
    • B23K1/20Preliminary treatment of work or areas to be soldered, e.g. in respect of a galvanic coating
    • B23K1/206Cleaning
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23GCLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/26Cleaning or polishing of the conductive pattern
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0793Aqueous alkaline solution, e.g. for cleaning or etching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0779Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
    • H05K2203/0786Using an aqueous solution, e.g. for cleaning or during drilling of holes
    • H05K2203/0796Oxidant in aqueous solution, e.g. permanganate

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Detergent Compositions (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
BR9205457A 1991-11-13 1992-09-28 Método e sistema para remover contaminantes de um substrato solido escolhido BR9205457A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US79181991A 1991-11-13 1991-11-13
PCT/US1992/008150 WO1993010280A1 (en) 1991-11-13 1992-09-28 Method and system for removing contaminants

Publications (1)

Publication Number Publication Date
BR9205457A true BR9205457A (pt) 1994-06-21

Family

ID=25154884

Family Applications (1)

Application Number Title Priority Date Filing Date
BR9205457A BR9205457A (pt) 1991-11-13 1992-09-28 Método e sistema para remover contaminantes de um substrato solido escolhido

Country Status (15)

Country Link
EP (1) EP0566712B1 (pt)
JP (1) JPH06504817A (pt)
KR (1) KR960002638B1 (pt)
AT (1) ATE125885T1 (pt)
AU (1) AU651253B2 (pt)
BR (1) BR9205457A (pt)
CA (1) CA2096546A1 (pt)
DE (1) DE69203851T2 (pt)
DK (1) DK0566712T3 (pt)
ES (1) ES2075718T3 (pt)
GR (1) GR3017956T3 (pt)
MX (1) MX9206559A (pt)
MY (1) MY129926A (pt)
WO (1) WO1993010280A1 (pt)
ZA (1) ZA928056B (pt)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA2096452A1 (en) * 1992-06-19 1993-12-20 William E. Elias Inorganic oxidant compositions for removing contaminants
FR2736936B1 (fr) * 1995-07-19 1997-08-14 Air Liquide Procede de degraissage a base de peroxyde d'hydrogene et applications a des articles metalliques
GB2349892A (en) * 1999-05-13 2000-11-15 Warwick Internat Group Ltd Metal cleaning
CN115338181A (zh) * 2022-07-26 2022-11-15 泸州龙芯微科技有限公司 芯片划片后表面清洗装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3046477A1 (de) * 1980-12-10 1982-07-08 Gebr. Schmid Maschinenfabrik GmbH & Co, 7290 Freudenstadt "verfahren zum aetzen von metalloberflaechen"
US4578162A (en) * 1984-05-29 1986-03-25 The Dow Chemical Company Method for dissolving copper in the presence of iron
HU198096B (en) * 1987-05-19 1989-07-28 Gyoergy Schamschula Composition for cleaning furnaces from the combustion side
WO1991009987A1 (en) * 1989-12-20 1991-07-11 Hughes Aircraft Company Peroxide composition for removing organic contaminants and method of using same
US5968039A (en) * 1991-10-03 1999-10-19 Essential Dental Systems, Inc. Laser device for performing canal surgery in narrow channels

Also Published As

Publication number Publication date
ES2075718T3 (es) 1995-10-01
AU2753792A (en) 1993-06-15
MX9206559A (es) 1993-05-01
ZA928056B (en) 1993-05-07
EP0566712B1 (en) 1995-08-02
DE69203851T2 (de) 1995-12-07
DE69203851D1 (de) 1995-09-07
WO1993010280A1 (en) 1993-05-27
JPH06504817A (ja) 1994-06-02
EP0566712A1 (en) 1993-10-27
CA2096546A1 (en) 1993-05-14
DK0566712T3 (da) 1995-12-18
MY129926A (en) 2007-05-31
AU651253B2 (en) 1994-07-14
ATE125885T1 (de) 1995-08-15
GR3017956T3 (en) 1996-02-29
KR960002638B1 (ko) 1996-02-24

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Legal Events

Date Code Title Description
FB36 Technical and formal requirements: requirement - article 36 of industrial property law
FA8 Dismissal: dismissal - article 36, par. 1 of industrial property law