CA1143005A - Appareil de pulverisation cathodique rf a bloc d'alimentation multi-reseau - Google Patents

Appareil de pulverisation cathodique rf a bloc d'alimentation multi-reseau

Info

Publication number
CA1143005A
CA1143005A CA000336679A CA336679A CA1143005A CA 1143005 A CA1143005 A CA 1143005A CA 000336679 A CA000336679 A CA 000336679A CA 336679 A CA336679 A CA 336679A CA 1143005 A CA1143005 A CA 1143005A
Authority
CA
Canada
Prior art keywords
network
impedance
source
voltage
line section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000336679A
Other languages
English (en)
Inventor
Harold J. Weber
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Coulter Systems Corp
Original Assignee
Coulter Systems Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/066,917 external-priority patent/US4284490A/en
Application filed by Coulter Systems Corp filed Critical Coulter Systems Corp
Application granted granted Critical
Publication of CA1143005A publication Critical patent/CA1143005A/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3444—Associated circuits
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H7/00—Multiple-port networks comprising only passive electrical elements as network components
    • H03H7/38—Impedance-matching networks

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
CA000336679A 1979-08-21 1979-09-28 Appareil de pulverisation cathodique rf a bloc d'alimentation multi-reseau Expired CA1143005A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/066,917 US4284490A (en) 1978-09-28 1979-08-21 R.F. Sputtering apparatus including multi-network power supply
US066,917 1987-06-25

Publications (1)

Publication Number Publication Date
CA1143005A true CA1143005A (fr) 1983-03-15

Family

ID=22072548

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000336679A Expired CA1143005A (fr) 1979-08-21 1979-09-28 Appareil de pulverisation cathodique rf a bloc d'alimentation multi-reseau

Country Status (7)

Country Link
JP (1) JPS56108875A (fr)
CA (1) CA1143005A (fr)
DE (1) DE2939167A1 (fr)
FR (1) FR2464009A1 (fr)
GB (1) GB2058470A (fr)
NL (1) NL7907241A (fr)
SE (1) SE7908083L (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0633452B2 (ja) * 1985-06-25 1994-05-02 株式会社シンクロン スパツタ装置
JP2831961B2 (ja) * 1988-01-11 1998-12-02 忠弘 大見 薄膜形成装置のスパッタリング制御装置
JPH02156081A (ja) * 1988-12-09 1990-06-15 Tokuda Seisakusho Ltd スパッタ装置
JP2001516954A (ja) * 1997-09-17 2001-10-02 東京エレクトロン株式会社 電気インピーダンス整合システムとその方法
DE10015699B4 (de) * 2000-03-27 2004-03-18 Forschungs- Und Applikationslabor Plasmatechnik Gmbh Dresden Schaltungsanordnung zur Impedanzkompensation
CN101057310B (zh) * 2004-11-12 2010-11-03 欧瑞康太阳Ip股份公司（特吕巴赫） 适于大面积衬底的电容性耦合rf等离子体反应器的阻抗匹配
DE202008006477U1 (de) * 2008-05-06 2008-07-24 Forschungs- Und Applikationslabor Plasmatechnik Gmbh Dresden Vorrichtung zur Modifizierung von Substratoberflächen
CN117004917B (zh) * 2023-08-14 2025-08-15 天津吉兆源科技有限公司 一种均匀性调节装置及磁控溅射真空镀膜机

Also Published As

Publication number Publication date
JPS56108875A (en) 1981-08-28
NL7907241A (nl) 1981-02-24
SE7908083L (sv) 1981-02-22
GB2058470A (en) 1981-04-08
FR2464009A1 (fr) 1981-02-27
DE2939167A1 (de) 1981-04-02

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