BR9610313A - Placas litográficas sem água. - Google Patents
Placas litográficas sem água.Info
- Publication number
- BR9610313A BR9610313A BR9610313-2A BR9610313A BR9610313A BR 9610313 A BR9610313 A BR 9610313A BR 9610313 A BR9610313 A BR 9610313A BR 9610313 A BR9610313 A BR 9610313A
- Authority
- BR
- Brazil
- Prior art keywords
- compounds
- pct
- water
- sec
- heating
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/06—Developable by an alkaline solution
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/16—Waterless working, i.e. ink repelling exposed (imaged) or non-exposed (non-imaged) areas, not requiring fountain solution or water, e.g. dry lithography or driography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
- B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
- B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Thermal Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Paper (AREA)
- Manufacture Or Reproduction Of Printing Formes (AREA)
- Materials For Photolithography (AREA)
- Heat Sensitive Colour Forming Recording (AREA)
Abstract
Patente de Invenção: <B>"PLACAS LITOGRáFICAS SEM áGUA"<D>. é descrito um método de preparação de uma placa litográfica sem água, o qual compreende um suporte tendo uma superfície oleofílica estando revestida sobre a superfície oleofílica uma mistura que compreende, como um dos componentes, um material de liberação repelente à água e repelente à tinta ou uma mistura de tais materiais, e como o outro componente essencial uma composição fotossensível insolúvel em água, a qual é tornada aquosa através da exposição à luz, ou uma composição insolúvel em água, a qual é tornada aquosa através da exposição ao calor, a proporção do material de liberação para a composição insolúvel em água na mistura sendo de 20 a 80 do material de liberação a 80 - 20 da composição insolúvel em água em peso, o tratamento de formação de imagem da mistura sobre o suporte, a revelação da mistura com uma solução alcalina aquosa, para tornar as áreas tratadas da composição insolúvel em água solúveis em água e para remover essa composição junto com o material de liberação e, dessa forma, a exposição da superfície oleofílica ao suporte nas áreas da placa tratadas e a manutenção do material de liberação e da composição insolúvel em água nas áreas não-tratadas da placa, assim, resultando em uma placa litografíca sem água de operação negativa.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB9516723.5A GB9516723D0 (en) | 1995-08-15 | 1995-08-15 | Water-less lithographic plates |
| PCT/GB1996/001973 WO1997007986A2 (en) | 1995-08-15 | 1996-08-13 | Water-less lithographic plates |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BR9610313A true BR9610313A (pt) | 2000-05-23 |
Family
ID=10779280
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BR9610313-2A BR9610313A (pt) | 1995-08-15 | 1996-08-13 | Placas litográficas sem água. |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US6130026A (pt) |
| EP (1) | EP0845115B1 (pt) |
| JP (1) | JPH11513131A (pt) |
| CN (1) | CN1196805A (pt) |
| AT (1) | ATE196953T1 (pt) |
| AU (1) | AU6747496A (pt) |
| BR (1) | BR9610313A (pt) |
| CA (1) | CA2226782A1 (pt) |
| DE (1) | DE69610639T2 (pt) |
| GB (1) | GB9516723D0 (pt) |
| WO (1) | WO1997007986A2 (pt) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3147908B2 (ja) | 1996-04-23 | 2001-03-19 | コダック ポリクローム グラフィックス カンパニー リミテッド | 感熱性組成物および該組成物を使用したリソグラフィックプリンティングフォームの作製方法 |
| JP3814961B2 (ja) | 1996-08-06 | 2006-08-30 | 三菱化学株式会社 | ポジ型感光性印刷版 |
| GB9713411D0 (en) | 1997-06-26 | 1997-08-27 | Horsell Graphic Ind Ltd | Waterless lithographic printing |
| EP1003645B1 (en) * | 1997-08-14 | 2003-09-24 | Kodak Polychrome Graphics Company Ltd. | Method of making electronic parts |
| EP0901902A3 (en) * | 1997-09-12 | 1999-03-24 | Fuji Photo Film Co., Ltd. | Positive photosensitive composition for use with an infrared laser |
| GB9719644D0 (en) * | 1997-09-17 | 1997-11-19 | Horsell Graphic Ind Ltd | Planographic printing |
| DE69836840T2 (de) | 1997-10-17 | 2007-10-11 | Fujifilm Corp. | Positiv arbeitendes photoempfindliches Aufzeichnungsmaterial für Infrarotlaser und positiv arbeitende Zusammensetzung für Infrarotlaser |
| GB9722862D0 (en) * | 1997-10-29 | 1997-12-24 | Horsell Graphic Ind Ltd | Pattern formation |
| US6399279B1 (en) | 1998-01-16 | 2002-06-04 | Mitsubishi Chemical Corporation | Method for forming a positive image |
| DE69925053T2 (de) | 1998-02-04 | 2006-03-02 | Mitsubishi Chemical Corp. | Positiv arbeitende lichtempfindliche Zusammensetzung, lichtempfindliche Druckplatte und Verfahren zur Herstellung eines positiven Bildes |
| GB9806478D0 (en) * | 1998-03-27 | 1998-05-27 | Horsell Graphic Ind Ltd | Pattern formation |
| US6352811B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6358669B1 (en) | 1998-06-23 | 2002-03-19 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6534238B1 (en) | 1998-06-23 | 2003-03-18 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| US6352812B1 (en) * | 1998-06-23 | 2002-03-05 | Kodak Polychrome Graphics Llc | Thermal digital lithographic printing plate |
| US6387591B1 (en) * | 1998-10-15 | 2002-05-14 | Agfa-Gevaert | Heat-mode driographic printing plate precursor |
| US6461794B1 (en) * | 1999-08-11 | 2002-10-08 | Kodak Polychrome Graphics Llc | Lithographic printing forms |
| US6555291B1 (en) | 2000-08-14 | 2003-04-29 | Kodak Polychrome Graphics, Llc | Thermal digital lithographic printing plate |
| DE10125794B4 (de) * | 2001-05-26 | 2005-03-24 | Sator Laser Gmbh | Verfahren zum Markieren oder Beschriften von Metallteilen |
| US6881533B2 (en) * | 2003-02-18 | 2005-04-19 | Kodak Polychrome Graphics Llc | Flexographic printing plate with ink-repellent non-image areas |
| US20040214108A1 (en) * | 2003-04-25 | 2004-10-28 | Ray Kevin B. | Ionic liquids as dissolution inhibitors in imageable elements |
| JP4458984B2 (ja) * | 2004-08-16 | 2010-04-28 | 富士フイルム株式会社 | 平版印刷版原版 |
| CN1896870B (zh) * | 2005-07-15 | 2010-12-01 | 乐凯集团第二胶片厂 | 适合于高车速涂布且无表观弊病的阳图ps版感光涂布液 |
| US7838195B2 (en) * | 2006-06-08 | 2010-11-23 | E. I. Du Pont De Nemours And Company | Planar test substrate for non-contact printing |
| KR20100094475A (ko) | 2007-10-26 | 2010-08-26 | 이 아이 듀폰 디 네모아 앤드 캄파니 | 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자 |
| US8541162B2 (en) * | 2010-09-01 | 2013-09-24 | E I Du Pont De Nemours And Company | High resolution, solvent resistant, thin elastomeric printing plates |
| US8563220B2 (en) * | 2010-09-01 | 2013-10-22 | E I Du Pont De Nemours And Company | High resolution, solvent resistant, thin elastomeric printing plates |
| CN105818562B (zh) * | 2015-01-05 | 2018-06-15 | 中国科学院化学研究所 | 一种水性油墨用版材及其制备方法 |
Family Cites Families (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2207495A1 (de) * | 1971-02-20 | 1972-08-24 | Dainippon Printing Co Ltd | Flachdruckplatten und Verfahren zu ihrer Herstellung |
| JPS4968803A (pt) * | 1972-11-02 | 1974-07-03 | ||
| US3901700A (en) * | 1973-05-17 | 1975-08-26 | Eastman Kodak Co | Repellent compositions of fluorinated polymers and oils in electrophotographic processes |
| US4087584A (en) * | 1975-10-31 | 1978-05-02 | Ricoh Co., Ltd. | Lithographic printing plate |
| EP0044220B1 (en) * | 1980-07-14 | 1985-04-24 | Toray Industries, Inc. | Dry planographic printing plate for direct printing |
| JPS589146A (ja) * | 1981-07-09 | 1983-01-19 | Nippon Paint Co Ltd | 水不要平版用版材 |
| US4510277A (en) * | 1983-11-03 | 1985-04-09 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Process for improving moisture resistance of epoxy resins by addition of chromium ions |
| DE3421471A1 (de) * | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Perfluoralkylgruppen aufweisende 1,2-naphthochinondiazidverbindungen und reproduktionsmaterialien, die diese verbindungen enthalten |
| DE3421448A1 (de) * | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Perfluoralkylgruppen aufweisende polymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck |
| DE3421526A1 (de) * | 1984-06-08 | 1985-12-12 | Hoechst Ag, 6230 Frankfurt | Perfluoralkylgruppen aufweisende copolymere, sie enthaltende reproduktionsschichten und deren verwendung fuer den wasserlosen offsetdruck |
| US4708925A (en) * | 1984-12-11 | 1987-11-24 | Minnesota Mining And Manufacturing Company | Photosolubilizable compositions containing novolac phenolic resin |
| US4617057A (en) * | 1985-06-04 | 1986-10-14 | Dow Corning Corporation | Oil and water repellent coating compositions |
| JP2520686B2 (ja) * | 1988-03-18 | 1996-07-31 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷板 |
| CA1336929C (en) * | 1988-06-28 | 1995-09-05 | Kansai Paint Co., Ltd. | Water-repellent film-forming composition |
| JPH0820734B2 (ja) * | 1988-08-11 | 1996-03-04 | 富士写真フイルム株式会社 | 感光性組成物及びそれを用いた光重合性組成物 |
| JP2648969B2 (ja) * | 1989-07-28 | 1997-09-03 | 富士写真フイルム株式会社 | 感光性組成物 |
| JP2532291B2 (ja) * | 1989-10-30 | 1996-09-11 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| JP2596850B2 (ja) * | 1990-07-09 | 1997-04-02 | 富士写真フイルム株式会社 | 湿し水不要感光性平版印刷版 |
| US5279917A (en) * | 1991-05-09 | 1994-01-18 | Konica Corporation | Light-sensitive composition comprising a fluorine copolymer surfactant |
| GB9122576D0 (en) * | 1991-10-24 | 1991-12-04 | Hercules Inc | Photopolymer resins with reduced plugging characteristics |
| DE4207264B4 (de) * | 1992-03-07 | 2005-07-28 | Clariant Gmbh | Negativ arbeitendes strahlungsempfindliches Gemisch und damit hergestelltes Aufzeichnungsmaterial |
| JPH05257269A (ja) * | 1992-03-12 | 1993-10-08 | Fuji Photo Film Co Ltd | 湿し水不要感光性平版印刷版の製造方法 |
| US5378580A (en) * | 1992-06-05 | 1995-01-03 | Agfa-Gevaert, N.V. | Heat mode recording material and method for producing driographic printing plates |
| US5713287A (en) * | 1995-05-11 | 1998-02-03 | Creo Products Inc. | Direct-to-Press imaging method using surface modification of a single layer coating |
| JP3147908B2 (ja) | 1996-04-23 | 2001-03-19 | コダック ポリクローム グラフィックス カンパニー リミテッド | 感熱性組成物および該組成物を使用したリソグラフィックプリンティングフォームの作製方法 |
| US5968709A (en) * | 1996-09-18 | 1999-10-19 | Agfa-Gevaert, N.V. | Heat mode recording material and method for producing driographic printing plates |
| US5858626A (en) * | 1996-09-30 | 1999-01-12 | Kodak Polychrome Graphics | Method of forming a positive image through infrared exposure utilizing diazonaphthoquinone imaging composition |
-
1995
- 1995-08-15 GB GBGB9516723.5A patent/GB9516723D0/en active Pending
-
1996
- 1996-08-13 EP EP96927770A patent/EP0845115B1/en not_active Expired - Lifetime
- 1996-08-13 CA CA002226782A patent/CA2226782A1/en not_active Abandoned
- 1996-08-13 CN CN96197027A patent/CN1196805A/zh active Pending
- 1996-08-13 DE DE69610639T patent/DE69610639T2/de not_active Expired - Fee Related
- 1996-08-13 AT AT96927770T patent/ATE196953T1/de not_active IP Right Cessation
- 1996-08-13 AU AU67474/96A patent/AU6747496A/en not_active Abandoned
- 1996-08-13 WO PCT/GB1996/001973 patent/WO1997007986A2/en not_active Ceased
- 1996-08-13 JP JP9509937A patent/JPH11513131A/ja not_active Ceased
- 1996-08-13 BR BR9610313-2A patent/BR9610313A/pt not_active Application Discontinuation
- 1996-08-13 US US09/011,590 patent/US6130026A/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| US6130026A (en) | 2000-10-10 |
| WO1997007986A2 (en) | 1997-03-06 |
| ATE196953T1 (de) | 2000-10-15 |
| EP0845115B1 (en) | 2000-10-11 |
| DE69610639T2 (de) | 2001-05-03 |
| JPH11513131A (ja) | 1999-11-09 |
| WO1997007986A3 (en) | 2001-09-13 |
| EP0845115A2 (en) | 1998-06-03 |
| DE69610639D1 (de) | 2000-11-16 |
| CN1196805A (zh) | 1998-10-21 |
| GB9516723D0 (en) | 1995-10-18 |
| CA2226782A1 (en) | 1997-03-06 |
| AU6747496A (en) | 1997-03-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FA10 | Dismissal: dismissal - article 33 of industrial property law |