CA1035574A - Applicateur rotatif de fluide - Google Patents

Applicateur rotatif de fluide

Info

Publication number
CA1035574A
CA1035574A CA211,477A CA211477A CA1035574A CA 1035574 A CA1035574 A CA 1035574A CA 211477 A CA211477 A CA 211477A CA 1035574 A CA1035574 A CA 1035574A
Authority
CA
Canada
Prior art keywords
rotary fluid
fluid applicator
applicator
rotary
fluid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA211,477A
Other languages
English (en)
Other versions
CA211477S (en
Inventor
Howard E. Hansen
Robert J. Straub
Edward M. Tuczynski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of CA1035574A publication Critical patent/CA1035574A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0408—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B21/00—Arrangements for supplying or controlling air or other gases for drying solid materials or objects
    • F26B21/50—Ducting arrangements from the source of air or other gases to the materials or objects being dried

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Drying Of Solid Materials (AREA)
  • Spray Control Apparatus (AREA)
  • Coating Apparatus (AREA)
CA211,477A 1973-11-07 1974-10-16 Applicateur rotatif de fluide Expired CA1035574A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US00413753A US3849906A (en) 1973-11-07 1973-11-07 Rotary fluid applicator

Publications (1)

Publication Number Publication Date
CA1035574A true CA1035574A (fr) 1978-08-01

Family

ID=23638474

Family Applications (1)

Application Number Title Priority Date Filing Date
CA211,477A Expired CA1035574A (fr) 1973-11-07 1974-10-16 Applicateur rotatif de fluide

Country Status (7)

Country Link
US (1) US3849906A (fr)
JP (1) JPS5074857A (fr)
CA (1) CA1035574A (fr)
DE (1) DE2442309A1 (fr)
FR (1) FR2249717B1 (fr)
GB (1) GB1482106A (fr)
IT (1) IT1022104B (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5417640A (en) * 1977-07-08 1979-02-09 Mitsubishi Electric Corp Malfunction preventive device for integrated circuit
US4429983A (en) 1982-03-22 1984-02-07 International Business Machines Corporation Developing apparatus for exposed photoresist coated wafers
DE3502648A1 (de) * 1985-01-26 1986-07-31 Carl Prof. Dr.-Ing. 5100 Aachen Kramer Vorrichtung zur mischung eines haupt-gasstroms mit mindestens einem neben-gasstrom
DE3503089A1 (de) * 1985-01-30 1986-07-31 Carl Prof. Dr.-Ing. 5100 Aachen Kramer Vorrichtung zur gleichmaessigen beaufschlagung einer planen flaeche mit einem gas
US11069521B2 (en) * 2017-02-06 2021-07-20 Planar Semiconductor, Inc. Subnanometer-level light-based substrate cleaning mechanism
TWI770115B (zh) * 2017-02-06 2022-07-11 新加坡商平面半導體公司 加工汙水之去除
WO2018144446A1 (fr) * 2017-02-06 2018-08-09 Planar Semiconductor, Inc. Mécanisme de nettoyage de substrat de niveau sous-nanométrique
JP2022541862A (ja) * 2020-06-30 2022-09-28 東莞宇宙電路板設備有限公司 表面処理機器

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2602003A (en) * 1946-10-30 1952-07-01 Willard Storage Battery Co Rotating apparatus for blowing loose foreign material from articles
US2532494A (en) * 1946-11-23 1950-12-05 Mcgraw Electric Co Method of making paper tubes

Also Published As

Publication number Publication date
DE2442309A1 (de) 1975-05-22
US3849906A (en) 1974-11-26
JPS5074857A (fr) 1975-06-19
IT1022104B (it) 1978-03-20
GB1482106A (en) 1977-08-03
FR2249717B1 (fr) 1976-12-31
FR2249717A1 (fr) 1975-05-30

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