BRPI0414904A - método melhorado para tratamento de microdesbaste de circuito de cobre e de metal misto - Google Patents

método melhorado para tratamento de microdesbaste de circuito de cobre e de metal misto

Info

Publication number
BRPI0414904A
BRPI0414904A BRPI0414904-1A BRPI0414904A BRPI0414904A BR PI0414904 A BRPI0414904 A BR PI0414904A BR PI0414904 A BRPI0414904 A BR PI0414904A BR PI0414904 A BRPI0414904 A BR PI0414904A
Authority
BR
Brazil
Prior art keywords
copper
improved method
mixed metal
metal circuit
micro
Prior art date
Application number
BRPI0414904-1A
Other languages
English (en)
Inventor
Harry Fuerhaupter
David Thomas Baron
Kuldip Singh Johal
Patrick Paul Brooks
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of BRPI0414904A publication Critical patent/BRPI0414904A/pt

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/10Etching compositions
    • C23F1/14Aqueous compositions
    • C23F1/16Acidic compositions
    • C23F1/18Acidic compositions for etching copper or alloys thereof
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/383Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03Conductive materials
    • H05K2201/0332Structure of the conductor
    • H05K2201/0335Layered conductors or foils
    • H05K2201/0338Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/06Thermal details
    • H05K2201/068Thermal details wherein the coefficient of thermal expansion is important
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/12Using specific substances
    • H05K2203/122Organic non-polymeric compounds, e.g. oil, wax or thiol
    • H05K2203/124Heterocyclic organic compounds, e.g. azole, furan
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • H05K3/064Photoresists
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4611Manufacturing multilayer circuits by laminating two or more circuit boards
    • H05K3/4641Manufacturing multilayer circuits by laminating two or more circuit boards having integrally laminated metal sheets or special power cores

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • ing And Chemical Polishing (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)
  • Chemically Coating (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)

Abstract

"MéTODO MELHORADO PARA TRATAMENTO DE MICRODESBASTE DE CIRCUITO DE COBRE E DE METAL MISTO". Processo para melhoria da adesão de materiais dielétricos a uma camada de metal, incluindo a provisão de uma camada de metal não-padronizada tendo uma primeira superfície principal, o microdesbaste da primeira superfície principal para a formação de uma superfície microdesbastada; e o ataque químico da camada de metal para a formação de um padrão de circuito na camada de metal, no qual o microdesbaste é realizado antes do ataque químico.
BRPI0414904-1A 2003-09-30 2004-09-27 método melhorado para tratamento de microdesbaste de circuito de cobre e de metal misto BRPI0414904A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/675,019 US20050067378A1 (en) 2003-09-30 2003-09-30 Method for micro-roughening treatment of copper and mixed-metal circuitry
PCT/US2004/031697 WO2005034596A2 (en) 2003-09-30 2004-09-27 Improved method for micro-roughening treatment of copper and mixed-metal circuitry

Publications (1)

Publication Number Publication Date
BRPI0414904A true BRPI0414904A (pt) 2006-11-07

Family

ID=34377021

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0414904-1A BRPI0414904A (pt) 2003-09-30 2004-09-27 método melhorado para tratamento de microdesbaste de circuito de cobre e de metal misto

Country Status (12)

Country Link
US (1) US20050067378A1 (pt)
EP (1) EP1668967B1 (pt)
JP (1) JP4629048B2 (pt)
KR (1) KR101177145B1 (pt)
CN (1) CN100594763C (pt)
AT (1) ATE447837T1 (pt)
BR (1) BRPI0414904A (pt)
CA (1) CA2536836A1 (pt)
DE (1) DE602004023958D1 (pt)
MY (1) MY147004A (pt)
TW (1) TWI347232B (pt)
WO (1) WO2005034596A2 (pt)

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Also Published As

Publication number Publication date
KR20060092225A (ko) 2006-08-22
DE602004023958D1 (de) 2009-12-17
MY147004A (en) 2012-10-15
WO2005034596A3 (en) 2005-06-16
TWI347232B (en) 2011-08-21
TW200514627A (en) 2005-05-01
ATE447837T1 (de) 2009-11-15
KR101177145B1 (ko) 2012-09-07
EP1668967B1 (en) 2009-11-04
EP1668967A2 (en) 2006-06-14
WO2005034596B1 (en) 2005-09-15
CA2536836A1 (en) 2005-04-14
US20050067378A1 (en) 2005-03-31
JP2007507616A (ja) 2007-03-29
JP4629048B2 (ja) 2011-02-09
CN1860832A (zh) 2006-11-08
WO2005034596A2 (en) 2005-04-14
CN100594763C (zh) 2010-03-17

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B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

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B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2158 DE 15/05/2012.