CA1053956A - Procede de photopolymerisation - Google Patents

Procede de photopolymerisation

Info

Publication number
CA1053956A
CA1053956A CA211,092A CA211092A CA1053956A CA 1053956 A CA1053956 A CA 1053956A CA 211092 A CA211092 A CA 211092A CA 1053956 A CA1053956 A CA 1053956A
Authority
CA
Canada
Prior art keywords
composition
photooxidizable
film
ethylenically unsaturated
component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA211,092A
Other languages
English (en)
Other versions
CA211092S (en
Inventor
David S. Breslow
David A. Simpson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hercules LLC
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Application granted granted Critical
Publication of CA1053956A publication Critical patent/CA1053956A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CA211,092A 1973-10-10 1974-10-09 Procede de photopolymerisation Expired CA1053956A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40519273A 1973-10-10 1973-10-10

Publications (1)

Publication Number Publication Date
CA1053956A true CA1053956A (fr) 1979-05-08

Family

ID=23602667

Family Applications (1)

Application Number Title Priority Date Filing Date
CA211,092A Expired CA1053956A (fr) 1973-10-10 1974-10-09 Procede de photopolymerisation

Country Status (6)

Country Link
JP (1) JPS5842459B2 (fr)
BE (1) BE820855A (fr)
CA (1) CA1053956A (fr)
DE (1) DE2446098C3 (fr)
FR (1) FR2247752B1 (fr)
GB (1) GB1488709A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110216176B (zh) * 2019-07-09 2024-05-28 南京机电职业技术学院 一种可调节式可同时生产不同弯度的大口径弯管生产机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE525225A (fr) * 1951-08-20
NL227834A (fr) * 1957-05-17
US3326710A (en) * 1964-04-16 1967-06-20 Sherwin Williams Co Method of curing polyester compositions and coatings containing synergistic combination of photosensitizers and compositions thereof
IL31102A (en) * 1967-12-18 1972-05-30 Fmc Corp Process of making polymeric relief plate
US3556792A (en) * 1968-05-22 1971-01-19 Gaf Corp Novel substituted allyl polymer derivatives useful as photoresists

Also Published As

Publication number Publication date
FR2247752A1 (fr) 1975-05-09
GB1488709A (en) 1977-10-12
BE820855A (fr) 1975-02-03
DE2446098A1 (de) 1975-04-17
FR2247752B1 (fr) 1981-05-29
DE2446098B2 (de) 1979-08-30
JPS5842459B2 (ja) 1983-09-20
JPS5083103A (fr) 1975-07-05
DE2446098C3 (de) 1985-05-30

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