CA1247740A - Dispositif a porte flottante utilisant un dielectrique composite - Google Patents
Dispositif a porte flottante utilisant un dielectrique compositeInfo
- Publication number
- CA1247740A CA1247740A CA000500348A CA500348A CA1247740A CA 1247740 A CA1247740 A CA 1247740A CA 000500348 A CA000500348 A CA 000500348A CA 500348 A CA500348 A CA 500348A CA 1247740 A CA1247740 A CA 1247740A
- Authority
- CA
- Canada
- Prior art keywords
- layer
- floating gate
- silicon
- silicon dioxide
- charge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007667 floating Methods 0.000 title claims abstract description 87
- 239000002131 composite material Substances 0.000 title claims abstract description 33
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 51
- 230000015654 memory Effects 0.000 claims abstract description 35
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 25
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 25
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 238000012546 transfer Methods 0.000 claims abstract description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 15
- 239000010703 silicon Substances 0.000 claims abstract description 15
- 229910052581 Si3N4 Inorganic materials 0.000 claims abstract description 14
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims abstract description 14
- 230000005689 Fowler Nordheim tunneling Effects 0.000 claims abstract description 10
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 13
- 230000005669 field effect Effects 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 3
- 238000002955 isolation Methods 0.000 claims description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 2
- 229960001866 silicon dioxide Drugs 0.000 claims 11
- 238000007600 charging Methods 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 230000007723 transport mechanism Effects 0.000 claims 1
- 230000014759 maintenance of location Effects 0.000 abstract description 11
- 150000004767 nitrides Chemical class 0.000 description 39
- 238000009792 diffusion process Methods 0.000 description 15
- 230000005641 tunneling Effects 0.000 description 8
- 229920005591 polysilicon Polymers 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- 230000007246 mechanism Effects 0.000 description 6
- 239000003989 dielectric material Substances 0.000 description 5
- 230000005684 electric field Effects 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 230000000717 retained effect Effects 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 241001663154 Electron Species 0.000 description 2
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000002457 bidirectional effect Effects 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 230000003252 repetitive effect Effects 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 240000001973 Ficus microcarpa Species 0.000 description 1
- LPQOADBMXVRBNX-UHFFFAOYSA-N ac1ldcw0 Chemical compound Cl.C1CN(C)CCN1C1=C(F)C=C2C(=O)C(C(O)=O)=CN3CCSC1=C32 LPQOADBMXVRBNX-UHFFFAOYSA-N 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 235000010210 aluminium Nutrition 0.000 description 1
- 230000001609 comparable effect Effects 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229940035564 duration Drugs 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000001272 nitrous oxide Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
Landscapes
- Non-Volatile Memory (AREA)
- Read Only Memory (AREA)
- Semiconductor Memories (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US70963085A | 1985-03-08 | 1985-03-08 | |
| US709,630 | 1985-03-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1247740A true CA1247740A (fr) | 1988-12-28 |
Family
ID=24850680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000500348A Expired CA1247740A (fr) | 1985-03-08 | 1986-01-24 | Dispositif a porte flottante utilisant un dielectrique composite |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS62502156A (fr) |
| CA (1) | CA1247740A (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0746704B2 (ja) * | 1986-05-15 | 1995-05-17 | 松下電子工業株式会社 | 半導体記憶装置 |
| JP4609533B2 (ja) | 2008-06-12 | 2011-01-12 | セイコーエプソン株式会社 | 半導体集積回路 |
| JP5606235B2 (ja) * | 2010-09-14 | 2014-10-15 | セイコーインスツル株式会社 | 半導体不揮発性メモリ装置 |
-
1986
- 1986-01-24 CA CA000500348A patent/CA1247740A/fr not_active Expired
- 1986-02-24 JP JP61501353A patent/JPS62502156A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62502156A (ja) | 1987-08-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKEX | Expiry |