BR9300626A - Material sensivel a luz e processo para a preparacao de uma imagem multicor - Google Patents
Material sensivel a luz e processo para a preparacao de uma imagem multicorInfo
- Publication number
- BR9300626A BR9300626A BR9300626A BR9300626A BR9300626A BR 9300626 A BR9300626 A BR 9300626A BR 9300626 A BR9300626 A BR 9300626A BR 9300626 A BR9300626 A BR 9300626A BR 9300626 A BR9300626 A BR 9300626A
- Authority
- BR
- Brazil
- Prior art keywords
- preparing
- light
- sensitive material
- multicolor image
- multicolor
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F3/00—Colour separation; Correction of tonal value
- G03F3/10—Checking the colour or tonal value of separation negatives or positives
- G03F3/106—Checking the colour or tonal value of separation negatives or positives using non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, other than silicon containing compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
- G03F7/0295—Photolytic halogen compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE4204949A DE4204949A1 (de) | 1992-02-19 | 1992-02-19 | Verfahren zur herstellung eines mehrfarbenbilds und lichtempfindliches material zur durchfuehrung dieses verfahrens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9300626A true BR9300626A (pt) | 1993-08-24 |
Family
ID=6452035
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9300626A BR9300626A (pt) | 1992-02-19 | 1993-02-18 | Material sensivel a luz e processo para a preparacao de uma imagem multicor |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US5725992A (pt) |
| EP (1) | EP0556731B1 (pt) |
| JP (1) | JPH0689024A (pt) |
| BR (1) | BR9300626A (pt) |
| CA (1) | CA2089861A1 (pt) |
| DE (2) | DE4204949A1 (pt) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2273101B (en) * | 1992-11-10 | 1997-03-05 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition |
| US5578412A (en) * | 1994-12-20 | 1996-11-26 | E. I. Dupont De Nemours And Company | Photosensitive films having a thermally sensitive material containing layer and process for using the same |
| JP4130102B2 (ja) * | 2001-09-18 | 2008-08-06 | 富士フイルム株式会社 | 感放射線性着色組成物 |
| US7645478B2 (en) * | 2005-03-31 | 2010-01-12 | 3M Innovative Properties Company | Methods of making displays |
| JP6707804B2 (ja) * | 2015-09-24 | 2020-06-10 | エルジー・ケム・リミテッド | 化合物およびこれを含む有機発光素子 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3987037A (en) * | 1971-09-03 | 1976-10-19 | Minnesota Mining And Manufacturing Company | Chromophore-substituted vinyl-halomethyl-s-triazines |
| US4189323A (en) * | 1977-04-25 | 1980-02-19 | Hoechst Aktiengesellschaft | Radiation-sensitive copying composition |
| JPS5815503A (ja) * | 1981-07-20 | 1983-01-28 | Fuji Photo Film Co Ltd | 光重合性組成物 |
| US4895787A (en) * | 1988-07-18 | 1990-01-23 | Hoechst Celanese Corporation | Photopolymerizable positive working, peel developable, single sheet color proofing system |
| US5049476A (en) * | 1988-07-18 | 1991-09-17 | Hoechst Celanese Corporation | Photopolymerizable, positive working, peel developable, single sheet color proofing system |
| JPH0820734B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | 感光性組成物及びそれを用いた光重合性組成物 |
| JPH0820733B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | ドライフイルムレジスト用光重合性組成物 |
| US4935331A (en) * | 1988-10-21 | 1990-06-19 | Hoechst Celanese Corporation | Pigment transfer to photopolymerizable positive-working imaging system |
| US5362874A (en) * | 1991-03-15 | 1994-11-08 | Fuji Photo Film Co., Ltd. | Light-sensitive bistrihalomethyl-s-triazine compounds |
| US5294515A (en) * | 1991-05-17 | 1994-03-15 | Hoechst Celanese Corporation | Photopolymerizable, negative working, peel developable, single sheet color proofing system |
| US5298361A (en) * | 1991-08-30 | 1994-03-29 | Minnesota Mining And Manufacturing Company | Light-sensitive article containing migration-resistant halomethyl-1,3,5-triazine photoinitiator |
| DE4204950A1 (de) * | 1992-02-19 | 1993-09-09 | Hoechst Ag | Verfahren zur herstellung eines mehrfarbenbilds und lichtempfindliches material zur durchfuehrung dieses verfahrens |
| US5300399A (en) * | 1993-01-21 | 1994-04-05 | Hoechst Celanese Corporation | Negative working, peel developable, single sheet color proofing system having a crosslinked layer containing a polymer with phenolic moieties |
-
1992
- 1992-02-19 DE DE4204949A patent/DE4204949A1/de not_active Withdrawn
-
1993
- 1993-02-12 DE DE59309251T patent/DE59309251D1/de not_active Expired - Fee Related
- 1993-02-12 EP EP93102192A patent/EP0556731B1/de not_active Expired - Lifetime
- 1993-02-18 BR BR9300626A patent/BR9300626A/pt not_active Application Discontinuation
- 1993-02-18 JP JP5029401A patent/JPH0689024A/ja active Pending
- 1993-02-18 CA CA002089861A patent/CA2089861A1/en not_active Abandoned
- 1993-02-19 US US08/020,829 patent/US5725992A/en not_active Expired - Fee Related
-
1995
- 1995-05-09 US US08/437,928 patent/US5693449A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2089861A1 (en) | 1993-08-20 |
| JPH0689024A (ja) | 1994-03-29 |
| DE4204949A1 (de) | 1993-09-09 |
| EP0556731B1 (de) | 1998-12-30 |
| EP0556731A1 (de) | 1993-08-25 |
| US5693449A (en) | 1997-12-02 |
| DE59309251D1 (de) | 1999-02-11 |
| US5725992A (en) | 1998-03-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EE | Request for examination | ||
| FB36 | Technical and formal requirements: requirement - article 36 of industrial property law | ||
| FA8 | Dismissal: dismissal - article 36, par. 1 of industrial property law |