BRPI0822520A2 - Sistema de plasma - Google Patents

Sistema de plasma

Info

Publication number
BRPI0822520A2
BRPI0822520A2 BRPI0822520-6A BRPI0822520A BRPI0822520A2 BR PI0822520 A2 BRPI0822520 A2 BR PI0822520A2 BR PI0822520 A BRPI0822520 A BR PI0822520A BR PI0822520 A2 BRPI0822520 A2 BR PI0822520A2
Authority
BR
Brazil
Prior art keywords
plasma system
plasma
Prior art date
Application number
BRPI0822520-6A
Other languages
English (en)
Inventor
Bianca
Ricardo
Enrique
Original Assignee
Alytus Corp S A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alytus Corp S A filed Critical Alytus Corp S A
Publication of BRPI0822520A2 publication Critical patent/BRPI0822520A2/pt
Publication of BRPI0822520B1 publication Critical patent/BRPI0822520B1/pt

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04Coating on selected surface areas, e.g. using masks
    • C23C16/045Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32532Electrodes
    • H01J37/32568Relative arrangement or disposition of electrodes; moving means
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Vapour Deposition (AREA)
BRPI0822520-6A 2008-03-12 2008-03-12 Sistema de plasma BRPI0822520B1 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EPPCTEP2008001967 2008-03-12
PCT/EP2008/001967 WO2009112053A1 (en) 2008-03-12 2008-03-12 Plasma system

Publications (2)

Publication Number Publication Date
BRPI0822520A2 true BRPI0822520A2 (pt) 2015-06-16
BRPI0822520B1 BRPI0822520B1 (pt) 2019-05-21

Family

ID=39865243

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0822520-6A BRPI0822520B1 (pt) 2008-03-12 2008-03-12 Sistema de plasma

Country Status (13)

Country Link
US (1) US8505480B2 (pt)
EP (1) EP2253008B1 (pt)
JP (1) JP5458445B2 (pt)
KR (1) KR101514479B1 (pt)
CN (1) CN101971288B (pt)
AR (1) AR071923A1 (pt)
BR (1) BRPI0822520B1 (pt)
CA (1) CA2718253C (pt)
DK (1) DK2253008T3 (pt)
ES (1) ES2621951T3 (pt)
MX (1) MX2010009997A (pt)
RU (1) RU2476953C2 (pt)
WO (1) WO2009112053A1 (pt)

Families Citing this family (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009112053A1 (en) 2008-03-12 2009-09-17 Ricardo Enrique Biana Plasma system
US7985188B2 (en) 2009-05-13 2011-07-26 Cv Holdings Llc Vessel, coating, inspection and processing apparatus
PT2251454E (pt) 2009-05-13 2014-10-01 Sio2 Medical Products Inc Revestimento e inspeção de vaso
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
US8715789B2 (en) * 2009-12-18 2014-05-06 Sub-One Technology, Inc. Chemical vapor deposition for an interior of a hollow article with high aspect ratio
CN102238795A (zh) * 2010-04-28 2011-11-09 盐城豪瑞达实业有限公司 一种惰性气体保护电弧等离子体石墨电极抗氧化烧蚀损耗的技术
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US10081864B2 (en) * 2011-03-10 2018-09-25 Kaiatech, Inc Method and apparatus for treating containers
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
US20120312233A1 (en) * 2011-06-10 2012-12-13 Ge Yi Magnetically Enhanced Thin Film Coating Method and Apparatus
CA2855353C (en) 2011-11-11 2021-01-19 Sio2 Medical Products, Inc. Passivation, ph protective or lubricity coating for pharmaceutical package, coating process and apparatus
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
DE102012103425A1 (de) 2012-04-19 2013-10-24 Roth & Rau Ag Mikrowellenplasmaerzeugungsvorrichtung und Verfahren zu deren Betrieb
EP2846755A1 (en) 2012-05-09 2015-03-18 SiO2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US20150297800A1 (en) 2012-07-03 2015-10-22 Sio2 Medical Products, Inc. SiOx BARRIER FOR PHARMACEUTICAL PACKAGE AND COATING PROCESS
CN102905455A (zh) * 2012-10-17 2013-01-30 浙江理工大学 对织物或聚合物薄膜连续聚合改性的大气压等离子体系统
US9664626B2 (en) 2012-11-01 2017-05-30 Sio2 Medical Products, Inc. Coating inspection method
CN102942950B (zh) * 2012-11-16 2015-01-28 中科合成油技术有限公司 一种提质重质碳氢化合物生产轻质油品的方法及其等离子体加氢反应器
WO2014078666A1 (en) 2012-11-16 2014-05-22 Sio2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
AU2013352436B2 (en) 2012-11-30 2018-10-25 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition on medical syringes, cartridges, and the like
US9662450B2 (en) 2013-03-01 2017-05-30 Sio2 Medical Products, Inc. Plasma or CVD pre-treatment for lubricated pharmaceutical package, coating process and apparatus
CN105392916B (zh) 2013-03-11 2019-03-08 Sio2医药产品公司 涂布包装材料
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
EP2971227B1 (en) 2013-03-15 2017-11-15 Si02 Medical Products, Inc. Coating method.
JP6277398B2 (ja) * 2013-08-27 2018-02-14 株式会社ユーテック プラズマcvd装置及び配管内の成膜方法
CN106062246B (zh) 2014-03-03 2020-05-08 皮考逊公司 用ald涂层保护中空体的内部
JP6302082B2 (ja) 2014-03-03 2018-03-28 ピコサン オーワイPicosun Oy Aldコーティングによるガスコンテナ内部の保護
WO2015148471A1 (en) 2014-03-28 2015-10-01 Sio2 Medical Products, Inc. Antistatic coatings for plastic vessels
KR101594904B1 (ko) * 2014-09-19 2016-02-18 재단법인 포항산업과학연구원 플라즈마 코팅장치
KR102786617B1 (ko) 2015-08-18 2025-03-26 에스아이오2 메디컬 프로덕츠, 엘엘씨 산소 전달률이 낮은, 의약품 및 다른 제품의 포장용기
CN108559977B (zh) * 2018-01-22 2020-11-20 大连理工大学 一种在细长金属管内壁低温涂层的方法及设备
CN108601192B (zh) * 2018-06-25 2019-07-12 超力等离子技术(常州)有限公司 一种等离子发生器
JP6595671B2 (ja) * 2018-07-20 2019-10-23 ピコサン オーワイ Aldコーティングによる中空ボディ内面の保護
US11371145B2 (en) 2019-03-15 2022-06-28 Halliburton Energy Services, Inc. Depositing coatings on and within a housing, apparatus, or tool using a coating system positioned therein
US11371137B2 (en) 2019-03-15 2022-06-28 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools
CN110331373A (zh) * 2019-07-04 2019-10-15 国家电网有限公司 一种实现固体绝缘件表面电导率调控的装置及方法
CN113124683B (zh) * 2020-01-15 2022-09-27 株洲弗拉德科技有限公司 一种带上料器真空气相沉积炉
US11788187B2 (en) 2020-08-27 2023-10-17 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools utilizing counter current flow of reactants
US11788189B2 (en) 2020-08-27 2023-10-17 Halliburton Energy Services, Inc. Depositing coatings on and within housings, apparatus, or tools utilizing pressurized cells
WO2024091420A1 (en) * 2022-10-24 2024-05-02 Lam Research Corporation Showerhead with three plenums

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2030180B (en) 1978-01-26 1983-05-25 Secr Defence Vapour deposition of metal in plasma discharge
IL74787A (en) * 1985-04-02 1988-12-30 Univ Ramot Method of depositing heat-reflecting coatings on tube and apparatus useful in such method
US5391232A (en) * 1985-12-26 1995-02-21 Canon Kabushiki Kaisha Device for forming a deposited film
US5322568A (en) * 1985-12-28 1994-06-21 Canon Kabushiki Kaisha Apparatus for forming deposited film
JPH0651908B2 (ja) * 1985-12-28 1994-07-06 キヤノン株式会社 薄膜多層構造の形成方法
JPS62167887A (ja) * 1986-01-20 1987-07-24 Nippon Kokan Kk <Nkk> 加熱式コ−テイング装置
JPS62167882A (ja) * 1986-01-20 1987-07-24 Nippon Kokan Kk <Nkk> 移動電極式コ−テイング方法
JPS62170477A (ja) 1986-01-22 1987-07-27 Nippon Kokan Kk <Nkk> 管内外面のコ−テイング方法
JPS6326373A (ja) * 1986-07-18 1988-02-03 Kobe Steel Ltd プラズマcvdによる管内面のコ−テイング方法
JPH05124841A (ja) * 1991-06-12 1993-05-21 Sumitomo Electric Ind Ltd ハーメチツクコート光フアイバの製造方法
MX9303141A (es) * 1992-05-28 1994-04-29 Polar Materials Inc Metodos y aparatos para depositar recubrimientos de barrera.
US5308649A (en) * 1992-06-26 1994-05-03 Polar Materials, Inc. Methods for externally treating a container with application of internal bias gas
JPH06326373A (ja) 1993-05-10 1994-11-25 Toyota Autom Loom Works Ltd 磁気抵抗半導体装置
US6112695A (en) * 1996-10-08 2000-09-05 Nano Scale Surface Systems, Inc. Apparatus for plasma deposition of a thin film onto the interior surface of a container
JP3684011B2 (ja) * 1996-12-12 2005-08-17 キヤノン株式会社 プラズマcvd法による堆積膜形成方法及び装置
DE19722272A1 (de) * 1997-05-28 1998-12-03 Leybold Systems Gmbh Vorrichtung zur Erzeugung von Plasma
JP3844274B2 (ja) * 1998-06-25 2006-11-08 独立行政法人産業技術総合研究所 プラズマcvd装置及びプラズマcvd方法
US6641673B2 (en) * 2000-12-20 2003-11-04 General Electric Company Fluid injector for and method of prolonged delivery and distribution of reagents into plasma
US7052736B2 (en) * 2002-06-11 2006-05-30 Southwest Research Institute Method for depositing coatings on the interior surfaces of tubular structures
US7300684B2 (en) * 2004-07-15 2007-11-27 Sub-One Technology, Inc. Method and system for coating internal surfaces of prefabricated process piping in the field
JP4664658B2 (ja) * 2004-12-02 2011-04-06 麒麟麦酒株式会社 プラズマcvd成膜装置及びガスバリア性を有するプラスチック容器の製造方法
US7608151B2 (en) * 2005-03-07 2009-10-27 Sub-One Technology, Inc. Method and system for coating sections of internal surfaces
KR101307040B1 (ko) * 2005-05-27 2013-09-11 기린비루 가부시키가이샤 가스 배리어성 플라스틱 용기의 제조 장치, 그 용기의 제조 방법
RU2311492C1 (ru) * 2006-04-28 2007-11-27 Виктор Иванович Чайрев Устройство для высокоскоростного магнетронного распыления
JP4382784B2 (ja) * 2006-08-17 2009-12-16 ふくはうちテクノロジー株式会社 ダイヤモンドライクカーボン膜の製膜装置
US8029875B2 (en) * 2007-05-23 2011-10-04 Southwest Research Institute Plasma immersion ion processing for coating of hollow substrates
WO2009112053A1 (en) 2008-03-12 2009-09-17 Ricardo Enrique Biana Plasma system

Also Published As

Publication number Publication date
US8505480B2 (en) 2013-08-13
EP2253008B1 (en) 2017-02-01
DK2253008T3 (en) 2017-05-08
CA2718253A1 (en) 2009-09-17
JP2011513593A (ja) 2011-04-28
CN101971288A (zh) 2011-02-09
US20110030617A1 (en) 2011-02-10
WO2009112053A1 (en) 2009-09-17
KR20110006655A (ko) 2011-01-20
EP2253008A1 (en) 2010-11-24
RU2476953C2 (ru) 2013-02-27
BRPI0822520B1 (pt) 2019-05-21
CN101971288B (zh) 2012-09-05
MX2010009997A (es) 2010-12-14
AR071923A1 (es) 2010-07-28
CA2718253C (en) 2016-04-19
JP5458445B2 (ja) 2014-04-02
ES2621951T3 (es) 2017-07-05
RU2010140972A (ru) 2012-04-20
KR101514479B1 (ko) 2015-04-22

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Legal Events

Date Code Title Description
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

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