CA2048669A1 - Procede de revetement - Google Patents

Procede de revetement

Info

Publication number: CA2048669A1
Authority: CA; Canada
Prior art keywords: substrate; irradiated; layer; regions; radiation
Prior art date: 1989-12-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

CA 2048669

Other languages

English (en)

Inventor

Hilmar Esrom

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

ASEA BROWN BOVERI AG

Original Assignee

Individual

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-12-22

Filing date

1990-12-20

Publication date

1991-06-23

1990-12-20 Application filed by Individual filed Critical Individual

1991-06-23 Publication of CA2048669A1 publication Critical patent/CA2048669A1/fr

Status Abandoned legal-status Critical Current

Links

238000000576 coating method Methods 0.000 title abstract description 11
239000000758 substrate Substances 0.000 claims abstract description 48
238000000034 method Methods 0.000 claims abstract description 19
150000001875 compounds Chemical class 0.000 claims abstract description 9
230000005855 radiation Effects 0.000 claims abstract description 9
229910052782 aluminium Inorganic materials 0.000 claims description 10
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 10
PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims description 7
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
229910052751 metal Inorganic materials 0.000 claims description 4
239000002184 metal Substances 0.000 claims description 4
239000000203 mixture Substances 0.000 claims description 4
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
229910052802 copper Inorganic materials 0.000 claims description 3
239000010949 copper Substances 0.000 claims description 3
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
229910052737 gold Inorganic materials 0.000 claims description 3
239000010931 gold Substances 0.000 claims description 3
229910052759 nickel Inorganic materials 0.000 claims description 3
239000000126 substance Substances 0.000 claims description 3
PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 2
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 2
VZPPHXVFMVZRTE-UHFFFAOYSA-N [Kr]F Chemical compound [Kr]F VZPPHXVFMVZRTE-UHFFFAOYSA-N 0.000 claims description 2
229910052725 zinc Inorganic materials 0.000 claims description 2
239000011701 zinc Substances 0.000 claims description 2
229910010293 ceramic material Inorganic materials 0.000 claims 1
238000001465 metallisation Methods 0.000 claims 1
238000004544 sputter deposition Methods 0.000 claims 1
238000007740 vapor deposition Methods 0.000 claims 1
230000001678 irradiating effect Effects 0.000 abstract description 8
239000011248 coating agent Substances 0.000 abstract description 7
230000003014 reinforcing effect Effects 0.000 abstract description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
239000007789 gas Substances 0.000 description 6
229910052757 nitrogen Inorganic materials 0.000 description 5
229910052581 Si3N4 Inorganic materials 0.000 description 3
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
239000000956 alloy Substances 0.000 description 2
229910045601 alloy Inorganic materials 0.000 description 2
239000000919 ceramic Substances 0.000 description 2
239000004020 conductor Substances 0.000 description 2
229910052756 noble gas Inorganic materials 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
238000002230 thermal chemical vapour deposition Methods 0.000 description 2
229910052724 xenon Inorganic materials 0.000 description 2
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 2
-1 AlN compound Chemical class 0.000 description 1
ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
QLJCFNUYUJEXET-UHFFFAOYSA-K aluminum;trinitrite Chemical compound [Al+3].[O-]N=O.[O-]N=O.[O-]N=O QLJCFNUYUJEXET-UHFFFAOYSA-K 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
ISQINHMJILFLAQ-UHFFFAOYSA-N argon hydrofluoride Chemical compound F.[Ar] ISQINHMJILFLAQ-UHFFFAOYSA-N 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000003054 catalyst Substances 0.000 description 1
239000000460 chlorine Substances 0.000 description 1
229910052801 chlorine Inorganic materials 0.000 description 1
238000010276 construction Methods 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
229910052743 krypton Inorganic materials 0.000 description 1
238000005121 nitriding Methods 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/0036—Laser treatment
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/4505—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application
- C04B41/455—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application the coating or impregnating process including a chemical conversion or reaction
- C04B41/4556—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements characterised by the method of application the coating or impregnating process including a chemical conversion or reaction coating or impregnating with a product reacting with the substrate, e.g. generating a metal coating by surface reduction of a ceramic substrate
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/5093—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials with elements other than metals or carbon
- C04B41/5096—Silicon
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/515—Other specific metals
- C04B41/5155—Aluminium
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/52—Multiple coating or impregnating multiple coating or impregnating with the same composition or with compositions only differing in the concentration of the constituents, is classified as single coating or impregnation
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/89—Coating or impregnation for obtaining at least two superposed coatings having different compositions
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C26/00—Coating not provided for in groups C23C2/00 - C23C24/00
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/105—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by conversion of non-conductive material on or in the support into conductive material, e.g. by using an energy beam
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Ceramic Engineering (AREA)
Materials Engineering (AREA)
Organic Chemistry (AREA)
Structural Engineering (AREA)
Inorganic Chemistry (AREA)
Chemical Kinetics & Catalysis (AREA)
Metallurgy (AREA)
Mechanical Engineering (AREA)
Manufacturing & Machinery (AREA)
Microelectronics & Electronic Packaging (AREA)
General Chemical & Material Sciences (AREA)
Optics & Photonics (AREA)
Physics & Mathematics (AREA)
Chemical Vapour Deposition (AREA)
Chemically Coating (AREA)
Manufacturing Of Printed Wiring (AREA)
Other Surface Treatments For Metallic Materials (AREA)
Physical Vapour Deposition (AREA)

CA 2048669 1989-12-22 1990-12-20 Procede de revetement Abandoned CA2048669A1 (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE19893942472 DE3942472A1 (de)	1989-12-22	1989-12-22	Beschichtungsverfahren
DEP3942472.3		1989-12-22

Publications (1)

Publication Number	Publication Date
CA2048669A1 true CA2048669A1 (fr)	1991-06-23

Family

ID=6396137

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA 2048669 Abandoned CA2048669A1 (fr)	1989-12-22	1990-12-20	Procede de revetement

Country Status (4)

Country	Link
JP (1)	JPH04505481A (fr)
CA (1)	CA2048669A1 (fr)
DE (1)	DE3942472A1 (fr)
WO (1)	WO1991009984A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0501278B1 (fr) *	1991-02-28	1998-09-30	Texas Instruments Incorporated	Procédé de fabrication d'un masque
DE4141365A1 (de) *	1991-12-14	1993-06-17	Mathias Dr Herrmann	Siliziumnitridsinterkoerper mit modifizierter oberflaeche und verfahren zur herstellung dieser modifizierten oberflaeche
TW260806B (fr) *	1993-11-26	1995-10-21	Ushio Electric Inc
DE4342258A1 (de) *	1993-12-10	1995-06-14	Resma Gmbh	Verfahren zur Erzeugung elektrisch leitender Bereiche an keramischen Werkstücken
DE4401612A1 (de) *	1994-01-20	1995-07-27	Resma Gmbh	Verfahren und Vorrichtung zur Erzeugung elektrisch leitender Bereiche auf Metallverbindungen enthaltenden isolierenden Keramikwerkstücken
US5460693A (en) *	1994-05-31	1995-10-24	Texas Instruments Incorporated	Dry microlithography process
DE10137763C2 (de) *	2001-08-02	2003-08-14	Siemens Ag	Verfahren zur Oberflächenvorbehandlung einer zu beschichtenden Oberfläche eines Substrates mit einem Beschichtungsmaterial
DE102006017630A1 (de) *	2006-04-12	2007-10-18	Lpkf Laser & Electronics Ag	Verfahren zur Herstellung einer Leiterbahnstruktur sowie eine derart hergestellte Leiterbahnstruktur
EP1845170A3 (fr) *	2006-04-12	2007-11-21	LPKF Laser & Electronics AG	Procédé de fabrication d'une structure conductrice tout comme structure conductrice ainsi fabriquée
TWI613177B (zh) *	2011-11-16	2018-02-01	製陶技術股份有限公司	製造一基材的方法
DE102017223646A1 (de)	2017-12-22	2019-06-27	Robert Bosch Gmbh	Verfahren zur Herstellung einer Schaltungsträgeranordnung und Schaltungsträgeranordnung
DE102017223648A1 (de)	2017-12-22	2019-06-27	Robert Bosch Gmbh	Verfahren zur Ausbildung von Leiterbahnen aus Aluminium durch Umwandlung von Aluminiumnitrid in Aluminium und Schaltungsträgeranordnung mit Leiterbahnen aus Aluminium auf einem Trägersubstrat
DE102017223647A1 (de)	2017-12-22	2019-06-27	Robert Bosch Gmbh	Verfahren zur Herstellung eines elektronischen Bauteils, elektronisches Bauteil, SMD Bauelement und Schaltungsträgeranordnung

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3256109A (en) *	1962-12-20	1966-06-14	Berger Carl	Metal formation within a substrate
US3390012A (en) *	1964-05-14	1968-06-25	Texas Instruments Inc	Method of making dielectric bodies having conducting portions
JPS60253207A (ja) *	1984-05-30	1985-12-13	株式会社東芝	コンデンサの製造方法
US4547432A (en) *	1984-07-31	1985-10-15	The United States Of America As Represented By The United States Department Of Energy	Method of bonding silver to glass and mirrors produced according to this method
JPS62136897A (ja) *	1985-12-11	1987-06-19	株式会社東芝	セラミツク回路基板の製造方法
US4691091A (en) *	1985-12-31	1987-09-01	At&T Technologies	Direct writing of conductive patterns
CH670171A5 (fr) *	1986-07-22	1989-05-12	Bbc Brown Boveri & Cie
JPH02501253A (ja) *	1987-09-14	1990-04-26	ヒューズ・エアクラフト・カンパニー	解離された窒化アルミニウムセラミックによる誘起金属化処理
GB2217349B (en) *	1988-03-29	1992-06-24	Univ Hull	Vapour deposited self-sealing ceramic coatings
US4933206A (en) *	1988-08-17	1990-06-12	Intel Corporation	UV-vis characteristic writing in silicon nitride and oxynitride films

1989
- 1989-12-22 DE DE19893942472 patent/DE3942472A1/de not_active Withdrawn
1990
- 1990-12-20 CA CA 2048669 patent/CA2048669A1/fr not_active Abandoned
- 1990-12-20 JP JP3502065A patent/JPH04505481A/ja active Pending
- 1990-12-20 WO PCT/EP1990/002270 patent/WO1991009984A1/fr not_active Ceased

Also Published As

Publication number	Publication date
WO1991009984A1 (fr)	1991-07-11
DE3942472A1 (de)	1991-06-27
JPH04505481A (ja)	1992-09-24

Legal Events

Date	Code	Title	Description
1994-06-20	FZDE	Dead

Publication	Publication Date	Title
US5080455A (en)	1992-01-14	Ion beam sputter processing
US5250329A (en)	1993-10-05	Method of depositing conductive lines on a dielectric
JP2948915B2 (ja)	1999-09-13	通路をメッキするレーザ法
US4898650A (en)	1990-02-06	Laser cleaning of metal stock
EP0149779B1 (fr)	1989-03-08	Décapage chimique de métaux induit par lasers eximères
US5666722A (en)	1997-09-16	Method of manufacturing printed circuit boards
US4622095A (en)	1986-11-11	Laser stimulated halogen gas etching of metal substrates
US4900581A (en)	1990-02-13	Method for producing metal films
US5246885A (en)	1993-09-21	Deposition method for high aspect ratio features using photoablation
US4904498A (en)	1990-02-27	Method for controlling an oxide layer metallic substrates by laser
US4832798A (en)	1989-05-23	Method and apparatus for plating composite
US5127998A (en)	1992-07-07	Area-selective metallization process
KR20000035640A (ko)	2000-06-26	반도체 구조물에서의 저온 구리 리플로우를 개선하기 위한구조물 및 방법
US4647476A (en)	1987-03-03	Insulating glass body with electrical feedthroughs and method of preparation
KR20050004026A (ko)	2005-01-12	세라믹의 금속화
US5225251A (en)	1993-07-06	Method for forming layers by UV radiation of aluminum nitride
EP0227371B1 (fr)	1992-04-01	Substrats céramiques et méthodes de leur production
US5316803A (en)	1994-05-31	Method for forming electrical interconnections in laminated vias
JPH04505481A (ja)	1992-09-24	被覆方法
US5066611A (en)	1991-11-19	Method for improving step coverage of a metallization layer on an integrated circuit by use of molybdenum as an anti-reflective coating
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