BRPI0921394A2 - processo para fabricação de placa de impressão litográfica, revelador para precursor de placa de impresão litrográfica e reforçador para revelação de precursor de placa de impressão litográfica - Google Patents

processo para fabricação de placa de impressão litográfica, revelador para precursor de placa de impresão litrográfica e reforçador para revelação de precursor de placa de impressão litográfica

Info

Publication number
BRPI0921394A2
BRPI0921394A2 BRPI0921394A BRPI0921394A BRPI0921394A2 BR PI0921394 A2 BRPI0921394 A2 BR PI0921394A2 BR PI0921394 A BRPI0921394 A BR PI0921394A BR PI0921394 A BRPI0921394 A BR PI0921394A BR PI0921394 A2 BRPI0921394 A2 BR PI0921394A2
Authority
BR
Brazil
Prior art keywords
printing plate
lithographic printing
plate precursor
precursor developer
manufacturing process
Prior art date
Application number
BRPI0921394A
Other languages
English (en)
Inventor
Yoshida Susumu
Taguchi Yoshinori
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of BRPI0921394A2 publication Critical patent/BRPI0921394A2/pt
Publication of BRPI0921394A8 publication Critical patent/BRPI0921394A8/pt

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
BRPI0921394A 2008-11-26 2009-11-26 processo para fabricação de placa de impressão litográfica, revelador para precursor de placa de impressão litográfica e reforçador para revelação de precursor de placa de impressão litográfica BRPI0921394A8 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008300699 2008-11-26
JP2009069124 2009-03-19
PCT/JP2009/069904 WO2010061869A1 (ja) 2008-11-26 2009-11-26 平版印刷版の製版方法、平版印刷版原版用現像液、及び、平版印刷版原版現像用補充液

Publications (2)

Publication Number Publication Date
BRPI0921394A2 true BRPI0921394A2 (pt) 2018-10-30
BRPI0921394A8 BRPI0921394A8 (pt) 2019-01-15

Family

ID=42225739

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0921394A BRPI0921394A8 (pt) 2008-11-26 2009-11-26 processo para fabricação de placa de impressão litográfica, revelador para precursor de placa de impressão litográfica e reforçador para revelação de precursor de placa de impressão litográfica

Country Status (7)

Country Link
US (1) US20120021358A1 (pt)
EP (1) EP2360529B1 (pt)
JP (1) JP5313115B2 (pt)
CN (1) CN102227684B (pt)
AU (1) AU2009320812A1 (pt)
BR (1) BRPI0921394A8 (pt)
WO (1) WO2010061869A1 (pt)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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JP5346845B2 (ja) * 2010-02-26 2013-11-20 富士フイルム株式会社 平版印刷版の作製方法及び平版印刷版原版用現像液
JP5525873B2 (ja) * 2010-03-15 2014-06-18 富士フイルム株式会社 平版印刷版の作製方法
CN102540771A (zh) * 2010-12-24 2012-07-04 无锡华润上华半导体有限公司 正性光刻胶用显影液及光刻工艺中的显影方法
EP2690497A4 (en) * 2011-03-24 2014-08-20 Nissan Chemical Ind Ltd POLYMERIC DEVELOPER
JP6028501B2 (ja) * 2012-10-03 2016-11-16 株式会社リコー 像担持体保護剤、保護層形成装置、及び画像形成装置
US10058542B1 (en) 2014-09-12 2018-08-28 Thioredoxin Systems Ab Composition comprising selenazol or thiazolone derivatives and silver and method of treatment therewith
US20190072856A1 (en) * 2016-03-16 2019-03-07 Agfa Nv Method for processing a lithographic printing plate
US10843244B2 (en) 2016-08-23 2020-11-24 Bulldog Green Remediation, Inc. Methods for bioremediation of hydrocarbon-contaminated media
CN116149147B (zh) * 2023-04-24 2023-07-14 甘肃华隆芯材料科技有限公司 一种光刻胶显影液及其制备方法和应用

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Also Published As

Publication number Publication date
EP2360529B1 (en) 2016-08-24
JP2010244011A (ja) 2010-10-28
CN102227684B (zh) 2014-03-12
BRPI0921394A8 (pt) 2019-01-15
CN102227684A (zh) 2011-10-26
US20120021358A1 (en) 2012-01-26
EP2360529A4 (en) 2012-12-05
EP2360529A1 (en) 2011-08-24
WO2010061869A1 (ja) 2010-06-03
JP5313115B2 (ja) 2013-10-09
AU2009320812A1 (en) 2010-06-03

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Legal Events

Date Code Title Description
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B15K Others concerning applications: alteration of classification

Free format text: AS CLASSIFICACOES ANTERIORES ERAM: G03F 7/32 , G03F 7/00 , G03F 7/027 , G03F 7/032

Ipc: G03F 7/027 (1990.01), G03F 7/32 (1990.01)

B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B11E Dismissal acc. art. 34 of ipl - requirements for examination incomplete
B11T Dismissal of application maintained [chapter 11.20 patent gazette]