CA1162028A - Silane ultra-pur et obtention de silicium - Google Patents
Silane ultra-pur et obtention de siliciumInfo
- Publication number
- CA1162028A CA1162028A CA000357023A CA357023A CA1162028A CA 1162028 A CA1162028 A CA 1162028A CA 000357023 A CA000357023 A CA 000357023A CA 357023 A CA357023 A CA 357023A CA 1162028 A CA1162028 A CA 1162028A
- Authority
- CA
- Canada
- Prior art keywords
- silane
- silicon
- zone
- stream
- product
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910000077 silane Inorganic materials 0.000 title claims abstract description 157
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 title claims abstract description 155
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 136
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 126
- 239000010703 silicon Substances 0.000 title claims abstract description 125
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 40
- 238000000034 method Methods 0.000 claims abstract description 153
- 230000008569 process Effects 0.000 claims abstract description 147
- 238000007323 disproportionation reaction Methods 0.000 claims abstract description 78
- 238000006243 chemical reaction Methods 0.000 claims abstract description 74
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims abstract description 74
- 239000012535 impurity Substances 0.000 claims abstract description 65
- 238000004821 distillation Methods 0.000 claims abstract description 64
- 239000000047 product Substances 0.000 claims abstract description 62
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 claims abstract description 61
- 239000005049 silicon tetrachloride Substances 0.000 claims abstract description 61
- 239000005046 Chlorosilane Substances 0.000 claims abstract description 56
- 229910052796 boron Inorganic materials 0.000 claims abstract description 53
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims abstract description 51
- 239000012530 fluid Substances 0.000 claims abstract description 40
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 40
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical class Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims abstract description 39
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 37
- 239000003456 ion exchange resin Substances 0.000 claims abstract description 34
- 229920003303 ion-exchange polymer Polymers 0.000 claims abstract description 34
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000001257 hydrogen Substances 0.000 claims abstract description 32
- 239000000463 material Substances 0.000 claims abstract description 29
- 239000006227 byproduct Substances 0.000 claims abstract description 21
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims abstract description 9
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 claims description 68
- 239000005052 trichlorosilane Substances 0.000 claims description 56
- 239000007789 gas Substances 0.000 claims description 29
- 238000000926 separation method Methods 0.000 claims description 27
- 238000000354 decomposition reaction Methods 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 23
- 239000011347 resin Substances 0.000 claims description 21
- 229920005989 resin Polymers 0.000 claims description 21
- 238000000746 purification Methods 0.000 claims description 17
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 16
- 150000002500 ions Chemical class 0.000 claims description 15
- 239000011863 silicon-based powder Substances 0.000 claims description 11
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 229910052799 carbon Inorganic materials 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 8
- 125000001302 tertiary amino group Chemical group 0.000 claims description 8
- 238000002844 melting Methods 0.000 claims description 7
- 230000008018 melting Effects 0.000 claims description 7
- 239000007787 solid Substances 0.000 claims description 7
- 239000003957 anion exchange resin Substances 0.000 claims description 6
- 150000002431 hydrogen Chemical class 0.000 claims description 5
- 239000000741 silica gel Substances 0.000 claims description 4
- 229910002027 silica gel Inorganic materials 0.000 claims description 4
- 230000006872 improvement Effects 0.000 claims description 3
- 239000011856 silicon-based particle Substances 0.000 claims description 3
- 238000007865 diluting Methods 0.000 claims description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 2
- 238000004064 recycling Methods 0.000 claims 6
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims 4
- 238000005984 hydrogenation reaction Methods 0.000 abstract description 18
- 239000000460 chlorine Substances 0.000 abstract description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract description 3
- 229910052801 chlorine Inorganic materials 0.000 abstract description 3
- 238000012545 processing Methods 0.000 description 20
- 239000002699 waste material Substances 0.000 description 13
- 239000000306 component Substances 0.000 description 11
- 238000009835 boiling Methods 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 239000011541 reaction mixture Substances 0.000 description 9
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 8
- 229910052802 copper Inorganic materials 0.000 description 8
- 238000010992 reflux Methods 0.000 description 8
- 239000013078 crystal Substances 0.000 description 7
- 239000002245 particle Substances 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 5
- 239000000543 intermediate Substances 0.000 description 5
- 229910001507 metal halide Inorganic materials 0.000 description 5
- 150000005309 metal halides Chemical class 0.000 description 5
- 238000001179 sorption measurement Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 229920001429 chelating resin Polymers 0.000 description 4
- 238000011161 development Methods 0.000 description 4
- 229920000548 poly(silane) polymer Polymers 0.000 description 4
- 239000002210 silicon-based material Substances 0.000 description 4
- 239000012808 vapor phase Substances 0.000 description 4
- KPZGRMZPZLOPBS-UHFFFAOYSA-N 1,3-dichloro-2,2-bis(chloromethyl)propane Chemical compound ClCC(CCl)(CCl)CCl KPZGRMZPZLOPBS-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000002708 enhancing effect Effects 0.000 description 3
- 238000010348 incorporation Methods 0.000 description 3
- 230000000750 progressive effect Effects 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 235000012431 wafers Nutrition 0.000 description 3
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical class [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 229910000519 Ferrosilicon Inorganic materials 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000012159 carrier gas Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- 241001024304 Mino Species 0.000 description 1
- ZVSZKXVTEKJXJC-UHFFFAOYSA-N [Cl].[Cl].[Cl].[Cl].[Si] Chemical compound [Cl].[Cl].[Cl].[Cl].[Si] ZVSZKXVTEKJXJC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001638 boron Chemical class 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000007596 consolidation process Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000004320 controlled atmosphere Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- ZOCHARZZJNPSEU-UHFFFAOYSA-N diboron Chemical compound B#B ZOCHARZZJNPSEU-UHFFFAOYSA-N 0.000 description 1
- 125000003963 dichloro group Chemical group Cl* 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 230000003467 diminishing effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 231100001261 hazardous Toxicity 0.000 description 1
- 208000006278 hypochromic anemia Diseases 0.000 description 1
- 238000005342 ion exchange Methods 0.000 description 1
- QLNWXBAGRTUKKI-UHFFFAOYSA-N metacetamol Chemical compound CC(=O)NC1=CC=CC(O)=C1 QLNWXBAGRTUKKI-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229940099990 ogen Drugs 0.000 description 1
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910021422 solar-grade silicon Inorganic materials 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- KUAZQDVKQLNFPE-UHFFFAOYSA-N thiram Chemical compound CN(C)C(=S)SSC(=S)N(C)C KUAZQDVKQLNFPE-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- -1 ~ichlorosilane Chemical class 0.000 description 1
Landscapes
- Silicon Compounds (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US6275579A | 1979-08-01 | 1979-08-01 | |
| US062,755 | 1979-08-01 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1162028A true CA1162028A (fr) | 1984-02-14 |
Family
ID=22044578
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000357023A Expired CA1162028A (fr) | 1979-08-01 | 1980-07-25 | Silane ultra-pur et obtention de silicium |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA1162028A (fr) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5094831A (en) * | 1989-07-31 | 1992-03-10 | Degussa Aktiengesellschaft | Process for the dismutation of chlorosilanes |
| DE10061680A1 (de) * | 2000-12-11 | 2002-06-20 | Solarworld Ag | Verfahren zur Herstellung von Silan |
| DE10062413A1 (de) * | 2000-12-14 | 2002-07-04 | Solarworld Ag | Verfahren zur Herstellung von Trichlorsilan |
| FR2933714A1 (fr) * | 2008-07-11 | 2010-01-15 | Air Liquide | Procede de recyclage de silane (sih4) |
| US8691055B2 (en) | 2004-11-19 | 2014-04-08 | Memc Electronic Materials Spa | Processes for the purification of trichlorosilane or silicon tetrachloride |
| TWI472486B (zh) * | 2006-03-02 | 2015-02-11 | 緬克電子材料股份有限公司 | 用於純化三氯矽烷及四氯化矽之方法和裝置 |
| CN108394904A (zh) * | 2018-05-20 | 2018-08-14 | 宁波工程学院 | 一种圆台形冷却夹套的甲硅烷热分解炉 |
| TWI637908B (zh) * | 2012-04-27 | 2018-10-11 | 香港商各星有限公司 | 純化含鹵代矽烷流的方法 |
| WO2021104618A1 (fr) | 2019-11-27 | 2021-06-03 | Wacker Chemie Ag | Procédé permettant d'éliminer une impureté d'un mélange de chlorosilane |
| WO2021164876A1 (fr) | 2020-02-20 | 2021-08-26 | Wacker Chemie Ag | Procédé d'obtention d'hexachlorodisilane par réaction d'au moins un chlorodisilane partiellement hydrogéné sur un adsorbeur solide non fonctionnalisé |
| WO2022096098A1 (fr) | 2020-11-05 | 2022-05-12 | Wacker Chemie Ag | Procédé d'élimination d'une impureté d'un mélange de chlorosilane |
-
1980
- 1980-07-25 CA CA000357023A patent/CA1162028A/fr not_active Expired
Cited By (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5094831A (en) * | 1989-07-31 | 1992-03-10 | Degussa Aktiengesellschaft | Process for the dismutation of chlorosilanes |
| DE10061680A1 (de) * | 2000-12-11 | 2002-06-20 | Solarworld Ag | Verfahren zur Herstellung von Silan |
| DE10062413A1 (de) * | 2000-12-14 | 2002-07-04 | Solarworld Ag | Verfahren zur Herstellung von Trichlorsilan |
| US8691055B2 (en) | 2004-11-19 | 2014-04-08 | Memc Electronic Materials Spa | Processes for the purification of trichlorosilane or silicon tetrachloride |
| TWI472486B (zh) * | 2006-03-02 | 2015-02-11 | 緬克電子材料股份有限公司 | 用於純化三氯矽烷及四氯化矽之方法和裝置 |
| WO2009112730A3 (fr) * | 2008-03-04 | 2010-02-25 | L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | PROCEDE DE RECYCLAGE DE SILANE (SiH4) |
| FR2933714A1 (fr) * | 2008-07-11 | 2010-01-15 | Air Liquide | Procede de recyclage de silane (sih4) |
| TWI637908B (zh) * | 2012-04-27 | 2018-10-11 | 香港商各星有限公司 | 純化含鹵代矽烷流的方法 |
| CN108394904A (zh) * | 2018-05-20 | 2018-08-14 | 宁波工程学院 | 一种圆台形冷却夹套的甲硅烷热分解炉 |
| WO2021104618A1 (fr) | 2019-11-27 | 2021-06-03 | Wacker Chemie Ag | Procédé permettant d'éliminer une impureté d'un mélange de chlorosilane |
| US12291458B2 (en) | 2019-11-27 | 2025-05-06 | Wacker Chemie Ag | Method for removing an impurity from a chlorosilane mixture |
| WO2021164876A1 (fr) | 2020-02-20 | 2021-08-26 | Wacker Chemie Ag | Procédé d'obtention d'hexachlorodisilane par réaction d'au moins un chlorodisilane partiellement hydrogéné sur un adsorbeur solide non fonctionnalisé |
| US12098075B2 (en) | 2020-02-20 | 2024-09-24 | Wacker Chemie Ag | Method for obtaining hexachlorodisilane by reacting at least one partially hydrogenated chlorodisilane on a solid unfunctionalized adsorber |
| WO2022096098A1 (fr) | 2020-11-05 | 2022-05-12 | Wacker Chemie Ag | Procédé d'élimination d'une impureté d'un mélange de chlorosilane |
| US12391559B2 (en) | 2020-11-05 | 2025-08-19 | Wacker Chemie Ag | Process for removing an impurity from a chlorosilane mixture |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |