BRPI0818917A2 - revestimento de óxido condutivo transparente para aplicações fotovolticas de película delgada e métodos de produção dos mesmos - Google Patents
revestimento de óxido condutivo transparente para aplicações fotovolticas de película delgada e métodos de produção dos mesmosInfo
- Publication number
- BRPI0818917A2 BRPI0818917A2 BRPI0818917A BRPI0818917A BRPI0818917A2 BR PI0818917 A2 BRPI0818917 A2 BR PI0818917A2 BR PI0818917 A BRPI0818917 A BR PI0818917A BR PI0818917 A BRPI0818917 A BR PI0818917A BR PI0818917 A2 BRPI0818917 A2 BR PI0818917A2
- Authority
- BR
- Brazil
- Prior art keywords
- thin film
- transparent conductive
- conductive oxide
- production methods
- oxide coating
- Prior art date
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3423—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings comprising a suboxide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/407—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/138—Manufacture of transparent electrodes, e.g. transparent conductive oxides [TCO] or indium tin oxide [ITO] electrodes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/90—Other aspects of coatings
- C03C2217/94—Transparent conductive oxide layers [TCO] being part of a multilayer coating
- C03C2217/948—Layers comprising indium tin oxide [ITO]
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/32—After-treatment
- C03C2218/324—De-oxidation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Inorganic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Chemical Vapour Deposition (AREA)
- Manufacturing Of Electric Cables (AREA)
- Photovoltaic Devices (AREA)
- Non-Insulated Conductors (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US99614407P | 2007-11-02 | 2007-11-02 | |
| PCT/US2008/012409 WO2009058385A1 (en) | 2007-11-02 | 2008-11-03 | Transparent conductive oxide coating for thin film photovoltaic applications and methods of making the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| BRPI0818917A2 true BRPI0818917A2 (pt) | 2017-05-16 |
Family
ID=40279714
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| BRPI0818917A BRPI0818917A2 (pt) | 2007-11-02 | 2008-11-03 | revestimento de óxido condutivo transparente para aplicações fotovolticas de película delgada e métodos de produção dos mesmos |
Country Status (20)
| Country | Link |
|---|---|
| US (1) | US9181124B2 (pt) |
| EP (1) | EP2217542A1 (pt) |
| JP (2) | JP2011504293A (pt) |
| KR (1) | KR101567615B1 (pt) |
| CN (1) | CN101980986B (pt) |
| AR (1) | AR069169A1 (pt) |
| AU (1) | AU2008319304B2 (pt) |
| BR (1) | BRPI0818917A2 (pt) |
| CA (1) | CA2704389A1 (pt) |
| CL (1) | CL2008003281A1 (pt) |
| IL (1) | IL205443A (pt) |
| MA (1) | MA31896B1 (pt) |
| MX (1) | MX2010004936A (pt) |
| MY (1) | MY162545A (pt) |
| RU (1) | RU2010122049A (pt) |
| SG (1) | SG10201402245VA (pt) |
| TN (1) | TN2010000195A1 (pt) |
| TW (2) | TWI533334B (pt) |
| WO (1) | WO2009058385A1 (pt) |
| ZA (1) | ZA201003879B (pt) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| MA33196B1 (fr) * | 2009-03-18 | 2012-04-02 | Agc Flat Glass Na Inc | Revêtement en film mince et son procédé de fabrication |
| DE102009033417C5 (de) | 2009-04-09 | 2022-10-06 | Interpane Entwicklungs-Und Beratungsgesellschaft Mbh | Verfahren und Anlage zur Herstellung eines beschichteten Gegenstands mittels Tempern |
| KR101082609B1 (ko) | 2009-10-16 | 2011-11-15 | 엘지이노텍 주식회사 | 터치패널용 면상 부재 및 이의 제조 방법 |
| DE102009050234A1 (de) * | 2009-10-21 | 2011-05-05 | Von Ardenne Anlagentechnik Gmbh | Verfahren zur Beschichtung eines Substrats mit einer TCO-Schicht und Dünnschichtsolarzelle |
| US20110094577A1 (en) * | 2009-10-28 | 2011-04-28 | Dilip Kumar Chatterjee | Conductive metal oxide films and photovoltaic devices |
| FR2956659B1 (fr) * | 2010-02-22 | 2014-10-10 | Saint Gobain | Substrat verrier revetu de couches a tenue mecanique amelioree |
| BE1019690A3 (fr) * | 2010-06-24 | 2012-10-02 | Agc Glass Europe | Vitrage isolant. |
| CN101887920A (zh) * | 2010-06-25 | 2010-11-17 | 蚌埠玻璃工业设计研究院 | 太阳能电池透明导电膜玻璃及其生产方法 |
| US8460765B2 (en) * | 2010-06-29 | 2013-06-11 | Primestar Solar, Inc. | Methods for forming selectively deposited thin films |
| US8525019B2 (en) * | 2010-07-01 | 2013-09-03 | Primestar Solar, Inc. | Thin film article and method for forming a reduced conductive area in transparent conductive films for photovoltaic modules |
| EP2447999A1 (en) | 2010-10-29 | 2012-05-02 | Applied Materials, Inc. | Method for depositing a thin film electrode and thin film stack |
| BE1019881A3 (fr) * | 2011-03-16 | 2013-02-05 | Agc Glass Europe | Vitrage isolant. |
| MX342762B (es) * | 2013-02-27 | 2016-10-12 | Basell Polyolefine Gmbh | Procesos de polietileno y sus composiciones. |
| EP3001428B1 (en) | 2013-05-23 | 2019-08-07 | Lintec Corporation | Conductive film and electronic device having conductive film |
| KR102090553B1 (ko) * | 2014-09-12 | 2020-03-19 | 홍콩 뱁티스트 유니버시티 | 사파이어 박막 코팅된 가요성 기판 |
| CN105619963A (zh) * | 2014-10-27 | 2016-06-01 | 河南安彩高科股份有限公司 | 一种低辐射镀膜玻璃 |
| US10571248B2 (en) * | 2017-01-09 | 2020-02-25 | Kla-Tencor Corporation | Transparent film error correction pattern in wafer geometry system |
| CN109182971B (zh) * | 2018-07-11 | 2020-02-07 | 南开大学 | 一种利用反应等离子沉积技术生长宽光谱mgzo-tco薄膜的方法及应用 |
| RU2686790C1 (ru) * | 2018-07-18 | 2019-04-30 | федеральное государственное бюджетное образовательное учреждение высшего образования "Белгородский государственный технологический университет им. В.Г. Шухова" | Способ иризации сортовой посуды из стекла |
| GB2582886B (en) * | 2018-10-08 | 2023-03-29 | Pilkington Group Ltd | Process for preparing a coated glass substrate |
| CN110981215B (zh) * | 2019-12-23 | 2021-06-22 | 厦门大学 | 一种提高铝掺杂氧化锌导电玻璃热稳定性的方法 |
| JP7143919B1 (ja) * | 2021-05-07 | 2022-09-29 | Agc株式会社 | 透明導電膜付きガラス基板及びその製造方法 |
| WO2023059510A1 (en) * | 2021-10-08 | 2023-04-13 | Applied Materials, Inc. | Integrated preclean-deposition system for optical films |
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-
2008
- 2008-11-03 TW TW103126649A patent/TWI533334B/zh not_active IP Right Cessation
- 2008-11-03 WO PCT/US2008/012409 patent/WO2009058385A1/en not_active Ceased
- 2008-11-03 EP EP08844315A patent/EP2217542A1/en not_active Withdrawn
- 2008-11-03 CA CA2704389A patent/CA2704389A1/en not_active Abandoned
- 2008-11-03 RU RU2010122049/03A patent/RU2010122049A/ru unknown
- 2008-11-03 TW TW097142396A patent/TWI453173B/zh not_active IP Right Cessation
- 2008-11-03 US US12/263,648 patent/US9181124B2/en not_active Expired - Fee Related
- 2008-11-03 SG SG10201402245VA patent/SG10201402245VA/en unknown
- 2008-11-03 MY MYPI2010001965A patent/MY162545A/en unknown
- 2008-11-03 CL CL2008003281A patent/CL2008003281A1/es unknown
- 2008-11-03 CN CN200880123892.7A patent/CN101980986B/zh not_active Expired - Fee Related
- 2008-11-03 AR ARP080104807A patent/AR069169A1/es not_active Application Discontinuation
- 2008-11-03 BR BRPI0818917A patent/BRPI0818917A2/pt not_active IP Right Cessation
- 2008-11-03 KR KR1020107012120A patent/KR101567615B1/ko not_active Expired - Fee Related
- 2008-11-03 MX MX2010004936A patent/MX2010004936A/es active IP Right Grant
- 2008-11-03 AU AU2008319304A patent/AU2008319304B2/en not_active Ceased
- 2008-11-03 JP JP2010532067A patent/JP2011504293A/ja active Pending
-
2010
- 2010-04-29 TN TN2010000195A patent/TN2010000195A1/fr unknown
- 2010-04-29 IL IL205443A patent/IL205443A/en not_active IP Right Cessation
- 2010-05-31 ZA ZA2010/03879A patent/ZA201003879B/en unknown
- 2010-06-01 MA MA32885A patent/MA31896B1/fr unknown
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2014
- 2014-10-03 JP JP2014204772A patent/JP5960221B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP5960221B2 (ja) | 2016-08-02 |
| MA31896B1 (fr) | 2010-12-01 |
| TN2010000195A1 (en) | 2011-11-11 |
| WO2009058385A1 (en) | 2009-05-07 |
| RU2010122049A (ru) | 2011-12-10 |
| SG10201402245VA (en) | 2014-08-28 |
| AU2008319304A1 (en) | 2009-05-07 |
| EP2217542A1 (en) | 2010-08-18 |
| KR101567615B1 (ko) | 2015-11-09 |
| US9181124B2 (en) | 2015-11-10 |
| TWI533334B (zh) | 2016-05-11 |
| CL2008003281A1 (es) | 2009-10-16 |
| AU2008319304B2 (en) | 2014-02-06 |
| AR069169A1 (es) | 2010-01-06 |
| MX2010004936A (es) | 2010-12-21 |
| CN101980986A (zh) | 2011-02-23 |
| JP2011504293A (ja) | 2011-02-03 |
| IL205443A (en) | 2014-11-30 |
| US20090120496A1 (en) | 2009-05-14 |
| CA2704389A1 (en) | 2009-05-07 |
| ZA201003879B (en) | 2011-03-30 |
| TW201443929A (zh) | 2014-11-16 |
| IL205443A0 (en) | 2010-12-30 |
| TWI453173B (zh) | 2014-09-21 |
| JP2015053494A (ja) | 2015-03-19 |
| MY162545A (en) | 2017-06-15 |
| TW200938501A (en) | 2009-09-16 |
| KR20100091208A (ko) | 2010-08-18 |
| CN101980986B (zh) | 2016-04-27 |
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