CA1061158A - Couche photosensible contenant du diazide de o-naphthoquinone, une resine et un aminoalkoxysilane - Google Patents

Couche photosensible contenant du diazide de o-naphthoquinone, une resine et un aminoalkoxysilane

Info

Publication number: CA1061158A
Authority: CA; Canada
Prior art keywords: printing plate; amino; resin; plate according; alkoxy silane
Prior art date: 1974-08-29
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA234,234A

Other languages

English (en)

Other versions

CA234234S (en

Inventor

Waltraud Kuhn

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hoechst AG

Original Assignee

Hoechst AG

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1974-08-29

Filing date

1975-08-27

Publication date

1979-08-28

1975-08-27 Application filed by Hoechst AG filed Critical Hoechst AG

1979-08-28 Application granted granted Critical

1979-08-28 Publication of CA1061158A publication Critical patent/CA1061158A/fr

Status Expired legal-status Critical Current

Links

229920005989 resin Polymers 0.000 title claims abstract description 16
239000011347 resin Substances 0.000 title claims abstract description 16
KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 title description 2
FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 title 1
238000007639 printing Methods 0.000 claims abstract description 36
-1 o-naphthoquinone diazide compound Chemical class 0.000 claims abstract description 22
229910000077 silane Inorganic materials 0.000 claims abstract description 18
229920003986 novolac Polymers 0.000 claims abstract description 11
229920003987 resole Polymers 0.000 claims abstract description 10
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 9
229910052782 aluminium Inorganic materials 0.000 claims abstract description 9
125000004432 carbon atom Chemical group C* 0.000 claims abstract description 5
125000000217 alkyl group Chemical group 0.000 claims abstract description 3
125000003277 amino group Chemical group 0.000 claims abstract description 3
125000005122 aminoalkylamino group Chemical group 0.000 claims abstract description 3
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 3
239000000203 mixture Substances 0.000 claims description 6
ROWWCTUMLAVVQB-UHFFFAOYSA-N triethoxysilylmethanamine Chemical compound CCO[Si](CN)(OCC)OCC ROWWCTUMLAVVQB-UHFFFAOYSA-N 0.000 claims description 2
SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims 1
125000004429 atom Chemical group 0.000 claims 1
PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 claims 1
150000001875 compounds Chemical class 0.000 description 4
239000007859 condensation product Substances 0.000 description 3
239000011877 solvent mixture Substances 0.000 description 3
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
239000012965 benzophenone Substances 0.000 description 2
239000013078 crystal Substances 0.000 description 2
239000003822 epoxy resin Substances 0.000 description 2
238000009472 formulation Methods 0.000 description 2
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
238000000034 method Methods 0.000 description 2
229920000647 polyepoxide Polymers 0.000 description 2
WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 1
XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
239000012670 alkaline solution Substances 0.000 description 1
RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
150000001768 cations Chemical class 0.000 description 1
238000001311 chemical methods and process Methods 0.000 description 1
238000012937 correction Methods 0.000 description 1
ZXJXZNDDNMQXFV-UHFFFAOYSA-M crystal violet Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1[C+](C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 ZXJXZNDDNMQXFV-UHFFFAOYSA-M 0.000 description 1
230000001747 exhibiting effect Effects 0.000 description 1
239000011888 foil Substances 0.000 description 1
FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
QZIQJVCYUQZDIR-UHFFFAOYSA-N mechlorethamine hydrochloride Chemical compound Cl.ClCCN(C)CCCl QZIQJVCYUQZDIR-UHFFFAOYSA-N 0.000 description 1
125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
239000000047 product Substances 0.000 description 1
239000002904 solvent Substances 0.000 description 1
229920002554 vinyl polymer Polymers 0.000 description 1
230000000007 visual effect Effects 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0751—Silicon-containing compounds used as adhesion-promoting additives or as means to improve adhesion

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Printing Plates And Materials Therefor (AREA)

CA234,234A 1974-08-29 1975-08-27 Couche photosensible contenant du diazide de o-naphthoquinone, une resine et un aminoalkoxysilane Expired CA1061158A (fr)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
DE2441315A DE2441315A1 (de)	1974-08-29	1974-08-29	Mit o-naphthochinondiazidverbindung vorsensibilisierte druckplatte

Publications (1)

Publication Number	Publication Date
CA1061158A true CA1061158A (fr)	1979-08-28

Family

ID=5924350

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA234,234A Expired CA1061158A (fr)	1974-08-29	1975-08-27	Couche photosensible contenant du diazide de o-naphthoquinone, une resine et un aminoalkoxysilane

Country Status (13)

Country	Link
JP (1)	JPS5152002A (fr)
BE (1)	BE832775A (fr)
BR (1)	BR7505522A (fr)
CA (1)	CA1061158A (fr)
DE (1)	DE2441315A1 (fr)
DK (1)	DK387175A (fr)
FR (1)	FR2283461A1 (fr)
GB (1)	GB1514552A (fr)
IE (1)	IE41520B1 (fr)
IT (1)	IT1041533B (fr)
LU (1)	LU73261A1 (fr)
NL (1)	NL7510061A (fr)
SE (1)	SE405049B (fr)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB2034911B (en) *	1978-10-26	1983-02-09	Toray Industries	Dry planographic printing plate
FR2478641A1 (fr) *	1980-03-24	1981-09-25	Rhone Poulenc Ind	Nouveaux photosensibilisateurs, leur procede d'obtention et leur utilisation dans des compositions photoresists
US4400100A (en) *	1981-03-02	1983-08-23	International Business Machines Corp.	Four layered ribbon for electrothermal printing
DE3473359D1 (de) *	1983-06-29	1988-09-15	Fuji Photo Film Co Ltd	Photosolubilizable composition
JPH04161957A (ja) *	1990-10-24	1992-06-05	Nippon Paint Co Ltd	光重合性組成物および感光性平版印刷版
JP2003119344A (ja)	2001-10-12	2003-04-23	Shin Etsu Chem Co Ltd	ハイブリッド化合物、レジスト材料及びパターン形成方法
JP5407563B2 (ja) *	2008-07-04	2014-02-05	Ｊｓｒ株式会社	ポジ型感放射線性樹脂組成物

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS494851B1 (fr) *	1968-04-26	1974-02-04
US3615538A (en) *	1968-08-02	1971-10-26	Printing Dev Inc	Photosensitive printing plates
JPS5119982B2 (fr) *	1972-01-26	1976-06-22
FR2193864B1 (fr) *	1972-07-31	1974-12-27	Rhone Poulenc Sa

1974
- 1974-08-29 DE DE2441315A patent/DE2441315A1/de not_active Ceased
1975
- 1975-08-26 NL NL7510061A patent/NL7510061A/xx not_active Application Discontinuation
- 1975-08-26 BE BE159492A patent/BE832775A/fr not_active IP Right Cessation
- 1975-08-27 GB GB35340/75A patent/GB1514552A/en not_active Expired
- 1975-08-27 SE SE7509509A patent/SE405049B/xx unknown
- 1975-08-27 IT IT51079/75A patent/IT1041533B/it active
- 1975-08-27 CA CA234,234A patent/CA1061158A/fr not_active Expired
- 1975-08-27 LU LU73261A patent/LU73261A1/xx unknown
- 1975-08-27 IE IE1872/75A patent/IE41520B1/en unknown
- 1975-08-28 JP JP50104489A patent/JPS5152002A/ja active Pending
- 1975-08-28 BR BR7505522*D patent/BR7505522A/pt unknown
- 1975-08-28 DK DK387175A patent/DK387175A/da unknown
- 1975-08-28 FR FR7526479A patent/FR2283461A1/fr active Granted

Also Published As

Publication number	Publication date
BR7505522A (pt)	1976-08-03
GB1514552A (en)	1978-06-14
LU73261A1 (fr)	1977-04-15
IT1041533B (it)	1980-01-10
DE2441315A1 (de)	1976-03-11
SE405049B (sv)	1978-11-13
NL7510061A (nl)	1976-03-02
FR2283461B1 (fr)	1978-04-07
JPS5152002A (en)	1976-05-08
IE41520B1 (en)	1980-01-16
FR2283461A1 (fr)	1976-03-26
BE832775A (fr)	1976-02-26
SE7509509L (sv)	1976-03-01
DK387175A (da)	1976-03-01
IE41520L (en)	1976-02-29

Publication	Publication Date	Title
CA1094379A (fr)	1981-01-27	Substance photosensible
CA1113107A (fr)	1981-11-24	Composition photosensible de reprographie
SU1178334A3 (ru)	1985-09-07	Фотополимеризующа с композици
US3890152A (en)	1975-06-17	Light-sensitive copying composition containing diazo resin and quinone diazide
US3785825A (en)	1974-01-15	Light-sensitive quinone diazide compounds,compositions,and presensitized lithographic plate
US5320931A (en)	1994-06-14	Light-sensitive composition
US3295974A (en)	1967-01-03	Light sensitive epoxy material for the photomechanical production of printing plates
JPS6235347A (ja)	1987-02-16	ポジ型ホトレジスト組成物
US4163672A (en)	1979-08-07	Photosensitive composition
JPH05158230A (ja)	1993-06-25	ポジ型感光性組成物
JPS561044A (en)	1981-01-08	Photosensitive composition
US5143816A (en)	1992-09-01	Light-sensitive composition comprising a polysiloxane and a naphthoquinone
GB2034911A (en)	1980-06-11	Dry planographic printing plate
EP0229629B1 (fr)	1991-03-20	Composition macromoléculaire photosensible
EP0130599A2 (fr)	1985-01-09	Composition photosolubilisable
JPWO2012102261A1 (ja)	2014-06-30	ジケトン構造含有有機基を含むシリコン含有レジスト下層膜形成組成物
KR870011503A (ko)	1987-12-23	혼합 에스테르 o-퀴논 감광제
GB1494043A (en)	1977-12-07	Photosensitive lithographic printing plate precursors
IE41520B1 (en)	1980-01-16	Improvements in presensitized printing plates
EP0360618B1 (fr)	1992-12-16	Composition photosensible
EP0410606A2 (fr)	1991-01-30	Polysiloxanes et compositions photoréserves positives
KR870011502A (ko)	1987-12-23	감광제 조성물
US5141840A (en)	1992-08-25	Light-sensitive composition containing onium salt and polysiloxane reaction product
JP2652010B2 (ja)	1997-09-10	ポジ型感光性組成物
US4299905A (en)	1981-11-10	Water-developable film-forming diazonium compound containing photopolymerizable compositions and negative-working lithographic plates prepared therefrom