BRPI0510823A - método para depositar um revestimento de óxido metálico e artigo - Google Patents

método para depositar um revestimento de óxido metálico e artigo

Info

Publication number
BRPI0510823A
BRPI0510823A BRPI0510823-3A BRPI0510823A BRPI0510823A BR PI0510823 A BRPI0510823 A BR PI0510823A BR PI0510823 A BRPI0510823 A BR PI0510823A BR PI0510823 A BRPI0510823 A BR PI0510823A
Authority
BR
Brazil
Prior art keywords
metal oxide
oxide coating
depositing
article
substrate
Prior art date
Application number
BRPI0510823-3A
Other languages
English (en)
Inventor
Dmitry P Dinega
Christopher M Weikart
Original Assignee
Dow Global Technologies
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Global Technologies filed Critical Dow Global Technologies
Publication of BRPI0510823A publication Critical patent/BRPI0510823A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/405—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Laminated Bodies (AREA)

Abstract

MéTODO PARA DEPOSITAR UM REVESTIMENTO DE óXIDO METáLICO E ARTIGO. Um revestimento de óxido metálico pode ser aplicado a um substrato (60) a uma temperatura relativamente baixa e a uma pressão próxima da atmosférica carregando um precursor de óxido metálico (10) e um agente oxidante através de uma descarga carona (40) ou uma descarga por barreira dielétrica para formar o óxido metálico e depositá-lo sobre o substrato.
BRPI0510823-3A 2004-05-20 2005-05-20 método para depositar um revestimento de óxido metálico e artigo BRPI0510823A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US57281304P 2004-05-20 2004-05-20
PCT/US2005/017747 WO2005113856A1 (en) 2004-05-20 2005-05-20 Plasma enhanced chemical vapor deposition of metal oxide

Publications (1)

Publication Number Publication Date
BRPI0510823A true BRPI0510823A (pt) 2007-12-26

Family

ID=34970263

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0510823-3A BRPI0510823A (pt) 2004-05-20 2005-05-20 método para depositar um revestimento de óxido metálico e artigo

Country Status (10)

Country Link
EP (1) EP1756329A1 (pt)
JP (1) JP2007538159A (pt)
KR (1) KR20070012718A (pt)
CN (1) CN1957109A (pt)
BR (1) BRPI0510823A (pt)
CA (1) CA2562914A1 (pt)
MX (1) MXPA06013380A (pt)
RU (1) RU2006145309A (pt)
SG (1) SG151324A1 (pt)
WO (1) WO2005113856A1 (pt)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7736698B2 (en) * 2006-05-05 2010-06-15 Pilkington Group Limited Method of depositing zinc oxide coatings on a substrate
WO2008137588A1 (en) * 2007-05-01 2008-11-13 Exatec, Llc Edge healing and field repair of plasma coating
DE102007025151A1 (de) * 2007-05-29 2008-09-04 Innovent E.V. Verfahren zum Beschichten eines Substrats
EP2145978A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur un substrat
EP2145979A1 (fr) 2008-07-16 2010-01-20 AGC Flat Glass Europe SA Procédé et installation pour le dépôt de couches sur les deux faces d'un substrat de façon simultanée
ES2335638B1 (es) * 2008-08-01 2011-02-09 Cosentino, S.A. Articulo en forma de tabla o losa fabricado de aglomerado petreo recubierto con laminas delgadas transparentes de tio2 o zno mediante tecnicas de deposicion en via seca con alta resistencia frente a la degradacion solar.
JP2010250088A (ja) * 2009-04-16 2010-11-04 Konica Minolta Business Technologies Inc 中間転写体、中間転写体の製造方法、及び画像形成装置
KR101133250B1 (ko) * 2009-09-29 2012-04-05 부산대학교 산학협력단 상압 플라즈마 표면처리된 폴리머 기판을 이용한 투명전극의 제조방법
DE102012003943B4 (de) * 2012-02-24 2017-09-14 Innovent E.V. Technologieentwicklung Verfahren zur Herstellung antibakterieller Nanoschichten auf Fäden oder textilen Materialien in Form von Gewebe, Gewirke oder Vlies, nach diesem Verfahren hergestelltes Erzeugnis und dessen Verwendung
DE102014118487A1 (de) * 2014-12-12 2016-06-16 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Abscheiden eines transparenten Mehrschichtsystems mit Kratzschutzeigenschaften
KR20250122490A (ko) 2022-12-14 2025-08-13 바스프 코팅스 게엠베하 다층 배리어 필름 코팅된 중합체 기판, 그의 제조 및 전자 장치에서의 용도
WO2026027436A1 (en) 2024-07-30 2026-02-05 Basf Coatings Gmbh Use of lithium containing compounds in vapor deposition and precursors for vapor deposition
EP4687175A1 (en) 2024-07-30 2026-02-04 BASF Coatings GmbH Multilayer film coated lithium substrate, its manufacture and use in secondary batteries

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6457767A (en) * 1987-08-28 1989-03-06 Seiko Epson Corp Josephson effect element
JPH07506850A (ja) * 1991-12-23 1995-07-27 アクゾ　ノーベル　ナムローゼ　フェンノートシャップ ポリエチレンテレフタレートマトリックス及びサーモトロピック液晶ブロックコポリマーのブレンド
JP4024546B2 (ja) * 2002-01-25 2007-12-19 住友ベークライト株式会社 無機薄膜付きフィルムの製造方法
GB0217553D0 (en) * 2002-07-30 2002-09-11 Sheel David W Titania coatings by CVD at atmospheric pressure

Also Published As

Publication number Publication date
CA2562914A1 (en) 2005-12-01
EP1756329A1 (en) 2007-02-28
MXPA06013380A (es) 2007-01-23
KR20070012718A (ko) 2007-01-26
WO2005113856A1 (en) 2005-12-01
JP2007538159A (ja) 2007-12-27
SG151324A1 (en) 2009-04-30
CN1957109A (zh) 2007-05-02
RU2006145309A (ru) 2008-06-27

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Legal Events

Date Code Title Description
B11A Dismissal acc. art.33 of ipl - examination not requested within 36 months of filing
B11Y Definitive dismissal - extension of time limit for request of examination expired [chapter 11.1.1 patent gazette]