CA2006124A1 - Laser a retroaction repartie pour systemes de communication a modulation de frequence - Google Patents

Laser a retroaction repartie pour systemes de communication a modulation de frequence

Info

Publication number
CA2006124A1
CA2006124A1 CA2006124A CA2006124A CA2006124A1 CA 2006124 A1 CA2006124 A1 CA 2006124A1 CA 2006124 A CA2006124 A CA 2006124A CA 2006124 A CA2006124 A CA 2006124A CA 2006124 A1 CA2006124 A1 CA 2006124A1
Authority
CA
Canada
Prior art keywords
oxidation
molybdenum foil
ion implantation
electrical lead
communication systems
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2006124A
Other languages
English (en)
Other versions
CA2006124C (fr
Inventor
Andrew R. Chraplyvy
Thomas L. Koch
Robert W. Tkach
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
American Telephone and Telegraph Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc
Publication of CA2006124A1 publication Critical patent/CA2006124A1/fr
Application granted granted Critical
Publication of CA2006124C publication Critical patent/CA2006124C/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/30Structure or shape of the active region; Materials used for the active region
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • H01S5/0622Controlling the frequency of the radiation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08Construction or shape of optical resonators or components thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/0618Details on the linewidth enhancement parameter alpha
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/06Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
    • H01S5/062Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
    • H01S5/06209Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in single-section lasers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/10Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
    • H01S5/12Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
    • H01S5/124Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers incorporating phase shifts

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Semiconductor Lasers (AREA)
  • Optical Communication System (AREA)
  • Vessels And Coating Films For Discharge Lamps (AREA)
CA002006124A 1989-01-27 1989-12-20 Laser a retroaction repartie pour systemes de communication a modulation de frequence Expired - Lifetime CA2006124C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/303,594 US4908833A (en) 1989-01-27 1989-01-27 Distributed feedback laser for frequency modulated communication systems
US303,594 1989-01-27

Publications (2)

Publication Number Publication Date
CA2006124A1 true CA2006124A1 (fr) 1990-07-27
CA2006124C CA2006124C (fr) 1993-10-12

Family

ID=23172814

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002006124A Expired - Lifetime CA2006124C (fr) 1989-01-27 1989-12-20 Laser a retroaction repartie pour systemes de communication a modulation de frequence

Country Status (10)

Country Link
US (1) US4908833A (fr)
EP (1) EP0380242B1 (fr)
JP (1) JPH069285B2 (fr)
KR (1) KR930002820B1 (fr)
CA (1) CA2006124C (fr)
DE (1) DE69007812T2 (fr)
DK (1) DK0380242T3 (fr)
ES (1) ES2050944T3 (fr)
HK (1) HK43095A (fr)
SG (1) SG116294G (fr)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5020153A (en) * 1989-02-08 1991-05-28 At&T Bell Laboratories Tunable narrowband receiver utilizing distributed Bragg reflector laser structure
US5073892A (en) * 1989-06-12 1991-12-17 Hitachi, Ltd. Semiconductor laser device
DE3934998A1 (de) * 1989-10-20 1991-04-25 Standard Elektrik Lorenz Ag Elektrisch wellenlaengenabstimmbarer halbleiterlaser
US5011264A (en) * 1989-12-28 1991-04-30 General Dynamics Corp., Electronics Divn. Wide linear dynamic range optical modulator
US5031188A (en) * 1990-04-30 1991-07-09 At&T Bell Laboratories Inline diplex lightwave transceiver
JP2689698B2 (ja) * 1990-07-19 1997-12-10 国際電信電話株式会社 αパラメータ符号を反転させた半導体素子
US5088099A (en) * 1990-12-20 1992-02-11 At&T Bell Laboratories Apparatus comprising a laser adapted for emission of single mode radiation having low transverse divergence
FR2688963B1 (fr) * 1992-03-20 1994-05-13 France Telecom Emetteur-recepteur a detection coherente.
FR2690295B1 (fr) * 1992-04-21 1994-06-03 France Telecom Systeme de transmission optique interactif.
US5384799A (en) * 1993-09-09 1995-01-24 Martin Marietta Corporation Frequency stabilized laser with electronic tunable external cavity
JP3515361B2 (ja) * 1997-03-14 2004-04-05 株式会社東芝 半導体発光素子
EP1067644B1 (fr) 1999-01-27 2014-07-30 Furukawa Electric Co., Ltd. Module laser a semi-conducteur
JP2001036192A (ja) * 1999-07-22 2001-02-09 Nec Corp 分布帰還型半導体レーザおよびその製造方法
US7139299B2 (en) * 2002-03-04 2006-11-21 Quintessence Photonics Corporation De-tuned distributed feedback laser diode
US7907648B2 (en) * 2002-12-03 2011-03-15 Finisar Corporation Optical FM source based on intra-cavity phase and amplitude modulation in lasers
US8792531B2 (en) 2003-02-25 2014-07-29 Finisar Corporation Optical beam steering for tunable laser applications
JP5532082B2 (ja) * 2006-06-20 2014-06-25 日亜化学工業株式会社 窒化物半導体レーザ素子
JP2008028375A (ja) * 2006-06-20 2008-02-07 Nichia Chem Ind Ltd 窒化物半導体レーザ素子
US8131157B2 (en) 2007-01-22 2012-03-06 Finisar Corporation Method and apparatus for generating signals with increased dispersion tolerance using a directly modulated laser transmitter
US7991291B2 (en) 2007-02-08 2011-08-02 Finisar Corporation WDM PON based on DML
US7991297B2 (en) 2007-04-06 2011-08-02 Finisar Corporation Chirped laser with passive filter element for differential phase shift keying generation
US8204386B2 (en) * 2007-04-06 2012-06-19 Finisar Corporation Chirped laser with passive filter element for differential phase shift keying generation
US8260150B2 (en) 2008-04-25 2012-09-04 Finisar Corporation Passive wave division multiplexed transmitter having a directly modulated laser array
US8199785B2 (en) 2009-06-30 2012-06-12 Finisar Corporation Thermal chirp compensation in a chirp managed laser
US20180195905A1 (en) * 2015-07-27 2018-07-12 Finisar Corporation Sweep Control of an Optical Heterodyne Measurement System
US10063032B2 (en) * 2016-03-06 2018-08-28 Finisar Corporation Distributed reflector laser
US11251585B2 (en) 2019-10-01 2022-02-15 Ii-Vi Delaware, Inc. DFB with weak optical feedback
US11233375B2 (en) 2019-10-01 2022-01-25 Ii-Vi Delaware, Inc. Two-kappa DBR laser
US11784464B2 (en) 2020-09-30 2023-10-10 Ii-Vi Delaware, Inc. Directly modulated laser

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3760292A (en) * 1970-12-22 1973-09-18 Bell Telephone Labor Inc Integrated feedback laser
US3884549A (en) * 1973-04-30 1975-05-20 Univ California Two demensional distributed feedback devices and lasers
US4023993A (en) * 1974-08-22 1977-05-17 Xerox Corporation Method of making an electrically pumped solid-state distributed feedback laser
US4096446A (en) * 1976-02-02 1978-06-20 Bell Telephone Laboratories, Incorporated Distributed feedback devices with perturbations deviating from uniformity for removing mode degeneracy
EP0106305B1 (fr) * 1982-10-12 1989-03-15 Nec Corporation Laser semi-conducteur à hétérostructure double avec une structure périodique formée dans la couche de guidage
JPS60202974A (ja) * 1983-10-18 1985-10-14 Kokusai Denshin Denwa Co Ltd <Kdd> 分布帰還形半導体レ−ザ
JPH0666509B2 (ja) * 1983-12-14 1994-08-24 株式会社日立製作所 分布帰還型半導体レ−ザ装置
JPS60133782A (ja) * 1983-12-21 1985-07-16 Nec Corp 半導体レ−ザ
US4751710A (en) * 1984-07-26 1988-06-14 Nec Corporation Semiconductor laser device
JPS6147685A (ja) * 1984-08-15 1986-03-08 Kokusai Denshin Denwa Co Ltd <Kdd> 分布帰還形半導体レ−ザ
JPH0632332B2 (ja) * 1984-08-24 1994-04-27 日本電気株式会社 半導体レ−ザ装置

Also Published As

Publication number Publication date
JPH02246292A (ja) 1990-10-02
SG116294G (en) 1994-11-25
JPH069285B2 (ja) 1994-02-02
HK43095A (en) 1995-03-31
DK0380242T3 (da) 1994-07-04
EP0380242A2 (fr) 1990-08-01
US4908833A (en) 1990-03-13
CA2006124C (fr) 1993-10-12
EP0380242B1 (fr) 1994-04-06
KR930002820B1 (ko) 1993-04-10
KR900012392A (ko) 1990-08-04
ES2050944T3 (es) 1994-06-01
DE69007812D1 (de) 1994-05-11
DE69007812T2 (de) 1994-07-28
EP0380242A3 (fr) 1991-06-05

Similar Documents

Publication Publication Date Title
CA2006124A1 (fr) Laser a retroaction repartie pour systemes de communication a modulation de frequence
TW364153B (en) Structure of jointing metal element and ceramic element and method thereof
AU4048897A (en) Non-polymeric flexible organic light emitting device
CA2152769A1 (fr) Methode de production d&#39;une membrane de diamant synthetique
WO1987007651A1 (fr) Appareil de fabrication de semiconducteurs
AU4290396A (en) A method of depositing tungsten nitride using a source gas comprising silicon
AU2447397A (en) High frequency microelectronics package
TW373220B (en) Electron tube
TW335540B (en) Ball grid array electronic package standoff design
AU558997B2 (en) Decorative carbon coating
MY105117A (en) Plastioc coated stell tube.
AU7294498A (en) Electrically tunable low secondary electron emission diamond-like coatings and process for depositing coatings
CA2256646A1 (fr) Procede pour former une electrode sur un substrat
GB8401534D0 (en) Biocompatible surfaces
CA2255522A1 (fr) Nouveaux composes contenant des electrodonneurs
TW353813B (en) Electroluminescent layer system
GB2155496B (en) Pulsed plasma coating process
EP0209954A3 (fr) Consolidation à l&#39;état fondu de poudre de silicium
EP0389270A3 (fr) Canon à électrons avec une grille d&#39;ombre intégrale
EP0375402A3 (fr) Enveloppe en quartz pour lampe avec feuille en molybdène pourvue d&#39;une surface résistant à l&#39;oxydation réalisée par implantation ionique
AU6407086A (en) Arc vapor depositing a coating in an evacuated chamber
EP0383581A3 (fr) Matériaux de revêtement intérieur pour un tube à rayons cathodiques
AU5557398A (en) Stratified composite with phosphorescent properties, method for the production and the use thereof
EP0160202A3 (fr) Dépôt de revêtements à l&#39;aide d&#39;un plasma à micro-ondes et revêtements obtenus par ce procédé
AU2317484A (en) Process for metallizing a surface, using electron beam curing of a varnish

Legal Events

Date Code Title Description
EEER Examination request
MKEX Expiry