BRPI0822520A2 - Sistema de plasma - Google Patents

Sistema de plasma

Info

Publication number
BRPI0822520A2
BRPI0822520A2 BRPI0822520-6A BRPI0822520A BRPI0822520A2 BR PI0822520 A2 BRPI0822520 A2 BR PI0822520A2 BR PI0822520 A BRPI0822520 A BR PI0822520A BR PI0822520 A2 BRPI0822520 A2 BR PI0822520A2
Authority
BR
Brazil
Prior art keywords
plasma system
plasma
Prior art date
Application number
BRPI0822520-6A
Other languages
English (en)
Inventor
Bianca
Ricardo
Enrique
Original Assignee
Alytus Corp S A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alytus Corp S A filed Critical Alytus Corp S A
Publication of BRPI0822520A2 publication Critical patent/BRPI0822520A2/pt
Publication of BRPI0822520B1 publication Critical patent/BRPI0822520B1/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
BRPI0822520-6A 2008-03-12 2008-03-12 Sistema de plasma BRPI0822520B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
PCT/EP2008/001967 WO2009112053A1 (en) 2008-03-12 2008-03-12 Plasma system
EPPCTEP2008001967 2008-03-12

Publications (2)

Publication Number Publication Date
BRPI0822520A2 true BRPI0822520A2 (pt) 2015-06-16
BRPI0822520B1 BRPI0822520B1 (pt) 2019-05-21

Family

ID=39865243

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0822520-6A BRPI0822520B1 (pt) 2008-03-12 2008-03-12 Sistema de plasma

Country Status (13)

Country Link
US (1) US8505480B2 (pt)
EP (1) EP2253008B1 (pt)
JP (1) JP5458445B2 (pt)
KR (1) KR101514479B1 (pt)
CN (1) CN101971288B (pt)
AR (1) AR071923A1 (pt)
BR (1) BRPI0822520B1 (pt)
CA (1) CA2718253C (pt)
DK (1) DK2253008T3 (pt)
ES (1) ES2621951T3 (pt)
MX (1) MX2010009997A (pt)
RU (1) RU2476953C2 (pt)
WO (1) WO2009112053A1 (pt)

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EP2253008B1 (en) 2008-03-12 2017-02-01 Alytus Corporation, S.A. Plasma system
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US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US8715789B2 (en) * 2009-12-18 2014-05-06 Sub-One Technology, Inc. Chemical vapor deposition for an interior of a hollow article with high aspect ratio
CN102238795A (zh) * 2010-04-28 2011-11-09 盐城豪瑞达实业有限公司 一种惰性气体保护电弧等离子体石墨电极抗氧化烧蚀损耗的技术
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
EP2683836B1 (en) * 2011-03-10 2021-02-17 Kaiatech, Inc. Method and apparatus for treating containers
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US20120312233A1 (en) * 2011-06-10 2012-12-13 Ge Yi Magnetically Enhanced Thin Film Coating Method and Apparatus
US9554968B2 (en) 2013-03-11 2017-01-31 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging
EP2776603B1 (en) 2011-11-11 2019-03-06 SiO2 Medical Products, Inc. PASSIVATION, pH PROTECTIVE OR LUBRICITY COATING FOR PHARMACEUTICAL PACKAGE, COATING PROCESS AND APPARATUS
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
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US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
CN102905455A (zh) * 2012-10-17 2013-01-30 浙江理工大学 对织物或聚合物薄膜连续聚合改性的大气压等离子体系统
CA2890066C (en) 2012-11-01 2021-11-09 Sio2 Medical Products, Inc. Coating inspection method
CN102942950B (zh) * 2012-11-16 2015-01-28 中科合成油技术有限公司 一种提质重质碳氢化合物生产轻质油品的方法及其等离子体加氢反应器
US9903782B2 (en) 2012-11-16 2018-02-27 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
KR102211950B1 (ko) 2012-11-30 2021-02-04 에스아이오2 메디컬 프로덕츠, 인크. 의료용 주사기 카트리지 등의 pecvd 증착 균일성 제어
US20160015898A1 (en) 2013-03-01 2016-01-21 Sio2 Medical Products, Inc. Plasma or cvd pre-treatment for lubricated pharmaceutical package, coating process and apparatus
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
JP6277398B2 (ja) * 2013-08-27 2018-02-14 株式会社ユーテック プラズマｃｖｄ装置及び配管内の成膜方法
WO2015132444A1 (en) 2014-03-03 2015-09-11 Picosun Oy Protecting an interior of a hollow body with an ald coating
CN106062245B (zh) 2014-03-03 2020-04-07 皮考逊公司 用ald涂层保护气体容器的内部
US11066745B2 (en) 2014-03-28 2021-07-20 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
KR101594904B1 (ko) * 2014-09-19 2016-02-18 재단법인 포항산업과학연구원 플라즈마 코팅장치
CN108138316A (zh) 2015-08-18 2018-06-08 Sio2医药产品公司 具有低氧气传输速率的药物和其他包装
CN108559977B (zh) * 2018-01-22 2020-11-20 大连理工大学 一种在细长金属管内壁低温涂层的方法及设备
CN108601192B (zh) * 2018-06-25 2019-07-12 超力等离子技术(常州)有限公司 一种等离子发生器
JP6595671B2 (ja) * 2018-07-20 2019-10-23 ピコサン オーワイ Ａｌｄコーティングによる中空ボディ内面の保護
US11371137B2 (en) 2019-03-15 2022-06-28 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools
US11371145B2 (en) 2019-03-15 2022-06-28 Halliburton Energy Services, Inc. Depositing coatings on and within a housing, apparatus, or tool using a coating system positioned therein
CN110331373A (zh) * 2019-07-04 2019-10-15 国家电网有限公司 一种实现固体绝缘件表面电导率调控的装置及方法
CN113124683B (zh) * 2020-01-15 2022-09-27 株洲弗拉德科技有限公司 一种带上料器真空气相沉积炉
US11788187B2 (en) 2020-08-27 2023-10-17 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools utilizing counter current flow of reactants
US11788189B2 (en) 2020-08-27 2023-10-17 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools utilizing pressurized cells
CN120112676A (zh) * 2022-10-24 2025-06-06 朗姆研究公司 具有三个充气室的喷头

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Also Published As

Publication number Publication date
DK2253008T3 (en) 2017-05-08
ES2621951T3 (es) 2017-07-05
CN101971288B (zh) 2012-09-05
RU2010140972A (ru) 2012-04-20
AR071923A1 (es) 2010-07-28
CA2718253A1 (en) 2009-09-17
WO2009112053A1 (en) 2009-09-17
CN101971288A (zh) 2011-02-09
CA2718253C (en) 2016-04-19
RU2476953C2 (ru) 2013-02-27
US20110030617A1 (en) 2011-02-10
KR101514479B1 (ko) 2015-04-22
JP5458445B2 (ja) 2014-04-02
EP2253008B1 (en) 2017-02-01
BRPI0822520B1 (pt) 2019-05-21
MX2010009997A (es) 2010-12-14
US8505480B2 (en) 2013-08-13
JP2011513593A (ja) 2011-04-28
EP2253008A1 (en) 2010-11-24
KR20110006655A (ko) 2011-01-20

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Legal Events

Date Code Title Description
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 10 (DEZ) ANOS CONTADOS A PARTIR DE 21/05/2019, OBSERVADAS AS CONDICOES LEGAIS. (CO) 10 (DEZ) ANOS CONTADOS A PARTIR DE 21/05/2019, OBSERVADAS AS CONDICOES LEGAIS

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

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B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2870 DE 06-01-2026 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.