CA1032392A - Enduit de reserve de protection durcissable par rayonnement a haute energie et mode de preparation - Google Patents

Enduit de reserve de protection durcissable par rayonnement a haute energie et mode de preparation

Info

Publication number
CA1032392A
CA1032392A CA205,002A CA205002A CA1032392A CA 1032392 A CA1032392 A CA 1032392A CA 205002 A CA205002 A CA 205002A CA 1032392 A CA1032392 A CA 1032392A
Authority
CA
Canada
Prior art keywords
high energy
radiation curable
energy radiation
preparatory process
curable resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA205,002A
Other languages
English (en)
Other versions
CA205002S (en
Inventor
Eugene D. Feit
Larry F. Thompson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA1032392A publication Critical patent/CA1032392A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Epoxy Resins (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
CA205,002A 1973-10-23 1974-07-18 Enduit de reserve de protection durcissable par rayonnement a haute energie et mode de preparation Expired CA1032392A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40892773A 1973-10-23 1973-10-23

Publications (1)

Publication Number Publication Date
CA1032392A true CA1032392A (fr) 1978-06-06

Family

ID=23618345

Family Applications (1)

Application Number Title Priority Date Filing Date
CA205,002A Expired CA1032392A (fr) 1973-10-23 1974-07-18 Enduit de reserve de protection durcissable par rayonnement a haute energie et mode de preparation

Country Status (9)

Country Link
JP (1) JPS5929852B2 (fr)
BE (1) BE821326A (fr)
CA (1) CA1032392A (fr)
DE (1) DE2450381C3 (fr)
FR (1) FR2248289B1 (fr)
GB (1) GB1484873A (fr)
IT (1) IT1024658B (fr)
NL (1) NL163633C (fr)
SE (1) SE419907B (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4130424A (en) * 1976-08-06 1978-12-19 Bell Telephone Laboratories, Incorporated Process using radiation curable epoxy containing resist and resultant product
JPS5786831A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS5786830A (en) * 1980-11-20 1982-05-31 Fujitsu Ltd Pattern forming material
JPS57109943A (en) * 1980-12-26 1982-07-08 Nippon Telegr & Teleph Corp <Ntt> Formation of submicron pattern using radiation sensitive resist
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
GB2285141B (en) * 1993-12-23 1998-03-11 Motorola Ltd Method of removing photo resist

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3770433A (en) * 1972-03-22 1973-11-06 Bell Telephone Labor Inc High sensitivity negative electron resist

Also Published As

Publication number Publication date
BE821326A (fr) 1975-02-17
FR2248289A1 (fr) 1975-05-16
FR2248289B1 (fr) 1979-03-16
NL7413817A (nl) 1975-04-25
IT1024658B (it) 1978-07-20
DE2450381A1 (de) 1975-04-24
JPS5074427A (fr) 1975-06-19
JPS5929852B2 (ja) 1984-07-24
SE7412962L (fr) 1975-04-24
GB1484873A (en) 1977-09-08
SE419907B (sv) 1981-08-31
NL163633B (nl) 1980-04-15
NL163633C (nl) 1980-09-15
DE2450381B2 (de) 1979-07-19
DE2450381C3 (de) 1984-09-20

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