BRPI0809194A2 - Método para revestir um substrato e equipamento para deposição a vácuo de liga metálica - Google Patents

Método para revestir um substrato e equipamento para deposição a vácuo de liga metálica

Info

Publication number
BRPI0809194A2
BRPI0809194A2 BRPI0809194-3A2A BRPI0809194A BRPI0809194A2 BR PI0809194 A2 BRPI0809194 A2 BR PI0809194A2 BR PI0809194 A BRPI0809194 A BR PI0809194A BR PI0809194 A2 BRPI0809194 A2 BR PI0809194A2
Authority
BR
Brazil
Prior art keywords
coating
equipment
metallic alloy
vacuum substrate
alloy vacuum
Prior art date
Application number
BRPI0809194-3A2A
Other languages
English (en)
Inventor
Patrick Choquet
Eric Silberberg
Bruno Schmitz
Daniel Chaleix
Original Assignee
Arcelormittal France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=38370938&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BRPI0809194(A2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Arcelormittal France filed Critical Arcelormittal France
Publication of BRPI0809194A2 publication Critical patent/BRPI0809194A2/pt
Publication of BRPI0809194B1 publication Critical patent/BRPI0809194B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
BRPI0809194A 2007-03-20 2008-03-19 processo para revestimento de um substrato e equipamento de deposição a vácuo BRPI0809194B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07290342A EP1972699A1 (fr) 2007-03-20 2007-03-20 Procede de revetement d'un substrat et installation de depot sous vide d'alliage metallique
PCT/FR2008/000347 WO2008142222A1 (fr) 2007-03-20 2008-03-19 Procédé de revêtement d'un substrat et installation de dépôt sous vide d'alliage métallique

Publications (2)

Publication Number Publication Date
BRPI0809194A2 true BRPI0809194A2 (pt) 2014-09-23
BRPI0809194B1 BRPI0809194B1 (pt) 2018-12-04

Family

ID=38370938

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0809194A BRPI0809194B1 (pt) 2007-03-20 2008-03-19 processo para revestimento de um substrato e equipamento de deposição a vácuo

Country Status (16)

Country Link
US (3) US8481120B2 (pt)
EP (2) EP1972699A1 (pt)
JP (1) JP5873621B2 (pt)
KR (1) KR101453583B1 (pt)
CN (1) CN101680080B (pt)
BR (1) BRPI0809194B1 (pt)
CA (1) CA2681329C (pt)
ES (1) ES2599364T3 (pt)
HU (1) HUE031482T2 (pt)
MA (1) MA31417B1 (pt)
MX (1) MX2009009914A (pt)
PL (1) PL2129810T3 (pt)
RU (1) RU2456372C2 (pt)
UA (1) UA99280C2 (pt)
WO (1) WO2008142222A1 (pt)
ZA (1) ZA200906306B (pt)

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KR101639811B1 (ko) * 2009-09-28 2016-07-15 주식회사 포스코 용융금속 공급장치
KR101639813B1 (ko) * 2009-10-08 2016-07-15 주식회사 포스코 연속 코팅 장치
CN103249860B (zh) 2010-12-13 2016-03-16 Posco公司 连续涂布设备
AU2012206581B2 (en) * 2011-01-14 2017-03-30 Arcelormittal Investigacion Y Desarrollo Automatic feeding device for an industrial metal-vapor generator
WO2013091889A1 (en) 2011-12-23 2013-06-27 Tata Steel Nederland Technology Bv Substrate with a double layered coating
US8778081B2 (en) 2012-01-04 2014-07-15 Colorado State University Research Foundation Process and hardware for deposition of complex thin-film alloys over large areas
AU2013242397B2 (en) * 2012-03-30 2017-06-15 Posco Method and apparatus for feeding liquid metal to an evaporator device
KR101439694B1 (ko) 2012-12-26 2014-09-12 주식회사 포스코 Zn-Mg 합금도금강판 및 그의 제조방법
KR102111020B1 (ko) * 2013-05-02 2020-05-15 삼성디스플레이 주식회사 증착 장치
UA117592C2 (uk) 2013-08-01 2018-08-27 Арселорміттал Пофарбований оцинкований сталевий лист та спосіб його виготовлення
UA116262C2 (uk) * 2013-08-01 2018-02-26 Арселорміттал Сталевий лист з цинковим покриттям
EP3066229B1 (en) * 2013-11-05 2020-08-26 Tata Steel Nederland Technology B.V. Method for controlling the composition of liquid metal in an evaporator device
EP3155140B1 (en) * 2014-06-11 2018-03-21 Tata Steel Nederland Technology B.V. Valve for high temperature liquid
KR102392869B1 (ko) * 2016-05-03 2022-04-29 타타 스틸 네덜란드 테크날러지 베.뷔. 전자기 펌프의 온도를 제어하기 위한 방법
WO2018020296A1 (en) 2016-07-27 2018-02-01 Arcelormittal Apparatus and method for vacuum deposition
CN110114501B (zh) 2016-12-26 2022-02-08 Posco公司 点焊性及耐腐蚀性优异的多层镀锌合金钢材
KR101940885B1 (ko) 2016-12-26 2019-01-21 주식회사 포스코 점용접성 및 내식성이 우수한 단층 아연합금도금강재 및 그 제조방법
WO2019043422A1 (en) * 2017-08-30 2019-03-07 Arcelormittal COATED METALLIC SUBSTRATE
WO2019043424A1 (en) * 2017-08-30 2019-03-07 Arcelormittal COATED METALLIC SUBSTRATE
WO2019116082A1 (en) * 2017-12-14 2019-06-20 Arcelormittal Vacuum deposition facility and method for coating a substrate
KR102109242B1 (ko) 2017-12-26 2020-05-11 주식회사 포스코 점용접성 및 내식성이 우수한 다층 아연합금도금강재
WO2019239185A1 (en) 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019239186A1 (en) * 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
WO2019239184A1 (en) * 2018-06-13 2019-12-19 Arcelormittal Vacuum deposition facility and method for coating a substrate
RU185096U1 (ru) * 2018-08-09 2018-11-21 Акционерное общество "Новосибирский приборостроительный завод" Устройство для измерения спектров отражения слоев многослойного покрытия в процессе их напыления
JP2019060021A (ja) * 2018-11-09 2019-04-18 アルセロルミタル・インベステイガシオン・イ・デサロジヨ・エセ・エレ 亜鉛コーティングを備えた塗装鋼板
WO2020109849A1 (en) 2018-11-30 2020-06-04 Arcelormittal Wire injection
CN112575294B (zh) * 2019-09-29 2023-02-10 宝山钢铁股份有限公司 一种具有双隔板的真空镀膜装置
CN113564534B (zh) * 2020-04-28 2023-05-09 宝山钢铁股份有限公司 一种真空镀机组镀液连续供给装置及其供给方法
CN113368522B (zh) * 2021-07-02 2022-12-23 上海大学 一种铟的真空蒸馏装置和蒸馏方法
KR102559972B1 (ko) 2021-07-21 2023-07-27 한국생산기술연구원 바나듐이 첨가된 고온 저마찰 특성 다성분계 박막 및 이의 제조방법
DE102021127116A1 (de) * 2021-10-19 2023-04-20 Thyssenkrupp Steel Europe Ag Verfahren zur Beschichtung eines Stahlflachproduktes mit geringer Lackkrateranfälligkeit

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Also Published As

Publication number Publication date
JP2010522272A (ja) 2010-07-01
KR20090122247A (ko) 2009-11-26
CA2681329C (fr) 2012-05-22
US20130239890A1 (en) 2013-09-19
MX2009009914A (es) 2009-10-20
JP5873621B2 (ja) 2016-03-01
ZA200906306B (en) 2010-05-26
CN101680080A (zh) 2010-03-24
US20180112305A1 (en) 2018-04-26
CA2681329A1 (fr) 2008-11-27
PL2129810T3 (pl) 2017-08-31
EP2129810B1 (fr) 2016-07-20
UA99280C2 (ru) 2012-08-10
RU2009138469A (ru) 2011-04-27
ES2599364T3 (es) 2017-02-01
EP2129810A1 (fr) 2009-12-09
HUE031482T2 (en) 2017-07-28
WO2008142222A1 (fr) 2008-11-27
CN101680080B (zh) 2012-07-11
BRPI0809194B1 (pt) 2018-12-04
MA31417B1 (fr) 2010-06-01
RU2456372C2 (ru) 2012-07-20
US8481120B2 (en) 2013-07-09
KR101453583B1 (ko) 2014-11-03
US20100104752A1 (en) 2010-04-29
EP1972699A1 (fr) 2008-09-24

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Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 04/12/2018, OBSERVADAS AS CONDICOES LEGAIS.