CA1151395A - Fabrication de silane et de silicone de haute purete - Google Patents
Fabrication de silane et de silicone de haute pureteInfo
- Publication number
- CA1151395A CA1151395A CA000334373A CA334373A CA1151395A CA 1151395 A CA1151395 A CA 1151395A CA 000334373 A CA000334373 A CA 000334373A CA 334373 A CA334373 A CA 334373A CA 1151395 A CA1151395 A CA 1151395A
- Authority
- CA
- Canada
- Prior art keywords
- silicon
- zone
- silane
- reaction zone
- trichlorosilane
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 131
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 129
- 238000004519 manufacturing process Methods 0.000 title claims description 42
- 229920001296 polysiloxane Polymers 0.000 title 1
- 238000006243 chemical reaction Methods 0.000 claims abstract description 104
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims abstract description 82
- 239000005052 trichlorosilane Substances 0.000 claims abstract description 80
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims abstract description 56
- 239000005049 silicon tetrachloride Substances 0.000 claims abstract description 56
- 239000012535 impurity Substances 0.000 claims abstract description 41
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims abstract description 26
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 140
- 229910052710 silicon Inorganic materials 0.000 claims description 116
- 239000010703 silicon Substances 0.000 claims description 116
- 238000000034 method Methods 0.000 claims description 104
- 230000008569 process Effects 0.000 claims description 95
- 229910052739 hydrogen Inorganic materials 0.000 claims description 51
- 238000004821 distillation Methods 0.000 claims description 46
- 239000001257 hydrogen Substances 0.000 claims description 44
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 41
- 238000007323 disproportionation reaction Methods 0.000 claims description 39
- 239000000463 material Substances 0.000 claims description 39
- 239000006227 byproduct Substances 0.000 claims description 38
- 238000000354 decomposition reaction Methods 0.000 claims description 37
- 239000000047 product Substances 0.000 claims description 31
- 239000002699 waste material Substances 0.000 claims description 27
- 239000007789 gas Substances 0.000 claims description 24
- 239000011863 silicon-based powder Substances 0.000 claims description 24
- 239000010949 copper Substances 0.000 claims description 23
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 22
- 229910052802 copper Inorganic materials 0.000 claims description 22
- 238000000746 purification Methods 0.000 claims description 22
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 18
- 239000003054 catalyst Substances 0.000 claims description 18
- 239000004065 semiconductor Substances 0.000 claims description 18
- 239000012530 fluid Substances 0.000 claims description 14
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 13
- 150000002431 hydrogen Chemical class 0.000 claims description 11
- 239000003456 ion exchange resin Substances 0.000 claims description 11
- 229920003303 ion-exchange polymer Polymers 0.000 claims description 11
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 9
- 125000001302 tertiary amino group Chemical group 0.000 claims description 9
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims description 8
- 230000015572 biosynthetic process Effects 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 8
- 230000008018 melting Effects 0.000 claims description 8
- 230000002708 enhancing effect Effects 0.000 claims description 7
- 239000003957 anion exchange resin Substances 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 239000000741 silica gel Substances 0.000 claims description 6
- 229910002027 silica gel Inorganic materials 0.000 claims description 6
- 239000011347 resin Substances 0.000 claims description 5
- 229920005989 resin Polymers 0.000 claims description 5
- 239000011856 silicon-based particle Substances 0.000 claims description 5
- 239000007787 solid Substances 0.000 claims description 5
- 238000007865 diluting Methods 0.000 claims description 4
- 230000007062 hydrolysis Effects 0.000 claims description 4
- 238000006460 hydrolysis reaction Methods 0.000 claims description 4
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 4
- 238000007596 consolidation process Methods 0.000 claims description 2
- 238000000227 grinding Methods 0.000 claims description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 2
- 238000004064 recycling Methods 0.000 claims 4
- 150000002500 ions Chemical class 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 238000005984 hydrogenation reaction Methods 0.000 abstract description 15
- 239000005046 Chlorosilane Substances 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 abstract description 3
- 150000001412 amines Chemical class 0.000 abstract description 2
- 229910004721 HSiCl3 Inorganic materials 0.000 abstract 2
- -1 amine hydrochloride Chemical class 0.000 abstract 1
- 238000012545 processing Methods 0.000 description 17
- 239000013078 crystal Substances 0.000 description 9
- 229910001507 metal halide Inorganic materials 0.000 description 6
- 150000005309 metal halides Chemical class 0.000 description 6
- 239000011541 reaction mixture Substances 0.000 description 6
- 238000013459 approach Methods 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 229920000548 poly(silane) polymer Polymers 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 238000010992 reflux Methods 0.000 description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 3
- 229910000519 Ferrosilicon Inorganic materials 0.000 description 3
- 229910052796 boron Inorganic materials 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 239000002210 silicon-based material Substances 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000010924 continuous production Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000003463 adsorbent Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 229920001429 chelating resin Polymers 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- 239000006200 vaporizer Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US93609178A | 1978-08-23 | 1978-08-23 | |
| US936,091 | 1986-11-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1151395A true CA1151395A (fr) | 1983-08-09 |
Family
ID=25468157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000334373A Expired CA1151395A (fr) | 1978-08-23 | 1979-08-23 | Fabrication de silane et de silicone de haute purete |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1151395A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013110247A1 (fr) * | 2012-01-28 | 2013-08-01 | Xi Chu | Procédé et système pour produire du silicium et dispositifs correspondants |
| CN110078080A (zh) * | 2019-04-26 | 2019-08-02 | 天津科技大学 | 一种结合渣浆处理与裂解反应的氯硅烷高沸物回收工艺 |
-
1979
- 1979-08-23 CA CA000334373A patent/CA1151395A/fr not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013110247A1 (fr) * | 2012-01-28 | 2013-08-01 | Xi Chu | Procédé et système pour produire du silicium et dispositifs correspondants |
| CN104271504A (zh) * | 2012-01-28 | 2015-01-07 | 储晞 | 用于生产硅和器件的方法及系统 |
| CN110540208A (zh) * | 2012-01-28 | 2019-12-06 | 储晞 | 一种生产硅的方法 |
| CN110078080A (zh) * | 2019-04-26 | 2019-08-02 | 天津科技大学 | 一种结合渣浆处理与裂解反应的氯硅烷高沸物回收工艺 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |