CA2472478A1 - Procede de nettoyage d'un article - Google Patents

Procede de nettoyage d'un article Download PDF

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Publication number
CA2472478A1
CA2472478A1 CA002472478A CA2472478A CA2472478A1 CA 2472478 A1 CA2472478 A1 CA 2472478A1 CA 002472478 A CA002472478 A CA 002472478A CA 2472478 A CA2472478 A CA 2472478A CA 2472478 A1 CA2472478 A1 CA 2472478A1
Authority
CA
Canada
Prior art keywords
fluid
carbon dioxide
pressure
article
solvent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002472478A
Other languages
English (en)
Inventor
John Frederic Billingham
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Praxair Technology Inc
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2472478A1 publication Critical patent/CA2472478A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0021—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by liquid gases or supercritical fluids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/08—Acids
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/28—Organic compounds containing halogen
    • C11D7/30—Halogenated hydrocarbons
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

L'invention concerne un procédé de nettoyage d'un article, consistant à mettre l'article en contact avec un fluide solvant renfermant du dioxyde de carbone pour dissoudre les contaminants de l'article dans le solvant, puis à déplacer le fluide solvant avec un fluide de déplacement autre que le dioxyde de carbone. Dans un aspect de l'invention, le fluide de déplacement est à une température et à une pression suffisantes pour éviter la formation d'une seconde phase dans le fluide solvant déplacé, au moins une partie du dioxyde de carbone étant recyclée vers l'article. Dans un autre aspect de l'invention, le procédé consiste à réduire la pression du fluide solvant avant qu'il ne soit déplacé à l'aide du gaz de déplacement.
CA002472478A 2002-01-07 2003-01-07 Procede de nettoyage d'un article Abandoned CA2472478A1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US34650702P 2002-01-07 2002-01-07
US60/346,507 2002-01-07
PCT/US2003/000529 WO2003057377A1 (fr) 2002-01-07 2003-01-07 Procede de nettoyage d'un article

Publications (1)

Publication Number Publication Date
CA2472478A1 true CA2472478A1 (fr) 2003-07-17

Family

ID=23359727

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002472478A Abandoned CA2472478A1 (fr) 2002-01-07 2003-01-07 Procede de nettoyage d'un article

Country Status (8)

Country Link
EP (1) EP1472017A4 (fr)
JP (1) JP2005515619A (fr)
KR (1) KR20040073548A (fr)
CN (1) CN1741863A (fr)
AU (1) AU2003235748A1 (fr)
CA (1) CA2472478A1 (fr)
TW (1) TWI291200B (fr)
WO (1) WO2003057377A1 (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6905555B2 (en) * 2001-02-15 2005-06-14 Micell Technologies, Inc. Methods for transferring supercritical fluids in microelectronic and other industrial processes
JP2004363404A (ja) * 2003-06-05 2004-12-24 Nippon Telegr & Teleph Corp <Ntt> 超臨界乾燥方法
DE102004029077B4 (de) * 2003-06-26 2010-07-22 Samsung Electronics Co., Ltd., Suwon Vorrichtung und Verfahren zur Entfernung eines Photoresists von einem Substrat
US20050288485A1 (en) * 2004-06-24 2005-12-29 Mahl Jerry M Method and apparatus for pretreatment of polymeric materials utilized in carbon dioxide purification, delivery and storage systems
JP5521193B2 (ja) * 2010-01-20 2014-06-11 学校法人千葉工業大学 気体化石燃料から水素を抽出する方法
US8551257B2 (en) 2010-08-06 2013-10-08 Empire Technology Development Llc Supercritical noble gases and cleaning methods
KR101395225B1 (ko) * 2010-11-25 2014-05-15 세메스 주식회사 기판처리방법
KR101187375B1 (ko) 2011-01-27 2012-10-05 부경대학교 산학협력단 반도체 기판의 실리콘 산화막의 식각방법
US10525416B2 (en) * 2017-05-16 2020-01-07 Tokyo Electron Limited Method of liquid filter wetting
CN108598019A (zh) * 2018-04-17 2018-09-28 德淮半导体有限公司 晶圆清洗设备及其清洗方法
CN111744870A (zh) * 2020-06-24 2020-10-09 中国科学院苏州纳米技术与纳米仿生研究所广东(佛山)研究院 一种半导体器件金锡焊接后的清洗方法
CN114078692B (zh) * 2022-01-07 2024-02-20 浙江大学杭州国际科创中心 一种晶圆清洗方法和晶圆清洗设备
CN114798602B (zh) * 2022-04-26 2024-01-23 四川博腾创达智能科技有限公司 一种颗粒污染物的清洗方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4911761A (en) * 1984-05-21 1990-03-27 Cfm Technologies Research Associates Process and apparatus for drying surfaces
US5267455A (en) * 1992-07-13 1993-12-07 The Clorox Company Liquid/supercritical carbon dioxide dry cleaning system
US5370742A (en) * 1992-07-13 1994-12-06 The Clorox Company Liquid/supercritical cleaning with decreased polymer damage
US5556479A (en) * 1994-07-15 1996-09-17 Verteq, Inc. Method and apparatus for drying semiconductor wafers
DE69610652T2 (de) * 1995-01-26 2001-05-10 Texas Instruments Inc., Dallas Verfahren zur Entfernung von Oberflächenkontamination
US5783082A (en) * 1995-11-03 1998-07-21 University Of North Carolina Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
US5868862A (en) * 1996-08-01 1999-02-09 Texas Instruments Incorporated Method of removing inorganic contamination by chemical alteration and extraction in a supercritical fluid media
US6306564B1 (en) * 1997-05-27 2001-10-23 Tokyo Electron Limited Removal of resist or residue from semiconductors using supercritical carbon dioxide
ATE420239T1 (de) * 1997-05-30 2009-01-15 Micell Integrated Systems Inc Oberflächebehandlung
US6454869B1 (en) * 2001-06-27 2002-09-24 International Business Machines Corporation Process of cleaning semiconductor processing, handling and manufacturing equipment

Also Published As

Publication number Publication date
JP2005515619A (ja) 2005-05-26
KR20040073548A (ko) 2004-08-19
AU2003235748A1 (en) 2003-07-24
TWI291200B (en) 2007-12-11
EP1472017A1 (fr) 2004-11-03
TW200412631A (en) 2004-07-16
CN1741863A (zh) 2006-03-01
EP1472017A4 (fr) 2007-03-21
WO2003057377A1 (fr) 2003-07-17

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued