JPS5842459B2 - カンコウゾウノケイセイホウ - Google Patents

カンコウゾウノケイセイホウ

Info

Publication number
JPS5842459B2
JPS5842459B2 JP49115691A JP11569174A JPS5842459B2 JP S5842459 B2 JPS5842459 B2 JP S5842459B2 JP 49115691 A JP49115691 A JP 49115691A JP 11569174 A JP11569174 A JP 11569174A JP S5842459 B2 JPS5842459 B2 JP S5842459B2
Authority
JP
Japan
Prior art keywords
film
composition
bonded
photooxidative
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP49115691A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5083103A (fr
Inventor
アレキサンダー シンプソン デイヴイド
サミユエル ブレスロウ デイヴイド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hercules LLC
Original Assignee
Hercules LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hercules LLC filed Critical Hercules LLC
Publication of JPS5083103A publication Critical patent/JPS5083103A/ja
Publication of JPS5842459B2 publication Critical patent/JPS5842459B2/ja
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
JP49115691A 1973-10-10 1974-10-09 カンコウゾウノケイセイホウ Expired JPS5842459B2 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US40519273A 1973-10-10 1973-10-10

Publications (2)

Publication Number Publication Date
JPS5083103A JPS5083103A (fr) 1975-07-05
JPS5842459B2 true JPS5842459B2 (ja) 1983-09-20

Family

ID=23602667

Family Applications (1)

Application Number Title Priority Date Filing Date
JP49115691A Expired JPS5842459B2 (ja) 1973-10-10 1974-10-09 カンコウゾウノケイセイホウ

Country Status (6)

Country Link
JP (1) JPS5842459B2 (fr)
BE (1) BE820855A (fr)
CA (1) CA1053956A (fr)
DE (1) DE2446098C3 (fr)
FR (1) FR2247752B1 (fr)
GB (1) GB1488709A (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110216176B (zh) * 2019-07-09 2024-05-28 南京机电职业技术学院 一种可调节式可同时生产不同弯度的大口径弯管生产机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE525225A (fr) * 1951-08-20
NL227834A (fr) * 1957-05-17
US3326710A (en) * 1964-04-16 1967-06-20 Sherwin Williams Co Method of curing polyester compositions and coatings containing synergistic combination of photosensitizers and compositions thereof
IL31102A (en) * 1967-12-18 1972-05-30 Fmc Corp Process of making polymeric relief plate
US3556792A (en) * 1968-05-22 1971-01-19 Gaf Corp Novel substituted allyl polymer derivatives useful as photoresists

Also Published As

Publication number Publication date
CA1053956A (fr) 1979-05-08
FR2247752A1 (fr) 1975-05-09
GB1488709A (en) 1977-10-12
BE820855A (fr) 1975-02-03
DE2446098A1 (de) 1975-04-17
FR2247752B1 (fr) 1981-05-29
DE2446098B2 (de) 1979-08-30
JPS5083103A (fr) 1975-07-05
DE2446098C3 (de) 1985-05-30

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