CA3201942A1 - Dispositif electronique multicouche a vide et procede de fabrication - Google Patents
Dispositif electronique multicouche a vide et procede de fabricationInfo
- Publication number
- CA3201942A1 CA3201942A1 CA3201942A CA3201942A CA3201942A1 CA 3201942 A1 CA3201942 A1 CA 3201942A1 CA 3201942 A CA3201942 A CA 3201942A CA 3201942 A CA3201942 A CA 3201942A CA 3201942 A1 CA3201942 A1 CA 3201942A1
- Authority
- CA
- Canada
- Prior art keywords
- magnetic
- planar
- conductor plate
- plate
- magnetic conductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/08—Focusing arrangements, e.g. for concentrating stream of electrons, for preventing spreading of stream
- H01J23/083—Electrostatic focusing arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/08—Focusing arrangements, e.g. for concentrating stream of electrons, for preventing spreading of stream
- H01J23/087—Magnetic focusing arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/09—Electric systems for directing or deflecting the discharge along a desired path, e.g. E-type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/10—Magnet systems for directing or deflecting the discharge along a desired path, e.g. a spiral path
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/16—Circuit elements, having distributed capacitance and inductance, structurally associated with the tube and interacting with the discharge
- H01J23/165—Manufacturing processes or apparatus therefore
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/58—Arrangements for focusing or reflecting ray or beam
- H01J29/62—Electrostatic lenses
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/70—Arrangements for deflecting ray or beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/18—Assembling together the component parts of electrode systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/58—Electron beam control inside the vessel
- H01J2229/581—Electron beam control inside the vessel by magnetic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/58—Electron beam control inside the vessel
- H01J2229/582—Electron beam control inside the vessel by electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J23/00—Details of transit-time tubes of the types covered by group H01J25/00
- H01J23/02—Electrodes; Magnetic control means; Screens
- H01J23/06—Electron or ion guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J25/00—Transit-time tubes, e.g. klystrons, travelling-wave tubes, magnetrons
- H01J25/34—Travelling-wave tubes; Tubes in which a travelling wave is simulated at spaced gaps
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Accelerators (AREA)
- Electron Beam Exposure (AREA)
- Electron Sources, Ion Sources (AREA)
- Measuring Magnetic Variables (AREA)
- Microwave Amplifiers (AREA)
- Welding Or Cutting Using Electron Beams (AREA)
- Laminated Bodies (AREA)
- Ceramic Products (AREA)
Abstract
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US202063198817P | 2020-11-15 | 2020-11-15 | |
| US63/198,817 | 2020-11-15 | ||
| US202063198915P | 2020-11-21 | 2020-11-21 | |
| US63/198,915 | 2020-11-21 | ||
| PCT/US2021/059277 WO2022104166A1 (fr) | 2020-11-15 | 2021-11-13 | Dispositif électronique multicouche à vide et procédé de fabrication |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA3201942A1 true CA3201942A1 (fr) | 2022-05-19 |
Family
ID=81586822
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA3201942A Pending CA3201942A1 (fr) | 2020-11-15 | 2021-11-13 | Dispositif electronique multicouche a vide et procede de fabrication |
Country Status (7)
| Country | Link |
|---|---|
| US (6) | US11894208B2 (fr) |
| EP (2) | EP4244912A4 (fr) |
| JP (6) | JP7518293B2 (fr) |
| KR (1) | KR20230104691A (fr) |
| CA (1) | CA3201942A1 (fr) |
| TW (2) | TWI836293B (fr) |
| WO (2) | WO2022104168A2 (fr) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11894208B2 (en) | 2020-11-15 | 2024-02-06 | Elve Inc. | Multi-layer vacuum electron device and method of manufacture |
| CN119547176A (zh) | 2022-06-12 | 2025-02-28 | 艾弗公司 | 用于真空电子设备中加速组装和改进对准的磁体阵列保持器 |
| US20240372238A1 (en) * | 2023-05-07 | 2024-11-07 | Elve Inc. | Geometric transformations for radio frequency (rf) performance in layered additive manufacturing of passive and active rf electronics |
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| US2845571A (en) | 1953-04-17 | 1958-07-29 | Kazan Benjamin | Electrostatically focused traveling wave tube |
| USRE25189E (en) | 1953-04-29 | 1962-06-19 | cioffi | |
| US4001630A (en) * | 1973-05-21 | 1977-01-04 | Siemens Aktiengesellschaft | Selectively damped travelling wave tube |
| US4409519A (en) * | 1981-07-29 | 1983-10-11 | Varian Associates, Inc. | TWT Slow-wave structure assembled from three ladder-like slabs |
| JPS61163536A (ja) | 1985-01-11 | 1986-07-24 | Mitsubishi Electric Corp | 進行波管 |
| JPH0673280B2 (ja) * | 1986-02-07 | 1994-09-14 | 株式会社東芝 | 進行波管の製造方法 |
| JPH0799666B2 (ja) * | 1990-07-18 | 1995-10-25 | インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン | 集積真空超小型電子素子の製造方法及びその構造 |
| US5332948A (en) * | 1992-05-13 | 1994-07-26 | Litton Systems, Inc. | X-z geometry periodic permanent magnet focusing system |
| US5744910A (en) * | 1993-04-02 | 1998-04-28 | Litton Systems, Inc. | Periodic permanent magnet focusing system for electron beam |
| JPH0831304A (ja) * | 1994-07-13 | 1996-02-02 | Hitachi Ltd | 電子線源及びそれを用いた電子線応用装置と電子装置 |
| JP2787899B2 (ja) * | 1995-03-20 | 1998-08-20 | 日本電気株式会社 | 冷陰極およびこれを用いた電子銃とマイクロ波管 |
| JPH08339773A (ja) * | 1995-06-09 | 1996-12-24 | Hitachi Ltd | 電子源及び電子線装置 |
| GB2313703B (en) | 1996-06-01 | 2001-03-21 | Ibm | Current sensing in vacuum electron devices |
| JP2891196B2 (ja) * | 1996-08-30 | 1999-05-17 | 日本電気株式会社 | 冷陰極電子銃およびこれを用いた電子ビーム装置 |
| US5848925A (en) | 1996-12-26 | 1998-12-15 | Motorola Inc. | Method for fabricating an array of edge electron emitters |
| US6593695B2 (en) * | 1999-01-14 | 2003-07-15 | Northrop Grumman Corp. | Broadband, inverted slot mode, coupled cavity circuit |
| US6538367B1 (en) * | 1999-07-15 | 2003-03-25 | Agere Systems Inc. | Field emitting device comprising field-concentrating nanoconductor assembly and method for making the same |
| US6664734B1 (en) | 1999-12-17 | 2003-12-16 | The United States Of America As Represented By The Secretary Of The Army | Traveling-wave tube with a slow-wave circuit on a photonic band gap crystal structures |
| JP2002270115A (ja) | 2001-03-09 | 2002-09-20 | Hitachi Ltd | カラー陰極線管装置 |
| US6747412B2 (en) | 2001-05-11 | 2004-06-08 | Bernard K. Vancil | Traveling wave tube and method of manufacture |
| KR20040030838A (ko) | 2001-07-25 | 2004-04-09 | 코닌클리즈케 필립스 일렉트로닉스 엔.브이. | 증폭기를 포함하는 전자 회로 |
| US7037370B2 (en) | 2003-02-06 | 2006-05-02 | Mearini Gerald T | Free-standing diamond structures and methods |
| US7279686B2 (en) * | 2003-07-08 | 2007-10-09 | Biomed Solutions, Llc | Integrated sub-nanometer-scale electron beam systems |
| US7116051B2 (en) | 2003-07-16 | 2006-10-03 | Vancil Bernard K | Multibeam klystron |
| US7315126B2 (en) * | 2004-11-04 | 2008-01-01 | L-3 Communications Corporation | Folded waveguide traveling wave tube having polepiece-cavity coupled-cavity circuit |
| EP1898476B1 (fr) * | 2005-06-15 | 2014-11-19 | Kyocera Corporation | Élément piézoélectrique multicouche et éjecteur utilisant ce dernier |
| WO2008008504A2 (fr) | 2006-07-13 | 2008-01-17 | Manhattan Technologies, Llc | Appareil et procédé pour produire des oscillations électromagnétiques |
| AU2008239489A1 (en) | 2007-02-21 | 2008-10-23 | Manhattan Technologies Ltd. | High frequency helical amplifier and oscillator |
| GB2448730A (en) | 2007-04-25 | 2008-10-29 | Innos Ltd | Fabrication of Planar Electronic Circuit Devices |
| FR2925217B1 (fr) | 2007-12-14 | 2013-05-24 | Thales Sa | Structure hyperfrequences pour tube microondes avec dispositif de confinement du faisceau a aimants permanents et refroidissement ameliore |
| WO2009123593A1 (fr) | 2008-04-03 | 2009-10-08 | Patrick Ferguson | Canon à électrons à faisceau creux destiné à être utilisé dans un klystron |
| US8723113B2 (en) | 2008-05-30 | 2014-05-13 | The State of Oregon Acting by and through the State Board of Higher Education of behalf of Oregon State University | Radio-frequency-free hybrid electrostatic/magnetostatic cell for transporting, trapping, and dissociating ions in mass spectrometers |
| JP5675596B2 (ja) | 2008-06-05 | 2015-02-25 | イノシス,インコーポレーテッド | 結合空洞進行波管 |
| US8648533B2 (en) | 2009-09-16 | 2014-02-11 | L-3 Communications Corporation | Overmoded cavity bounded by first and second grids for providing electron beam/RF signal interaction that is transversely distributed across the cavity |
| US8547006B1 (en) * | 2010-02-12 | 2013-10-01 | Calabazas Creek Research, Inc. | Electron gun for a multiple beam klystron with magnetic compression of the electron beams |
| EP2546385A4 (fr) | 2010-03-09 | 2013-08-07 | Emd Corp | Dispositif de pulvérisation |
| JP5386636B2 (ja) | 2010-05-06 | 2014-01-15 | 株式会社日立ハイテクノロジーズ | 走査電子顕微鏡及び試料観察方法 |
| US8786284B2 (en) * | 2011-01-11 | 2014-07-22 | Bridge12 Technologies, Inc. | Integrated high-frequency generator system utilizing the magnetic field of the target application |
| US8766541B1 (en) | 2011-09-26 | 2014-07-01 | The United States Of America As Represented By The Secretary Of The Air Force | Nonlinear transmission line modulated electron beam emission |
| US9000394B2 (en) | 2011-12-20 | 2015-04-07 | Hermes Microvision, Inc. | Multi-axis magnetic lens for focusing a plurality of charged particle beams |
| US8723137B1 (en) | 2012-10-17 | 2014-05-13 | Innosys, Inc | Hybrid magnet for vacuum electronic device |
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| ITMI20130897A1 (it) * | 2013-05-31 | 2014-12-01 | St Microelectronics Srl | Dispositivo microelettronico a vuoto integrato e relativo metodo di fabbricazione. |
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| US9731445B2 (en) | 2015-08-20 | 2017-08-15 | The Boeing Company | Additive manufacturing systems and methods for magnetic materials |
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| US10395880B2 (en) * | 2017-08-21 | 2019-08-27 | Varex Imaging Corporation | Electron gun adjustment in a vacuum |
| US10573483B2 (en) | 2017-09-01 | 2020-02-25 | Varex Imaging Corporation | Multi-grid electron gun with single grid supply |
| US10903035B2 (en) | 2018-03-12 | 2021-01-26 | Wisconsin Alumni Research Foundation | High-frequency vacuum electronic device |
| CN108682605B (zh) | 2018-05-21 | 2020-01-31 | 中国工程物理研究院应用电子学研究所 | 一种耦合两腔高功率微波发生器及使用方法 |
| CN109273337B (zh) | 2018-11-12 | 2023-11-10 | 北京大学 | 一种片上微型x射线源及其制造方法 |
| US11894208B2 (en) * | 2020-11-15 | 2024-02-06 | Elve Inc. | Multi-layer vacuum electron device and method of manufacture |
-
2021
- 2021-11-12 US US17/525,658 patent/US11894208B2/en active Active
- 2021-11-12 US US17/525,698 patent/US11961693B2/en active Active
- 2021-11-13 WO PCT/US2021/059279 patent/WO2022104168A2/fr not_active Ceased
- 2021-11-13 EP EP21892947.9A patent/EP4244912A4/fr active Pending
- 2021-11-13 CA CA3201942A patent/CA3201942A1/fr active Pending
- 2021-11-13 JP JP2023529014A patent/JP7518293B2/ja active Active
- 2021-11-13 EP EP21892949.5A patent/EP4244880A4/fr active Pending
- 2021-11-13 WO PCT/US2021/059277 patent/WO2022104166A1/fr not_active Ceased
- 2021-11-13 KR KR1020237019324A patent/KR20230104691A/ko active Pending
- 2021-11-13 JP JP2023528965A patent/JP7587039B2/ja active Active
- 2021-11-15 TW TW110142440A patent/TWI836293B/zh active
- 2021-11-15 TW TW110142439A patent/TWI829034B/zh active
-
2024
- 2024-02-05 US US18/433,175 patent/US12217926B2/en active Active
- 2024-02-27 US US18/588,895 patent/US12463000B2/en active Active
- 2024-07-04 JP JP2024107944A patent/JP7588266B2/ja active Active
- 2024-11-07 JP JP2024195090A patent/JP7794930B2/ja active Active
- 2024-11-11 JP JP2024196639A patent/JP7796845B2/ja active Active
-
2025
- 2025-02-03 US US19/044,432 patent/US20250182994A1/en active Pending
- 2025-10-06 US US19/351,197 patent/US20260038760A1/en active Pending
- 2025-12-18 JP JP2025265410A patent/JP2026053465A/ja active Pending
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request |
Effective date: 20230515 |
|
| D15 | Examination report completed |
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