BRPI0910587A2 - método e aparelho para eletrogalvanização - Google Patents

método e aparelho para eletrogalvanização

Info

Publication number
BRPI0910587A2
BRPI0910587A2 BRPI0910587A BRPI0910587A BRPI0910587A2 BR PI0910587 A2 BRPI0910587 A2 BR PI0910587A2 BR PI0910587 A BRPI0910587 A BR PI0910587A BR PI0910587 A BRPI0910587 A BR PI0910587A BR PI0910587 A2 BRPI0910587 A2 BR PI0910587A2
Authority
BR
Brazil
Prior art keywords
electroplating
Prior art date
Application number
BRPI0910587A
Other languages
English (en)
Inventor
Klaus Tomantschger
Original Assignee
Integran Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Integran Technologies Inc filed Critical Integran Technologies Inc
Publication of BRPI0910587A2 publication Critical patent/BRPI0910587A2/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/007—Current directing devices
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00—Processes for servicing or operating cells for electrolytic coating
    • C25D21/12—Process control or regulation
    • C25D21/14—Controlled addition of electrolyte components
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003—Electroplating using gases, e.g. pressure influence
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Automation & Control Theory (AREA)
  • Electroplating Methods And Accessories (AREA)
BRPI0910587A 2008-04-18 2009-03-04 método e aparelho para eletrogalvanização BRPI0910587A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US12/081,623 US8062496B2 (en) 2008-04-18 2008-04-18 Electroplating method and apparatus
PCT/CA2009/000264 WO2009127037A1 (en) 2008-04-18 2009-03-04 Electroplating method and apparatus

Publications (1)

Publication Number Publication Date
BRPI0910587A2 true BRPI0910587A2 (pt) 2015-09-22

Family

ID=41198720

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0910587A BRPI0910587A2 (pt) 2008-04-18 2009-03-04 método e aparelho para eletrogalvanização

Country Status (8)

Country Link
US (2) US8062496B2 (pt)
EP (1) EP2262928A1 (pt)
KR (1) KR20110008043A (pt)
CN (1) CN102007232B (pt)
BR (1) BRPI0910587A2 (pt)
CA (1) CA2716394A1 (pt)
MX (1) MX2010010658A (pt)
WO (1) WO2009127037A1 (pt)

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KR102045821B1 (ko) * 2017-09-28 2019-11-19 (주)포인텍 전기도금라인의 무선행거에 장착된 기판에 인가되는 전류의 제어방법
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US12004803B2 (en) 2021-03-15 2024-06-11 Covidien Lp Thrombectomy treatment system
US11974752B2 (en) 2019-12-12 2024-05-07 Covidien Lp Electrically enhanced retrieval of material from vessel lumens
US12318126B2 (en) 2021-06-25 2025-06-03 Covidien Lp Current generator for a medical treatment system
CN108716017B (zh) * 2018-06-19 2023-07-28 昆山硕凯自动化科技有限公司 一种连续点蜡轴
CN108707951B (zh) * 2018-06-19 2023-08-01 昆山硕凯自动化科技有限公司 一种连续点蜡槽
US20190388107A1 (en) 2018-06-22 2019-12-26 Covidien Lp Electrically enhanced retrieval of material from vessel lumens
KR102012731B1 (ko) * 2018-12-06 2019-08-21 주식회사 에이엔씨코리아 6 가 크롬도금액 및 이를 이용한 크랙프리 펄스 전기도금방법
KR102639119B1 (ko) 2018-12-31 2024-02-20 엘지디스플레이 주식회사 전기 도금 장치 및 이를 이용한 전기 도금 방법
US20220127744A1 (en) * 2019-02-01 2022-04-28 Lumishield Technologies Incorporated Methods and Compositions for Improved Adherence of Organic Coatings to Materials
US11612430B2 (en) 2019-03-19 2023-03-28 Covidien Lp Electrically enhanced retrieval of material from vessel lumens
US11523838B2 (en) 2019-06-12 2022-12-13 Covidien Lp Retrieval of material from corporeal lumens
US11791061B2 (en) 2019-09-12 2023-10-17 Asbury Graphite North Carolina, Inc. Conductive high strength extrudable ultra high molecular weight polymer graphene oxide composite
US12320025B2 (en) * 2020-09-11 2025-06-03 University Of Cincinnati Electrochemical deposition of functionalized high entropy alloys
US11963713B2 (en) 2021-06-02 2024-04-23 Covidien Lp Medical treatment system
CN113668039A (zh) * 2021-08-17 2021-11-19 Oppo广东移动通信有限公司 挂具组件和设备组件
US11944374B2 (en) 2021-08-30 2024-04-02 Covidien Lp Electrical signals for retrieval of material from vessel lumens
CN114108048B (zh) * 2021-11-19 2023-05-23 南京航空航天大学 一种提高晶圆级阵列微结构电铸厚度均匀性的方法
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CN115679398B (zh) * 2022-11-17 2023-06-16 重庆太蓝新能源有限公司 参比电极的电镀方法及电池
CN116240611B (zh) * 2023-02-23 2025-07-25 京东方科技集团股份有限公司 一种电镀板、电镀装置以及电镀方法
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Also Published As

Publication number Publication date
US8062496B2 (en) 2011-11-22
MX2010010658A (es) 2010-11-09
CA2716394A1 (en) 2009-10-22
EP2262928A1 (en) 2010-12-22
US20100006445A1 (en) 2010-01-14
CN102007232A (zh) 2011-04-06
KR20110008043A (ko) 2011-01-25
CN102007232B (zh) 2013-05-01
US20120024696A1 (en) 2012-02-02
WO2009127037A1 (en) 2009-10-22

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 7A ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2367 DE 17-05-2016 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.