BRPI0911980A2 - pulverização catódica rotativa de magnetron com alta rigidez - Google Patents

pulverização catódica rotativa de magnetron com alta rigidez

Info

Publication number: BRPI0911980A2
Authority: BR; Brazil
Prior art keywords: magnetron sputtering; high rigidity; rotary magnetron; rigidity rotary; sputtering
Prior art date: 2008-05-16

Application number

BRPI0911980A

Other languages

English (en)

Inventor

Ivan Van De Putte

Parsifal Goderis

Original Assignee

Bekaert Advanced Coatings

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2008-05-16

Filing date

2009-05-06

Publication date

2015-10-13

2009-05-06 Application filed by Bekaert Advanced Coatings filed Critical Bekaert Advanced Coatings

2015-10-13 Publication of BRPI0911980A2 publication Critical patent/BRPI0911980A2/pt

Links

238000001755 magnetron sputter deposition Methods 0.000 title 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/342—Hollow targets
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
- H01J37/3497—Temperature of target

Landscapes

Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Plasma & Fusion (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Physical Vapour Deposition (AREA)

BRPI0911980A 2008-05-16 2009-05-06 pulverização catódica rotativa de magnetron com alta rigidez BRPI0911980A2 (pt)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
EP08156347		2008-05-16
PCT/EP2009/055486 WO2009138348A1 (en)	2008-05-16	2009-05-06	A rotatable sputtering magnetron with high stiffness

Publications (1)

Publication Number	Publication Date
BRPI0911980A2 true BRPI0911980A2 (pt)	2015-10-13

Family

ID=39798277

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
BRPI0911980A BRPI0911980A2 (pt)	2008-05-16	2009-05-06	pulverização catódica rotativa de magnetron com alta rigidez

Country Status (7)

Country	Link
US (1)	US8500976B2 (pt)
EP (1)	EP2301060B1 (pt)
JP (1)	JP5524185B2 (pt)
KR (1)	KR20110014593A (pt)
CN (1)	CN102027565B (pt)
BR (1)	BRPI0911980A2 (pt)
WO (1)	WO2009138348A1 (pt)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US20100120926A1 (en) *	2008-09-19	2010-05-13	Greatpoint Energy, Inc.	Processes for Gasification of a Carbonaceous Feedstock
US9512516B1 (en)	2009-09-24	2016-12-06	Beijing Apollo Ding Rong Solar Technology Co., Ltd.	Cooling water jet pack for high power rotary cathodes
DE102010063685B4 (de) *	2010-02-21	2012-07-12	Von Ardenne Anlagentechnik Gmbh	Magnetronanordnung mit einem Hohltarget
DE102010040759B4 (de)	2010-09-14	2015-10-08	Von Ardenne Gmbh	Kühlanordnung für Targets von Sputterquellen
JP5687045B2 (ja) *	2010-12-20	2015-03-18	キヤノンアネルバ株式会社	スパッタリング装置およびスパッタリング方法
DE102011075543B4 (de)	2011-05-10	2015-10-08	Von Ardenne Gmbh	Anordnung zur Kühlung eines längserstreckten Magnetron
KR101988391B1 (ko)	2011-06-27	2019-06-12	솔레라스 리미티드	스퍼터링 타겟
CN102348320A (zh) *	2011-10-01	2012-02-08	中国科学院近代物理研究所	非圆断面薄壁真空管道及非圆断面薄壁真空室
EP2626887A1 (en)	2012-02-13	2013-08-14	Soleras Advanced Coatings bvba	Online adjustable magnet bar
DE102012204425A1 (de)	2012-03-20	2013-09-26	Von Ardenne Anlagentechnik Gmbh	Sputterverfahren und Sputtervorrichtung
WO2014031156A1 (en) *	2012-08-24	2014-02-27	Cardinal Cg Company	Apparatus for cylindrical magnetron sputtering
DE102012109424A1 (de)	2012-10-04	2014-04-10	Von Ardenne Anlagentechnik Gmbh	Sputtermagnetron und Verfahren zur dynamischen Magnetfeldbeeinflussung
DE102013100974B4 (de) *	2013-01-31	2015-03-12	Von Ardenne Gmbh	Sputtermagnetron mit Magnetfeldbeeinflussung
US9418823B2 (en) *	2013-03-01	2016-08-16	Sputtering Components, Inc.	Sputtering apparatus
US9312108B2 (en)	2013-03-01	2016-04-12	Sputtering Components, Inc.	Sputtering apparatus
BE1021020B1 (nl) *	2013-04-12	2014-12-19	Soleras Advanced Coatings Bvba	Hybride magneet draagstructuur
DE202013012043U1 (de)	2013-07-31	2015-02-23	Von Ardenne Gmbh	Magnetträgeranordnung
CN103924200B (zh) *	2013-12-30	2017-07-04	上海天马有机发光显示技术有限公司	一种薄膜沉积装置
CN106795621B (zh) *	2014-04-28	2020-05-22	零件喷涂公司	磁控管组件和旋转靶阴极组件
US10371244B2 (en)	2015-04-09	2019-08-06	United Technologies Corporation	Additive manufactured gear for a geared architecture gas turbine engine
US10727034B2 (en) *	2017-08-16	2020-07-28	Sputtering Components, Inc.	Magnetic force release for sputtering sources with magnetic target materials
US11322338B2 (en) *	2017-08-31	2022-05-03	Taiwan Semiconductor Manufacturing Co., Ltd.	Sputter target magnet
JP6876594B2 (ja) *	2017-11-13	2021-05-26	キヤノントッキ株式会社	スパッタ装置
DE102021129521B3 (de) *	2021-11-12	2023-03-30	VON ARDENNE Asset GmbH & Co. KG	Magnetsystem, Sputtervorrichtung und Verfahren

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4422916A (en) *	1981-02-12	1983-12-27	Shatterproof Glass Corporation	Magnetron cathode sputtering apparatus
US4904362A (en) *	1987-07-24	1990-02-27	Miba Gleitlager Aktiengesellschaft	Bar-shaped magnetron or sputter cathode arrangement
JPH0688229A (ja) *	1991-01-29	1994-03-29	Boc Group Inc:The	二重円筒マグネトロンに於けるスパッタリングターゲットの磁場ゾーン回転の電気制御
US5262032A (en)	1991-05-28	1993-11-16	Leybold Aktiengesellschaft	Sputtering apparatus with rotating target and target cooling
US5571393A (en) *	1994-08-24	1996-11-05	Viratec Thin Films, Inc.	Magnet housing for a sputtering cathode
GB0118803D0 (en) *	2001-08-02	2001-09-26	Bekaert Sa Nv	Adjustable magnet configuration and method for magnetron sputtering
DE10213049A1 (de)	2002-03-22	2003-10-02	Dieter Wurczinger	Drehbare Rohrkatode
US20040129561A1 (en) *	2003-01-07	2004-07-08	Von Ardenne Anlagentechnik Gmbh	Cylindrical magnetron magnetic array mid span support
JP2009513818A (ja) *	2003-07-04	2009-04-02	ベーカート・アドヴァンスト・コーティングス	回転管状スパッタターゲット組立体
US7993496B2 (en) *	2004-07-01	2011-08-09	Cardinal Cg Company	Cylindrical target with oscillating magnet for magnetron sputtering
US7560011B2 (en)	2005-10-24	2009-07-14	Guardian Industries Corp.	Sputtering target and method/apparatus for cooling the target
US20070089982A1 (en)	2005-10-24	2007-04-26	Hendryk Richert	Sputtering target and method/apparatus for cooling the target
US7504011B2 (en)	2005-10-24	2009-03-17	Guardian Industries Corp.	Sputtering target and method/apparatus for cooling the target
US7879210B2 (en) *	2006-02-03	2011-02-01	Applied Materials, Inc.	Partially suspended rolling magnetron

2009
- 2009-05-06 BR BRPI0911980A patent/BRPI0911980A2/pt not_active IP Right Cessation
- 2009-05-06 JP JP2011508872A patent/JP5524185B2/ja not_active Expired - Fee Related
- 2009-05-06 EP EP09745681.8A patent/EP2301060B1/en active Active
- 2009-05-06 KR KR1020107025535A patent/KR20110014593A/ko not_active Ceased
- 2009-05-06 CN CN200980117737.9A patent/CN102027565B/zh active Active
- 2009-05-06 WO PCT/EP2009/055486 patent/WO2009138348A1/en not_active Ceased
- 2009-05-06 US US12/992,020 patent/US8500976B2/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
EP2301060A1 (en)	2011-03-30
JP5524185B2 (ja)	2014-06-18
EP2301060B1 (en)	2014-07-09
KR20110014593A (ko)	2011-02-11
CN102027565B (zh)	2013-03-06
CN102027565A (zh)	2011-04-20
US8500976B2 (en)	2013-08-06
WO2009138348A1 (en)	2009-11-19
JP2011521101A (ja)	2011-07-21
US20110062022A1 (en)	2011-03-17

Legal Events

Date	Code	Title	Description
2015-12-08	B08F	Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]	Free format text: REFERENTE A 6A ANUIDADE.
2016-04-05	B08K	Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]	Free format text: EM VIRTUDE DO ARQUIVAMENTO PUBLICADO NA RPI 2344 DE 08-12-2015 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDO O ARQUIVAMENTO DO PEDIDO DE PATENTE, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.
2017-05-02	B25E	Requested change of name of applicant rejected	Owner name: BEKAERT ADVANCED COATINGS (BE)

Publication	Publication Date	Title
BRPI0911980A2 (pt)	2015-10-13	pulverização catódica rotativa de magnetron com alta rigidez
EP2010125A4 (en)	2014-05-07	DOSE COUNTER
BRPI0913596A2 (pt)	2015-11-24	válvula de alta velocidade embutida
DK2107581T3 (da)	2012-08-06	Elektronisk drejekontakt
BRPI0815400A2 (pt)	2015-02-03	Plasma de baixa impedância
EP2186372A4 (en)	2012-09-26	FEMTO-BTS RF ACCESS MECHANISM
EP2128722A4 (en)	2010-05-26	CLOCK
EP2436722A4 (en)	2013-08-28	SELF-WEARING POLYMER THIN LAYER
EP2195945A4 (en)	2012-05-30	Persistent resource allocation
PT2051744E (pt)	2014-02-06	Aparelho de esterilização
EP2222208A4 (en)	2013-02-06	SHELF FOR LOADING BOX
BRPI0908409A2 (pt)	2015-08-11	Comutador de linha única de múltiplos ciclos
BRPI0919230A2 (pt)	2015-12-15	vidraça de alta reflexão
BRPI0816829A2 (pt)	2015-03-10	Indicador de posição de eixo rotativo
DE602007010865D1 (de)	2011-01-13	Magnetron
BRPI0806571A2 (pt)	2014-05-06	Fralda com painéis extensores de quadris
BRPI0716883A2 (pt)	2013-10-15	Acumulador de produto giratório
BRPI0818013A2 (pt)	2015-04-14	Mecanismo de rotação
BRPI0820014A2 (pt)	2015-05-19	Unidade de revestimento a vácuo de pvd
BRPI0812107A2 (pt)	2014-11-25	Formulação de duloxetina
IT1397182B1 (it)	2013-01-04	Sensore di frequenza di rotazione
FI20075275A0 (fi)	2007-04-19	RF-transkonduktanssituloaste
DE602007002723D1 (de)	2009-11-26	Nabeneinheit
EP2063745A4 (en)	2012-04-04	COOKING UTENSIL
FR2929045B1 (fr)	2013-05-17	Magnetron