CL2022002604A1 - Método para el tratamiento de un sustrato metálico para la preparación de electrodos - Google Patents

Método para el tratamiento de un sustrato metálico para la preparación de electrodos

Info

Publication number
CL2022002604A1
CL2022002604A1 CL2022002604A CL2022002604A CL2022002604A1 CL 2022002604 A1 CL2022002604 A1 CL 2022002604A1 CL 2022002604 A CL2022002604 A CL 2022002604A CL 2022002604 A CL2022002604 A CL 2022002604A CL 2022002604 A1 CL2022002604 A1 CL 2022002604A1
Authority
CL
Chile
Prior art keywords
metallic substrate
electrodes
preparation
treatment
electrode
Prior art date
Application number
CL2022002604A
Other languages
English (en)
Spanish (es)
Inventor
Calderara Alice
Brichese Marianna
Original Assignee
Industrie De Nora Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Industrie De Nora Spa filed Critical Industrie De Nora Spa
Publication of CL2022002604A1 publication Critical patent/CL2022002604A1/es

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C25B11/03—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form perforated or foraminous
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
    • C25B11/093—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds at least one noble metal or noble metal oxide and at least one non-noble metal oxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/08—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/10—Other heavy metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/02—Hydrogen or oxygen
    • C25B1/04—Hydrogen or oxygen by electrolysis of water
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B1/00—Electrolytic production of inorganic compounds or non-metals
    • C25B1/01—Products
    • C25B1/34—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis
    • C25B1/46—Simultaneous production of alkali metal hydroxides and chlorine, oxyacids or salts of chlorine, e.g. by chlor-alkali electrolysis in diaphragm cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/055—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material
    • C25B11/057—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the substrate or carrier material consisting of a single element or compound
    • C25B11/061—Metal or alloy
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/17—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof
    • C25B9/19—Cells comprising dimensionally-stable non-movable electrodes; Assemblies of constructional parts thereof with diaphragms
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C25D17/12—Shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/02—Etching
    • C25F3/06—Etching of iron or steel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Electrodes For Compound Or Non-Metal Manufacture (AREA)
  • ing And Chemical Polishing (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Electrolytic Production Of Metals (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
CL2022002604A 2020-03-24 2022-09-23 Método para el tratamiento de un sustrato metálico para la preparación de electrodos CL2022002604A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT202000006187 2020-03-24

Publications (1)

Publication Number Publication Date
CL2022002604A1 true CL2022002604A1 (es) 2023-04-21

Family

ID=70918869

Family Applications (1)

Application Number Title Priority Date Filing Date
CL2022002604A CL2022002604A1 (es) 2020-03-24 2022-09-23 Método para el tratamiento de un sustrato metálico para la preparación de electrodos

Country Status (18)

Country Link
US (1) US20230151503A1 (ko)
EP (1) EP4127275B1 (ko)
JP (1) JP2023523690A (ko)
KR (1) KR20220158061A (ko)
CN (1) CN115335556A (ko)
AR (1) AR121638A1 (ko)
AU (1) AU2021243591B2 (ko)
BR (1) BR112022019176A2 (ko)
CA (1) CA3175062A1 (ko)
CL (1) CL2022002604A1 (ko)
ES (1) ES2975497T3 (ko)
IL (1) IL296656B2 (ko)
MX (1) MX2022011840A (ko)
MY (1) MY210102A (ko)
SA (1) SA522440586B1 (ko)
TW (1) TW202206653A (ko)
WO (1) WO2021191241A1 (ko)
ZA (1) ZA202210124B (ko)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114481284A (zh) * 2021-12-28 2022-05-13 清华大学 镍电极及其制备方法和应用
CN114941153A (zh) * 2022-05-31 2022-08-26 中自环保科技股份有限公司 基于质子交换膜的水电解膜电极、制备方法、组件及应用
CN119020815A (zh) * 2024-10-29 2024-11-26 陕西华秦新能源科技有限责任公司 一种电极及其制备方法和应用

Family Cites Families (24)

* Cited by examiner, † Cited by third party
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GB526854A (en) * 1939-03-27 1940-09-26 Battelle Memorial Institute Improvements in or relating to the electrolytic polishing of metal surfaces and an electrolyte therefor
JPS55113887A (en) * 1979-02-27 1980-09-02 Toagosei Chem Ind Co Ltd Production of electrolytic cathode
US5314601A (en) * 1989-06-30 1994-05-24 Eltech Systems Corporation Electrodes of improved service life
JPH08283977A (ja) * 1995-04-14 1996-10-29 Chlorine Eng Corp Ltd 活性陰極およびその製造方法
IT1317969B1 (it) * 2000-06-09 2003-07-21 Nora Elettrodi De Elettrodo caratterizzato da elevata adesione di uno strato cataliticosuperficiale.
WO2004048643A1 (ja) * 2002-11-27 2004-06-10 Asahi Kasei Chemicals Corporation 複極式ゼロギャップ電解セル
WO2008128957A1 (en) * 2007-04-18 2008-10-30 Industrie De Nora S.P.A. Electrodes with mechanically roughened surface for electrochemical applications
US8431698B2 (en) * 2007-08-29 2013-04-30 Biolume Inc. Bioluminescent endoscopy methods and compounds
CN101660194A (zh) * 2009-09-18 2010-03-03 西北有色金属研究院 一种涂层导体用镍钨合金基带的电化学抛光方法
CN102762776B (zh) * 2010-02-10 2015-03-18 培尔梅烈克电极股份有限公司 产氢用活性阴极
JP6183620B2 (ja) * 2012-10-31 2017-08-23 株式会社大阪ソーダ ゼロギャップ式食塩電解槽用陽極、食塩電解槽、及びこれを用いる食塩電解方法
WO2015164730A1 (en) * 2014-04-25 2015-10-29 The George Washington University Process for the production of ammonia from air and water
JP2018024925A (ja) * 2016-08-12 2018-02-15 日立造船株式会社 電極の製造方法
CN106757299B (zh) * 2016-12-15 2019-01-15 上海电气核电设备有限公司 一种镍基合金金相组织的电解抛光腐蚀剂及其使用方法
CN106637377B (zh) * 2016-12-19 2019-03-19 二重（德阳）重型装备有限公司 镍基合金电解抛光液及其抛光方法
CN106521587A (zh) 2016-12-29 2017-03-22 中核北方核燃料元件有限公司 一种不锈钢条带的镀镍方法
DE102017110863B4 (de) * 2017-05-18 2021-02-04 Zentrum für Sonnenenergie- und Wasserstoff-Forschung Baden-Württemberg Nickelelektrode, Verfahren zu deren Herstellung und deren Verwendung
CN108425144B (zh) * 2018-03-23 2020-04-24 陕西师范大学 一种电催化全分解水产氢产氧的喀斯特泡沫镍的制备方法
JP7144251B2 (ja) * 2018-09-10 2022-09-29 田中貴金属工業株式会社 水素発生用電極およびその製造方法
CN109750317B (zh) * 2018-12-26 2020-06-30 浙江工业大学 一种多孔镍基铜铼复合析氢电极的制备方法
CN110205670B (zh) * 2019-07-10 2020-09-08 二重（德阳）重型装备有限公司 缓蚀性镍基合金电解抛光液及其抛光方法
CN110592614B (zh) * 2019-09-27 2021-05-11 西南石油大学 一种三维自支撑性水分解制氢电催化剂及其制备方法
CN110760862A (zh) 2019-11-26 2020-02-07 江东电子材料有限公司 一种光面粗化电解铜箔的生产工艺
US10975482B1 (en) * 2020-02-27 2021-04-13 Haiming Li Self-derivative iron-containing nickel anode for water electrolysis

Also Published As

Publication number Publication date
IL296656A (en) 2022-11-01
MY210102A (en) 2025-08-27
TW202206653A (zh) 2022-02-16
AR121638A1 (es) 2022-06-22
CA3175062A1 (en) 2021-09-30
EP4127275C0 (en) 2024-03-06
EP4127275A1 (en) 2023-02-08
AU2021243591B2 (en) 2026-04-16
JP2023523690A (ja) 2023-06-07
SA522440586B1 (ar) 2025-06-24
AU2021243591A1 (en) 2022-09-29
CN115335556A (zh) 2022-11-11
US20230151503A1 (en) 2023-05-18
ES2975497T3 (es) 2024-07-08
MX2022011840A (es) 2022-10-20
BR112022019176A2 (pt) 2022-11-01
KR20220158061A (ko) 2022-11-29
ZA202210124B (en) 2024-01-31
IL296656B2 (en) 2024-05-01
IL296656B1 (en) 2024-01-01
EP4127275B1 (en) 2024-03-06
WO2021191241A1 (en) 2021-09-30

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