CA3201942A1 - Dispositif electronique multicouche a vide et procede de fabrication - Google Patents

Dispositif electronique multicouche a vide et procede de fabrication

Info

Publication number
CA3201942A1
CA3201942A1 CA3201942A CA3201942A CA3201942A1 CA 3201942 A1 CA3201942 A1 CA 3201942A1 CA 3201942 A CA3201942 A CA 3201942A CA 3201942 A CA3201942 A CA 3201942A CA 3201942 A1 CA3201942 A1 CA 3201942A1
Authority
CA
Canada
Prior art keywords
magnetic
planar
conductor plate
plate
magnetic conductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CA3201942A
Other languages
English (en)
Inventor
Diana Gamzina DAUGHERTY
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Elve Inc
Original Assignee
Elve Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Elve Inc filed Critical Elve Inc
Publication of CA3201942A1 publication Critical patent/CA3201942A1/fr
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/02Electrodes; Magnetic control means; Screens
    • H01J23/08Focusing arrangements, e.g. for concentrating stream of electrons, for preventing spreading of stream
    • H01J23/083Electrostatic focusing arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/02Electrodes; Magnetic control means; Screens
    • H01J23/08Focusing arrangements, e.g. for concentrating stream of electrons, for preventing spreading of stream
    • H01J23/087Magnetic focusing arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/02Electrodes; Magnetic control means; Screens
    • H01J23/09Electric systems for directing or deflecting the discharge along a desired path, e.g. E-type
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/02Electrodes; Magnetic control means; Screens
    • H01J23/10Magnet systems for directing or deflecting the discharge along a desired path, e.g. a spiral path
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/16Circuit elements, having distributed capacitance and inductance, structurally associated with the tube and interacting with the discharge
    • H01J23/165Manufacturing processes or apparatus therefore
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/58Arrangements for focusing or reflecting ray or beam
    • H01J29/62Electrostatic lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/70Arrangements for deflecting ray or beam
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/18Assembling together the component parts of electrode systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/58Electron beam control inside the vessel
    • H01J2229/581Electron beam control inside the vessel by magnetic means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/58Electron beam control inside the vessel
    • H01J2229/582Electron beam control inside the vessel by electrostatic means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J23/00Details of transit-time tubes of the types covered by group H01J25/00
    • H01J23/02Electrodes; Magnetic control means; Screens
    • H01J23/06Electron or ion guns
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J25/00Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
    • H01J25/34Travelling-wave tubes; Tubes in which a travelling wave is simulated at spaced gaps

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Particle Accelerators (AREA)
  • Electron Beam Exposure (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Measuring Magnetic Variables (AREA)
  • Microwave Amplifiers (AREA)
  • Welding Or Cutting Using Electron Beams (AREA)
  • Laminated Bodies (AREA)
  • Ceramic Products (AREA)

Abstract

La présente invention concerne des dispositifs électroniques à vide (VED) comprenant une pluralité de couches bidimensionnelles de divers matériaux qui sont reliés ensemble pour former simultanément un ou plusieurs VED. Les couches bidimensionnelles de matériaux sont usinées pour inclure des éléments nécessaires au fonctionnement du dispositif de sorte à former des éléments tridimensionnels lorsqu'elles sont assemblées et reliées en une structure tridimensionnelle. Les couches bidimensionnelles sont reliées ensemble en une structure de type sandwich. Le processus de fabrication permet l'incorporation de matériaux métalliques, magnétiques, céramiques et d'autres matériaux requis pour la fabrication de VED tout en maintenant la précision de position requise et de multiples dispositifs par capacité par lots.
CA3201942A 2020-11-15 2021-11-13 Dispositif electronique multicouche a vide et procede de fabrication Pending CA3201942A1 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US202063198817P 2020-11-15 2020-11-15
US63/198,817 2020-11-15
US202063198915P 2020-11-21 2020-11-21
US63/198,915 2020-11-21
PCT/US2021/059277 WO2022104166A1 (fr) 2020-11-15 2021-11-13 Dispositif électronique multicouche à vide et procédé de fabrication

Publications (1)

Publication Number Publication Date
CA3201942A1 true CA3201942A1 (fr) 2022-05-19

Family

ID=81586822

Family Applications (1)

Application Number Title Priority Date Filing Date
CA3201942A Pending CA3201942A1 (fr) 2020-11-15 2021-11-13 Dispositif electronique multicouche a vide et procede de fabrication

Country Status (7)

Country Link
US (6) US11894208B2 (fr)
EP (2) EP4244912A4 (fr)
JP (6) JP7518293B2 (fr)
KR (1) KR20230104691A (fr)
CA (1) CA3201942A1 (fr)
TW (2) TWI836293B (fr)
WO (2) WO2022104168A2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11894208B2 (en) 2020-11-15 2024-02-06 Elve Inc. Multi-layer vacuum electron device and method of manufacture
CN119547176A (zh) 2022-06-12 2025-02-28 艾弗公司 用于真空电子设备中加速组装和改进对准的磁体阵列保持器
US20240372238A1 (en) * 2023-05-07 2024-11-07 Elve Inc. Geometric transformations for radio frequency (rf) performance in layered additive manufacturing of passive and active rf electronics

Family Cites Families (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2845571A (en) 1953-04-17 1958-07-29 Kazan Benjamin Electrostatically focused traveling wave tube
USRE25189E (en) 1953-04-29 1962-06-19 cioffi
US4001630A (en) * 1973-05-21 1977-01-04 Siemens Aktiengesellschaft Selectively damped travelling wave tube
US4409519A (en) * 1981-07-29 1983-10-11 Varian Associates, Inc. TWT Slow-wave structure assembled from three ladder-like slabs
JPS61163536A (ja) 1985-01-11 1986-07-24 Mitsubishi Electric Corp 進行波管
JPH0673280B2 (ja) * 1986-02-07 1994-09-14 株式会社東芝 進行波管の製造方法
JPH0799666B2 (ja) * 1990-07-18 1995-10-25 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 集積真空超小型電子素子の製造方法及びその構造
US5332948A (en) * 1992-05-13 1994-07-26 Litton Systems, Inc. X-z geometry periodic permanent magnet focusing system
US5744910A (en) * 1993-04-02 1998-04-28 Litton Systems, Inc. Periodic permanent magnet focusing system for electron beam
JPH0831304A (ja) * 1994-07-13 1996-02-02 Hitachi Ltd 電子線源及びそれを用いた電子線応用装置と電子装置
JP2787899B2 (ja) * 1995-03-20 1998-08-20 日本電気株式会社 冷陰極およびこれを用いた電子銃とマイクロ波管
JPH08339773A (ja) * 1995-06-09 1996-12-24 Hitachi Ltd 電子源及び電子線装置
GB2313703B (en) 1996-06-01 2001-03-21 Ibm Current sensing in vacuum electron devices
JP2891196B2 (ja) * 1996-08-30 1999-05-17 日本電気株式会社 冷陰極電子銃およびこれを用いた電子ビーム装置
US5848925A (en) 1996-12-26 1998-12-15 Motorola Inc. Method for fabricating an array of edge electron emitters
US6593695B2 (en) * 1999-01-14 2003-07-15 Northrop Grumman Corp. Broadband, inverted slot mode, coupled cavity circuit
US6538367B1 (en) * 1999-07-15 2003-03-25 Agere Systems Inc. Field emitting device comprising field-concentrating nanoconductor assembly and method for making the same
US6664734B1 (en) 1999-12-17 2003-12-16 The United States Of America As Represented By The Secretary Of The Army Traveling-wave tube with a slow-wave circuit on a photonic band gap crystal structures
JP2002270115A (ja) 2001-03-09 2002-09-20 Hitachi Ltd カラー陰極線管装置
US6747412B2 (en) 2001-05-11 2004-06-08 Bernard K. Vancil Traveling wave tube and method of manufacture
KR20040030838A (ko) 2001-07-25 2004-04-09 코닌클리즈케 필립스 일렉트로닉스 엔.브이. 증폭기를 포함하는 전자 회로
US7037370B2 (en) 2003-02-06 2006-05-02 Mearini Gerald T Free-standing diamond structures and methods
US7279686B2 (en) * 2003-07-08 2007-10-09 Biomed Solutions, Llc Integrated sub-nanometer-scale electron beam systems
US7116051B2 (en) 2003-07-16 2006-10-03 Vancil Bernard K Multibeam klystron
US7315126B2 (en) * 2004-11-04 2008-01-01 L-3 Communications Corporation Folded waveguide traveling wave tube having polepiece-cavity coupled-cavity circuit
EP1898476B1 (fr) * 2005-06-15 2014-11-19 Kyocera Corporation Élément piézoélectrique multicouche et éjecteur utilisant ce dernier
WO2008008504A2 (fr) 2006-07-13 2008-01-17 Manhattan Technologies, Llc Appareil et procédé pour produire des oscillations électromagnétiques
AU2008239489A1 (en) 2007-02-21 2008-10-23 Manhattan Technologies Ltd. High frequency helical amplifier and oscillator
GB2448730A (en) 2007-04-25 2008-10-29 Innos Ltd Fabrication of Planar Electronic Circuit Devices
FR2925217B1 (fr) 2007-12-14 2013-05-24 Thales Sa Structure hyperfrequences pour tube microondes avec dispositif de confinement du faisceau a aimants permanents et refroidissement ameliore
WO2009123593A1 (fr) 2008-04-03 2009-10-08 Patrick Ferguson Canon à électrons à faisceau creux destiné à être utilisé dans un klystron
US8723113B2 (en) 2008-05-30 2014-05-13 The State of Oregon Acting by and through the State Board of Higher Education of behalf of Oregon State University Radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers
JP5675596B2 (ja) 2008-06-05 2015-02-25 イノシス,インコーポレーテッド 結合空洞進行波管
US8648533B2 (en) 2009-09-16 2014-02-11 L-3 Communications Corporation Overmoded cavity bounded by first and second grids for providing electron beam/RF signal interaction that is transversely distributed across the cavity
US8547006B1 (en) * 2010-02-12 2013-10-01 Calabazas Creek Research, Inc. Electron gun for a multiple beam klystron with magnetic compression of the electron beams
EP2546385A4 (fr) 2010-03-09 2013-08-07 Emd Corp Dispositif de pulvérisation
JP5386636B2 (ja) 2010-05-06 2014-01-15 株式会社日立ハイテクノロジーズ 走査電子顕微鏡及び試料観察方法
US8786284B2 (en) * 2011-01-11 2014-07-22 Bridge12 Technologies, Inc. Integrated high-frequency generator system utilizing the magnetic field of the target application
US8766541B1 (en) 2011-09-26 2014-07-01 The United States Of America As Represented By The Secretary Of The Air Force Nonlinear transmission line modulated electron beam emission
US9000394B2 (en) 2011-12-20 2015-04-07 Hermes Microvision, Inc. Multi-axis magnetic lens for focusing a plurality of charged particle beams
US8723137B1 (en) 2012-10-17 2014-05-13 Innosys, Inc Hybrid magnet for vacuum electronic device
JP6095338B2 (ja) * 2012-11-28 2017-03-15 株式会社日立製作所 電子銃および荷電粒子線装置
JP6139944B2 (ja) 2013-04-01 2017-05-31 株式会社日本触媒 フルオロスルホニルイミドのアルカリ金属塩の製造方法
ITMI20130897A1 (it) * 2013-05-31 2014-12-01 St Microelectronics Srl Dispositivo microelettronico a vuoto integrato e relativo metodo di fabbricazione.
US9105440B2 (en) 2013-08-30 2015-08-11 Hermes Microvision, Inc. Apparatus of plural charged particle beams with multi-axis magnetic lens
US10062538B2 (en) 2014-10-07 2018-08-28 Nanyang Technological University Electron device and method for manufacturing an electron device
WO2016130580A1 (fr) 2015-02-10 2016-08-18 The Regents Of The University Of California Procédé de fabrication de poudre nanocomposite de scandate de tungstène pour cathodes
US9731445B2 (en) 2015-08-20 2017-08-15 The Boeing Company Additive manufacturing systems and methods for magnetic materials
US9819320B1 (en) * 2016-04-21 2017-11-14 The Government Of The United States Of America As Represented By The Secretary Of The Air Force Coaxial amplifier device
US11373834B2 (en) * 2016-07-22 2022-06-28 Devesh S. BHOSALE Apparatus for generating electromagnetic waves
US10395880B2 (en) * 2017-08-21 2019-08-27 Varex Imaging Corporation Electron gun adjustment in a vacuum
US10573483B2 (en) 2017-09-01 2020-02-25 Varex Imaging Corporation Multi-grid electron gun with single grid supply
US10903035B2 (en) 2018-03-12 2021-01-26 Wisconsin Alumni Research Foundation High-frequency vacuum electronic device
CN108682605B (zh) 2018-05-21 2020-01-31 中国工程物理研究院应用电子学研究所 一种耦合两腔高功率微波发生器及使用方法
CN109273337B (zh) 2018-11-12 2023-11-10 北京大学 一种片上微型x射线源及其制造方法
US11894208B2 (en) * 2020-11-15 2024-02-06 Elve Inc. Multi-layer vacuum electron device and method of manufacture

Also Published As

Publication number Publication date
US20250182994A1 (en) 2025-06-05
JP7588266B2 (ja) 2024-11-21
US20240242916A1 (en) 2024-07-18
TW202236719A (zh) 2022-09-16
WO2022104166A1 (fr) 2022-05-19
EP4244880A4 (fr) 2024-12-11
US11894208B2 (en) 2024-02-06
US20220157549A1 (en) 2022-05-19
JP2023549863A (ja) 2023-11-29
JP2023549866A (ja) 2023-11-29
JP7794930B2 (ja) 2026-01-06
EP4244880A2 (fr) 2023-09-20
US20220157550A1 (en) 2022-05-19
JP7796845B2 (ja) 2026-01-09
TWI829034B (zh) 2024-01-11
JP2024138352A (ja) 2024-10-08
TWI836293B (zh) 2024-03-21
US12463000B2 (en) 2025-11-04
KR20230104691A (ko) 2023-07-10
JP7518293B2 (ja) 2024-07-17
EP4244912A4 (fr) 2025-06-18
JP2025024058A (ja) 2025-02-19
JP7587039B2 (ja) 2024-11-19
JP2026053465A (ja) 2026-03-25
US12217926B2 (en) 2025-02-04
TW202236341A (zh) 2022-09-16
US20240258061A1 (en) 2024-08-01
US11961693B2 (en) 2024-04-16
EP4244912A1 (fr) 2023-09-20
WO2022104168A3 (fr) 2022-06-23
US20260038760A1 (en) 2026-02-05
JP2025024029A (ja) 2025-02-19
WO2022104168A2 (fr) 2022-05-19

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