SU1178334A3 - Фотополимеризующа с композици - Google Patents
Фотополимеризующа с композици Download PDFInfo
- Publication number
- SU1178334A3 SU1178334A3 SU792723099A SU2723099A SU1178334A3 SU 1178334 A3 SU1178334 A3 SU 1178334A3 SU 792723099 A SU792723099 A SU 792723099A SU 2723099 A SU2723099 A SU 2723099A SU 1178334 A3 SU1178334 A3 SU 1178334A3
- Authority
- SU
- USSR - Soviet Union
- Prior art keywords
- photoinitiator
- composition
- epoxy monomer
- ratio
- sample
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 11
- 239000000178 monomer Substances 0.000 claims abstract description 8
- 239000004593 Epoxy Substances 0.000 claims abstract description 7
- 150000003839 salts Chemical class 0.000 claims abstract 2
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 claims 1
- 229940068918 polyethylene glycol 400 Drugs 0.000 claims 1
- 125000005409 triarylsulfonium group Chemical group 0.000 claims 1
- 239000004698 Polyethylene Substances 0.000 abstract 1
- -1 polyethylene Polymers 0.000 abstract 1
- 229920000573 polyethylene Polymers 0.000 abstract 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 5
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 4
- 239000000126 substance Substances 0.000 description 2
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 1
- 101100231508 Caenorhabditis elegans ceh-5 gene Proteins 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 1
- 238000005538 encapsulation Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000002990 reinforced plastic Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 150000008054 sulfonate salts Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C07F9/902—Compounds without antimony-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/687—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
1. «ЮТОПОЛИМЕРИЗУЩАЯ КОМПОЗИЦИЯ , включающа эпоксидный мономер и фотоинициатор, отличающа с тем, что, с целью повышени скорости отверждени , в качестве фотоинициатора композици содержит комплексную соль т{ иарщ1сульфони общей формулы Кз где X. F, ОВ; RI R. |. п t при следующем соотношении компоненОВ1 IfSC..4.l , Эпоксидный мономер 50-100 Фотоинициатор 0,05-0,5 2. Композици по п. 1, о т л ичающа с тем, что она дополО ) нительно содержит полиэтиленглН-. коль-400 при соотнош йин эпоксидного мономера и полиэтш1енгликол -400, равном 1:1. в
Description
W 1. 11 Изобретение относитс к фотополимеризующимс составам, которые могут найти применение дл оптических линз корпусов автомобилей и лодок, форм, амортизационных материалов армированных пластиков, защитных покрытий, смол дл заливки, уплотнени или инкапсул ции компонентов электроники Цель изобретени - повышение скорости отверждени составов. Примеры 1-8. Готов т растворы , содержащие 100 мае.ч. диглициДШ10ВОГО эфира B-Uc -фенола (эпоксидиь т мономер ДЕК фирмы Дау Кемикел К ) и 0,1 мае.ч. сульфониевых солей (табл. 1). Каждый раствор отвешивают 3 форму из сажевого каучука дл ;г;лучени образца толщиной 0,5 см. 3:п ем форму помещают под лампы 275 В солнечного света на рассто нии 10 см. Каждый образец после такой экспозиции погружают в ацетон, ймсугаивают, измер ют толщину. Полученные результаты приведены в табл. 1. Примеры 9-18. Готов т раствор . содержащие 100 мае.ч. эпокси-ла -- 3,4-эпоксициклогексилметш1-3,4--эиоксициклогекеенкарбоксилат ( ERZ 221 фирмы Юнион Карбайд Корп.0 и 0,1 мае.ч. сульфониевых солей, перечисленнык в табл. 2. Каждый раст4 вор отвешивают в форму из сажевого каучука дл цолучени образца толщиной 0,5 см. Затем форму помещают под лампу солнечного света 275 В на рассто нии 10 см.Каждьй образец экспонируют 4 мин и 15 мин. После отверждени образец помещают в ацетон, перемешивают 20 мин, вьшимают, сушат на воздухе, измер ют толщину. Данные приведены в табл. 2. Примеры 19-24. Готов т составы , содержащие эпоксидный мономер диглицидиловый эфир полипропиленгликол (ДЁЯ-736 фирмы ДАУ Кемикал К ) и сульфониевые соли (см. табл. 3). Полученные составы экспонируют JB каучуковой форме под лампой солнечного света 275 В на рассто нии 10 см. Данные приведены в табл.3. Примеры 25-35. Готов т растворы, содержащие 50 йас.ч. 3,4-эпоксициклогексилметил-З,4-эпоксициклогексанкарбоксилата .(ERZ-4221 фирмы Юнион Карбайд Корп.) и 50 мае.ч. полиэт-ш1енгликол -400. К 20 мае.ч. этого раствора добавл ют количеетво фотоинициатора, указанное в табл. 4. Образцы заливают в каучуковую форму толщиной 12,7 мм и экепонируют под лампой солнечного света 275 В на рассто нии 10 см. Результаты приведены в табл. 4. Т а б л и ц а 1
C. ( ),SbFg Az, S SbFg
()SbF6 C. .S ( (Cl
()58 sbFe
(CgH)I SbF ) SbF
5
5;
0,2-0,5 0,7-1,0 0,7-1,0 1,0-1,2 1,1-1,2 1,1-1,2
Образец
Сульфониева соль по примеру
()2SbFg
SbFg
Ar,S
( CgHjSCCgHp SbFgOH (CgHpS ,S( ( CgH,S(CeH5)BF4 ( C,H,-S(C6H5)2AsF ArjS PFe AsF BF4
Сульфониева соль
Ilproiep
.,
SbF
Ar SF
C,(,)P7
FFg
BF4
Толщина в мм, при экспозиции
гз; 4 мин I 1Ь мин
0 0 0 0 0 0
Таблица 3
Соль сульфони , мае.ч. Яа 100 мае.ч. эпоксида
5,6 5,6
0
0
0
0
Т а б л и ц а 4
Claims (2)
1. ФОТОПОЛИМЕРИЗУЮЩАЯ КОМПОЗИЦИЯ, включающая эпоксидный мономер и фотоинициатор,' отличающаяся тем, что, с целью повышения скорости отверждения, в качестве фотоинициатора композиция содержит комплексную соль триарилсульфония общей формулы где X = F, ОН;
Rr R4= н (при следующем соотношении компонентов! мас.ч.: ' , ·
Эпоксидный мономер 50-100 Фотоинициатор 0,05-0,5 ·
2. Композиция по п. 1, о т л ичающаяся тем, что она дополнительно содержит полиэтиленгли·· < коль-400 при соотношении эпоксидного мономера и полиэтиленгликоля-400, равном 1:1.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US05/876,114 US4173476A (en) | 1978-02-08 | 1978-02-08 | Complex salt photoinitiator |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SU1178334A3 true SU1178334A3 (ru) | 1985-09-07 |
Family
ID=25367025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SU792723099A SU1178334A3 (ru) | 1978-02-08 | 1979-02-07 | Фотополимеризующа с композици |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US4173476A (ru) |
| JP (1) | JPS54151936A (ru) |
| AR (1) | AR223168A1 (ru) |
| AU (1) | AU521611B2 (ru) |
| BE (1) | BE874004A (ru) |
| BR (1) | BR7900747A (ru) |
| CA (1) | CA1121092A (ru) |
| CH (1) | CH640222A5 (ru) |
| DE (2) | DE2904626A1 (ru) |
| FR (1) | FR2416884A1 (ru) |
| GB (1) | GB2014144B (ru) |
| IN (1) | IN154811B (ru) |
| SE (1) | SE446862B (ru) |
| SU (1) | SU1178334A3 (ru) |
| ZA (1) | ZA786897B (ru) |
Families Citing this family (257)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4407759A (en) * | 1974-05-02 | 1983-10-04 | General Electric Company | Photoinitiators |
| US4299938A (en) * | 1979-06-19 | 1981-11-10 | Ciba-Geigy Corporation | Photopolymerizable and thermally polymerizable compositions |
| US4286047A (en) * | 1979-07-25 | 1981-08-25 | Minnesota Mining And Manufacturing Company | Pressure-sensitive adhesive susceptible to ultraviolet light-induced detackification |
| US4250203A (en) * | 1979-08-30 | 1981-02-10 | American Can Company | Cationically polymerizable compositions containing sulfonium salt photoinitiators and odor suppressants and method of polymerization using same |
| US4374066A (en) * | 1979-09-28 | 1983-02-15 | General Electric Company | Method for making triarylsulfonium salts |
| ZA805273B (en) * | 1979-09-28 | 1981-11-25 | Gen Electric | Process of deep section curing photocurable compositions |
| GB2069486B (en) * | 1980-02-19 | 1984-09-26 | Gen Electric | Method for making triarylsulphonium salts |
| US4339567A (en) * | 1980-03-07 | 1982-07-13 | Ciba-Geigy Corporation | Photopolymerization by means of sulphoxonium salts |
| US4319974A (en) * | 1980-04-21 | 1982-03-16 | General Electric Company | UV Curable compositions and substrates treated therewith |
| US4367251A (en) * | 1980-04-21 | 1983-01-04 | General Electric Company | UV Curable compositions and substrates treated therewith |
| US4362263A (en) * | 1980-04-24 | 1982-12-07 | Westinghouse Electric Corp. | Solderable solventless UV curable enamel |
| US4383025A (en) * | 1980-07-10 | 1983-05-10 | Ciba-Geigy Corporation | Photopolymerization by means of sulfoxonium salts |
| US4398014A (en) * | 1980-11-04 | 1983-08-09 | Ciba-Geigy Corporation | Sulfoxonium salts and their use as polymerization catalysts |
| US4874798A (en) * | 1983-02-07 | 1989-10-17 | Union Carbide Corporation | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents |
| US4812488A (en) * | 1983-02-07 | 1989-03-14 | Union Carbide Corporation | Photocopolymerizable compositions based on hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents |
| US4622349A (en) * | 1983-02-07 | 1986-11-11 | Union Carbide Corporation | Blends of epoxides and monoepoxides |
| US4818776A (en) * | 1983-02-07 | 1989-04-04 | Union Carbide Corporation | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials having primary hydroxyl content |
| US4593051A (en) * | 1983-02-07 | 1986-06-03 | Union Carbide Corporation | Photocopolymerizable compositons based on epoxy and polymer/hydroxyl-containing organic materials |
| US4814361A (en) * | 1983-02-07 | 1989-03-21 | Union Carbide Corporation | Blends of epoxides and monoepoxides |
| GB2137626B (en) * | 1983-03-31 | 1986-10-15 | Sericol Group Ltd | Water based photopolymerisable compositions and their use |
| JPS6121126A (ja) * | 1984-07-11 | 1986-01-29 | Suriibondo:Kk | 紫外線硬化性樹脂組成物 |
| US4946817A (en) * | 1984-07-17 | 1990-08-07 | The Dow Chemical Company | Latent catalysts for epoxy-containing compounds |
| US4594291A (en) * | 1984-07-17 | 1986-06-10 | The Dow Chemical Company | Curable, partially advanced epoxy resins |
| US5503937A (en) * | 1984-07-17 | 1996-04-02 | The Dow Chemical Company | Curable composition which comprises adducts of heterocyclic compounds |
| US4554342A (en) * | 1984-07-30 | 1985-11-19 | Shell Oil Company | Heat-curable compositions comprising an epoxy resin, an amine and a sulfonium salt |
| DE3537401A1 (de) * | 1984-10-22 | 1986-04-24 | General Electric Co., Schenectady, N.Y. | Verfahren zur herstellung von triarylsulfoniumsalzen |
| JPS61190524A (ja) * | 1985-01-25 | 1986-08-25 | Asahi Denka Kogyo Kk | エネルギ−線硬化性組成物 |
| US4694029A (en) * | 1985-04-09 | 1987-09-15 | Cook Paint And Varnish Company | Hybrid photocure system |
| US5012001A (en) * | 1985-09-03 | 1991-04-30 | General Electric Company | Triaryl sulfonium photoinitiators |
| US4882245A (en) * | 1985-10-28 | 1989-11-21 | International Business Machines Corporation | Photoresist composition and printed circuit boards and packages made therewith |
| US4892894A (en) * | 1985-11-07 | 1990-01-09 | Union Carbide Chemical And Plastics Company Inc. | Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials |
| US4654379A (en) * | 1985-12-05 | 1987-03-31 | Allied Corporation | Semi-interpenetrating polymer networks |
| DE3604580A1 (de) * | 1986-02-14 | 1987-08-20 | Basf Ag | Haertbare mischungen, enthaltend n-sulfonylaminosulfoniumsalze als kationisch wirksame katalysatoren |
| US4690957A (en) * | 1986-02-27 | 1987-09-01 | Mitsubishi Denki Kabushiki Kaisha | Ultra-violet ray curing type resin composition |
| US4751138A (en) | 1986-08-11 | 1988-06-14 | Minnesota Mining And Manufacturing Company | Coated abrasive having radiation curable binder |
| US4857562A (en) * | 1987-01-30 | 1989-08-15 | General Electric Company | UV curable epoxy resin compositions with delayed cure |
| US4760013A (en) * | 1987-02-17 | 1988-07-26 | International Business Machines Corporation | Sulfonium salt photoinitiators |
| US4975300A (en) * | 1987-12-31 | 1990-12-04 | Minnesota Mining And Manufacturing Company | Method for curing an organic coating using condensation heating and radiation energy |
| DE3806745A1 (de) * | 1988-03-02 | 1989-09-14 | Henkel Kgaa | Lichtinduziert dunkelhaertende klebstoffe |
| EP0379464B1 (de) * | 1989-01-16 | 1993-02-10 | Ciba-Geigy Ag | Araliphatische Sulfoniumsalze und deren Verwendung |
| US5247113A (en) * | 1989-01-16 | 1993-09-21 | Ciba-Geigy Corporation | Araliphatic sulfonium and their use |
| DE3902114A1 (de) * | 1989-01-25 | 1990-08-02 | Basf Ag | Strahlungsempfindliche, ethylenisch ungesaettigte, copolymerisierbare sulfoniumsalze und verfahren zu deren herstellung |
| EP0410606B1 (en) | 1989-07-12 | 1996-11-13 | Fuji Photo Film Co., Ltd. | Siloxane polymers and positive working light-sensitive compositions comprising the same |
| US5110711A (en) * | 1989-10-10 | 1992-05-05 | International Business Machines Corporation | Method for forming a pattern |
| US5059512A (en) * | 1989-10-10 | 1991-10-22 | International Business Machines Corporation | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions |
| US5098816A (en) * | 1989-10-10 | 1992-03-24 | International Business Machines Corporation | Method for forming a pattern of a photoresist |
| CA2034400A1 (en) * | 1990-04-30 | 1991-10-31 | James Vincent Crivello | Method for making triarylsulfonium hexafluorometal or metalloid salts |
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| US5814431A (en) | 1996-01-10 | 1998-09-29 | Mitsubishi Chemical Corporation | Photosensitive composition and lithographic printing plate |
| US5907333A (en) * | 1997-03-28 | 1999-05-25 | Lexmark International, Inc. | Ink jet print head containing a radiation curable resin layer |
| US5931803A (en) * | 1997-04-04 | 1999-08-03 | Playtex Products, Inc. | Epoxy coated tampon applicator having a pierce-through fingergrip |
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| US2514186A (en) * | 1945-10-22 | 1950-07-04 | Firestone Tire & Rubber Co | Antimony phenol sulfides |
| US2581930A (en) * | 1950-01-25 | 1952-01-08 | Firestone Tire & Rubber Co | Stabilization of rubber with a mixture of a phenol sulfide and trivalent antimony oxide |
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| NL128404C (ru) * | 1959-12-24 | |||
| US3691133A (en) * | 1971-03-25 | 1972-09-12 | Union Carbon Corp | Polyepoxide compositions containing dicyandiamide and an iodonium, phosphonium, or sulfonium salt |
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| GB1512982A (en) * | 1974-05-02 | 1978-06-01 | Gen Electric | Salts |
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- 1978-02-08 US US05/876,114 patent/US4173476A/en not_active Expired - Lifetime
- 1978-12-08 ZA ZA786897A patent/ZA786897B/xx unknown
- 1978-12-29 CA CA000318857A patent/CA1121092A/en not_active Expired
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1979
- 1979-02-05 SE SE7900980A patent/SE446862B/sv unknown
- 1979-02-07 BE BE0/193326A patent/BE874004A/xx not_active IP Right Cessation
- 1979-02-07 DE DE19792904626 patent/DE2904626A1/de active Granted
- 1979-02-07 BR BR7900747A patent/BR7900747A/pt unknown
- 1979-02-07 SU SU792723099A patent/SU1178334A3/ru active
- 1979-02-07 AU AU44025/79A patent/AU521611B2/en not_active Ceased
- 1979-02-07 JP JP1318879A patent/JPS54151936A/ja active Granted
- 1979-02-07 AR AR275421A patent/AR223168A1/es active
- 1979-02-07 DE DE2954646A patent/DE2954646C2/de not_active Expired - Lifetime
- 1979-02-07 FR FR7903070A patent/FR2416884A1/fr active Granted
- 1979-02-07 GB GB7904234A patent/GB2014144B/en not_active Expired
- 1979-02-07 CH CH121379A patent/CH640222A5/de not_active IP Right Cessation
-
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- 1982-09-13 IN IN1059/CAL/82A patent/IN154811B/en unknown
Non-Patent Citations (1)
| Title |
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| Патент US 4058401, кл. 96-48, опублик. 1975. * |
Also Published As
| Publication number | Publication date |
|---|---|
| AU521611B2 (en) | 1982-04-22 |
| AU4402579A (en) | 1979-08-16 |
| JPS6326105B2 (ru) | 1988-05-27 |
| DE2954646C2 (ru) | 1991-01-24 |
| IN154811B (ru) | 1984-12-15 |
| SE446862B (sv) | 1986-10-13 |
| ZA786897B (en) | 1980-07-30 |
| SE7900980L (sv) | 1979-08-09 |
| FR2416884A1 (fr) | 1979-09-07 |
| AR223168A1 (es) | 1981-07-31 |
| DE2904626C2 (ru) | 1989-10-05 |
| GB2014144B (en) | 1982-07-28 |
| GB2014144A (en) | 1979-08-22 |
| BE874004A (fr) | 1979-08-07 |
| CH640222A5 (de) | 1983-12-30 |
| CA1121092A (en) | 1982-03-30 |
| FR2416884B1 (ru) | 1984-08-17 |
| DE2904626A1 (de) | 1979-08-09 |
| BR7900747A (pt) | 1979-08-28 |
| JPS54151936A (en) | 1979-11-29 |
| US4173476A (en) | 1979-11-06 |
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